JPS6366236A - Optical disk substrate - Google Patents
Optical disk substrateInfo
- Publication number
- JPS6366236A JPS6366236A JP61210909A JP21090986A JPS6366236A JP S6366236 A JPS6366236 A JP S6366236A JP 61210909 A JP61210909 A JP 61210909A JP 21090986 A JP21090986 A JP 21090986A JP S6366236 A JPS6366236 A JP S6366236A
- Authority
- JP
- Japan
- Prior art keywords
- polyolefin
- radiation
- optical disk
- disk substrate
- molecular weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 16
- 230000003287 optical effect Effects 0.000 title claims abstract description 13
- 229920000098 polyolefin Polymers 0.000 claims abstract description 20
- 230000005855 radiation Effects 0.000 claims abstract description 14
- 125000003118 aryl group Chemical group 0.000 claims abstract description 9
- 229920005989 resin Polymers 0.000 claims abstract description 8
- 239000011347 resin Substances 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims abstract description 7
- 229920000728 polyester Polymers 0.000 claims abstract description 7
- 230000008018 melting Effects 0.000 claims abstract description 4
- 238000002844 melting Methods 0.000 claims abstract description 4
- 238000001746 injection moulding Methods 0.000 abstract description 4
- 238000004898 kneading Methods 0.000 abstract description 3
- 238000000465 moulding Methods 0.000 abstract description 3
- 239000008188 pellet Substances 0.000 abstract description 3
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000005453 pelletization Methods 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 5
- -1 polyethylene Polymers 0.000 description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 229920000515 polycarbonate Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- 229920005992 thermoplastic resin Polymers 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 230000005374 Kerr effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は例えばレーザーなど光の照射により、情報を再
生したり記録、消失する光ディスクの基板に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a substrate for an optical disk on which information is reproduced, recorded, and erased by irradiation with light such as a laser.
光ディスクの基板は大別して、(1)無機ガラス、(2
)熱硬化性樹脂イエボキシ)、(3)熱可塑性樹脂の3
種類に分けることができる。これらの基板はそれぞれ大
きな長所、短所を持っているが、熱可塑性樹脂が主に採
用検討されている。それは以下の理由による。今後高度
情報通信システムや付加価値通信網など四−カルネット
ワーク化の構築が進むにつれ高密度記録の可能な光ディ
スクの需要は急速に伸びることが予想される。この場合
大量生産性に優れていることが必要不可欠となる。また
基板にはトラッキング案内用のグループの形成が高精度
にできることも必要である。これらの点を鑑みると熱可
塑性樹脂を射出成形法により成形すする方法が鰻も適し
ている訳である。この熱可塑性樹脂には特公昭43−8
978号公報や「日経エレクトロニクス」第292号、
第133頁(1982年)に述べられている、ポリメタ
クリル酸メチル、ポリスチレン、ポリカーボネートが主
に上げられる。Substrates for optical disks can be roughly divided into (1) inorganic glass, (2)
) thermosetting resin eboxy), (3) thermoplastic resin 3
It can be divided into types. Each of these substrates has significant advantages and disadvantages, but thermoplastic resin is mainly being considered for adoption. This is due to the following reasons. In the future, as the construction of four-cal networks such as advanced information communication systems and value-added communication networks progresses, the demand for optical discs capable of high-density recording is expected to increase rapidly. In this case, it is essential to have excellent mass productivity. It is also necessary that groups for tracking guidance can be formed on the substrate with high precision. In view of these points, injection molding of thermoplastic resin is suitable for eel as well. This thermoplastic resin is
Publication No. 978, "Nikkei Electronics" No. 292,
Main examples include polymethyl methacrylate, polystyrene, and polycarbonate, which are described on page 133 (1982).
〔発明が解決しようとする問題点3
面子にポリメタクリル酸メチルとポリスチレンは熱変形
温度に代表される耐熱性が劣り高温条件下に於ける使用
に耐えない問題が有る。、1だポリカーボネートは流動
性が悪いため基板に内部応力が発生し易く複屈折が大き
いという問題が有る。[Problem to be Solved by the Invention 3] Polymethyl methacrylate and polystyrene have a problem in that they have poor heat resistance, typified by heat distortion temperature, and cannot withstand use under high temperature conditions. Since polycarbonate has poor fluidity, it tends to generate internal stress in the substrate and has a problem of large birefringence.
特に最近注目されている光磁気ディスクはカー効果、フ
ァラデー効果による微妙な差をバイナリ−信号として捕
える構造のため複屈折が大きいと致命的となる。In particular, magneto-optical disks, which have been attracting attention recently, have a structure that captures subtle differences due to the Kerr effect and Faraday effect as binary signals, so a large birefringence would be fatal.
本発明はこの様な問題を解決するものであり、その目的
は耐熱性、透明性に優れ、且つ複屈折の小さい光ディス
ク基板を得んとするものである。The present invention is intended to solve these problems, and its purpose is to provide an optical disk substrate that has excellent heat resistance, transparency, and low birefringence.
上記の問題を解決するため本発明の光ディスク基板は(
1)芳香族ポリエステル70〜95%とポリオl/フィ
ン5〜30重量%からなる樹脂を用い成形後、放射線照
射を行う、(2)ポリオレフィンに分子[1000〜1
00fIOの低分子量ポリオレフィンを用いる、(3)
放射線照射を真空中で且つポリオレフィンの融点付近に
加熱して行うことを特徴とする。不発明に用いるポリオ
レフィンの割合(含有量)は5〜30重量%で好ましく
は10〜200〜20重量。含有量が5%未満では流動
性向上効果が少ないため複屈折が大きく、グループの形
成が不安定となる。30%を越えると熱変形温度と西明
度共に低下するため本発明の効果が少ない。ポリオレフ
ィンの分子−り走は1000〜1゜000、好ましくは
2000 =5000である。In order to solve the above problems, the optical disc substrate of the present invention (
1) Using a resin consisting of 70 to 95% aromatic polyester and 5 to 30% by weight of polyol/fin, irradiation is performed after molding. (2) The polyolefin has molecules [1000 to 1
Using low molecular weight polyolefin of 00fIO, (3)
It is characterized in that the radiation irradiation is carried out in a vacuum and by heating to around the melting point of the polyolefin. The proportion (content) of the polyolefin used in the invention is 5 to 30% by weight, preferably 10 to 200 to 20% by weight. If the content is less than 5%, the effect of improving fluidity is small, resulting in large birefringence and unstable group formation. If it exceeds 30%, both the heat deformation temperature and the brightness decrease, so the effect of the present invention is small. The molecular migration of the polyolefin is 1000 to 1°000, preferably 2000 = 5000.
分子量1000未満では熱変形温度が低(10000を
越えると流動性向上効果が少なく複屈折が太キ<ffつ
グループの形成が悲い。ポリオレフィンの含有量と分子
量の大小には相反する面があるため組み合せにより最適
なポイントは異なる。1だポリオレフィンを含有し放射
線処理を行なわないと熱変形温度が大巾に低くなると共
に複屈折も大きくなる。ちなみにポリオレフィンを含ま
ず芳香族y +)エステルのみでは放射線照射を行うと
照射前より熱変形温度は低くなる傾向を示す。放射線照
射を空気中で行うと酸素が拡散吸収され、酸化により主
鎖が切断されるため真空中ないしは不活性ガス中で行う
ことが好ましい。さらに加熱をポリオレフィンの融点付
近の温度で行うとポリマーの架橋効率が良くなるため好
ましい。If the molecular weight is less than 1,000, the heat distortion temperature is low (if it exceeds 10,000, there is little effect on improving fluidity and the birefringence is large and the formation of groups is unfortunate.There is a conflict between the polyolefin content and the size of the molecular weight. Therefore, the optimal point differs depending on the combination.If 1 contains polyolefin and is not subjected to radiation treatment, the heat distortion temperature will be significantly lower and the birefringence will also increase.By the way, if only aromatic y +) ester does not contain polyolefin, When irradiated with radiation, the heat distortion temperature tends to be lower than before irradiation. When radiation irradiation is performed in air, oxygen is diffused and absorbed and the main chain is severed due to oxidation, so it is preferable to perform radiation irradiation in vacuum or in an inert gas. Furthermore, heating at a temperature near the melting point of the polyolefin improves the crosslinking efficiency of the polymer, which is preferable.
以下実施例に従い本発明を説明する。 The present invention will be explained below with reference to Examples.
実施例−1
粘度平均分子量25000〜40000の式(1)に示
した芳香族ポリエステルと低分子量ポリエチレンを第1
表に示した条件で加熱混練しペレットを得た。Example-1 The aromatic polyester shown in formula (1) with a viscosity average molecular weight of 25,000 to 40,000 and low molecular weight polyethylene were
Pellets were obtained by heating and kneading under the conditions shown in the table.
次に射出成形機を用いて該ペレットをシリンダ一温度2
90υ〜、!+40 ’O、射出圧力200ν/d、金
型温度40℃〜120℃の条件下で成形しφ120?+
−71L厚さ1.2朋の光ディスク基板と熱変形温度・
光透過率測定用試験片を得た。次にこれらの成形品を真
空度2Xi O””−5X10”” TOrrの雰囲気
下で90℃〜110℃に加熱した後、電子線加速器を用
いて電子線を20〜70Mrad照射した。Next, using an injection molding machine, the pellets are molded into a cylinder at a temperature of 2.
90υ~,! Molded under the conditions of +40'O, injection pressure of 200ν/d, and mold temperature of 40℃ to 120℃ to φ120? +
-71L 1.2 mm thick optical disc substrate and thermal deformation temperature
A test piece for measuring light transmittance was obtained. Next, these molded products were heated to 90° C. to 110° C. in an atmosphere with a vacuum degree of 2Xi O””-5×10” TOrr, and then irradiated with an electron beam of 20 to 70 Mrad using an electron beam accelerator.
第 1 表
(ここで樹脂略称のアルファベットの小文字はポリオレ
フィンの中でポリエチレンを大文字はポリプロピレンを
示す。)
実施例−2
ポリオレフィン樹脂に低分子量ポリプロピレンを、芳香
族ポリエステル樹脂に式(2)に示した樹脂を用い、実
施例1と同様な条件で混練、射出成形を行なった。また
ここで用いた芳香族ポリエステルの粘度平均分子量は3
0000である。Table 1 (Here, the lowercase letters in the resin abbreviations indicate polyethylene, and the uppercase letters indicate polypropylene.) Example 2 Low molecular weight polypropylene was used as the polyolefin resin, and the aromatic polyester resin shown in formula (2) was used. Using resin, kneading and injection molding were performed under the same conditions as in Example 1. In addition, the viscosity average molecular weight of the aromatic polyester used here was 3
It is 0000.
−O−o−0−・・・・・・・・・(2)次にコバルト
30を用いて、真空度2 X 10−’TOrr の
雰囲気中でγ線を12Mrad成形品に照射した。ここ
ではポリプロピレンを用いているためr線照射中には成
形品の加熱を行なわない以上の実施例−1と実施例−2
の成形品(試料)を下記の条件で評価した。-O-o-0- (2) Next, the 12 Mrad molded product was irradiated with gamma rays using Cobalt 30 in an atmosphere with a degree of vacuum of 2 x 10-'TOrr. Since polypropylene is used here, the molded product is not heated during r-ray irradiation.Example-1 and Example-2
A molded article (sample) was evaluated under the following conditions.
熱変形温度:ASTM D−648
光透過率 :ASTM D−1003(633ルm)
複屈折:エリプソメーター シングルパス (63
3n yL)
ここでの複屈折の値は基板の使用範囲中で最も高かった
値である。Heat distortion temperature: ASTM D-648 Light transmittance: ASTM D-1003 (633 lumens) Birefringence: Ellipsometer single pass (63
3n yL) The value of birefringence here is the highest value within the usage range of the substrate.
測定結果を第2表と第3表に示した。第2表が実施例1
.第3表が実施例2である。また比較例【第4表)とし
てポリメタクリル酸メチル(比較例1)、ポリスチレン
(比較例2)、ポリカーボネート(比較例3)9放射線
照射を行なわないもの(比較例4)、放射線照射を空気
中で行なりたもの(比較例5)、放射線照射時に成形品
を加熱しなかったもの(比較例6:室温、真空中)を示
した。比較例4〜6は表1のb−s樹脂を用いている。The measurement results are shown in Tables 2 and 3. Table 2 is Example 1
.. Table 3 is Example 2. Comparative examples (Table 4) include polymethyl methacrylate (comparative example 1), polystyrene (comparative example 2), polycarbonate (comparative example 3), 9 without radiation irradiation (comparative example 4), and irradiation in the air. (Comparative Example 5) and one in which the molded article was not heated during radiation irradiation (Comparative Example 6: room temperature, vacuum). Comparative Examples 4 to 6 use the b-s resins shown in Table 1.
表より判る様に実施例1.実施例2共に本実施例では熱
変形温度が高く、透明性に優れ且つ複屈折が小さい。こ
れに対して、ポリメタクリル酸メチルは熱変形温度が低
い。ざリスチレンは熱変形温度、複屈折共に劣り、ポリ
カーボネートは複屈折が大きい。As can be seen from the table, Example 1. Both Example 2 and this Example have a high heat deformation temperature, excellent transparency, and low birefringence. In contrast, polymethyl methacrylate has a low heat distortion temperature. Zarystyrene has poor heat distortion temperature and birefringence, while polycarbonate has high birefringence.
また芳香族ポリエステルとポリオレフィンの混合系では
放射線照射を行なわないと熱変形温度。In addition, in the case of a mixed system of aromatic polyester and polyolefin, the heat distortion temperature will decrease unless radiation is applied.
複屈折共に劣る。ここで流動性を向上させ内部応力の発
生を抑えても複屈折が僅かであるが大きい傾向にあるの
は使用したポリオレフィンが結晶性を示すタイプである
ためである。この結晶性はポリオレフィンの含有量に左
右されポリオレフィンが少ないと示さない場合もある。Both birefringence is inferior. Even if the fluidity is improved and the generation of internal stress is suppressed, the birefringence tends to be small but large because the polyolefin used is of a crystalline type. This crystallinity depends on the polyolefin content and may not be exhibited if the polyolefin content is small.
!、た結晶性を示しても放射線の照射により消える。さ
らに放射線の照射を空気中で行うと、熱変形温度は照射
しないものよりは高いが真空中で行うより低く、成形品
の加熱も同様に加熱を行なわない方が低い。! Even if it exhibits crystallinity, it disappears upon irradiation with radiation. Furthermore, when irradiation with radiation is performed in air, the heat distortion temperature is higher than when irradiation is not performed, but lower than when irradiation is performed in vacuum, and the heating of the molded product is similarly lower when irradiation is not performed.
第 2 表
〔発明の効果〕
以上述べた様に、本発明によれば熱変形温度に代表され
る耐熱性、透明性が優れ且つ複屈折の小さい光ディスク
基板を得ることができる。Table 2 [Effects of the Invention] As described above, according to the present invention, it is possible to obtain an optical disk substrate that has excellent heat resistance represented by heat distortion temperature, excellent transparency, and low birefringence.
以 上that's all
Claims (3)
フィン5〜30重量%からなる樹脂を用い成形後、放射
線を照射したことを特徴とする光ディスク基板。(1) An optical disc substrate characterized in that it is molded using a resin consisting of 70 to 95% by weight of aromatic polyester and 5 to 30% by weight of polyolefin and then irradiated with radiation.
低分子量ポリオレフィンを用いたことを特徴とする特許
請求の範囲第1項記載の光ディスク基板。(2) The optical disc substrate according to claim 1, wherein the polyolefin is a low molecular weight polyolefin having a molecular weight of 1,000 to 10,000.
ンの融点付近に加熱して行なったことを特徴とする特許
請求の範囲第1項記載の光ディスク基板。(3) The optical disc substrate according to claim 1, wherein the radiation irradiation is performed in a vacuum and by heating near the melting point of the low molecular weight polyolefin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61210909A JPS6366236A (en) | 1986-09-08 | 1986-09-08 | Optical disk substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61210909A JPS6366236A (en) | 1986-09-08 | 1986-09-08 | Optical disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6366236A true JPS6366236A (en) | 1988-03-24 |
Family
ID=16597073
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61210909A Pending JPS6366236A (en) | 1986-09-08 | 1986-09-08 | Optical disk substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6366236A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0493983U (en) * | 1991-01-09 | 1992-08-14 |
-
1986
- 1986-09-08 JP JP61210909A patent/JPS6366236A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0493983U (en) * | 1991-01-09 | 1992-08-14 |
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