JPS6354792A - Gas supplying/discharging device for gas laser oscillator - Google Patents

Gas supplying/discharging device for gas laser oscillator

Info

Publication number
JPS6354792A
JPS6354792A JP19848886A JP19848886A JPS6354792A JP S6354792 A JPS6354792 A JP S6354792A JP 19848886 A JP19848886 A JP 19848886A JP 19848886 A JP19848886 A JP 19848886A JP S6354792 A JPS6354792 A JP S6354792A
Authority
JP
Japan
Prior art keywords
gas
flow rate
laser
container
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19848886A
Other languages
Japanese (ja)
Inventor
Akihiro Otani
昭博 大谷
Akiyoshi Nawa
名和 章好
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP19848886A priority Critical patent/JPS6354792A/en
Publication of JPS6354792A publication Critical patent/JPS6354792A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/036Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To so adjust gas discharging as to reduce a pressure variation in a laser gas vessel by branching a gas discharge passage to two passages, and setting the discharge flow rates of the passages to the values near the injecting flow rate. CONSTITUTION:A conduit from a pipe 26 to a vacuum pump 30 disposed at the rear stream side of a discharge passage is branched to two passages 44, 45. The opening of a valve 41 is so set by a manual adjustment that the discharge flow rate of the laser gas passing one passage 44 is slightly more than the injecting gas flow rate from a gas cylinder 21 and the discharge flow rate of the laser gas passing the other passage 45 is slightly less than the injecting gas flow rate from the cylinder 21. Solenoid valves 42, 43 are so opened or closed as to alternately switch to selectively open the passages 44, 45 by the pressure variation in a vessel 6 to control the laser gas pressure in the vessel 6 in a predetermined range.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、連続ガス交換タイプのガスレーザ発振器の
レーザガス容器内にレーザガスを常時連続的に給排気さ
せる装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a device for continuously supplying and exhausting laser gas into a laser gas container of a continuous gas exchange type gas laser oscillator.

[従来の技術] ガスレーザ発振器には太きく分けて二つの型式がある。[Conventional technology] There are two broad types of gas laser oscillators.

その一つは「レーザガス封じ切りタイプ」と言われるも
のであって、主に大容量のものに用いられており、この
ものはレーザガス容器内に一部レーザガスを封入すると
、レーザ動作途中でのガスの給排気は行なわず所定の使
用期間経過後にガスの全量入替えを行なっている。
One of these is the "laser gas sealed type", which is mainly used for large-capacity products.When a portion of the laser gas is sealed in the laser gas container, the gas is released during laser operation. Gas is not supplied or exhausted, but the entire amount of gas is replaced after a predetermined period of use.

他の型式としては、「連続ガス交換タイプ」と言われる
ものがあって、このものはレーザ動作中においてレーザ
ガス容器内のレーザガスの一部を常時連続的に給排気さ
せてガス交換するように  。
Another type is the "continuous gas exchange type," which exchanges gas by continuously supplying and exhausting a portion of the laser gas in the laser gas container during laser operation.

なっており、ガスの一部を交換するのにガス給排気装置
を備えている。
It is equipped with a gas supply and exhaust system to exchange part of the gas.

このように容器内のレーザガスを入替えるのは、レーザ
の出力に伴ない、充填された該レーザガスの成分が変化
するためである。
The reason why the laser gas in the container is replaced in this manner is that the components of the filled laser gas change as the laser output increases.

上記二つの型式のうち、後者の型式のガスレーザ発振器
の従来技術を第3図を参照しながら説明すると、図にお
いて、(1)、(2)は互いに対向配置され、電源(3
)と接続された電極、(4)は全反射鏡、(5)は全反
射鏡(4)と対向配置された部分反射鏡、(6〕はレー
ザガス容器であって、内部にはレーザ発振を行なうため
のレーザガスが充填され、該ガスはブロア(7)により
容器(6)内を矢印に示すように循環している。(8)
は電極(1)、(2)によるグロー放電により放電空間
(9)で励起されて加熱されたレーザガスを冷却するガ
ス冷却器である。 (10)はビームレーザであって、
このビームレーザ(’to)は、放電空間(9)内の放
電によってレーザガスがエネルギーを得て励起されてレ
ーザ発振をし、該レーザが反射fi (4) 、(5)
間を往復する毎に放電エネルギーを得てくり返し反射さ
れて、その後、部分反射鏡(5)を通過して外部に射出
されて所定の目的に供されるものである。
Of the above two types, the conventional technology of the latter type of gas laser oscillator will be explained with reference to Fig. 3. In the figure, (1) and (2) are arranged opposite to each other,
), (4) is a total reflection mirror, (5) is a partial reflection mirror placed opposite to total reflection mirror (4), and (6) is a laser gas container, inside which a laser oscillation is carried out. The container (6) is filled with a laser gas for the purpose of the laser treatment, and the gas is circulated in the container (6) as shown by the arrow by a blower (7).(8)
is a gas cooler that cools the laser gas excited and heated in the discharge space (9) by glow discharge caused by the electrodes (1) and (2). (10) is a beam laser,
In this beam laser ('to), the laser gas gains energy and is excited by the discharge in the discharge space (9), causing laser oscillation, and the laser is reflected by fi (4), (5).
Each time it moves back and forth between the two, discharge energy is obtained and reflected repeatedly, and then it passes through a partial reflecting mirror (5) and is emitted to the outside for a predetermined purpose.

かかる構成のガスレーザ発振器(11)のガス容器(6
)内のレーザガスの一部を、レーザ出力中に連続的に常
時交換するために、図に示すようなガス給排気装置が設
けられており、ガスボンベ(21)に充填されたガスは
、弁類(22)、(23) 、流量計(24)及びパイ
プ(25)を介して容器(6)に一定量づつ注入される
。この場合所定の注入流量の設定は弁(23)の開度を
手動調節して行なう、一方容器(6)内のレーザガスの
排出をするのには、該ガスを容器(6)と連通するパイ
プ(26)、弁(27)を通過させ、容器(6)内の圧
力を示す圧力計(2日)からの基準圧力H,Lの信号に
基づいて、電磁弁(29)を開閉動作させている。即ち
、容器(6)内の圧力が上昇して上限基準圧力Hに達す
れば、その出力信号により電磁弁(29)は「開」とな
り、該「開」の状態が続いて容器(6)内の圧力が下降
して下限基準圧力りになればその出力信号により電磁弁
(29)は「閉」となる、この場合、所定の排出流量の
設定は、上記ガス給送系統と同様に弁(27)の開度を
手動調節して行なうが、注入流量に比べてかなり大きめ
に設定しておく必要がある。これはガス排出流量をガス
注入流量に近づけて設定すると、弁(27)等へのごみ
のつまりゃ季節による温度変化等を原因とする経時変化
により、コントロールする圧力範囲が不安定となり、さ
らに仮にガス排出流量の方がガス注入流量より小さくな
るというs悪が生じると、電磁4r(2a)が「開」状
態であっても容器(6)内のレーザガス圧力が上昇し続
け、危険を伴なうためである。なお、(30)はガスの
給排気中も常時運転している真空ポンプ、(31)はT
L電磁弁29)のバイパス回路で゛あり、通常は弁(3
2)は「閉」となっている。
The gas container (6) of the gas laser oscillator (11) with such a configuration
) A gas supply/exhaust device as shown in the figure is provided in order to continuously exchange a part of the laser gas in the gas cylinder (21) during laser output. (22), (23) are injected in fixed amounts into the container (6) via the flowmeter (24) and pipe (25). In this case, the predetermined injection flow rate is set by manually adjusting the opening degree of the valve (23), while the laser gas in the container (6) is discharged through a pipe that communicates the gas with the container (6). (26), the solenoid valve (29) is opened and closed based on the reference pressure H and L signals from the pressure gauge (2nd) which indicates the pressure inside the container (6) through the valve (27). There is. That is, when the pressure inside the container (6) increases and reaches the upper limit reference pressure H, the solenoid valve (29) becomes "open" due to the output signal, and the "open" state continues and the inside of the container (6) When the pressure decreases to the lower limit reference pressure, the output signal causes the solenoid valve (29) to close. In this case, the predetermined discharge flow rate is set by the valve ( This is done by manually adjusting the opening degree of step 27), but it needs to be set considerably larger than the injection flow rate. This is because if the gas exhaust flow rate is set close to the gas injection flow rate, the pressure range to be controlled will become unstable due to dust clogging in the valve (27), etc., and changes over time caused by seasonal temperature changes, etc. If the gas exhaust flow rate becomes smaller than the gas injection flow rate, the laser gas pressure inside the container (6) will continue to rise even if the electromagnetic 4r (2a) is in the "open" state, resulting in a dangerous situation. This is for the purpose of In addition, (30) is a vacuum pump that is constantly operating even during gas supply and exhaust, and (31) is a T
This is a bypass circuit for the L solenoid valve 29), and normally the valve (3
2) is “closed”.

[発明が解決しようとする問題点] 通常、容器(6)内のレーザガスの圧力は数十[Tor
rl  (例えば50Torr) c7)場合が多いノ
テあるが、レーザ発振効率はレーザガス圧力の変動に伴
なって変化するため、容器(6)内部圧力の変動範囲が
大きいと(例えば50Torr±5Torr)、  レ
ーザ出力の変動も大きくなってしまうため、該変動範囲
を小さくするように圧力調節する必要がある。
[Problems to be Solved by the Invention] Normally, the pressure of the laser gas in the container (6) is several tens of Torr.
rl (e.g. 50 Torr) c7) Note that this is often the case, but since the laser oscillation efficiency changes with fluctuations in the laser gas pressure, if the fluctuation range of the internal pressure of the container (6) is large (e.g. 50 Torr ± 5 Torr), the laser Since the fluctuation in output also becomes large, it is necessary to adjust the pressure so as to reduce the range of fluctuation.

しかしながら、上記のような従来のガスレーザ発振器の
ガス給排気装置により変動範囲の小さい圧力調節を行な
う場合は(例えば50Torr±1Torr)、弁(2
7)の微妙な開度調部に時間を要し、しかも排出ガス流
量が経時変化し易くなる。また、電磁弁(29)の開閉
頻度は少ない方が望ましいのであるが(例えば1回/1
0秒程度)、従来装置では該開閉頻度が非常に多くなり
(例えば1〜3回/秒)、シたがって電磁弁(29)の
寿命が短くなって、この電磁弁(29)を頻繁に取り替
えなければならないという問題点があった。特に、容器
(6)の容積が小さい場合や、ガスの注入流量が多い場
合等に上記不具合は著しくなる。
However, when adjusting the pressure with a small fluctuation range (for example, 50 Torr ± 1 Torr) using the gas supply and exhaust device of the conventional gas laser oscillator as described above, the valve (2
7) It takes time to finely adjust the opening, and moreover, the exhaust gas flow rate tends to change over time. Also, it is desirable that the solenoid valve (29) opens and closes less frequently (for example, once/1 time).
(approximately 0 seconds), and in the conventional device, the frequency of opening and closing is very high (for example, 1 to 3 times/second), and therefore the life of the solenoid valve (29) is shortened, and this solenoid valve (29) has to be operated frequently. The problem was that it had to be replaced. In particular, the above-mentioned problem becomes serious when the volume of the container (6) is small or when the gas injection flow rate is large.

また、容器(6)内のレーザガスの圧力が上昇しすぎる
と、容器(6)内に配設されたブロア(7)の負荷が大
きくなり、該ブロア(7)の軸受部の焼付や電源に故障
が起こり、ブロア(7)の正転ができなくなるという問
題点があった。
Furthermore, if the pressure of the laser gas in the container (6) increases too much, the load on the blower (7) disposed in the container (6) will increase, causing seizure of the bearing of the blower (7) and damage to the power supply. There was a problem in that a failure occurred and the blower (7) could no longer be rotated in the normal direction.

この発明はかかる問題点を解決するためになされもので
、レーザガス容器内の圧力変動を小さくするようなガス
排出3J節を行なうことができるとともに、電磁弁の開
閉頻度を減少させて該電磁弁の寿命を改善することので
きるガスレーザ発振器のガス給排気装置を得ることを目
的とする。
This invention was made to solve these problems, and it is possible to perform gas discharge 3J to reduce pressure fluctuations in the laser gas container, and to reduce the frequency of opening and closing of the solenoid valve. The object of the present invention is to obtain a gas supply/exhaust device for a gas laser oscillator that can improve the service life.

[問題点を解決するための手段] この発明に係るガスレーザ発振器のガス給排気装置は、
レーザガス容器内に、レーザ発振を行なうためのレーザ
ガスを充填し、レーザガスを該容器内に連続的に給排気
させてガス交換をするものにおいて、排気経路を2つに
分岐させ、一方の分岐経路は注入ガス流量よりわずかに
多い排出流量に設足し、他方の分岐経路は注入ガス流量
よりわずかに少ない排出流量に設定するとともに、上記
排気経路には開閉器を配設し、この開閉器は、容器内の
圧力を検出する圧力計からの上限設定圧力信号により上
記一方の分岐経路を、上記圧力計からの下限設定圧力信
号により上記他方の分岐経路を、それぞれ選択的に開放
流通させるようにしたものである。
[Means for solving the problem] A gas supply and exhaust device for a gas laser oscillator according to the present invention has the following features:
A laser gas container is filled with a laser gas for laser oscillation, and the laser gas is continuously supplied and exhausted into the container for gas exchange.The exhaust path is branched into two, and one branch path is The exhaust flow rate is set to be slightly higher than the injection gas flow rate, and the other branch route is set to a discharge flow rate slightly lower than the injection gas flow rate, and a switch is installed on the exhaust route, and this switch One branch path is selectively opened and circulated by an upper limit setting pressure signal from a pressure gauge that detects the internal pressure, and the other branch path is selectively opened by a lower limit setting pressure signal from the pressure gauge. It is.

[作用] この発明においては、ガスの排気経路を2つの経路に分
岐したから、各経路を流れる排出流量を注入流量に近い
値でそれぞれ設定することが可能となる。
[Operation] In the present invention, since the gas exhaust route is branched into two routes, it is possible to set the exhaust flow rate through each route to a value close to the injection flow rate.

[実施例] 以下第1図に示した本発明の一実施例に基づいて、従来
と同−又は相当部分には同−符りを付して、本発明の特
徴を中心に説明する。第1図は本実施例装置の説明図で
あり、図示のように1本発明はレーザガス容器(6)内
のレーザガスを排出する手段に特徴を有している。
[Embodiment] Based on an embodiment of the present invention shown in FIG. 1, the features of the present invention will be mainly explained below, with the same or equivalent parts as those in the prior art being given the same reference numerals. FIG. 1 is an explanatory diagram of the apparatus of this embodiment, and as shown in the figure, one feature of the present invention is the means for discharging the laser gas in the laser gas container (6).

即ち、容器(6)の排気経路にはガス排出用のパイプ(
26)が取付けられており、この排気経路のうち、パイ
プ(26)と、後流側に配設された真空ポンプ(30)
との間が2つの経路(44)、(45)に分岐されてい
る。この一方の分岐経路(44)には弁(40)と開閉
器(42)が、他方の分岐経路(45)には弁(41)
と開閉器(43)が、それぞれ配設されている。この実
施例では開閉W(42)、(43)としてそれぞれ電磁
弁を用いた場合を示している。なお、容器(6)へのガ
スの注入設備、弁(32)を備えたバイパス回路(31
)、圧力計(28)は第3図と同様のものが設けられて
いる。
That is, a gas exhaust pipe (
26) is installed, and in this exhaust route, a pipe (26) and a vacuum pump (30) arranged on the downstream side are installed.
The route between the two branches is divided into two routes (44) and (45). One branch route (44) has a valve (40) and a switch (42), and the other branch route (45) has a valve (41).
and a switch (43) are respectively provided. In this embodiment, a case is shown in which electromagnetic valves are used as the opening/closing Ws (42) and (43), respectively. In addition, a bypass circuit (31) equipped with equipment for injecting gas into the container (6) and a valve (32) is provided.
), and a pressure gauge (28) similar to that shown in FIG. 3 is provided.

次に以上のように構成された上記実施例の動作について
説明する。まず、電磁弁(43)が「閉」、電磁弁(4
2)が「開」の状態において、一方の分岐経路(44)
を通過するレーザガスの排出流量として、ボンベ(21
)からの注入ガス流ff1(Q)よりわずかに多い所定
の流i(Q+)となるように、弁(40)の開度を手動
調節して設定する0次に電磁弁(42)が「閉」、電磁
弁(43)が「開」の状態において、他方の分岐経路(
45)を通過するレーザガスの排出流量として、ボンベ
(21)からの注入ガス流量(Q)よりわずかに少ない
所定の流量(Q2)となるように、弁(41)の開度を
手動調節して設定する。
Next, the operation of the above-described embodiment configured as above will be explained. First, the solenoid valve (43) is "closed" and the solenoid valve (43) is "closed".
2) is in the "open" state, one branch route (44)
The exhaust flow rate of the laser gas passing through the cylinder (21
) The zero-order solenoid valve (42) is set by manually adjusting the opening degree of the valve (40) so that a predetermined flow i (Q+) is slightly larger than the injection gas flow ff1 (Q) from the When the solenoid valve (43) is in the “closed” state and the solenoid valve (43) is in the “open” state, the other branch path (
The opening degree of the valve (41) is manually adjusted so that the discharge flow rate of the laser gas passing through the cylinder (45) is a predetermined flow rate (Q2) that is slightly smaller than the injection gas flow rate (Q) from the cylinder (21). Set.

然して、最初、電磁弁(42)、(43)が共に「閉」
状態でボンベ(21)からレーザガスが容器(6)内に
一定量(Q)づつ注入されている場合において、容器(
6)内の圧力が上昇して上限基準圧力Hに達すれば、圧
力計(28)からの上限設定圧力信号により電磁弁(4
2)が「開」となる、すると、経路(44)を(Q+ 
)の流量のガスが排出される。ここで排出流量(Q+ 
)は注入流量(Q)よりわずかに多いため、容器(8)
内の圧力はゆっくりと下降し、やがて下限基準圧力りに
達する。すると、圧力計(28)からの下限設定圧力信
号により電磁弁(42)は「閉」となり、電磁弁(43
)が「開」となる、すると、経路(45)の設定排出流
量(Q2)は注入流量(Q)よりわずかに少ないため、
容器(6)内の圧力はゆっくりと上昇し、やがて上限基
準圧力Hに達し、圧力計(28)からの上限設定圧力信
号により電磁弁(42)と(43)が切替わる。以下容
器(6)内の圧力変動により、上記切替えがくり返され
る。このようにして、電磁弁(42) 、(43)によ
り上記2つの分岐経路(44)、(45)をそれぞれ選
択的に開放流通させるべく交互に切替えることにより、
容器(6)内のレーザガス圧力が一定範囲にコントール
される。
However, at first, both solenoid valves (42) and (43) were "closed".
When the laser gas is injected from the cylinder (21) into the container (6) in a constant amount (Q) at a time, the container (
6) rises and reaches the upper limit reference pressure H, the solenoid valve (4) is activated by the upper limit setting pressure signal from the pressure gauge (28).
2) becomes “open”, then route (44) becomes (Q+
) is discharged. Here, the discharge flow rate (Q+
) is slightly higher than the injection flow rate (Q), so the container (8)
The internal pressure slowly decreases and eventually reaches the lower limit reference pressure. Then, the solenoid valve (42) is "closed" by the lower limit setting pressure signal from the pressure gauge (28), and the solenoid valve (43) is closed.
) becomes "open", then the set discharge flow rate (Q2) of route (45) is slightly smaller than the injection flow rate (Q), so
The pressure inside the container (6) increases slowly and eventually reaches the upper limit reference pressure H, and the solenoid valves (42) and (43) are switched by the upper limit setting pressure signal from the pressure gauge (28). Thereafter, the above switching is repeated due to pressure fluctuations within the container (6). In this way, by alternately switching the two branch paths (44) and (45) to selectively open and circulate the two branch paths (44) and (45) using the solenoid valves (42) and (43),
The laser gas pressure within the container (6) is controlled within a certain range.

第2図は、他の実施例装置を示す説明図であり、この実
施例における2つの分岐経路(44) 。
FIG. 2 is an explanatory diagram showing another example device, and shows two branch paths (44) in this example.

(45)を切替えて選択的に開放流通させる開閉器(5
0)としては、北記実施例で用いた2台の電磁弁の代り
に、1台の三方電磁弁(50)を用いた場合を示してい
る。即ち、圧力計(28)からの−上限及び下成膜定圧
力信号により三方電磁弁(50)を動作させることによ
り、分岐経路(44)、(45)を切替えることができ
る。
(45) to selectively open and circulate the switch (5
0) shows the case where one three-way solenoid valve (50) is used instead of the two solenoid valves used in the above embodiment. That is, the branch paths (44) and (45) can be switched by operating the three-way solenoid valve (50) based on the -upper and lower constant pressure signals from the pressure gauge (28).

したがって、上記各実施例では、経路(44)。Therefore, in each of the above embodiments, the route (44).

(45)共、はぼガス注入量(Q)に近い流量で容器(
6)内のガスを常時排気しているので、従来技術の説明
と同じく、圧力変動範囲の小さい圧力コントロール幅(
例えば50Torr±ITorr)であっても、電磁弁
(42)、(43)又は三方TL電磁弁50)の開閉回
数が減少することとなり(例えば1回710秒程度の開
閉回数にすることが可能)、該電磁弁又は三方電磁涛の
寿命が長くなり、開閉器の故障が少なくなる。また、容
器(6)内のガス圧力変動幅を小さくできるので、レー
ザ発振効率の低下を防止できるとともに、容器(6)内
のレーザガスの圧力が低下しすぎて電極部が異常なアー
ク放電を起こし、該″rrL極部が破壊されるという故
障も防止できることとなる。
(45) In both cases, the container (
6) Since the gas within is constantly exhausted, the pressure control width (
For example, even if the temperature is 50 Torr±ITorr), the number of openings and closings of the solenoid valves (42), (43) or the three-way TL solenoid valve 50) will be reduced (for example, the number of openings and closings can be reduced to about 710 seconds each time). , the life of the solenoid valve or three-way solenoid is extended, and the failure of the switch is reduced. In addition, since the range of gas pressure fluctuation in the container (6) can be reduced, it is possible to prevent a decrease in laser oscillation efficiency, and the pressure of the laser gas in the container (6) can drop too much, causing abnormal arc discharge in the electrode section. , it is also possible to prevent a failure in which the ``rrL pole portion is destroyed.

なお、開閉器として、電気により動作する電磁弁又は三
方電磁弁の代りに、空気圧力により動作する弁を用いて
もよい。
Note that as the switch, a valve operated by air pressure may be used instead of a solenoid valve or a three-way solenoid valve operated by electricity.

また、圧力計(28)の型式としては、ブルドン管式圧
力計、半導体センサを用いたもの、マノメータタイプ、
ビラニータイプ等どのような型式のものであってもよい
In addition, the types of the pressure gauge (28) include a Bourdon tube type pressure gauge, one using a semiconductor sensor, a manometer type,
It may be of any type, such as the Villany type.

ところで、L2各実施例ではガス排気側に開閉器と、分
岐した2つの経路を設けた場合を示したが、ガス注入側
、即ち、ボンベ(21)と容器(6)との間に設けても
上記実施例と同様の効果を奏する。
By the way, in each L2 example, a case was shown in which a switch was provided on the gas exhaust side and two branched paths were provided, but a switch was provided on the gas injection side, that is, between the cylinder (21) and the container (6). This embodiment also produces the same effects as the above embodiment.

[発明の効果] この発明は以上説明したとおり、ガス排気経路を2経路
に分岐させ、一方の経路の排出流量をガス注入Ktmよ
りやや多く、他方をやや少なくなるようにそれぞれ設定
し、交互に切替えて選択的に開放流通させるようにした
ことから、注入流量に近い値の排出流量とすることがで
きて、ゆっくりした圧力コントロールができることとな
り、開閉器のON・OFF回数を減少させて該開閉器の
寿命を向上させて、レーザ発振器を故障の少ない信頚性
の高いものにすることができるという効果がある。
[Effects of the Invention] As explained above, this invention branches the gas exhaust route into two routes, sets the exhaust flow rate of one route to be slightly higher than the gas injection Ktm, and the other route to be slightly lower, and alternately By switching to selectively open and flow, the discharge flow rate can be set to a value close to the injection flow rate, allowing for slow pressure control, reducing the number of times the switch is turned on and off. This has the effect of increasing the lifespan of the device and making the laser oscillator less likely to fail and highly reliable.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例を示すガス給排気装置を備
えたガスレーザ発振器の経路を示す説明図、第2図はこ
の発明の他の実施例装置を示す説明図、第3図は従来の
ガス給排気装置を備えたガスレーザ発振器の経路を示す
第1図相当の説明図である。 図において (6)はレーザガス容器。 (11)はガスレーザ発振器、  (28)は圧力計、
(42)、(43)は開閉器(電磁弁)、(44)は一
方の分岐経路、 (45)は他方の分岐経路、 (50)は開閉器(三方電磁弁)、 Qは注入ガス流量。 QlはQよりわずかに多い排出流量、 Q2はQよりわずかに少ない排出流量。 なお、各図中、同一符号は同−又は相当部分を示す。 代  理  人   大  岩  増  雄第1図 第2図
FIG. 1 is an explanatory diagram showing a path of a gas laser oscillator equipped with a gas supply/exhaust device showing one embodiment of the present invention, FIG. 2 is an explanatory diagram showing another embodiment of the device of the invention, and FIG. 3 is a conventional diagram. FIG. 2 is an explanatory diagram corresponding to FIG. 1 showing a path of a gas laser oscillator equipped with a gas supply/exhaust device. In the figure, (6) is a laser gas container. (11) is a gas laser oscillator, (28) is a pressure gauge,
(42), (43) are switches (solenoid valves), (44) is one branch route, (45) is the other branch route, (50) is a switch (three-way solenoid valve), Q is the injection gas flow rate . Ql is a discharge flow rate slightly higher than Q, and Q2 is a discharge flow rate slightly lower than Q. In each figure, the same reference numerals indicate the same or corresponding parts. Agent Masuo Oiwa Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] レーザ発振を行なうためのレーザガスが内部に充填され
たレーザガス容器を備え、該容器内にレーザガスを連続
的に給排気させてガス交換するガスレーザ発振器におい
て、排気経路を2つに分岐させ、一方の分岐経路は注入
ガス流量よりわずかに多い排出流量に、他方の分岐経路
は、注入ガス流量よりわずかに少ない排出流量にそれぞ
れ設定し、上記排気経路には、容器内の圧力を検出する
圧力計からの上限設定圧力信号により上記一方の分岐経
路を、上記圧力計からの下限設定圧力信号により上記他
方の分岐経路をそれぞれ選択的に開放流通させる開閉器
を配設したことを特徴とするガスレーザ発振器のガス給
排気装置。
In a gas laser oscillator, which is equipped with a laser gas container filled with laser gas for laser oscillation, and which continuously supplies and exhausts the laser gas into the container for gas exchange, the exhaust path is branched into two, and one branch is connected to the other branch. One route is set to a discharge flow rate slightly higher than the injection gas flow rate, and the other branch route is set to a discharge flow rate slightly lower than the injection gas flow rate. Gas in a gas laser oscillator, characterized in that a switch is provided for selectively opening and circulating one branch path in response to an upper limit setting pressure signal and selectively opening and circulating the other branch path in response to a lower limit setting pressure signal from the pressure gauge. Supply and exhaust equipment.
JP19848886A 1986-08-25 1986-08-25 Gas supplying/discharging device for gas laser oscillator Pending JPS6354792A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19848886A JPS6354792A (en) 1986-08-25 1986-08-25 Gas supplying/discharging device for gas laser oscillator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19848886A JPS6354792A (en) 1986-08-25 1986-08-25 Gas supplying/discharging device for gas laser oscillator

Publications (1)

Publication Number Publication Date
JPS6354792A true JPS6354792A (en) 1988-03-09

Family

ID=16391949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19848886A Pending JPS6354792A (en) 1986-08-25 1986-08-25 Gas supplying/discharging device for gas laser oscillator

Country Status (1)

Country Link
JP (1) JPS6354792A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017157707A (en) * 2016-03-02 2017-09-07 三菱電機株式会社 Laser device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017157707A (en) * 2016-03-02 2017-09-07 三菱電機株式会社 Laser device

Similar Documents

Publication Publication Date Title
JP2660097B2 (en) Fuel cell generator
KR950023882A (en) Gas valve having a gas control valve having a polymer body coupled with a thermally reactive gas shutoff valve having a metal body
JPS6354792A (en) Gas supplying/discharging device for gas laser oscillator
JP3572401B2 (en) Fuel circulation system for fuel cell system
JPS58163182A (en) Fuel cell
JPH0565593B2 (en)
JP3044060B2 (en) Laser gas supply control device in gas laser oscillator
JP2650105B2 (en) Gas control device
JP3372401B2 (en) Closed tank type dissolved oxygen removing device and closed piping system using the same
JPH1073005A (en) Ground seal steam governor
JPS6348141Y2 (en)
JPH09266342A (en) Gas laser oscillator
JP2918209B2 (en) Autoclave cooling system
JP2827911B2 (en) Gas control device
JP3283856B2 (en) Pressure control valve for vacuum
JP7487703B2 (en) Storage Shelf
KR0165318B1 (en) Cooling system of ion implant apparatus
JPH04176177A (en) Laser gas supply control method of gas laser oscillator
JPH0821744B2 (en) Gas laser oscillator
JPH06244478A (en) Laser gas mixer
JPS61150798A (en) Cold isostatic pressure reducer
JPS5992586A (en) Gas laser device
JP2613698B2 (en) Compressor pressure control method
SU1196518A1 (en) Device for controlling motor operation of turbine unit
KR20000027586A (en) High current ion implanter