JPS6230624B2 - - Google Patents

Info

Publication number
JPS6230624B2
JPS6230624B2 JP57228916A JP22891682A JPS6230624B2 JP S6230624 B2 JPS6230624 B2 JP S6230624B2 JP 57228916 A JP57228916 A JP 57228916A JP 22891682 A JP22891682 A JP 22891682A JP S6230624 B2 JPS6230624 B2 JP S6230624B2
Authority
JP
Japan
Prior art keywords
chromium
layer
photomask blank
etching
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57228916A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59119353A (ja
Inventor
Shigekazu Matsui
Kenichi Kagaya
Masao Ushida
Koichi Maruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP57228916A priority Critical patent/JPS59119353A/ja
Publication of JPS59119353A publication Critical patent/JPS59119353A/ja
Publication of JPS6230624B2 publication Critical patent/JPS6230624B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/88—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for production of originals simulating relief

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57228916A 1982-12-27 1982-12-27 フオトマスクブランク Granted JPS59119353A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57228916A JPS59119353A (ja) 1982-12-27 1982-12-27 フオトマスクブランク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57228916A JPS59119353A (ja) 1982-12-27 1982-12-27 フオトマスクブランク

Publications (2)

Publication Number Publication Date
JPS59119353A JPS59119353A (ja) 1984-07-10
JPS6230624B2 true JPS6230624B2 (enrdf_load_stackoverflow) 1987-07-03

Family

ID=16883860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57228916A Granted JPS59119353A (ja) 1982-12-27 1982-12-27 フオトマスクブランク

Country Status (1)

Country Link
JP (1) JPS59119353A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4071551A1 (en) 2021-04-06 2022-10-12 Shin-Etsu Chemical Co., Ltd. Photomask blank, method for producing photomask, and photomask

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07101502B2 (ja) * 1986-06-12 1995-11-01 住友特殊金属株式会社 磁気記録媒体
TWI572972B (zh) * 2008-03-31 2017-03-01 Ｈｏｙａ股份有限公司 空白光罩、光罩及半導體積體電路之製造方法
JP5562835B2 (ja) * 2008-03-31 2014-07-30 Ｈｏｙａ株式会社 フォトマスクブランク、フォトマスクおよびフォトマスクブランクの製造方法
JP6594742B2 (ja) * 2014-11-20 2019-10-23 Ｈｏｙａ株式会社 フォトマスクブランク及びそれを用いたフォトマスクの製造方法、並びに表示装置の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5322031B2 (enrdf_load_stackoverflow) * 1974-02-02 1978-07-06
JPS5752070A (en) * 1980-09-16 1982-03-27 Hitachi Ltd Multilayer liquid crystal display element
JPS5773741A (en) * 1980-10-24 1982-05-08 Toppan Printing Co Ltd Photomask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4071551A1 (en) 2021-04-06 2022-10-12 Shin-Etsu Chemical Co., Ltd. Photomask blank, method for producing photomask, and photomask
US12372863B2 (en) 2021-04-06 2025-07-29 Shin-Etsu Chemical Co., Ltd. Photomask blank, method for producing photomask, and photomask

Also Published As

Publication number Publication date
JPS59119353A (ja) 1984-07-10

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