JPS6358350B2 - - Google Patents

Info

Publication number
JPS6358350B2
JPS6358350B2 JP55183405A JP18340580A JPS6358350B2 JP S6358350 B2 JPS6358350 B2 JP S6358350B2 JP 55183405 A JP55183405 A JP 55183405A JP 18340580 A JP18340580 A JP 18340580A JP S6358350 B2 JPS6358350 B2 JP S6358350B2
Authority
JP
Japan
Prior art keywords
mask
see
film
metal
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55183405A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57105740A (en
Inventor
Kaname Myazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP18340580A priority Critical patent/JPS57105740A/ja
Publication of JPS57105740A publication Critical patent/JPS57105740A/ja
Publication of JPS6358350B2 publication Critical patent/JPS6358350B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP18340580A 1980-12-24 1980-12-24 See-through glass mask Granted JPS57105740A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18340580A JPS57105740A (en) 1980-12-24 1980-12-24 See-through glass mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18340580A JPS57105740A (en) 1980-12-24 1980-12-24 See-through glass mask

Publications (2)

Publication Number Publication Date
JPS57105740A JPS57105740A (en) 1982-07-01
JPS6358350B2 true JPS6358350B2 (enrdf_load_stackoverflow) 1988-11-15

Family

ID=16135197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18340580A Granted JPS57105740A (en) 1980-12-24 1980-12-24 See-through glass mask

Country Status (1)

Country Link
JP (1) JPS57105740A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01121856A (ja) * 1987-11-06 1989-05-15 Fujitsu Ltd シースルーマスク
DE10322500A1 (de) 2003-05-19 2004-12-09 Alfred Dr. Meyerhuber Vogelschutzvorrichtung für einen transparenten Stoff, Glas mit einer Vogelschutzvorrichtung und Herstellungsverfahren hierfür

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50120975A (enrdf_load_stackoverflow) * 1974-03-11 1975-09-22

Also Published As

Publication number Publication date
JPS57105740A (en) 1982-07-01

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