JPS6364069B2 - - Google Patents
Info
- Publication number
- JPS6364069B2 JPS6364069B2 JP21362984A JP21362984A JPS6364069B2 JP S6364069 B2 JPS6364069 B2 JP S6364069B2 JP 21362984 A JP21362984 A JP 21362984A JP 21362984 A JP21362984 A JP 21362984A JP S6364069 B2 JPS6364069 B2 JP S6364069B2
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- electrode
- pulse
- auxiliary electrode
- cooling medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000008367 deionised water Substances 0.000 claims description 12
- 229910021641 deionized water Inorganic materials 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 239000002826 coolant Substances 0.000 claims description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 4
- 229910021529 ammonia Inorganic materials 0.000 claims description 3
- 150000008282 halocarbons Chemical class 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 2
- 239000003507 refrigerant Substances 0.000 claims description 2
- 230000005284 excitation Effects 0.000 claims 1
- 239000003990 capacitor Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 239000003989 dielectric material Substances 0.000 description 8
- 239000012530 fluid Substances 0.000 description 5
- 230000010355 oscillation Effects 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21362984A JPS6191983A (ja) | 1984-10-11 | 1984-10-11 | 放電励起短パルスレ−ザ装置 |
| US06/782,568 US4686682A (en) | 1984-10-09 | 1985-10-01 | Discharge excitation type short pulse laser device |
| EP85112484A EP0177888B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device |
| DE3587852T DE3587852T2 (de) | 1984-10-09 | 1985-10-02 | Kurzpulslaservorrichtung vom Entladungsanregungstyp. |
| CA000492327A CA1259122A (en) | 1984-10-09 | 1985-10-04 | Discharge excitation type short pulse laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21362984A JPS6191983A (ja) | 1984-10-11 | 1984-10-11 | 放電励起短パルスレ−ザ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6191983A JPS6191983A (ja) | 1986-05-10 |
| JPS6364069B2 true JPS6364069B2 (enrdf_load_stackoverflow) | 1988-12-09 |
Family
ID=16642318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21362984A Granted JPS6191983A (ja) | 1984-10-09 | 1984-10-11 | 放電励起短パルスレ−ザ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6191983A (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0636448B2 (ja) * | 1987-03-17 | 1994-05-11 | 三菱電機株式会社 | 放電励起レ−ザ装置 |
| JPH01307284A (ja) * | 1988-06-06 | 1989-12-12 | Agency Of Ind Science & Technol | 放電電極 |
| KR920702048A (ko) * | 1990-03-05 | 1992-08-12 | 다께바야시 쇼오고 | 방전여기 엑시머 레이저장치 |
| JP2734191B2 (ja) * | 1990-10-09 | 1998-03-30 | 日本電気株式会社 | レーザ装置 |
| CN102969645B (zh) * | 2012-11-21 | 2015-07-15 | 中国科学院光电研究院 | 双电极放电腔的导流装置及应用其的放电腔、准分子激光器 |
-
1984
- 1984-10-11 JP JP21362984A patent/JPS6191983A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6191983A (ja) | 1986-05-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3763442A (en) | Ion laser plasma tube cooling device and method | |
| US3772610A (en) | Arcless electrode construction for gas transport laser | |
| GB1452156A (en) | Gas lasers | |
| US4077020A (en) | Pulsed gas laser | |
| JPS6364069B2 (enrdf_load_stackoverflow) | ||
| JPS61116889A (ja) | 放電励起型短パルスレ−ザ装置 | |
| US3670256A (en) | Laser guide construction | |
| JP4142099B2 (ja) | 冷却レーザダイオードアレイモジュール組立体 | |
| KR100805690B1 (ko) | 슬롯형 리모트 저온 플라즈마 반응기 | |
| US3440558A (en) | High repetition rate laser | |
| JPS63227776A (ja) | 沈積装置用陰極/ターゲット組合体 | |
| US3622910A (en) | Dynamic convective cooled laser | |
| JPS6239555B2 (enrdf_load_stackoverflow) | ||
| JP4732978B2 (ja) | サーモチャック装置およびサーモチャック装置の製造方法 | |
| JPH01273375A (ja) | 放電励起エキシマレーザ装置 | |
| JP2009099902A (ja) | 放電励起ガスレーザ装置の冷却機構 | |
| JPS6017975A (ja) | 無声放電式ガスレ−ザ装置 | |
| JP2001048503A (ja) | 空冷式オゾン発生器 | |
| JPS63313882A (ja) | レ−ザ発振装置 | |
| JPH0255205A (ja) | オゾン発生装置 | |
| Zhelamsky et al. | On the transient heat transfer in liquid helium in narrow horizontal channels | |
| JPH05343777A (ja) | パルスレーザ装置 | |
| JPS61170084A (ja) | レ−ザ発振器 | |
| Baltog et al. | Thermal stabilization of the discharge in a nitrogen laser | |
| JPH01246881A (ja) | ガスレーザ発振装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |