JPH0620520B2 - Cleaning method of air diffuser nozzle - Google Patents
Cleaning method of air diffuser nozzleInfo
- Publication number
- JPH0620520B2 JPH0620520B2 JP61220333A JP22033386A JPH0620520B2 JP H0620520 B2 JPH0620520 B2 JP H0620520B2 JP 61220333 A JP61220333 A JP 61220333A JP 22033386 A JP22033386 A JP 22033386A JP H0620520 B2 JPH0620520 B2 JP H0620520B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- supply pipe
- stored liquid
- valve
- gas injection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
- B01F23/23105—Arrangement or manipulation of the gas bubbling devices
- B01F23/2312—Diffusers
- B01F23/23121—Diffusers having injection means, e.g. nozzles with circumferential outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
- B01F23/23105—Arrangement or manipulation of the gas bubbling devices
- B01F23/2312—Diffusers
- B01F23/23126—Diffusers characterised by the shape of the diffuser element
- B01F23/231265—Diffusers characterised by the shape of the diffuser element being tubes, tubular elements, cylindrical elements or set of tubes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/20—Jet mixers, i.e. mixers using high-speed fluid streams
- B01F25/21—Jet mixers, i.e. mixers using high-speed fluid streams with submerged injectors, e.g. nozzles, for injecting high-pressure jets into a large volume or into mixing chambers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/10—Maintenance of mixers
- B01F35/145—Washing or cleaning mixers not provided for in other groups in this subclass; Inhibiting build-up of material on machine parts using other means
- B01F35/1452—Washing or cleaning mixers not provided for in other groups in this subclass; Inhibiting build-up of material on machine parts using other means using fluids
- B01F35/1453—Washing or cleaning mixers not provided for in other groups in this subclass; Inhibiting build-up of material on machine parts using other means using fluids by means of jets of fluid, e.g. air
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Cleaning In General (AREA)
- Treating Waste Gases (AREA)
- Nozzles (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、湿式排煙脱硫装置における亜硫酸塩の酸化な
どに用いられる散気ノズルのノズル洗浄方法に関する。TECHNICAL FIELD The present invention relates to a nozzle cleaning method for air diffuser nozzles used for oxidation of sulfite in a wet flue gas desulfurization apparatus.
従来一般に用いられる気体吹込方法について第2図の一
例に基づき具体的に説明する。A gas blowing method generally used conventionally will be specifically described based on an example of FIG.
通気槽1に貯溜する貯溜液2中に気体供給管3を配し該
気体供給管3に設けた気体噴射管4から気体を噴射し気
液接触処理を行なう。A gas supply pipe 3 is arranged in a stored liquid 2 stored in an aeration tank 1, and a gas is injected from a gas injection pipe 4 provided in the gas supply pipe 3 to perform a gas-liquid contact process.
従来の技術において、長期に亘って気液接触処理を継続
すると第3図に示したごとく、気体噴射管4内へスケー
リングが見られ、このスケールは経時的に成長し遂には
閉塞に致ったり、又気体噴射量が局部に集中したり、あ
るいは通気背圧の上昇による通気動力費の上昇などの不
都合が見られた。In the conventional technique, when the gas-liquid contact treatment is continued for a long period of time, scaling is observed in the gas injection pipe 4 as shown in FIG. 3, and this scale grows with time and eventually becomes blocked. In addition, there were inconveniences such as the amount of gas injection being concentrated locally, or the ventilation power cost increasing due to the increase of the ventilation back pressure.
〔問題点を解決するための手段〕 本発明は、かかる従来の不都合を解消すべく採用した技
術であり、定期的に通気を一時停止し、貯溜液に浸漬し
た気体供給管内に貯溜液を勢いよく逆流させ又勢いよく
排出して気体噴射管内を洗浄する方法であり、通気槽内
に散気して貯溜液を気液接触処理させるための気体吹込
装置において、気体供給管から供給される気体を複数の
気体噴射管から前記貯溜液中に噴射させ気液接触処理す
ると共に、間欠的に前記気体供給管に取付けた遮断弁を
全閉とし次いで該遮断弁と前記気体噴射管の区間の気体
供給管に取受けた気体放出弁を全開とし、前記遮断弁と
気体噴射管の区間に封入された気体を放出させつつ前記
通気槽の貯溜液を逆流させ、次いで前記気体放出弁を全
閉し次いで前記遮断弁を開として逆流した前記貯流液を
前記通気槽内へ排出し再び気体を噴射させることを特徴
とする散気ノズルの洗浄方法である。[Means for Solving Problems] The present invention is a technique adopted in order to eliminate such a conventional inconvenience, in which ventilation is temporarily stopped and the stored liquid is urged in the gas supply pipe immersed in the stored liquid. This is a method of cleaning the inside of the gas injection pipe by well backflowing or discharging vigorously, and the gas supplied from the gas supply pipe in the gas blowing device for diffusing in the aeration tank and performing the gas-liquid contact treatment of the stored liquid. Is injected into the stored liquid from a plurality of gas injection pipes to perform gas-liquid contact treatment, and intermittently the shutoff valve attached to the gas supply pipe is fully closed, and then the gas in the section between the shutoff valve and the gas injection pipe is closed. The gas release valve received by the supply pipe is fully opened, the stored liquid in the aeration tank is made to flow backward while releasing the gas enclosed in the section of the shutoff valve and the gas injection pipe, and then the gas release valve is fully closed. Then, the shut-off valve is opened to allow reverse flow. In addition, it is a method for cleaning a diffuser nozzle, characterized in that the stored liquid is discharged into the aeration tank and gas is injected again.
本発明によれば、気体噴射管内に発生したスケールは多
量の液を勢いよく逆流・排出させることで気体噴射管か
ら剥離し、洗浄され、この操作を定期的に実施すること
で気体噴射管を正常な状態で維持できる。According to the present invention, the scale generated in the gas injection pipe is peeled off from the gas injection pipe by vigorously backflowing and discharging a large amount of liquid and washed, and the gas injection pipe is cleaned by regularly performing this operation. It can be maintained in a normal state.
本発明を第1図の実施態様例に基づき具体的に説明す
る。The present invention will be specifically described based on the embodiment example of FIG.
第1図に於いて、通気槽1内に貯溜する貯留液2中に浸
漬した気体供給管3に気体を送り、該気体供給管3を介
して供給される気体は該気体供給管3に複数個取付けた
気体噴射管4から貯留液2中に噴射されるが、定期的に
前記気体供給管3の途中に設けた遮断弁5を全閉とし、
次いで気体放出弁6を全開とし前記遮断弁5と前記気体
噴射管4の区間の気体供給管3に封入された気体を放出
し、即ち貯液2を前記気体噴射管4の全てから逆流さ
せ、次いで該気体放出弁6を全閉したのち遮断弁5を全
開として先に気体供給管3内に逆流している貯留液を気
体の圧力で貯留液2中に排出させ引き続き気体接触操作
を継続するものである。In FIG. 1, a gas is sent to a gas supply pipe 3 immersed in a storage liquid 2 stored in an aeration tank 1, and a plurality of gases are supplied to the gas supply pipe 3 through the gas supply pipe 3. It is injected into the stored liquid 2 from the individually attached gas injection pipe 4, but the shutoff valve 5 provided in the middle of the gas supply pipe 3 is fully closed at regular intervals.
Next, the gas release valve 6 is fully opened to release the gas enclosed in the gas supply pipe 3 in the section between the shutoff valve 5 and the gas injection pipe 4, that is, the stored liquid 2 is caused to flow backward from all of the gas injection pipe 4, Next, the gas release valve 6 is fully closed, and then the shutoff valve 5 is fully opened to discharge the stored liquid that has previously flowed back into the gas supply pipe 3 into the stored liquid 2 by the pressure of the gas to continue the gas contact operation. It is a thing.
実施例において、下記の条件で実施したとき全ての気体
噴射管内にスケーリングは全く見られなかった。In the examples, no scaling was observed in all the gas injection pipes when carried out under the following conditions.
(運用条件) 1.装置仕様 気体噴射管内径:10A sch40 気体噴射管数:24本 貯留液量:150 m3 貯留液レベル:5m 気体供給管径:100A sch20 2.貯留液質(石膏スラリー) スラリー濃度:13wt% 3.通気条件 気 体:空気 流 量:1000m3N/Hr 圧 力:0.72kg/cm2 4.洗浄条件 気体放出弁全開時間:6秒 洗浄周期:1回/12時間 〔発明の効果〕 本発明によって、全ての気体噴射管をスケールの付着が
なく正常に維持出来、その結果気液接触効率を目標値に
維持出来、又通気背圧の上昇を見ることもなくなった。(Operating conditions) 1. Equipment specifications Gas injection pipe inner diameter: 10A sch40 Number of gas injection pipes: 24 Reservoir volume: 150 m 3 Reservoir level: 5 m Gas supply pipe diameter: 100A sch20 2. Reservoir quality (gypsum slurry) Slurry concentration: 13wt% 3. Aeration conditions Air: Air flow: 1000m 3 N / Hr Pressure: 0.72kg / cm 2 4. Cleaning conditions Gas release valve fully open time: 6 seconds Cleaning cycle: 1 time / 12 hours [ EFFECTS OF THE INVENTION According to the present invention, all the gas injection pipes can be normally maintained without the adhesion of scale, and as a result, the gas-liquid contact efficiency can be maintained at a target value, and the ventilation back pressure is not increased.
第1図は本発明の一実施態様例、第2図は従来例、第3
図は従来例における気体噴射管のスケーリングの状況を
示した断面図である。 1……通気槽、2……貯留液、3……気体供給管、4…
…気体噴射管、5……遮断弁、6……気体放出弁。FIG. 1 is an embodiment of the present invention, FIG. 2 is a conventional example, and FIG.
The drawing is a cross-sectional view showing the state of scaling of the gas injection pipe in the conventional example. 1 ... Aeration tank, 2 ... Reservoir, 3 ... Gas supply pipe, 4 ...
… Gas injection pipe, 5 …… shut-off valve, 6 …… gas release valve.
Claims (1)
させるための気体吹込装置において、気体供給管から供
給される気体を複数の気体噴射管から前記貯溜液中に噴
射させ気液接触処理すると共に、間欠的に前記気体供給
管に取付けた遮断弁を全閉とし次いで該遮断弁と前記気
体噴射管の区間の気体供給管に取付けた気体放出弁を全
開とし、前記遮断弁と気体噴射管の区間に封入された気
体を放出させつつ前記通気槽の貯溜液を逆流させ、次い
で前記気体放出弁を全閉し次いで前記遮断弁を開として
逆流した前記貯溜液を前記通気槽内へ排出し再び気体を
噴射させることを特徴とする散気ノズルの洗浄方法。1. A gas blowing device for air-liquid contact treatment of a stored liquid by diffusing in a vent tank, wherein gas supplied from a gas supply pipe is injected into the stored liquid from a plurality of gas injection pipes. Performing gas-liquid contact treatment, intermittently fully closing a shutoff valve attached to the gas supply pipe, and then fully opening a gas release valve attached to the gas supply pipe in the section between the shutoff valve and the gas injection pipe to shut off the shutoff. The stored liquid in the aeration tank is made to flow backward while releasing the gas enclosed in the section between the valve and the gas injection pipe, then the gas discharge valve is fully closed, and then the shutoff valve is opened to make the stored liquid flow backward. A method for cleaning an air diffuser nozzle, which comprises discharging the gas into a tank and injecting the gas again.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61220333A JPH0620520B2 (en) | 1986-09-18 | 1986-09-18 | Cleaning method of air diffuser nozzle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61220333A JPH0620520B2 (en) | 1986-09-18 | 1986-09-18 | Cleaning method of air diffuser nozzle |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6377525A JPS6377525A (en) | 1988-04-07 |
JPH0620520B2 true JPH0620520B2 (en) | 1994-03-23 |
Family
ID=16749502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61220333A Expired - Lifetime JPH0620520B2 (en) | 1986-09-18 | 1986-09-18 | Cleaning method of air diffuser nozzle |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0620520B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104324630A (en) * | 2014-09-28 | 2015-02-04 | 四川德成动物保健品有限公司 | Medicinal liquid preparation pot based on three-way valve |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06288615A (en) * | 1993-04-05 | 1994-10-18 | Inax Corp | Domestic heat recovery apparatus for waste hot water |
US6706189B2 (en) | 1998-10-09 | 2004-03-16 | Zenon Environmental Inc. | Cyclic aeration system for submerged membrane modules |
KR100768873B1 (en) | 2000-12-04 | 2007-10-19 | 구보다코포레이션 | Air diffuser and flushing method thereof |
CA2398461C (en) * | 2000-12-04 | 2007-10-30 | Kubota Corporation | Multistage immersion type membrane separator and high-concentration wastewater treatment facility using same |
JP5228011B2 (en) * | 2010-09-06 | 2013-07-03 | 株式会社日立製作所 | Water treatment equipment |
JP2013107040A (en) * | 2011-11-21 | 2013-06-06 | Chugoku Electric Power Co Inc:The | Piping line system and method for removing impurity of piping line |
JP6239418B2 (en) * | 2014-03-25 | 2017-11-29 | 三機工業株式会社 | Air diffuser and cleaning method |
JP7169777B2 (en) * | 2017-09-11 | 2022-11-11 | 東京エレクトロン株式会社 | SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND STORAGE MEDIUM |
US11594430B2 (en) | 2017-09-11 | 2023-02-28 | Tokyo Electron Limited | Substrate liquid processing apparatus, substrate liquid processing method and recording medium |
-
1986
- 1986-09-18 JP JP61220333A patent/JPH0620520B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104324630A (en) * | 2014-09-28 | 2015-02-04 | 四川德成动物保健品有限公司 | Medicinal liquid preparation pot based on three-way valve |
Also Published As
Publication number | Publication date |
---|---|
JPS6377525A (en) | 1988-04-07 |
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