JPS63754U - - Google Patents
Info
- Publication number
- JPS63754U JPS63754U JP1986092571U JP9257186U JPS63754U JP S63754 U JPS63754 U JP S63754U JP 1986092571 U JP1986092571 U JP 1986092571U JP 9257186 U JP9257186 U JP 9257186U JP S63754 U JPS63754 U JP S63754U
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- wafer
- surface plate
- rotating
- rotating surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 claims description 13
- 239000007788 liquid Substances 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 2
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986092571U JPS63754U (en:Method) | 1986-06-18 | 1986-06-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986092571U JPS63754U (en:Method) | 1986-06-18 | 1986-06-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63754U true JPS63754U (en:Method) | 1988-01-06 |
Family
ID=30954391
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986092571U Pending JPS63754U (en:Method) | 1986-06-18 | 1986-06-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63754U (en:Method) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02100321A (ja) * | 1988-10-07 | 1990-04-12 | Sony Corp | 研磨装置および研磨方法 |
| JP2000288918A (ja) * | 1999-04-02 | 2000-10-17 | Applied Materials Inc | パターン面を備える改良型ｃｍｐプラテン |
-
1986
- 1986-06-18 JP JP1986092571U patent/JPS63754U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02100321A (ja) * | 1988-10-07 | 1990-04-12 | Sony Corp | 研磨装置および研磨方法 |
| JP2000288918A (ja) * | 1999-04-02 | 2000-10-17 | Applied Materials Inc | パターン面を備える改良型ｃｍｐプラテン |
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