JPS6365639B2 - - Google Patents
Info
- Publication number
- JPS6365639B2 JPS6365639B2 JP58196401A JP19640183A JPS6365639B2 JP S6365639 B2 JPS6365639 B2 JP S6365639B2 JP 58196401 A JP58196401 A JP 58196401A JP 19640183 A JP19640183 A JP 19640183A JP S6365639 B2 JPS6365639 B2 JP S6365639B2
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- rotating shaft
- susceptor
- exhaust hole
- susceptors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001947 vapour-phase growth Methods 0.000 claims description 9
- 239000012495 reaction gas Substances 0.000 claims description 7
- 239000000758 substrate Substances 0.000 description 21
- 238000009826 distribution Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010923 batch production Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 1
- 235000012489 doughnuts Nutrition 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/12—Substrate holders or susceptors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19640183A JPS6090894A (ja) | 1983-10-20 | 1983-10-20 | 気相成長装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19640183A JPS6090894A (ja) | 1983-10-20 | 1983-10-20 | 気相成長装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6090894A JPS6090894A (ja) | 1985-05-22 |
JPS6365639B2 true JPS6365639B2 (fr) | 1988-12-16 |
Family
ID=16357250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19640183A Granted JPS6090894A (ja) | 1983-10-20 | 1983-10-20 | 気相成長装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6090894A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2597955Y2 (ja) * | 1991-12-28 | 1999-07-26 | 京セラ株式会社 | 画像形成装置 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60149131U (ja) * | 1984-03-15 | 1985-10-03 | 株式会社東芝 | 気相成長装置 |
US4838983A (en) * | 1986-07-03 | 1989-06-13 | Emcore, Inc. | Gas treatment apparatus and method |
US4772356A (en) * | 1986-07-03 | 1988-09-20 | Emcore, Inc. | Gas treatment apparatus and method |
JP3181171B2 (ja) * | 1994-05-20 | 2001-07-03 | シャープ株式会社 | 気相成長装置および気相成長方法 |
EP0921557A3 (fr) * | 1997-09-30 | 2004-03-17 | Siemens Aktiengesellschaft | Formation de couche non homogène par utilisation d'un rideau protecteur de gas inerte |
JP2015185750A (ja) * | 2014-03-25 | 2015-10-22 | 東京エレクトロン株式会社 | 真空処理装置 |
CN106399970A (zh) * | 2016-10-10 | 2017-02-15 | 无锡宏纳科技有限公司 | 环管式低压化学气相沉淀腔 |
CN106245111A (zh) * | 2016-10-10 | 2016-12-21 | 无锡宏纳科技有限公司 | 低压化学气相沉淀腔的晶圆支撑结构 |
CN106245004A (zh) * | 2016-10-10 | 2016-12-21 | 无锡宏纳科技有限公司 | 内外喷气式低压化学气相沉淀腔 |
CN111501019A (zh) * | 2020-05-13 | 2020-08-07 | 深圳市纳设智能装备有限公司 | 一种用于cvd设备的反应室涡轮结构 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52144961A (en) * | 1976-05-28 | 1977-12-02 | Hitachi Ltd | Vapor growth method |
JPS5329101U (fr) * | 1976-08-19 | 1978-03-13 | ||
JPS577899A (en) * | 1980-06-13 | 1982-01-16 | Hitachi Ltd | Vapor phase reacting apparatus |
-
1983
- 1983-10-20 JP JP19640183A patent/JPS6090894A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52144961A (en) * | 1976-05-28 | 1977-12-02 | Hitachi Ltd | Vapor growth method |
JPS5329101U (fr) * | 1976-08-19 | 1978-03-13 | ||
JPS577899A (en) * | 1980-06-13 | 1982-01-16 | Hitachi Ltd | Vapor phase reacting apparatus |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2597955Y2 (ja) * | 1991-12-28 | 1999-07-26 | 京セラ株式会社 | 画像形成装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6090894A (ja) | 1985-05-22 |
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