JPS6350937A - Formation of master disk for planar information recording carrier - Google Patents
Formation of master disk for planar information recording carrierInfo
- Publication number
- JPS6350937A JPS6350937A JP19435986A JP19435986A JPS6350937A JP S6350937 A JPS6350937 A JP S6350937A JP 19435986 A JP19435986 A JP 19435986A JP 19435986 A JP19435986 A JP 19435986A JP S6350937 A JPS6350937 A JP S6350937A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- resist
- optical disk
- information recording
- master
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title 1
- 239000000758 substrate Substances 0.000 claims abstract description 37
- 238000000034 method Methods 0.000 claims abstract description 13
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 239000007789 gas Substances 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 230000003287 optical effect Effects 0.000 abstract description 14
- 239000011521 glass Substances 0.000 abstract description 13
- 238000005530 etching Methods 0.000 abstract description 9
- 238000001746 injection moulding Methods 0.000 abstract description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 abstract description 4
- 238000004380 ashing Methods 0.000 abstract description 3
- 238000003491 array Methods 0.000 abstract 2
- 238000001312 dry etching Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、溝またはピット列を有する平板状情報記録担
体の原盤を作成する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for producing a master disc of a flat information recording carrier having grooves or pit rows.
従来の技術
基板表面に微細なパターンを形成するエツチング技術は
、半導体集積回路、プリント基板、透明電導膜、さらに
光ディスクなどの情報記録媒体の製造には欠くことので
きない技術となっている。BACKGROUND OF THE INVENTION Etching technology for forming fine patterns on the surface of a substrate has become an indispensable technology for manufacturing semiconductor integrated circuits, printed circuit boards, transparent conductive films, and information recording media such as optical disks.
特に最近では、パターンの微細化、プロセスの自動化々
どの要求から、エツチングプロセスのドライ化が注目を
集めている。既にVLSIの製造にはドライエツチング
プロセスが実用化されているが、これよシさらに微細な
サブミクロンのパターン形成を行なう光デイスク基板の
作成にも、この技術が取り入れられている。Particularly recently, dry etching processes have been attracting attention due to demands for finer patterns and automation of processes. Dry etching processes have already been put into practical use in the production of VLSIs, but this technology has also been incorporated into the production of optical disk substrates in which even finer submicron patterns are formed.
以下、第2図を参照しながら、光デイスク基板上のパタ
ーン形成をドライエツチングにより行なう方法を説明す
る。Hereinafter, with reference to FIG. 2, a method of forming a pattern on an optical disk substrate by dry etching will be explained.
3ペーノ
まず、高精度に研磨されたガラス基板10表面に、フォ
トレジスト2を均一に塗布する(第2図(a))。そし
て、ガラス基板1を回転させながら、所望のピット列や
溝の構造に対応して変調を受けたレーザー光3をフォト
レジスト2に照射する(第2図(b))。これを現像す
ることにより、フォトレジスト2の露光された領域が除
去されて、表面に同心円状または螺旋状の凹凸パターン
が現われる(第2図(C))。First, a photoresist 2 is uniformly applied to the highly precisely polished surface of the glass substrate 10 (FIG. 2(a)). Then, while rotating the glass substrate 1, the photoresist 2 is irradiated with a laser beam 3 modulated in accordance with the desired structure of pit rows and grooves (FIG. 2(b)). By developing this, the exposed area of the photoresist 2 is removed, and a concentric or spiral uneven pattern appears on the surface (FIG. 2(C)).
次に、この凹凸パターン付きガラス基板に対し、気体プ
ラズマ4を作用させてガラス基板1のエツチングを行な
う。エツチング用のガスとしては、Cu73などが用い
られる。Next, the glass substrate 1 is etched by applying gas plasma 4 to the uneven patterned glass substrate. Cu73 or the like is used as the etching gas.
所定の深さでエツチングを進行させた後(第2図((i
) ) 、残留したフォトレジスト2を02ガスを用い
たプラズマアッシングにより除去すれば、表面に所定の
同心円状または螺旋状の溝やピット列が刻まれたガラス
基板が得られる(第2図(e))。After etching progresses to a predetermined depth (Fig. 2 ((i)
)) If the remaining photoresist 2 is removed by plasma ashing using 02 gas, a glass substrate with predetermined concentric or spiral grooves or pit rows carved on the surface can be obtained (see Fig. 2(e)). )).
このガラス基板の表面にNiなどの電鋳を行ない、これ
を剥離することによって光デイスク原盤5が得られる(
第2図(わ)。光デイスク基板6はこの原盤をもとにし
て射出成型などの方法で複製される(第2図(g))。By electroforming Ni or the like on the surface of this glass substrate and peeling it off, the optical disk master 5 is obtained (
Figure 2 (wa). The optical disk substrate 6 is reproduced based on this master by a method such as injection molding (FIG. 2(g)).
発明が解決しようとする問題点
従来の方法ではガラス基板に溝を形成するため、射出成
型のように大きな力の加わるディスク複製工程に用いる
ためにはこのガラス基板から金属の原盤を作成する工程
が必要であった。Problems to be Solved by the Invention In the conventional method, grooves are formed on a glass substrate, so it is necessary to create a metal master from this glass substrate in order to use it in a disk duplication process where large forces are applied, such as injection molding. It was necessary.
問題点を解決するための手段
本発明は、上記問題点を解決するため、平板状金属基板
にプラズマ状の気体を作用させて溝またはピット列を形
成し、これを直接光ディスク原盤として使用するもので
ある。Means for Solving the Problems In order to solve the above-mentioned problems, the present invention forms grooves or pit rows by applying plasma-like gas to a flat metal substrate, and uses this directly as an optical disc master. It is.
作用 この手段による作用は以下のようになる。action The effect of this means is as follows.
金属基板上にフォトレジストマスクを設け、これにプラ
ズマ状気体を作用させればガラス基板と同様に金属基板
のエツチングが進行し、表面に溝が形成される。これを
用いれば従来のようなガラス基板から金属製のディスク
原盤を作成する工程6 ページ
は不要になる。If a photoresist mask is provided on a metal substrate and a plasma-like gas is applied to the photoresist mask, etching of the metal substrate proceeds in the same way as a glass substrate, and grooves are formed on the surface. If this is used, the 6-page process of creating a metal disk master from a glass substrate as in the past becomes unnecessary.
実施例
本発明の実施例について第1図を参照しながら説明する
。Embodiment An embodiment of the present invention will be described with reference to FIG.
まず、高精度に研磨されたOr基板7の表面に、フォト
レジスト2を均一に塗布する(第1図(IL) )。First, a photoresist 2 is uniformly applied to the highly precisely polished surface of the Or substrate 7 (FIG. 1 (IL)).
そして、Or基板7を回転させながら、所望のピット列
や溝の構造に対応して変調を受けたレーザー光3をフォ
トレジスト2に照射する(第1図(b))。Then, while rotating the Or substrate 7, the photoresist 2 is irradiated with a laser beam 3 modulated in accordance with the desired structure of pit rows and grooves (FIG. 1(b)).
これを現像することにより、フォトレジスト2の露光さ
れた領域が除去されて、表面に同心円状または螺旋状の
凹凸パターンが現われる(第1図(C))。By developing this, the exposed area of the photoresist 2 is removed, and a concentric or spiral uneven pattern appears on the surface (FIG. 1(C)).
次に、この凹凸パターン付きOr基板7に対し、CCl
4ガスを用いてエツチングを行なう。所定の深さまでエ
ツチングを進行させた後(第1図(d))、残留したフ
ォトレジスト2を02ガスを用いたプラズマアッシング
により除去すれば、表面に所定の同心円状または螺旋状
の溝やピット列が刻まれたOr基板7が得られる(第1
図(e))。光デイスク基板6はこれをもとにして射出
成型などの方法6ページ
で複製される(第1図(0)。Next, CCl
Etching is performed using 4 gases. After etching has progressed to a predetermined depth (Fig. 1(d)), the remaining photoresist 2 is removed by plasma ashing using 02 gas, thereby forming predetermined concentric or spiral grooves or pits on the surface. An Or substrate 7 with rows carved therein is obtained (first
Figure (e)). Based on this, the optical disk substrate 6 is reproduced by a method such as injection molding (FIG. 1(0)).
なお、エツチング用のガスとしては本実施例のaaa4
以外に、OH2C12* B’ 65あるいはCCl4
と0□の混合ガスなどを用いることができる。さらに基
板としては本実施例のOrの他、Ni、ムl。Note that the etching gas used in this example was aaa4.
In addition, OH2C12* B' 65 or CCl4
A mixed gas of 0□ and 0□ can be used. Further, as a substrate, in addition to Or in this embodiment, Ni and Mul.
Ti、Co、Fe、Mo、W、Si、Cu等、さらにそ
れらを主成分とする合金を用いることができる。Ti, Co, Fe, Mo, W, Si, Cu, etc., and alloys containing these as main components can be used.
発明の効果
以上のように、本発明は、平板状金属基板にプラズマ状
の気体を作用させて直接光ディスク原盤を作成すること
によシ、従来あったガラス基板から金属製のディスク原
盤を作成する工程を省略することができる。Effects of the Invention As described above, the present invention creates a metal disc master from a conventional glass substrate by directly creating an optical disc master by applying plasma-like gas to a flat metal substrate. The process can be omitted.
第1図は本発明の一実施例における平板状情報記録担体
の原盤作成方法を示した工程図、第2図は従来例の光デ
ィスクの原盤作成方法を示す工程図である。
1・・・・・・ガラス基板、2・・・・・・フォトレジ
スト、3・・・・・・レーザー光、4・・・・・・気体
プラズマの入射方向、7 ベージ
5・・・・・・光デイスク原盤、6・・・・・・光デイ
スク基板、7・・・・・・Or基板。
代理人の氏名 弁理士 中 尾 敏 男 ほか1名区
d A
へ へ 6 へ0
8 句 も+−1
++J ′
第2図
(iン
IN −4
(εン
(土ン
(υFIG. 1 is a process diagram showing a method for producing a master disk for a flat information recording carrier according to an embodiment of the present invention, and FIG. 2 is a process diagram showing a conventional method for producing a master disk for an optical disk. 1...Glass substrate, 2...Photoresist, 3...Laser light, 4...Incidence direction of gas plasma, 7 Page 5... . . . Optical disk master disc, 6 . . . Optical disk substrate, 7 . . . Or substrate. Name of agent: Patent attorney Toshio Nakao and 1 other person
d A to 6 to 0
8 phrases also +-1
++J ′ Fig. 2 (in IN -4 (εn (earth)
Claims (3)
開口部を有するフォトレジストを設ける工程、及び前記
平板状金属基板に対しプラズマ状態の気体を作用させて
前記開口部に対応した溝またはピット列を形成する工程
を含むことを特徴とする平板状情報記録担体の原盤作成
方法。(1) A step of providing a photoresist having concentric or spiral openings on the surface of a flat metal substrate, and applying a gas in a plasma state to the flat metal substrate to form grooves corresponding to the openings. 1. A method for producing a master disc for a flat information recording carrier, the method comprising the step of forming a pit row.
を形成する部位がCr、Ni、Al、Ti、Co、Fe
、Mo、W、Si、Cuのうち少なくとも一つを主成分
とする材料で形成されていることを特徴とする特許請求
の範囲第1項記載の平板状情報記録担体の原盤作成方法
。(2) In the flat metal substrate, at least the portion where the groove or pit row is formed is made of Cr, Ni, Al, Ti, Co, or Fe.
2. A method for producing a master disc of a flat information recording carrier according to claim 1, wherein the master disc is made of a material containing at least one of the following as a main component: , Mo, W, Si, and Cu.
CH_2Cl_2、BCl_3、O_2のうち少なくと
も一つを用いることを特徴とする特許請求の範囲第1項
記載の平板状情報記録担体の原盤作成方法。(3) As gases in plasma state, Ar, CCl_4,
2. The method for producing a master of a flat information recording carrier according to claim 1, characterized in that at least one of CH_2Cl_2, BCl_3, and O_2 is used.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61194359A JP2658023B2 (en) | 1986-08-20 | 1986-08-20 | Master disc making method for flat information record carrier |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61194359A JP2658023B2 (en) | 1986-08-20 | 1986-08-20 | Master disc making method for flat information record carrier |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6350937A true JPS6350937A (en) | 1988-03-03 |
JP2658023B2 JP2658023B2 (en) | 1997-09-30 |
Family
ID=16323265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61194359A Expired - Fee Related JP2658023B2 (en) | 1986-08-20 | 1986-08-20 | Master disc making method for flat information record carrier |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2658023B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2701151A1 (en) * | 1993-02-03 | 1994-08-05 | Digipress Sa | Method of manufacturing a pressing die, especially for the production of optical discs, pressing die obtained by this method and product, such as an optical disc, obtained from this pressing die |
US5338178A (en) * | 1990-11-30 | 1994-08-16 | Hitachi, Ltd. | Embossing metal hold |
CN110962258A (en) * | 2019-12-10 | 2020-04-07 | 维沃移动通信有限公司 | Manufacturing method of injection mold, processing equipment of shell and shell of electronic equipment |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60147946A (en) * | 1984-01-10 | 1985-08-05 | Sharp Corp | Manufacture of optical memory element |
JPS60226041A (en) * | 1984-04-25 | 1985-11-11 | Hoya Corp | Information glass substrate and its production |
-
1986
- 1986-08-20 JP JP61194359A patent/JP2658023B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60147946A (en) * | 1984-01-10 | 1985-08-05 | Sharp Corp | Manufacture of optical memory element |
JPS60226041A (en) * | 1984-04-25 | 1985-11-11 | Hoya Corp | Information glass substrate and its production |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5338178A (en) * | 1990-11-30 | 1994-08-16 | Hitachi, Ltd. | Embossing metal hold |
FR2701151A1 (en) * | 1993-02-03 | 1994-08-05 | Digipress Sa | Method of manufacturing a pressing die, especially for the production of optical discs, pressing die obtained by this method and product, such as an optical disc, obtained from this pressing die |
CN110962258A (en) * | 2019-12-10 | 2020-04-07 | 维沃移动通信有限公司 | Manufacturing method of injection mold, processing equipment of shell and shell of electronic equipment |
Also Published As
Publication number | Publication date |
---|---|
JP2658023B2 (en) | 1997-09-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |