JPS5992586A - Gas laser device - Google Patents
Gas laser deviceInfo
- Publication number
- JPS5992586A JPS5992586A JP20298982A JP20298982A JPS5992586A JP S5992586 A JPS5992586 A JP S5992586A JP 20298982 A JP20298982 A JP 20298982A JP 20298982 A JP20298982 A JP 20298982A JP S5992586 A JPS5992586 A JP S5992586A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- pressure
- discharge tube
- supply means
- laser device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、気体をレーザ発振の媒質とするガスレーザ装
置に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a gas laser device using gas as a laser oscillation medium.
従来例の構成とその問題点
３ページ
Ｃ０２ガスレーザなど、気体をレーザ発振の媒質とする
ガスレーザ装置は一般に媒質ガスをグロー放電により励
起してレーザ発振を行う。グロー放電は減圧下で行われ
るのが一般的であり、真空ポンプなどの減圧手段が設け
られる。長時間の出力低下が問題にならない場合には減
圧後しτザ媒質を供給し、ガスをレーザ装置内に封じ込
めて使用される。また長時間の出力安定性が要求される
場合には減圧手段を設けるとともに、媒質ガスの供給手
段が設けられる。媒質ガスは一定量連続で供給される場
合と一定時間毎に間欠的に供給される場合とがある。Conventional Structure and Problems Page 3 Gas laser devices that use gas as a medium for laser oscillation, such as a C02 gas laser, generally perform laser oscillation by exciting the medium gas by glow discharge. Glow discharge is generally performed under reduced pressure, and a pressure reducing means such as a vacuum pump is provided. If long-term output reduction is not a problem, the laser medium is supplied after the pressure is reduced, and the gas is sealed within the laser device. Further, when long-term output stability is required, a pressure reducing means and a medium gas supply means are provided. The medium gas may be supplied continuously in a fixed amount or intermittently at fixed time intervals.
第１図は従来のガスレーザ装置の概略構成図である。図
において、１はレーザ出力の取出鏡（以下出力鏡という
）、２は全反射鏡である。出力鏡１と全反射鏡２により
光学的共振器が形成される。FIG. 1 is a schematic diagram of a conventional gas laser device. In the figure, 1 is a laser output mirror (hereinafter referred to as an output mirror), and 2 is a total reflection mirror. The output mirror 1 and the total reflection mirror 2 form an optical resonator.
光学的共振器の間はガラスやセラミックなどで作られた
放電管３が設けられる。この放電管３内はレーザ媒質ガ
スで充満されている。４は放電用電極であり、６は放電
管３からのガス出口であり、減圧手段６に接続されてい
る。７は放電管３へのガス供給口であり、媒質ガス供給
手段８に接続されている。この媒質ガス供給手段８はガ
スボンベ９、減圧弁１０．ガス流量調整弁１１などから
構成されている。A discharge tube 3 made of glass, ceramic, etc. is provided between the optical resonators. The inside of this discharge tube 3 is filled with laser medium gas. 4 is a discharge electrode, and 6 is a gas outlet from the discharge tube 3, which is connected to a pressure reducing means 6. 7 is a gas supply port to the discharge tube 3, and is connected to a medium gas supply means 8. This medium gas supply means 8 includes a gas cylinder 9, a pressure reducing valve 10. It is composed of a gas flow rate adjustment valve 11 and the like.
このようなレーザ装置において、装置停止後、再運転時
、出力安定までに長時間を要する問題があった。特に長
時間停止後の再運転では顕著な現象であった。これは減
圧状態で装置が長時間放置されるため、外部からの大気
混入が発生し、装置内部へのガス吸着が発生するためで
ある。これにより、媒質ガス成分が変化し、再運転時の
出力安定に長時間を必要とすることになる。また大気中
の水分が装置内部へ吸着し、再運転時減圧手段による減
圧動作により、光学部品に水分が結露し部品破壊の一因
となるという欠点も生じていた。In such a laser device, there is a problem in that it takes a long time to stabilize the output after the device is stopped and restarted. This phenomenon was especially noticeable when restarting after a long stop. This is because the device is left in a reduced pressure state for a long time, which causes air to enter from the outside and causes gas adsorption into the device. As a result, the medium gas components change, and it takes a long time to stabilize the output when restarting the operation. Additionally, moisture in the atmosphere is adsorbed into the inside of the device, and when the device is restarted, the pressure reduction operation by the pressure reduction means causes the moisture to condense on the optical components, which may cause damage to the components.
発明の目的
本発明は、このような従来の欠点を除去したものであり
、装置内部への大気混入を低減し、再運転時の出力安定
時間を短縮するとともに光学部品５ページ
の破壊を防止することを目的とするものである。Purpose of the Invention The present invention eliminates these conventional drawbacks, reduces air intrusion into the inside of the device, shortens the output stabilization time during restart, and prevents damage to optical components. The purpose is to
発明の構成
上記目的を達成するために本発明は、装置運転停止後、
装置の減圧部分にガスを供給する手段を設け、これによ
りほぼ大気圧に到達させることにより、外部からの大気
ガスの混入を防止したものである。Structure of the Invention In order to achieve the above object, the present invention provides the following features:
A means for supplying gas to the depressurized part of the apparatus is provided to reach approximately atmospheric pressure, thereby preventing atmospheric gas from entering from the outside.
実施例の説明 以下本発明を第２図の実施例により説明する。Description of examples The present invention will be explained below with reference to the embodiment shown in FIG.
図において、１は出力鏡、２は全反射鏡、３は放電管、
４は放電用電極、５はガス出口、６は減圧手段、７はガ
ス供給口である。そしてガスボンベ９からのガスは減圧
弁１ｏで減圧される。第１のガス流量調整弁１１−１は
装置運転時、ガスを放電管３に供給するだめのガス量を
調整するもので、第１の開閉コック１２−１に連結され
る。第２のガス流量調整弁１１−２は装置停止時、ガス
を放電管３に供給するために設けられ、第２の開閉コッ
ク１２−２に連結されている。In the figure, 1 is an output mirror, 2 is a total reflection mirror, 3 is a discharge tube,
4 is a discharge electrode, 5 is a gas outlet, 6 is a pressure reducing means, and 7 is a gas supply port. Then, the pressure of the gas from the gas cylinder 9 is reduced by the pressure reducing valve 1o. The first gas flow rate adjustment valve 11-1 adjusts the amount of gas to be supplied to the discharge tube 3 during operation of the device, and is connected to the first opening/closing cock 12-1. The second gas flow rate regulating valve 11-2 is provided to supply gas to the discharge tube 3 when the apparatus is stopped, and is connected to the second opening/closing cock 12-2.
開閉コック１２−１．１２−２は手動以外に電６７、−
ッ
気的信号で自動的に開閉されると効果的である。The opening/closing cock 12-1, 12-2 can be operated manually or by electric 67, -
It would be effective if they were opened and closed automatically by an air signal.
装置動作開始時は、第１の開閉コック１２−１を開とし
、第２の開閉コック１２−２は閉とする。When the device starts operating, the first opening/closing cock 12-1 is opened and the second opening/closing cock 12-2 is closed.
第１のガス流量調整弁１１−１により供給するガス流量
を決め、放電管３の内部圧力を制御する。The gas flow rate to be supplied is determined by the first gas flow rate regulating valve 11-1, and the internal pressure of the discharge tube 3 is controlled.
装置停止後は第２の開閉コック１２−２を開として、放
電管３の内圧を高める。大気圧への到達時間短縮には停
止時のガス流量を大きくすることが望ましく、第１の開
閉コック１２−１を開のままに保持してもよい。After the apparatus is stopped, the second opening/closing cock 12-2 is opened to increase the internal pressure of the discharge tube 3. In order to shorten the time required to reach atmospheric pressure, it is desirable to increase the gas flow rate during stoppage, and the first opening/closing cock 12-1 may be kept open.
混合ガスが媒質の場合は、それぞれのガスボンベに応じ
て減圧弁、ガス流量調整弁を設けてもよい。放電管３の
内部圧力を異常に高めないためガス出口６に圧力検出手
段１３を設け、開閉コック１２−１ 、１２−２を大気
圧に昇圧時点で閉としてもよい。またガスの消費量を少
なくするため減圧手段６により排出される媒質ガスを再
度放電管３に供給するガス循環手段１４を設けた場合に
ついては、ガス循環手段１４の内部も大気圧に昇圧する
と効果的である０昇圧ガス流量を大きくする７ベージ
ことは大気圧到達時間短縮に効果がある。また放ると効
果的である。When mixed gas is the medium, a pressure reducing valve and a gas flow rate regulating valve may be provided depending on each gas cylinder. In order to prevent the internal pressure of the discharge tube 3 from becoming abnormally high, a pressure detection means 13 may be provided at the gas outlet 6, and the opening/closing cocks 12-1 and 12-2 may be closed when the pressure is increased to atmospheric pressure. In addition, in the case where gas circulation means 14 is provided to supply the medium gas discharged by the pressure reduction means 6 to the discharge tube 3 again in order to reduce gas consumption, it is effective to increase the pressure inside the gas circulation means 14 to atmospheric pressure. Increasing the zero pressurization gas flow rate, which is the target, is effective in shortening the time required to reach atmospheric pressure. It is also effective to release it.
さらに本発明において、昇圧ガスを放電管３より減圧手
段６に向って流れるように供給することが放電管３の内
部の汚染を防止するうえで有効で力差が付加されており
、減圧手段停止後には大気側より減圧側への大気逆流が
発生する。減圧手段６には一般的に冷却油や潤滑油など
が用いられており、これが放電管３内に逆流し、光学部
品の汚染が発生するが、本発明では停止後昇圧ガス流に
よりこの逆流を防止することができ、放電管内の汚染防
止ができる。Furthermore, in the present invention, supplying the pressurized gas from the discharge tube 3 to the pressure reduction means 6 is effective in preventing contamination inside the discharge tube 3, and a force difference is added to stop the pressure reduction means. Later, atmospheric backflow occurs from the atmospheric side to the reduced pressure side. Cooling oil, lubricating oil, etc. are generally used in the pressure reducing means 6, and this backflows into the discharge tube 3, causing contamination of optical components. However, in the present invention, this backflow is prevented by a pressurized gas flow after stopping. This can prevent contamination inside the discharge tube.
第２のガス流量調整弁１１−２の流量を適切に選択し、
大気圧への昇圧時間を選択し、昇圧時間経過後、開閉コ
ック１２−２を閉とすることも本発明の実施においてガ
ス消費量低減に効果的である。第２図では同一ボンベよ
り昇圧ガスを供給しているが、別のボンベとしてもよい
ことはいうまでもない０昇圧ガスとしては装置内に吸着
しにぐいガス、例えば不活性ガスが本発明の目的達成に
効果的であり、特にレーザ媒質ガスそのものを用いるの
が最も効果を発揮する。Appropriately select the flow rate of the second gas flow rate adjustment valve 11-2,
In carrying out the present invention, it is also effective to select the time for increasing the pressure to atmospheric pressure and to close the opening/closing cock 12-2 after the pressure increasing time has elapsed. In Fig. 2, the pressurized gas is supplied from the same cylinder, but it goes without saying that a different cylinder may be used.As the zero pressurized gas, gases that are difficult to adsorb in the device, such as inert gases, are used in the present invention. It is effective in achieving the objective, and in particular, using the laser medium gas itself is most effective.
発明の効果
以上のように本発明によれば、レーザ装置停止時装置内
部の圧力を大気圧もしくはそれ以上に保持できるため外
部からの大気混入を防止でき、しだがって装置内部への
大気吸着による媒質ガス成分の変化が減少し、出力安定
化に大きな効果がある。特に大気中の水分吸着による光
学部品の破壊を防止することができる。Effects of the Invention As described above, according to the present invention, when the laser device is stopped, the pressure inside the device can be maintained at atmospheric pressure or higher, thereby preventing air from entering the device from outside, and thus preventing atmospheric adsorption into the inside of the device. This reduces changes in the medium gas components due to this change, which has a great effect on stabilizing output. In particular, destruction of optical components due to adsorption of moisture in the atmosphere can be prevented.
また減圧手段からの汚染防止を図ることができ、レーザ
出力の安定性向上と光学部品の破壊、汚染防止による長
寿命化といった工業的価値の高いものである。Furthermore, it is possible to prevent contamination from the pressure reducing means, and it has high industrial value in that it improves the stability of laser output and extends the life of optical components by preventing damage and contamination.
第１図は従来のガスレーザ装置の概略構成図、９ページ
第２図は本発明によるガスレーザ装置の一実施例の概略
構成図である。
１・・・・・・出力鏡、２・・・・・・全反射鏡、３・
・・・・・放電管、４・・・・・・放電用電極、６・・
・・・・ガス出口、６・・・・・・減圧手段、７・・・
・・・ガス供給口、９・・・・・・ガスポ／べ、１ｏ・
・・・・・減圧弁、１１−１．１１−２・・・・・・ガ
ス流量調整弁、１２−１．１２−２・・・・・・開閉コ
ック、１３・・・・・・圧力検出手段、１４・・・・・
・循環手段、１６・・・・・・圧力弁。
代理人の氏名 弁理士 中 尾 敏 男 ほか１名４０
ｚFIG. 1 is a schematic diagram of a conventional gas laser device, and FIG. 2, page 9, is a schematic diagram of an embodiment of a gas laser device according to the present invention. 1... Output mirror, 2... Total reflection mirror, 3.
...Discharge tube, 4...Discharge electrode, 6...
... Gas outlet, 6 ... Pressure reduction means, 7 ...
...Gas supply port, 9...Gas point/be, 1o.
...Pressure reducing valve, 11-1.11-2...Gas flow rate adjustment valve, 12-1.12-2...Opening/closing cock, 13...Pressure Detection means, 14...
- Circulation means, 16...pressure valve. Name of agent: Patent attorney Toshio Nakao and 1 other person 40
z
Claims (1)
放電管と、その放電管のレーザ発振にかかわる領域を減
圧する減圧手段と、前記放電管へ媒質ガスを供給する媒
質ガス供給手段と、装置停止時に媒質ガス流路内の圧力
をほぼ大気圧に昇圧する昇圧ガス供給手段とを備えたガ
スレーザ装置。 （２）減圧領域のガス圧力を検出し大気圧に昇圧時点で
昇圧ガス供給手段を停止する圧力検出手段を設けた特許
請求の範囲第（１）項に記載のガスレーザ装置。 （３）昇圧ガス供給手段のガスの成分をレーザ発振媒質
ガスとほぼ同等とした特許請求の範囲第（１）項に記載
のガスレーザ装置。 （４）減圧手段より排出される媒質ガスを再度減圧領域
に供給するガス循環手段を有し、装置停止２１・−ジ 時昇圧ガス供給手段により循環領域をほぼ大気圧とした
特許請求の範囲第（１）項に記載のガスレーザ装置。 （６）媒質ガス供給手段のガス流量より昇圧ガス供給手
段のガス流量を大きくした特許請求の範囲第（１）項に
記載のガスレーザ装置。 （６）一定圧力以上でガスが大気中に放出される圧力弁
を設けた特許請求の範囲第（１）項に記載のガスレーザ
装置。 （７） 圧力弁が動作した後、昇圧ガス供給手段のガ
ス供給を停止する特許請求の範囲第（６）項に記載のガ
スレーザ装置。 （８）昇圧ガス供給手段の昇圧ガスが放電管より減圧手
段へ向って流れるようにした特許請求の範囲第（１）項
に記載のガスレーザ装置。[Scope of Claims] (1) A discharge tube filled with gas as a laser oscillation medium, a pressure reducing means for reducing pressure in a region of the discharge tube involved in laser oscillation, and a medium gas for supplying a medium gas to the discharge tube. A gas laser apparatus comprising a supply means and a pressurized gas supply means for increasing the pressure in a medium gas flow path to approximately atmospheric pressure when the apparatus is stopped. (2) The gas laser device according to claim (1), further comprising pressure detection means for detecting the gas pressure in the reduced pressure region and stopping the pressurized gas supply means when the pressure is increased to atmospheric pressure. (3) The gas laser device according to claim (1), wherein the gas component of the pressurized gas supply means is substantially the same as that of the laser oscillation medium gas. (4) It has a gas circulation means for again supplying the medium gas discharged from the pressure reduction means to the reduced pressure area, and when the apparatus is stopped 21.-- the circulation area is brought to approximately atmospheric pressure by the pressurizing gas supply means. The gas laser device according to item (1). (6) The gas laser device according to claim (1), wherein the gas flow rate of the pressurized gas supply means is larger than the gas flow rate of the medium gas supply means. (6) The gas laser device according to claim (1), further comprising a pressure valve that releases gas into the atmosphere at a pressure equal to or higher than a certain pressure. (7) The gas laser device according to claim (6), wherein the gas supply from the pressurized gas supply means is stopped after the pressure valve operates. (8) The gas laser device according to claim (1), wherein the pressurized gas of the pressurized gas supply means flows from the discharge tube toward the pressure reducing means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20298982A JPS5992586A (en) | 1982-11-18 | 1982-11-18 | Gas laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20298982A JPS5992586A (en) | 1982-11-18 | 1982-11-18 | Gas laser device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5992586A true JPS5992586A (en) | 1984-05-28 |
Family
ID=16466483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20298982A Pending JPS5992586A (en) | 1982-11-18 | 1982-11-18 | Gas laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5992586A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6114774A (en) * | 1984-06-29 | 1986-01-22 | Matsushita Electric Ind Co Ltd | Laser medium supplying method of carbon dioxide gas laser |
| JPS6412591A (en) * | 1987-07-07 | 1989-01-17 | Fanuc Ltd | Gas laser equipment |
| KR100239408B1 (en) * | 1996-12-31 | 2000-01-15 | 김영환 | Method for manufacturing solid state image sensing device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5729577A (en) * | 1980-07-30 | 1982-02-17 | Anelva Corp | Automatic continuous sputtering apparatus |
-
1982
- 1982-11-18 JP JP20298982A patent/JPS5992586A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5729577A (en) * | 1980-07-30 | 1982-02-17 | Anelva Corp | Automatic continuous sputtering apparatus |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6114774A (en) * | 1984-06-29 | 1986-01-22 | Matsushita Electric Ind Co Ltd | Laser medium supplying method of carbon dioxide gas laser |
| JPS6412591A (en) * | 1987-07-07 | 1989-01-17 | Fanuc Ltd | Gas laser equipment |
| KR100239408B1 (en) * | 1996-12-31 | 2000-01-15 | 김영환 | Method for manufacturing solid state image sensing device |
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