JPS6359267B2 - - Google Patents
Info
- Publication number
- JPS6359267B2 JPS6359267B2 JP57229255A JP22925582A JPS6359267B2 JP S6359267 B2 JPS6359267 B2 JP S6359267B2 JP 57229255 A JP57229255 A JP 57229255A JP 22925582 A JP22925582 A JP 22925582A JP S6359267 B2 JPS6359267 B2 JP S6359267B2
- Authority
- JP
- Japan
- Prior art keywords
- type
- barrier
- layer
- semiconductor device
- adjustment layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000004888 barrier function Effects 0.000 claims description 35
- 239000004065 semiconductor Substances 0.000 claims description 25
- 150000001875 compounds Chemical class 0.000 claims description 13
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 12
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 claims 2
- 230000005533 two-dimensional electron gas Effects 0.000 description 7
- 239000010931 gold Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 238000005036 potential barrier Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57229255A JPS59124169A (ja) | 1982-12-29 | 1982-12-29 | 化合物半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57229255A JPS59124169A (ja) | 1982-12-29 | 1982-12-29 | 化合物半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59124169A JPS59124169A (ja) | 1984-07-18 |
JPS6359267B2 true JPS6359267B2 (enrdf_load_html_response) | 1988-11-18 |
Family
ID=16889239
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57229255A Granted JPS59124169A (ja) | 1982-12-29 | 1982-12-29 | 化合物半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59124169A (enrdf_load_html_response) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59149063A (ja) * | 1983-02-16 | 1984-08-25 | Nec Corp | 半導体装置 |
-
1982
- 1982-12-29 JP JP57229255A patent/JPS59124169A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59124169A (ja) | 1984-07-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5705827A (en) | Tunnel transistor and method of manufacturing same | |
JP2786327B2 (ja) | ヘテロ接合電界効果トランジスタ | |
JPS6313355B2 (enrdf_load_html_response) | ||
US5414273A (en) | Heterojunction bipolar transistor | |
US4716445A (en) | Heterojunction bipolar transistor having a base region of germanium | |
EP0566591A1 (en) | SEMICONDUCTOR DEVICE. | |
JPH07123164B2 (ja) | 半導体装置 | |
JPH0355980B2 (enrdf_load_html_response) | ||
JPS6359267B2 (enrdf_load_html_response) | ||
JPH033954B2 (enrdf_load_html_response) | ||
EP0788658A1 (en) | Graded compositions of ii-vi semiconductors and devices utilizing same | |
JPH0465532B2 (enrdf_load_html_response) | ||
US5773842A (en) | Resonant-tunnelling hot electron transistor | |
EP0247667B1 (en) | Hot charge-carrier transistors | |
CA1237538A (en) | Lateral bipolar transistor | |
US6812070B2 (en) | Epitaxially-grown backward diode | |
JPS63161677A (ja) | 電界効果トランジスタ | |
JP2970783B2 (ja) | 高電子移動度トランジスタとその製造方法 | |
JPH04221834A (ja) | ダブルヘテロバイポーラトランジスタ | |
JP3044398B2 (ja) | バイポーラトランジスタ | |
JPH0620142B2 (ja) | 半導体装置 | |
JPH0656853B2 (ja) | ヘテロ接合バイポ−ラトランジスタ | |
JPH07120791B2 (ja) | 半導体装置 | |
JPH03165576A (ja) | 量子細線半導体装置およびその製造方法 | |
JPH069211B2 (ja) | バイポ−ラトランジスタ |