JPS6378339A - Production of magnetic recording medium - Google Patents
Production of magnetic recording mediumInfo
- Publication number
- JPS6378339A JPS6378339A JP22316786A JP22316786A JPS6378339A JP S6378339 A JPS6378339 A JP S6378339A JP 22316786 A JP22316786 A JP 22316786A JP 22316786 A JP22316786 A JP 22316786A JP S6378339 A JPS6378339 A JP S6378339A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic recording
- film
- recording layer
- uniformity
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 238000001312 dry etching Methods 0.000 claims abstract description 8
- 229920006254 polymer film Polymers 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 2
- 230000005294 ferromagnetic effect Effects 0.000 abstract description 5
- 238000007740 vapor deposition Methods 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 30
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 230000005415 magnetization Effects 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- -1 polyethylene terephthalate Polymers 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000005462 imide group Chemical group 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 239000010687 lubricating oil Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 229910020708 Co—Pd Inorganic materials 0.000 description 1
- 229910020515 Co—W Inorganic materials 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、高密度磁気記録層として強磁性金属薄膜を有
する磁気記録媒体の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a magnetic recording medium having a ferromagnetic metal thin film as a high-density magnetic recording layer.
従来の技術
近年、高密度磁気記録層として、Ｃｏ−Ｎｉの斜め蒸着
膜や、垂直方向に磁化できるＣｏ−Ｃｒスパッタ膜等の
強磁性金属薄膜が実用化に向は検討されている。2. Description of the Related Art In recent years, the practical use of ferromagnetic metal thin films such as obliquely deposited Co--Ni films and Co--Cr sputtered films that can be magnetized in the perpendicular direction has been studied as high-density magnetic recording layers.
特に、垂直磁気記録方式は、今後の高密度化に重要な技
術として注目されている〔外国論文誌：アイイーイーイ
ー トランザクションズ オンマクネｆイクス（ＩＥＥ
Ｅ ＴＲＡＮＳＡＣＴＩＯＮＳＯＮ ＭＡＧＮＥＴＩ
Ｃ３）Ｖｏｌ、ＭＡＧ−１３、Ｊｉ５ｐ、ｐ、１２７２
〜１２７７（１９了７）〕。In particular, perpendicular magnetic recording is attracting attention as an important technology for future high-density recording [Foreign journal: IEE Transactions Oncology (IEE)
E TRANSACTIONSON MAGNETI
C3) Vol, MAG-13, Ji5p, p, 1272
~1277 (19 ryo 7)].
垂直記録では媒体面に垂直な反平行磁化転移を形成させ
るので、磁化転移が極めて狭いものとなり、高密度の記
録が可能になるが、この方式の実現には、垂直異方性を
有する媒体の使用が不可欠で、耐久性のある信号出力対
雑音比（以下Ｃ／Ｎと記す）の大きな媒体が量産規模で
得られることが鍵といえる〔応用磁気セミナ、″′垂直
磁気記録方式゛″（ｓｏ年１２月）〕。In perpendicular recording, an antiparallel magnetization transition perpendicular to the medium surface is formed, so the magnetization transition becomes extremely narrow and high-density recording is possible. The key is to be able to obtain a durable medium with a high signal output to noise ratio (hereinafter referred to as C/N) on a mass production scale [Applied Magnetics Seminar, ``Perpendicular Magnetic Recording'' ( (December 2015)].
現状では、電磁変換特性からみると、スパッタ法で得た
Ｃｏ−Ｃｒ膜が最も垂直磁化膜として優れており、この
磁気記録層上に各種の保護膜を配して耐久性を改良する
検討が盛んである〔例えば、応用磁気セミナ、′垂直磁
気記録方式″６７〜７６頁（１９８５））。At present, in terms of electromagnetic conversion characteristics, the Co-Cr film obtained by sputtering is the most excellent as a perpendicularly magnetized film, and studies are underway to improve durability by placing various protective films on this magnetic recording layer. (For example, Applied Magnetic Seminar, ``Perpendicular Magnetic Recording System,'' pp. 67-76 (1985)).
例えば、特開昭５７−１１６７７１号公報にはイミド基
を有する高分子をスパッタして磁気記録層上の保護膜と
する方法が示されており、特開昭６１−１２６６２７号
公報には硬質カーボン層と含フツ素潤滑油層を積層する
方法が示されている。For example, JP-A-57-116771 discloses a method of sputtering a polymer having an imide group to form a protective film on a magnetic recording layer, and JP-A-61-126,627 discloses a method of sputtering a polymer having imide groups to form a protective film on a magnetic recording layer. A method of laminating the fluorine-containing lubricating oil layer and the fluorine-containing lubricating oil layer is shown.
真空蒸着膜、プラズマ重合膜等についても面内磁化膜を
実施例として数多く提案開示されている〔例えば、特開
昭６１−１５１８３７号、特開昭６１−１６０２６号、
同５８−ｅｏ４ｉ７号の公報〕。Many proposals and disclosures have been made regarding vacuum-deposited films, plasma-polymerized films, etc., using in-plane magnetized films as examples [for example, JP-A-61-151837, JP-A-61-16026,
Publication No. 58-eo4i7].
一方、保護膜と別の見方で、磁気記録層を強化すること
が提案されている。その代表的な例は、高分子フィルム
上にカーボンや、シリカ等の微粒子を大量に塗布して１
００人〜３００人程度の微細な凹凸を形成したのち、Ｃ
ｏ−Ｎｉ−０膜等を電子ビーム蒸着したもので、動摩擦
係数、スチル耐久の改良等が確認されている〔例えば米
国特許第４ 、５８４ 、５４９ 号ＢＡＭＪ書）。On the other hand, it has been proposed to strengthen the magnetic recording layer from a different perspective than the protective film. A typical example is to coat a large amount of fine particles such as carbon or silica on a polymer film.
After forming fine irregularities of about 00 to 300, C.
It has been confirmed that an o-Ni-0 film or the like is deposited by electron beam, and the coefficient of dynamic friction and still durability are improved (for example, US Pat. No. 4,584,549 BAMJ).
発明が解決しようとする問題点
しかしながら、上記した構成では、耐久性の面で微粒子
塗布、真空蒸着法により製造する方法が実用上優れてい
るものの、記録波長が短かくなってくると、雑音が大き
くなる傾向があシ改善が望まれている。本発明は上記し
た事情に鑑みなされたもので、優れたＣ／Ｎの媒体を均
一に製造することの出来る製造方法を提供するものであ
る。Problems to be Solved by the Invention However, with the above-mentioned structure, although the manufacturing method using fine particle coating and vacuum evaporation is superior in terms of durability, noise increases as the recording wavelength becomes shorter. There is a tendency for it to increase, and improvement is desired. The present invention has been made in view of the above-mentioned circumstances, and provides a manufacturing method that can uniformly manufacture a medium with an excellent C/N.
問題点を解決するための手段
本発明の磁気記録媒体の製造方法は、上記した問題点を
解決するために、高分子フィルム上に連続的に積層した
複数の蒸着膜をドライエツチングした後、その上に磁気
記録層を蒸着形成するようにしたものである。Means for Solving the Problems In order to solve the above-mentioned problems, the method for manufacturing a magnetic recording medium of the present invention involves dry etching a plurality of deposited films successively laminated on a polymer film, and then etching the deposited films. A magnetic recording layer is formed on top by vapor deposition.
作 用
本発明の製造方法は上記した構成により、複数の蒸着膜
が積層された層をドライエツチングすることで出来る微
細な凹凸形状の均一性が極めて良好なため、その上に蒸
着形成された強磁性金属薄膜からなる磁気記録層の磁気
的均一性が良好となり、Ｃ／Ｎ改善がなされるもので、
再現良く大面積に渡って均一性が確保できることになる
のである。Effect: Due to the above-described structure, the manufacturing method of the present invention has extremely good uniformity in the fine unevenness formed by dry etching a layer in which a plurality of vapor-deposited films are laminated. The magnetic uniformity of the magnetic recording layer made of a magnetic metal thin film is improved, and the C/N is improved.
This means that uniformity can be ensured over a large area with good reproducibility.
実施例
以下、図面を参照しながら本発明の磁気記録媒体の製造
方法について詳しく説明する。EXAMPLES Hereinafter, a method for manufacturing a magnetic recording medium of the present invention will be explained in detail with reference to the drawings.
第１図は本発明を実施するために用いた磁気記録媒体製
造装置の要部構成図である。第１図に於て、１は処理す
るフィルムで、２は第１真空容器、３は第２真空容器、
４は送り出し軸、６は第１円筒キャン、６，７はフリー
ローラ、８は第２円筒キャン、９は巻取υ軸、１ｏは第
１のガス導入ボート、１１は放電電極、１２は第２のガ
ス導入ボート、１３はターゲットホルダー、１４はター
ゲット、１６は磁界発生器、１６．１７は真空排気系、
１８．１９は高周波電源である。FIG. 1 is a block diagram of the main parts of a magnetic recording medium manufacturing apparatus used to carry out the present invention. In FIG. 1, 1 is a film to be processed, 2 is a first vacuum container, 3 is a second vacuum container,
4 is a feeding shaft, 6 is a first cylindrical can, 6 and 7 are free rollers, 8 is a second cylindrical can, 9 is a winding υ axis, 1o is a first gas introduction boat, 11 is a discharge electrode, and 12 is a second cylindrical can. 2 gas introduction boat, 13 target holder, 14 target, 16 magnetic field generator, 16.17 vacuum exhaust system,
18.19 is a high frequency power supply.
第２図は本発明によシ製造した磁気記録媒体の一例の拡
大断面図である。FIG. 2 is an enlarged sectional view of an example of a magnetic recording medium manufactured according to the present invention.
第２図で、２１は高分子フィルム、２２はドライエツチ
ング層、２３は強磁性金属薄膜、２４は潤滑層である。In FIG. 2, 21 is a polymer film, 22 is a dry etching layer, 23 is a ferromagnetic metal thin film, and 24 is a lubricating layer.
厚み１０／ｊｍの表面粗さ５０Ａのポリエチレンテレフ
タレートフィルム上に、あらかじめ、ＣｒとＴ１の積層
膜を高周波スパッタ法で形成した。A laminated film of Cr and T1 was formed in advance on a polyethylene terephthalate film having a thickness of 10/jm and a surface roughness of 50A by high-frequency sputtering.
Ｃｒ ターゲットとＴ１ターゲットを用い、１３．５６
（ＭＨｚ ）の高周波放電により、まずＣｒを換算厚
みが６０人となるようにスパッタ蒸着し、引き続きＴ１
を換算厚み７０Ａとなるようにスパッタ蒸着した。ここ
での換算厚みとは均一な連続膜とみなした時の厚みで、
この厚み領域では、不連続膜でＣｒとＴｉが均一に分散
したような膜となっている。Using Cr target and T1 target, 13.56
First, Cr was sputter-deposited using a high frequency discharge of (MHz) to an equivalent thickness of 60 mm, and then T1
was sputter-deposited to a converted thickness of 70A. The equivalent thickness here is the thickness when it is considered as a uniform continuous film.
In this thickness region, the film is a discontinuous film in which Cr and Ti are uniformly dispersed.
この状態のフィルム１を第１図の装置で送り出し軸４に
装着し、第１真空容器２でドライエツチングにより、微
細な凹凸を形成する。１１の放電電極をＡｌ！のワイヤ
によるメツシュ電極とすることで、より微細な凹凸形成
を図るようにした。１８は１３．５６（ＭＨｚ）の高周
波電源で、１．９（ＫＷ）投入した。放電ガスは１ｏよ
りＡｒを導入し、圧力は２ Ｘ １０−２（Ｔｏｒｒ）
に保ｚた。The film 1 in this state is mounted on a delivery shaft 4 using the apparatus shown in FIG. 1, and is dry-etched in the first vacuum container 2 to form fine irregularities. 11 discharge electrodes are made of Al! By using a mesh electrode made of wire, we were able to form even finer irregularities. No. 18 was a high frequency power supply of 13.56 (MHz), which was turned on at 1.9 (KW). Ar is introduced from 1o as the discharge gas, and the pressure is 2 x 10-2 (Torr).
I kept it.
主にＴ１がエツチングされる条件のため、Ｃｒが凹凸形
状を形成するに授かる系となっている。凹凸の高さは、
約１３０人で、凸部の密度は２×１０ 個／Ｃ−にした
。Because of the conditions in which T1 is mainly etched, the system is such that Cr is conducive to forming an uneven shape. The height of the unevenness is
There were about 130 people, and the density of convex parts was set to 2 x 10 pieces/C-.
かかるフィルムを３の部屋に導き、８に沿った状態で、
ターゲット１４にＣｒを２１ｗｔ％含む、Ｃｏ−Ｃｒを
用い、１０６ （Ｏｅ ）の表面磁界強度で、１ｓ、ｓ
ｅ（ＭＨｚ）のマグネトロン式の高周波スパッタリング
で０．１５／ｌｆｍのＣｏ−Ｃｒ垂直磁化膜を形成した
。放電ガスはＡ ｒ ＋ Ｈ２（Ａ ｒ 、’ Ｈ２＝
５ ”、 ２ ）で、７ Ｘ １０”” （Ｔｏｒｒ）
とし、１ ３．５６（ＭＨｚ）、２．２ＫＷの条件で製
膜した。この膜の上にパー７０ロバルミチン酸を６０人
真空蒸着した潤滑層を形成し、幅８Ｉ！１１の磁気テー
プを製造した。Guide the film into room 3, along line 8,
The target 14 was made of Co-Cr containing 21 wt% of Cr, and the surface magnetic field strength was 106 (Oe) for 1 s, s.
A Co--Cr perpendicular magnetization film of 0.15/lfm was formed by magnetron-type high frequency sputtering of e (MHz). The discharge gas is A r + H2 (A r ,' H2=
5", 2), 7 x 10" (Torr)
The film was formed under the conditions of 13.56 (MHz) and 2.2 KW. On top of this film, a lubricating layer is formed by vacuum-depositing Par70 robalmitic acid by 60 people, and the width is 8I! Eleven magnetic tapes were manufactured.
比較例は、同じ高分子フィルム上に溶液塗布法で、凹凸
の高さを同じく１３０八となり、凸部の密度を平均２
Ｘ １０９ 個／Ｃ−となるようにシリカ微粒子を塗布
してから、同一条件でＣｏ−Ｃｒ垂直磁化膜、パーフロ
ロバルミチン酸を形成してテープ化した。In the comparative example, the same polymer film was coated with a solution coating method, the height of the unevenness was 1308, and the density of the unevenness was 2 on average.
After applying silica fine particles at a ratio of X 109 particles/C-, a Co--Cr perpendicular magnetization film and perfluorobalmitic acid were formed under the same conditions, and a tape was formed.
両者を８ミリビデオのメカニズムを用いて、記録波長を
変化させてＣ／Ｎを比較した。用いたヘッドは、ギャッ
プ長０．１５）ｔｍのフェライトヘッドである。記録波
長０．８μｍでは両者のＣ／Ｎに差はみられないが、Ｑ
、８．ｎりは本発明によるテープの方が、２．２ （ｄ
Ｂ） 、 ０．４ｐｍでは４．７（ｄＢ）Ｃ／Ｎが良好
であった。The C/N of both was compared using an 8 mm video mechanism and varying the recording wavelength. The head used was a ferrite head with a gap length of 0.15)tm. At a recording wavelength of 0.8 μm, there is no difference in C/N between the two, but Q
, 8. The tape according to the present invention has a 2.2 (d
B) 4.7 (dB) C/N was good at 0.4 pm.
また、均一性についての比較は、本発明によるものは、
０．６μｍの記録波長を記録した時の再生Ｃ／Ｎが、任
意（７）１００本のテープの１０００個所の測定で、ｏ
、５（ｄＢ）以内であったのに対し、比較例のテープは
、任意の１６本のテープの１５０個所の測定で、２．７
（ｄＢ）のばらつきがあり、この比較に於ても本発明の
価値がわかる。Furthermore, in terms of uniformity, the one according to the present invention is
The playback C/N when recording at a recording wavelength of 0.6 μm is arbitrary (7) measured at 1000 locations on 100 tapes.
, within 5 (dB), whereas the tape of the comparative example had a value of 2.7 (dB) when measured at 150 points on 16 arbitrary tapes.
(dB), and this comparison also shows the value of the present invention.
上記した実施例の媒体は、スチル状態で雑音が発生する
までの耐久時間も２０℃３０％ＲＨ，４０℃８０％ＲＨ
で共に２．５〜３倍長い耐久性を示す点も有利なことで
あるといえる。The media of the above-mentioned examples also have an endurance time of 20°C, 30% RH, and 40°C, 80% RH until noise occurs in a still state.
It can also be said that it is advantageous that the durability is 2.5 to 3 times longer in both cases.
実施例ではポリエチレンテレフタレートフィルムで説明
したが、他にポリフェニレンサルフフイド、ポリサルフ
ォン等でもよい。In the examples, polyethylene terephthalate film was used, but other materials such as polyphenylene sulfide and polysulfone may also be used.
ドライエツチング層の構成材料は、金属、酸化物、窒化
物等から適宜選択できるもので、２層で構成すれば充分
である場合が殆んどであるが、パーマロイ層上に２層を
付加して２層部で凹凸を形成する等層数は適宜選択すれ
ばよい。The constituent material of the dry etching layer can be selected from metals, oxides, nitrides, etc., and in most cases it is sufficient to consist of two layers, but two layers may be added on top of the permalloy layer. The number of equal layers forming unevenness in the two-layer portion may be appropriately selected.
磁気記録層はＣｏ−Ｃｒの他にＣｏ 、 Ｃｏ＝Ｆｅ
。The magnetic recording layer is made of Co, Co=Fe in addition to Co-Cr.
.
Ｃｏ−Ｎｉ 、Ｃｏ−Ｂ１ 、Ｆｅ −Ａｇ 、Ｇｏ−
Ｂ、Ｃｏ−Ｐｒ 。Co-Ni, Co-B1, Fe-Ag, Go-
B, Co-Pr.
Ｃｏ−Ｐｄ、Ｃｏ−Ｍｏ、Ｃｏ−Ｗ、Ｃｏ−Ｔａ、Ｃｏ
−Ｔｉ等及びそれらの部分酸化膜で磁化容易軸に無関係
で、スパッタ法の他に電子ビーム蒸着による形成も有効
である。Co-Pd, Co-Mo, Co-W, Co-Ta, Co
- Ti, etc. and their partially oxidized films, regardless of the axis of easy magnetization, are effectively formed by electron beam evaporation in addition to sputtering.
尚、実施態様は磁気テープに限らず、磁気ディスクであ
ってもよいのは勿論である。Note that the embodiment is not limited to a magnetic tape, and of course may also be a magnetic disk.
発明の効果
以上のように本発明によれば、高密度磁気記録時に優れ
たＣ／Ｎを与えることのできる磁気記録媒体を大量に均
一に生産できるといったすぐれ之効来がある。Effects of the Invention As described above, the present invention has the excellent effect that magnetic recording media capable of providing excellent C/N during high-density magnetic recording can be uniformly produced in large quantities.
第１図は本発明を実施するのに用いた磁気記録媒体製造
装置の一例の要部構成図、第２図は第１図の装置で製造
した磁気記録媒体の拡大断面図である。
１・・・・・・処理フィルム、１１・・・・・・放電電
極、１４・・・・・・ターゲット、１８．１９・・・・
・・高周波電源、２１・・・・・・高分子フィルム、２
２・・川・ドライエツチング層、２３・・・・・・強磁
性金属薄膜。FIG. 1 is a block diagram of essential parts of an example of a magnetic recording medium manufacturing apparatus used to carry out the present invention, and FIG. 2 is an enlarged sectional view of the magnetic recording medium manufactured by the apparatus shown in FIG. 1... Treated film, 11... Discharge electrode, 14... Target, 18.19...
...High frequency power supply, 21...Polymer film, 2
2... river/dry etching layer, 23... ferromagnetic metal thin film.
Claims (1)
ライエッチングした後、その上に磁気記録層を蒸着形成
することを特徴とする磁気記録媒体の製造方法。1. A method for manufacturing a magnetic recording medium, comprising dry etching a plurality of deposited films successively laminated on a polymer film, and then depositing a magnetic recording layer thereon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22316786A JPS6378339A (en) | 1986-09-19 | 1986-09-19 | Production of magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22316786A JPS6378339A (en) | 1986-09-19 | 1986-09-19 | Production of magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6378339A true JPS6378339A (en) | 1988-04-08 |
Family
ID=16793848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22316786A Pending JPS6378339A (en) | 1986-09-19 | 1986-09-19 | Production of magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6378339A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7407685B2 (en) * | 2002-04-09 | 2008-08-05 | Fuji Electric Device Technology Co., Ltd. | Magnetic recording medium and the method of manufacturing the same |
-
1986
- 1986-09-19 JP JP22316786A patent/JPS6378339A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7407685B2 (en) * | 2002-04-09 | 2008-08-05 | Fuji Electric Device Technology Co., Ltd. | Magnetic recording medium and the method of manufacturing the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6378339A (en) | Production of magnetic recording medium | |
| JP2537915B2 (en) | Magnetic recording media | |
| JP2594380B2 (en) | Magnetic recording media | |
| JP2558753B2 (en) | Magnetic recording media | |
| JP2553621B2 (en) | Magnetic recording media | |
| JP2951892B2 (en) | Magnetic recording media | |
| JPH03116520A (en) | Magnetic recording medium | |
| JPS62202311A (en) | Thin metallic film type magnetic recording medium | |
| JPH01320619A (en) | Magnetic recording medium | |
| JPS61284829A (en) | Magnetic recording medium | |
| JPH01211220A (en) | Magnetic recording medium | |
| JPS58171717A (en) | Magnetic recording medium | |
| JPH01204214A (en) | Magnetic recording medium | |
| JPH01189029A (en) | Magnetic recording medium | |
| JPH01205716A (en) | Magnetic recording medium | |
| JPS6156563B2 (en) | ||
| JPH07101501B2 (en) | Magnetic recording medium | |
| JPH01166322A (en) | Magnetic recording medium | |
| JPS63149825A (en) | Magnetic recording medium | |
| JPH01109517A (en) | Magnetic recording medium | |
| JPH10228619A (en) | Magnetic recording medium and magnetic recording method | |
| JPH02149922A (en) | Magnetic recording medium | |
| JPS6174133A (en) | Magnetic recording medium | |
| JPS6378341A (en) | Production of magnetic recording medium | |
| JPH01176311A (en) | Magnetic recording medium |