JPS6377525A - Washing method for diffusion nozzle - Google Patents
Washing method for diffusion nozzleInfo
- Publication number
- JPS6377525A JPS6377525A JP61220333A JP22033386A JPS6377525A JP S6377525 A JPS6377525 A JP S6377525A JP 61220333 A JP61220333 A JP 61220333A JP 22033386 A JP22033386 A JP 22033386A JP S6377525 A JPS6377525 A JP S6377525A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- pipe
- liquid
- valve
- storage liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 7
- 238000009792 diffusion process Methods 0.000 title abstract 2
- 238000005406 washing Methods 0.000 title 1
- 239000007788 liquid Substances 0.000 claims abstract description 36
- 238000002347 injection Methods 0.000 claims description 22
- 239000007924 injection Substances 0.000 claims description 22
- 238000005273 aeration Methods 0.000 claims description 12
- 238000004140 cleaning Methods 0.000 claims description 6
- 238000007664 blowing Methods 0.000 claims description 3
- 238000007599 discharging Methods 0.000 abstract description 5
- 238000011001 backwashing Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 49
- 238000005516 engineering process Methods 0.000 description 4
- 238000009423 ventilation Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 238000006477 desulfuration reaction Methods 0.000 description 1
- 230000023556 desulfurization Effects 0.000 description 1
- 239000003546 flue gas Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
- B01F23/23105—Arrangement or manipulation of the gas bubbling devices
- B01F23/2312—Diffusers
- B01F23/23121—Diffusers having injection means, e.g. nozzles with circumferential outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
- B01F23/23105—Arrangement or manipulation of the gas bubbling devices
- B01F23/2312—Diffusers
- B01F23/23126—Diffusers characterised by the shape of the diffuser element
- B01F23/231265—Diffusers characterised by the shape of the diffuser element being tubes, tubular elements, cylindrical elements or set of tubes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/20—Jet mixers, i.e. mixers using high-speed fluid streams
- B01F25/21—Jet mixers, i.e. mixers using high-speed fluid streams with submerged injectors, e.g. nozzles, for injecting high-pressure jets into a large volume or into mixing chambers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/10—Maintenance of mixers
- B01F35/145—Washing or cleaning mixers not provided for in other groups in this subclass; Inhibiting build-up of material on machine parts using other means
- B01F35/1452—Washing or cleaning mixers not provided for in other groups in this subclass; Inhibiting build-up of material on machine parts using other means using fluids
- B01F35/1453—Washing or cleaning mixers not provided for in other groups in this subclass; Inhibiting build-up of material on machine parts using other means using fluids by means of jets of fluid, e.g. air
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Nozzles (AREA)
- Cleaning In General (AREA)
- Treating Waste Gases (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、湿式排煙脱硫装置における亜硫酸塩の酸化な
どに用いられる散気ノズルのノズル洗浄方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a nozzle cleaning method for an aeration nozzle used for oxidizing sulfites in a wet flue gas desulfurization device.
従来一般に用いられる気体吹込方法について第２図の一
例に基づき具体的に説明する。A gas blowing method commonly used in the past will be specifically explained based on an example shown in FIG.
通気槽１に貯溜する貯溜液２中に気体供給管３を配し該
気体供給管３に設けた気体噴射管４から気体を噴射し気
液接触処理を行なう。A gas supply pipe 3 is arranged in a stored liquid 2 stored in an aeration tank 1, and gas is injected from a gas injection pipe 4 provided in the gas supply pipe 3 to perform a gas-liquid contact process.
従来の技術において、長期に亘って気液接触処理を継続
すると第３図に示したごとく、気体噴射管４内ヘスケー
リングが見られ、このスケール）は経時的に成長し遂に
は閉塞に致ったり。In conventional technology, if gas-liquid contact treatment is continued for a long period of time, scaling within the gas injection pipe 4 is observed as shown in Figure 3, and this scale grows over time and eventually becomes blocked. Or.
又気体噴射量が局部に集中したり、あるいは通気背圧の
上昇による通気動力費の上昇などの不都合が見られた。In addition, there were also disadvantages such as concentration of the gas injection amount in a local area and increase in ventilation power cost due to an increase in ventilation back pressure.
本発明は、かかる従来の不都合を解消すべく採用した技
術であり、定期的に通気を一時停止し、貯溜液に浸漬し
た気体供給管内に貯溜液を勢いよく逆流させ又勢いよく
排出して気体噴射管内を洗浄する方法であり、通気槽内
に散気して貯溜液を気液接触処理させるための気体吹込
装置において、気体供給管から供給される気体を複数の
気体噴射管から前記貯溜液中に噴射させ気液接触処理す
ると共に、間欠的に前記気体供給管に取付けた遮断弁を
全閉とし次いで該遮断弁と前記気体噴射管の区間の気体
供給管に取付けた気体放出弁を全開とし、前記遮断弁と
気体噴射管の区間に封入された気体を放出させつつ前記
通気槽の貯溜液を逆流させ、次いで前記気体放出弁を全
閉し次いで前記遮断弁を開として逆流した前記貯溜液を
前記通気槽内へ排出し再び気体を噴射させることを特徴
とする散気ノズルの洗浄方法である。The present invention is a technology adopted in order to eliminate such conventional inconveniences.The present invention is a technology that is adopted in order to eliminate such conventional disadvantages. This is a method for cleaning the inside of an injection pipe, and in a gas blowing device for dispersing air into an aeration tank to bring the stored liquid into gas-liquid contact treatment, gas supplied from a gas supply pipe is sent to the stored liquid from a plurality of gas injection pipes. At the same time, the cutoff valve attached to the gas supply pipe is intermittently fully closed, and then the gas release valve attached to the gas supply pipe in the section between the cutoff valve and the gas injection pipe is fully opened. Then, the gas sealed in the section between the cutoff valve and the gas injection pipe is released, while the stored liquid in the aeration tank is caused to flow back, and then the gas release valve is fully closed, and then the cutoff valve is opened to remove the backflow of the stored liquid. This method of cleaning an aeration nozzle is characterized by discharging the liquid into the aeration tank and injecting gas again.
本発明によれば、気体噴射管内に発生したスケールは多
量の液を勢いよく逆流・排出させることで気体噴射管か
ら剥離し、洗浄され、この操作を定期的に実施すること
で気体噴射管を正常な状態で維持できる。According to the present invention, the scale generated in the gas injection pipe is peeled off and cleaned from the gas injection pipe by forcefully backflowing and discharging a large amount of liquid, and by periodically performing this operation, the gas injection pipe can be cleaned. Can be maintained in normal condition.
本発明を第１図の実施態様例に基づき具体的に説明する
。The present invention will be specifically explained based on the embodiment example shown in FIG.
第１図に於いて、通気槽１内に貯溜する貯留液２中に浸
漬した気体供給管３に気体を送り、該気体供給管３を介
して供給される気体は該気体供給管３に複数個取付けた
気体噴射管４から貯留液２中に噴射されるが、定期的に
前記気体供給管３の途中に設けた遮断弁５を全閉とし、
次いで気体放出弁６を全開とし前記遮断弁５と前記気体
噴射管４の区間の気体供給管３に封入された気体を放出
し、即ち貯留液２を前記気体噴射管４の全てから逆流さ
せ、次いで該気体放出弁６を全閉したのち遮断弁５を全
開として先に気体供給管３内に逆流している貯留液を気
体の圧力で貯留液２中に排出させ引き続き気液接触操作
を継続するものである。In FIG. 1, gas is sent to a gas supply pipe 3 immersed in a stored liquid 2 stored in an aeration tank 1, and the gas supplied through the gas supply pipe 3 is supplied to a plurality of gas supply pipes 3. The gas is injected from the attached gas injection pipe 4 into the stored liquid 2, but periodically the cutoff valve 5 provided in the middle of the gas supply pipe 3 is fully closed.
Next, the gas release valve 6 is fully opened to release the gas sealed in the gas supply pipe 3 in the section between the cutoff valve 5 and the gas injection pipe 4, that is, to cause the stored liquid 2 to flow back from all the gas injection pipes 4, Next, after fully closing the gas release valve 6, the shutoff valve 5 is fully opened, and the stored liquid flowing backward into the gas supply pipe 3 is discharged into the stored liquid 2 using gas pressure, and the gas-liquid contact operation is continued. It is something to do.
実施例において、下記の条件で実施したとき全ての気体
噴射管内にスケーリングは全く見られなかった。In the examples, no scaling was observed in any of the gas injection tubes when the tests were carried out under the following conditions.
（運用条件）
１装置仕様
気体噴射管内径： １０ＡＳＣｈ４０気体噴射管数
：２４本
貯 留 液 量 ＝ １５０ イ貯留液レベ
ル ：５ｍ
気体供給管径： １００Ａ ｓｃｈ ２０２、貯留
液質（石膏スラリー）
スラリー濃度 ： １３ｗｔ％
３、通気条件
気 体 ° 空気
流 量 ’ １０００．＆Ｎ／Ｈｒ
圧 力 ’ ０．７２ 汀／ｄ４、
洗浄条件
気体放出弁全開時間＝ ６秒
洗 浄 周 期 ： １回７１２時間〔発明の効果〕
本発明によって、全ての気体噴射管をスケールの付着が
なく正常に維持出来、その結果気液接触効率を目標値に
維持出来、又通気背圧の上昇を見ることもなくなった。(Operating conditions) 1 device specifications Gas injection tube inner diameter: 10ASCh40 Number of gas injection tubes
: 24 bottles Storage liquid volume = 150 b Storage liquid level: 5m Gas supply pipe diameter: 100A sch 202, Storage liquid quality (gypsum slurry) Slurry concentration: 13wt% 3, Ventilation conditions Gas ° Air flow rate '1000. &N/Hr
Pressure '0.72 /d4,
Cleaning conditions Gas discharge valve fully open time = 6 seconds Cleaning cycle: 712 hours once [Effects of the invention] By the present invention, all gas injection pipes can be maintained normally without scale adhesion, and as a result, the gas-liquid contact efficiency is improved. was able to be maintained at the target value, and no increase in ventilation back pressure was observed.
第１図は本発明の一実施態様例、第２図は従来例、第３
図は従来例における気体噴射管のスケーリングの状況を
示した断面図である。
１・・・通気槽、２・・・貯留液、３・・・気体供給管
、４・・・気体噴射管、５・・・遮断弁、６・・・気体
放出弁。Fig. 1 is an example of an embodiment of the present invention, Fig. 2 is a conventional example, and Fig. 3 is an example of an embodiment of the present invention.
The figure is a sectional view showing the scaling of a gas injection pipe in a conventional example. DESCRIPTION OF SYMBOLS 1... Aeration tank, 2... Storage liquid, 3... Gas supply pipe, 4... Gas injection pipe, 5... Shutoff valve, 6... Gas release valve.
Claims (1)
気体吹込装置において、気体供給管から供給される気体
を複数の気体噴射管から前記貯溜液中に噴射させ気液接
触処理すると共に、間欠的に前記気体供給管に取付けた
遮断弁を全閉とし次いで該遮断弁と前記気体噴射管の区
間の気体供給管に取付けた気体放出弁を全開とし、前記
遮断弁と気体噴射管の区間に封入された気体を放出させ
つつ前記通気槽の貯溜液を逆流させ、次いで前記気体放
出弁を全閉し次いで前記遮断弁を開として逆流した前記
貯溜液を前記通気槽内へ排出し再び気体を噴射させるこ
とを特徴とする散気ノズルの洗浄方法。In a gas blowing device for performing gas-liquid contact treatment on a stored liquid by diffusing air into an aeration tank, gas supplied from a gas supply pipe is injected into the stored liquid from a plurality of gas injection pipes to perform a gas-liquid contact treatment. At the same time, the cutoff valve attached to the gas supply pipe is intermittently fully closed, and then the gas release valve attached to the gas supply pipe in the section between the cutoff valve and the gas injection pipe is fully opened, and the cutoff valve and the gas injection pipe are completely closed. The gas sealed in the section is released while the liquid stored in the aeration tank is caused to flow backward, and then the gas release valve is fully closed, and the shutoff valve is opened to discharge the liquid stored in the aeration tank that has flowed back. A method for cleaning an aeration nozzle characterized by injecting gas again.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61220333A JPH0620520B2 (en) | 1986-09-18 | 1986-09-18 | Cleaning method of air diffuser nozzle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61220333A JPH0620520B2 (en) | 1986-09-18 | 1986-09-18 | Cleaning method of air diffuser nozzle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6377525A true JPS6377525A (en) | 1988-04-07 |
| JPH0620520B2 JPH0620520B2 (en) | 1994-03-23 |
Family
ID=16749502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61220333A Expired - Lifetime JPH0620520B2 (en) | 1986-09-18 | 1986-09-18 | Cleaning method of air diffuser nozzle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0620520B2 (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06288615A (en) * | 1993-04-05 | 1994-10-18 | Inax Corp | Domestic heat recovery apparatus for waste hot water |
| WO2002045833A1 (en) * | 2000-12-04 | 2002-06-13 | Kubota Corporation | Air diffuser and flushing method thereof |
| US6843908B2 (en) * | 2000-12-04 | 2005-01-18 | Kubota Corporation | Multistage immersion type membrane separator and high-concentration wastewater treatment facility using same |
| US7186343B2 (en) | 1998-10-09 | 2007-03-06 | Zenon Technology Partnership | Cyclic aeration system for submerged membrane modules |
| JP2012055799A (en) * | 2010-09-06 | 2012-03-22 | Hitachi Ltd | Water treatment apparatus |
| JP2013107040A (en) * | 2011-11-21 | 2013-06-06 | Chugoku Electric Power Co Inc:The | Piping line system and method for removing impurity of piping line |
| JP2015182036A (en) * | 2014-03-25 | 2015-10-22 | 三機工業株式会社 | Aeration device and cleaning method |
| CN109494152A (en) * | 2017-09-11 | 2019-03-19 | 东京毅力科创株式会社 | Substrate liquid processing device, substrate liquid processing method and storage medium |
| KR20190029448A (en) * | 2017-09-11 | 2019-03-20 | 도쿄엘렉트론가부시키가이샤 | Substrate liquid processing apparatus, substrate liquid processing method and recording medium |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104324630A (en) * | 2014-09-28 | 2015-02-04 | 四川德成动物保健品有限公司 | Medicinal liquid preparation pot based on three-way valve |
-
1986
- 1986-09-18 JP JP61220333A patent/JPH0620520B2/en not_active Expired - Lifetime
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06288615A (en) * | 1993-04-05 | 1994-10-18 | Inax Corp | Domestic heat recovery apparatus for waste hot water |
| US7186343B2 (en) | 1998-10-09 | 2007-03-06 | Zenon Technology Partnership | Cyclic aeration system for submerged membrane modules |
| WO2002045833A1 (en) * | 2000-12-04 | 2002-06-13 | Kubota Corporation | Air diffuser and flushing method thereof |
| US6843908B2 (en) * | 2000-12-04 | 2005-01-18 | Kubota Corporation | Multistage immersion type membrane separator and high-concentration wastewater treatment facility using same |
| US6843470B2 (en) | 2000-12-04 | 2005-01-18 | Kubota Corporation | Air diffuser and flushing method thereof |
| JP2012055799A (en) * | 2010-09-06 | 2012-03-22 | Hitachi Ltd | Water treatment apparatus |
| JP2013107040A (en) * | 2011-11-21 | 2013-06-06 | Chugoku Electric Power Co Inc:The | Piping line system and method for removing impurity of piping line |
| JP2015182036A (en) * | 2014-03-25 | 2015-10-22 | 三機工業株式会社 | Aeration device and cleaning method |
| CN109494152A (en) * | 2017-09-11 | 2019-03-19 | 东京毅力科创株式会社 | Substrate liquid processing device, substrate liquid processing method and storage medium |
| KR20190029448A (en) * | 2017-09-11 | 2019-03-20 | 도쿄엘렉트론가부시키가이샤 | Substrate liquid processing apparatus, substrate liquid processing method and recording medium |
| JP2019050349A (en) * | 2017-09-11 | 2019-03-28 | 東京エレクトロン株式会社 | Substrate liquid processing apparatus, substrate liquid processing method and storage medium |
| US11594430B2 (en) | 2017-09-11 | 2023-02-28 | Tokyo Electron Limited | Substrate liquid processing apparatus, substrate liquid processing method and recording medium |
| CN109494152B (en) * | 2017-09-11 | 2023-11-14 | 东京毅力科创株式会社 | Substrate liquid processing apparatus, substrate liquid processing method, and storage medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0620520B2 (en) | 1994-03-23 |
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