JPS6379948A - Manufacture of mask for vapor deposition - Google Patents
Manufacture of mask for vapor depositionInfo
- Publication number
- JPS6379948A JPS6379948A JP22446786A JP22446786A JPS6379948A JP S6379948 A JPS6379948 A JP S6379948A JP 22446786 A JP22446786 A JP 22446786A JP 22446786 A JP22446786 A JP 22446786A JP S6379948 A JPS6379948 A JP S6379948A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- mask
- yag laser
- laser light
- deposition mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 4
- 230000001678 irradiating effect Effects 0.000 claims abstract description 4
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 4
- 229910052802 copper Inorganic materials 0.000 claims abstract description 3
- 229910000889 permalloy Inorganic materials 0.000 claims abstract description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 3
- 239000010935 stainless steel Substances 0.000 claims abstract description 3
- 239000002184 metal Substances 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 9
- 239000010949 copper Substances 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 238000005553 drilling Methods 0.000 claims 1
- 230000005389 magnetism Effects 0.000 abstract description 2
- 238000003754 machining Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 7
- 238000005530 etching Methods 0.000 description 4
- 239000011651 chromium Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は高い加工精度を有し、かつ、大面積化が容易で
ある蒸着用マスクの製造法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for manufacturing a vapor deposition mask that has high processing accuracy and can easily be made to have a large area.
従来の技術
ここで言う蒸着用マスクとは、基板上の所定の部分のみ
に金属、半導体などから成る蒸着膜を形成する為に用い
る、基板と蒸発源との間に置く平板状のマスクのことで
ある。この蒸着用マスクの製造法として、従来より行わ
れているのは、主にエツチング法である。Conventional technology The evaporation mask referred to here refers to a flat mask placed between the substrate and the evaporation source, which is used to form a evaporated film of metal, semiconductor, etc. only on a predetermined portion of the substrate. It is. The etching method has traditionally been used as a manufacturing method for this vapor deposition mask.
エツチング法は、金属板上に耐食性皮膜をフォトリソグ
ラフィー的な手法で所定のパターンにて形成し、金属板
を腐食させる化学薬品に接触させることにより、耐食性
皮膜のない部分に穴を開ける方法である。片方の面から
腐食させる方法と両面から腐食させる方法とがある。The etching method is a method in which a corrosion-resistant film is formed in a predetermined pattern on a metal plate using a photolithography method, and holes are made in areas where there is no corrosion-resistant film by contacting the metal plate with chemicals that corrode it. . There are two methods: corroding from one side and corroding from both sides.
発明が解決しようとする問題点
基板上に蒸着膜をｌｏＸＩＯμｍ′程度の矩形パターン
で形成したい場合がある。このとき蒸着用マスクとして
は勿論同じ大きさの微細な開口の穴を持ったものが必要
となる。しかしながら、エツチング法では１０μｍのパ
ターンを得るには、基板の厚さを少なくとも１０μｍ以
下にしなければならず、製造工程上および使用する上に
おいて取り扱いが繁雑になる。また、エツチング法では
矩形の開口部の角の部分が直角とならず、その半径が基
板の厚さ程度の円弧状となる。Problems to be Solved by the Invention There are cases where it is desired to form a deposited film on a substrate in a rectangular pattern of about loXIO μm'. At this time, a mask for vapor deposition that has fine openings of the same size is of course required. However, in order to obtain a 10 .mu.m pattern using the etching method, the thickness of the substrate must be at least 10 .mu.m or less, which makes handling difficult in the manufacturing process and in use. Furthermore, in the etching method, the corners of the rectangular opening are not at right angles, but are arcuate with a radius approximately equal to the thickness of the substrate.
問題点を解決するだめの手段
前記問題点を解決するために本発明の蒸着用マスクの製
造法は、金属板にＹＡＧレーザー光を照射して所定の位
置に六開けすることにより得るものである。Means for Solving the Problems In order to solve the above-mentioned problems, the method of manufacturing a vapor deposition mask of the present invention is obtained by irradiating a metal plate with YAG laser light and making six holes at predetermined positions. .
作用
本発明は前記した構成をなすが、金属板にＹＡＧレーザ
ーを照射することによって、所定のパターンに穴開けす
る。ＹＡＧレーザー光はその波長が１．０６μｍであり
１０μｍ程度に集光させるのは容易であるので、この製
法により開口部の加工精度の高いマスクを得ることがで
きる。さらに、マスクの表面に金属膜を形成することに
より強度と、必要によっては磁性を持たせることも可能
である。Function The present invention has the above-described configuration, but holes are made in a predetermined pattern by irradiating a metal plate with a YAG laser. Since the YAG laser beam has a wavelength of 1.06 μm and can be easily focused to about 10 μm, this manufacturing method makes it possible to obtain a mask with high processing accuracy of the opening. Furthermore, by forming a metal film on the surface of the mask, it is possible to impart strength and, if necessary, magnetism.
実施例
以下、本発明の代表的な一実施例について、図面を参照
しながら説明する。EXAMPLE Hereinafter, a typical example of the present invention will be described with reference to the drawings.
実施例１
第１図（ａｌは本発明の実施例の蒸着用マスクの構成断
面図、第１図（ｂｌは平面図を示す図である。第１図（
ａｌにおいて１は金属板、２は金属膜であり、第１図（
ａｌおよび第１図（ｂｌにおいて、３は開口部を示す。Example 1 FIG. 1 (al is a cross-sectional view of the configuration of a vapor deposition mask according to an embodiment of the present invention, FIG. 1 (bl is a plan view). FIG. 1 (
In al, 1 is a metal plate and 2 is a metal film, as shown in Figure 1 (
In al and FIG. 1 (bl), 3 indicates the opening.
マスクの製造工程を第２図（ａ）、 （ｂ）に示す。The mask manufacturing process is shown in FIGS. 2(a) and 2(b).
第２図（ａｌ金属板１にＹＡＧレーザー加工により所望
のパターンの穴を開ける。第２図（ｂｌ金属板１の上に
金属膜３を蒸着形成する。金属板１はニッケル（Ｎｉ）
、アルミニウム（Ａｆｆ）、銅（Ｃｕ）。Figure 2 (A desired pattern of holes is made in the Al metal plate 1 by YAG laser processing. Figure 2 (The metal film 3 is formed by vapor deposition on the BL metal plate 1. The metal plate 1 is made of nickel (Ni).
, aluminum (Aff), copper (Cu).
ステンレス、パーマロイ、チタン（Ｔｉ）等、金属膜２
ばニッケル（Ｎｉ）、クロム（Ｃｒ）、アルミニウム（
Ａｆ）等からそれぞれ形成されている。これらの金属は
薄板化が容易である。最小の穴の形状はレーザー出射端
のスリット形状で決るので矩形も可能である。以上のよ
うな製造法により開口部に加工精度の高い蒸着用マスク
を得ることが可能である。Metal film 2 such as stainless steel, permalloy, titanium (Ti), etc.
Nickel (Ni), chromium (Cr), aluminum (
Af), etc., respectively. These metals can be easily made into thin plates. The shape of the minimum hole is determined by the shape of the slit at the laser emission end, so a rectangular shape is also possible. By the above-described manufacturing method, it is possible to obtain a vapor deposition mask with high processing accuracy in the opening.
実施例１においては金属膜２を蒸着形成したが、スパッ
タリングや電気メソギなどの手法を用いてもよい。また
、勿論この工程を省略してもマスクとして使用できる。In Example 1, the metal film 2 was formed by vapor deposition, but a method such as sputtering or electric method may be used. Of course, it can also be used as a mask even if this step is omitted.
また、金属板１および金属膜２の少なくとも一方が磁性
金属であれば、このマスクを蒸着の際使用するとき、磁
石によって固定することができる。つまり、被蒸着基板
の一方の面にこの蒸着マスクを置き、反対の面に磁石を
置いて基板と蒸着マスクを密着固定することが可能であ
る。Further, if at least one of the metal plate 1 and the metal film 2 is a magnetic metal, the mask can be fixed with a magnet when used for vapor deposition. In other words, it is possible to place this vapor deposition mask on one surface of the substrate to be vapor-deposited and place a magnet on the opposite surface to tightly fix the substrate and the vapor deposition mask.
発明の効果
以上のように本発明の蒸着用マスクの製造法に従い、金
属板をＹＡＧレーザー加工により穴開けして加工精度の
良い開口部を有する蒸着用マスクを得ることができる。Effects of the Invention As described above, according to the method of manufacturing a vapor deposition mask of the present invention, a metal plate can be drilled by YAG laser processing to obtain a vapor deposition mask having openings with high processing accuracy.
この製法により、例えば、面積がｌ０ＸＩＯμＭの開口
部を有する蒸着マスクを得ることが可能である。By this manufacturing method, it is possible to obtain, for example, a vapor deposition mask having an opening with an area of 10×IO μM.
第１図（ａｌは本発明の一実施例１の蒸着用マスクの構
成断面図、第１図ｆｂｌはその平面図、第２図（ａ）。
（ｂｌは本発明による実施例１の蒸着用マスクの製造工
程図である。
■・・・・・・金属板、２・・・・・・金属膜、３・・
・・・・開口部。
代理人の氏名 弁理士 中尾敏男 はか１名第２図
レーサニ）＝
（ｂ） 団コ］■１FIG. 1 (al is a cross-sectional view of the configuration of a vapor deposition mask according to Example 1 of the present invention, FIG. 1 fbl is a plan view thereof, and FIG. 2 (a). It is a manufacturing process diagram of a mask.■...Metal plate, 2...Metal film, 3...
····Aperture. Name of agent: Patent attorney Toshio Nakao, 1 person (Figure 2) = (b) Group] ■1
Claims (3)
に穴あけすることにより得られることを特徴とする蒸着
用マスクの製造法。(1) A method for manufacturing a vapor deposition mask, which is obtained by irradiating a metal plate with YAG laser light and drilling holes at predetermined positions.
る特許請求の範囲第（１）項記載の蒸着用マスクの製造
法。(2) A method for manufacturing a vapor deposition mask according to claim (1), characterized in that a metal film is formed on the vapor deposition mask.
）、銅（Ｃｕ）、ステンレス、パーマロイ、チタン（Ｔ
ｉ）の何れかであることを特徴とする特許請求の範囲第
（１）項または第（２）項のいずれかに記載の蒸着用マ
スクの製造法。(3) The metal plate is nickel (Ni), aluminum (Al)
), copper (Cu), stainless steel, permalloy, titanium (T
i) The method for manufacturing a vapor deposition mask according to claim 1 or 2, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22446786A JPS6379948A (en) | 1986-09-22 | 1986-09-22 | Manufacture of mask for vapor deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22446786A JPS6379948A (en) | 1986-09-22 | 1986-09-22 | Manufacture of mask for vapor deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6379948A true JPS6379948A (en) | 1988-04-09 |
Family
ID=16814247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22446786A Pending JPS6379948A (en) | 1986-09-22 | 1986-09-22 | Manufacture of mask for vapor deposition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6379948A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100625967B1 (en) * | 2000-10-11 | 2006-09-20 | 삼성에스디아이 주식회사 | Vacuum evaporation mask and method of manufacturing the same |
| US20150104608A1 (en) * | 2013-10-15 | 2015-04-16 | Samsung Display Co., Ltd. | Metal mask and manufacturing method thereof |
-
1986
- 1986-09-22 JP JP22446786A patent/JPS6379948A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100625967B1 (en) * | 2000-10-11 | 2006-09-20 | 삼성에스디아이 주식회사 | Vacuum evaporation mask and method of manufacturing the same |
| US20150104608A1 (en) * | 2013-10-15 | 2015-04-16 | Samsung Display Co., Ltd. | Metal mask and manufacturing method thereof |
| US9676063B2 (en) * | 2013-10-15 | 2017-06-13 | Samsung Display Co., Ltd. | Method of manufacturing a metal mask by laser cutting |
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