JPS577899A - Vapor phase reacting apparatus - Google Patents

Vapor phase reacting apparatus

Info

Publication number
JPS577899A
JPS577899A JP7902780A JP7902780A JPS577899A JP S577899 A JPS577899 A JP S577899A JP 7902780 A JP7902780 A JP 7902780A JP 7902780 A JP7902780 A JP 7902780A JP S577899 A JPS577899 A JP S577899A
Authority
JP
Japan
Prior art keywords
susceptors
wafers
vapor phase
high frequency
outside
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7902780A
Other languages
Japanese (ja)
Inventor
Noriyoshi Nakazawa
Akira Kanai
Hiroo Tochikubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7902780A priority Critical patent/JPS577899A/en
Publication of JPS577899A publication Critical patent/JPS577899A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To uniformly treat many wafers by vertically setting a plurality of susceptors each supporting wafers on a horizontally rotating plate placed in a bell jar and installing a high frequency coil along the outside of the rotation locus of the susceptors.
CONSTITUTION: The titled apparatus is composed of a bell jar 11 forming space as a reactor, a horizontally rotating plate 12 in the jar 11, susceptors 15 attached on the plate 12 and a high frequency coil 17 installed along the outside of the rotation locus of the susceptors 15. The susceptors 15 are radially arranged, and wafers W are supported on both sides of each of the susceptors, so that number of wafers W capable of being treated at once is increased. The wafers W are subjected to uniform induction heating with the coil 17.
COPYRIGHT: (C)1982,JPO&Japio
JP7902780A 1980-06-13 1980-06-13 Vapor phase reacting apparatus Pending JPS577899A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7902780A JPS577899A (en) 1980-06-13 1980-06-13 Vapor phase reacting apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7902780A JPS577899A (en) 1980-06-13 1980-06-13 Vapor phase reacting apparatus

Publications (1)

Publication Number Publication Date
JPS577899A true JPS577899A (en) 1982-01-16

Family

ID=13678446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7902780A Pending JPS577899A (en) 1980-06-13 1980-06-13 Vapor phase reacting apparatus

Country Status (1)

Country Link
JP (1) JPS577899A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6090894A (en) * 1983-10-20 1985-05-22 Fujitsu Ltd Vapor phase growing apparatus
JPS62500624A (en) * 1984-10-19 1987-03-12 テトロン・インコ−ポレ−テッド Reactor equipment for semiconductor wafer processing
JPS6333816A (en) * 1986-07-03 1988-02-13 エムコ−ル　インコ−ポレイテツド Method and apparatus for treating substrate in gas
JP2015185750A (en) * 2014-03-25 2015-10-22 東京エレクトロン株式会社 vacuum processing apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6090894A (en) * 1983-10-20 1985-05-22 Fujitsu Ltd Vapor phase growing apparatus
JPS6365639B2 (en) * 1983-10-20 1988-12-16 Fujitsu Ltd
JPS62500624A (en) * 1984-10-19 1987-03-12 テトロン・インコ−ポレ−テッド Reactor equipment for semiconductor wafer processing
US4694779A (en) * 1984-10-19 1987-09-22 Tetron, Inc. Reactor apparatus for semiconductor wafer processing
JPS6333816A (en) * 1986-07-03 1988-02-13 エムコ−ル　インコ−ポレイテツド Method and apparatus for treating substrate in gas
JP2015185750A (en) * 2014-03-25 2015-10-22 東京エレクトロン株式会社 vacuum processing apparatus

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