JPS6356531B2 - - Google Patents
Info
- Publication number
- JPS6356531B2 JPS6356531B2 JP56118389A JP11838981A JPS6356531B2 JP S6356531 B2 JPS6356531 B2 JP S6356531B2 JP 56118389 A JP56118389 A JP 56118389A JP 11838981 A JP11838981 A JP 11838981A JP S6356531 B2 JPS6356531 B2 JP S6356531B2
- Authority
- JP
- Japan
- Prior art keywords
- diazo compound
- lithographic printing
- printing plate
- diazo
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000008049 diazo compounds Chemical class 0.000 claims description 48
- 238000007639 printing Methods 0.000 claims description 35
- 238000000576 coating method Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 19
- 239000011248 coating agent Substances 0.000 claims description 18
- 230000035945 sensitivity Effects 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 230000009257 reactivity Effects 0.000 claims description 5
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 4
- 238000010894 electron beam technology Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000001737 promoting effect Effects 0.000 claims description 3
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 17
- 238000002474 experimental method Methods 0.000 description 8
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- 238000002835 absorbance Methods 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000007859 condensation product Substances 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000002798 spectrophotometry method Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920005749 polyurethane resin Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- MHOFGBJTSNWTDT-UHFFFAOYSA-M 2-[n-ethyl-4-[(6-methoxy-3-methyl-1,3-benzothiazol-3-ium-2-yl)diazenyl]anilino]ethanol;methyl sulfate Chemical compound COS([O-])(=O)=O.C1=CC(N(CCO)CC)=CC=C1N=NC1=[N+](C)C2=CC=C(OC)C=C2S1 MHOFGBJTSNWTDT-UHFFFAOYSA-M 0.000 description 1
- PLXMOAALOJOTIY-FPTXNFDTSA-N Aesculin Natural products OC[C@@H]1[C@@H](O)[C@H](O)[C@@H](O)[C@H](O)[C@H]1Oc2cc3C=CC(=O)Oc3cc2O PLXMOAALOJOTIY-FPTXNFDTSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000010668 complexation reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- -1 zinc halides Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17322980A | 1980-07-28 | 1980-07-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57118239A JPS57118239A (en) | 1982-07-23 |
| JPS6356531B2 true JPS6356531B2 (de) | 1988-11-08 |
Family
ID=22631087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56118389A Granted JPS57118239A (en) | 1980-07-28 | 1981-07-28 | Improved photosensitive material |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS57118239A (de) |
| AU (1) | AU544060B2 (de) |
| DE (1) | DE3129501A1 (de) |
| DK (1) | DK335681A (de) |
| FR (1) | FR2487534A1 (de) |
| GB (1) | GB2080964B (de) |
| IT (1) | IT1171405B (de) |
| NL (1) | NL8103455A (de) |
| SE (1) | SE8104565L (de) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4702995A (en) * | 1984-08-24 | 1987-10-27 | Nec Corporation | Method of X-ray lithography |
| CA1285418C (en) * | 1985-07-18 | 1991-07-02 | Robert A. Owens | Pre-exposure method for increased sensitivity in high contrast resist development |
| JP2511658B2 (ja) * | 1986-09-09 | 1996-07-03 | コニカ株式会社 | 耐刷力および耐薬品性が優れた感光性印刷版の製造方法 |
| FR2697646B1 (fr) * | 1992-11-03 | 1995-01-13 | Digipress Sa | Procédé pour la préparation de compositions photosensibles à base de résines polymérisables et dispositif pour l'exécution de ce procédé. |
| IL106619A0 (en) * | 1993-08-08 | 1993-12-08 | Scitex Corp Ltd | Apparatus and method for exposing a photosensitive substrate |
| EP0862518B2 (de) * | 1995-11-24 | 2006-05-17 | Kodak Polychrome Graphics Company Ltd. | Hydrophilierter träger für flachdruckplatte und verfahren zu seiner herstellung |
| GB9624224D0 (en) | 1996-11-21 | 1997-01-08 | Horsell Graphic Ind Ltd | Planographic printing |
| GB9702568D0 (en) * | 1997-02-07 | 1997-03-26 | Horsell Graphic Ind Ltd | Planographic printing |
| GB9710552D0 (en) | 1997-05-23 | 1997-07-16 | Horsell Graphic Ind Ltd | Planographic printing |
| US6357351B1 (en) | 1997-05-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Substrate for planographic printing |
| US6293197B1 (en) | 1999-08-17 | 2001-09-25 | Kodak Polychrome Graphics | Hydrophilized substrate for planographic printing |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1064100A (en) * | 1964-03-04 | 1967-04-05 | Warren S D Co | Improved photolithographic coating containing a diazonium salt |
| DE1447955C3 (de) * | 1965-01-02 | 1978-10-05 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung einer vorsensibilisierten Druckplatte |
| GB1328782A (en) * | 1967-11-15 | 1973-09-05 | Howson Algraphy Ltd | Printing plates |
| US3899332A (en) * | 1972-09-11 | 1975-08-12 | Lith Kem Corp | Printing plate and method of making the same |
| ZA739244B (en) * | 1973-04-19 | 1974-11-27 | Grace W R & Co | Preparation of printing of pattern plates |
| DE2534795C3 (de) * | 1975-08-04 | 1978-05-24 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Herstellung von Strukturen aus Positiv-Fotolackschichten |
-
1981
- 1981-07-20 AU AU73121/81A patent/AU544060B2/en not_active Ceased
- 1981-07-21 NL NL8103455A patent/NL8103455A/nl not_active Application Discontinuation
- 1981-07-21 IT IT48940/81A patent/IT1171405B/it active
- 1981-07-24 GB GB8122829A patent/GB2080964B/en not_active Expired
- 1981-07-27 DE DE19813129501 patent/DE3129501A1/de not_active Withdrawn
- 1981-07-27 DK DK335681A patent/DK335681A/da not_active Application Discontinuation
- 1981-07-27 SE SE8104565A patent/SE8104565L/ unknown
- 1981-07-28 FR FR8114658A patent/FR2487534A1/fr active Pending
- 1981-07-28 JP JP56118389A patent/JPS57118239A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57118239A (en) | 1982-07-23 |
| IT8148940A0 (it) | 1981-07-21 |
| FR2487534A1 (fr) | 1982-01-29 |
| DK335681A (da) | 1982-01-29 |
| GB2080964A (en) | 1982-02-10 |
| DE3129501A1 (de) | 1982-05-27 |
| NL8103455A (nl) | 1982-02-16 |
| AU544060B2 (en) | 1985-05-16 |
| IT1171405B (it) | 1987-06-10 |
| AU7312181A (en) | 1982-02-04 |
| GB2080964B (en) | 1984-08-30 |
| SE8104565L (sv) | 1982-01-29 |
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