JPS634890A - Washer for small-sized part - Google Patents
Washer for small-sized partInfo
- Publication number
- JPS634890A JPS634890A JP14693486A JP14693486A JPS634890A JP S634890 A JPS634890 A JP S634890A JP 14693486 A JP14693486 A JP 14693486A JP 14693486 A JP14693486 A JP 14693486A JP S634890 A JPS634890 A JP S634890A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- flat plate
- cleaned
- small parts
- fixing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 44
- 239000000853 adhesive Substances 0.000 claims description 5
- 230000001070 adhesive effect Effects 0.000 claims description 5
- 238000004506 ultrasonic cleaning Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005108 dry cleaning Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000013020 steam cleaning Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は洗浄装置に係り、小型光学部品、磁性体、セラ
ミックス等の小型加工成品の洗浄に好適な洗浄装置に関
するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a cleaning device, and more particularly, to a cleaning device suitable for cleaning small processed products such as small optical parts, magnetic materials, and ceramics.
一般に洗浄手段にはブラシ洗浄、高圧ジェット洗浄、超
音波洗浄等があり、これら湿式洗浄は無機物の除去に有
効であり、−方、紫外線を使用するオゾン洗浄のような
乾式洗浄は、有機物の除去に有効であるといわれている
。In general, cleaning methods include brush cleaning, high-pressure jet cleaning, ultrasonic cleaning, etc. These wet cleaning methods are effective for removing inorganic substances, while dry cleaning methods such as ozone cleaning using ultraviolet rays are effective for removing organic substances. It is said to be effective for
しかし、湿式洗浄を実施する場合でも被洗浄物の表面に
凹凸がある場合には、上記の各種の洗浄を併用する必要
があり、光学部品や磁気ヘッド部品のように小型で精密
な部品、中間成品等の場合に洗浄後に薄膜形成などの後
工程が存在する場合には、表面は半導体ウェハと同等の
清浄度が要求されている。However, even when performing wet cleaning, if the surface of the object to be cleaned has unevenness, it is necessary to use the various types of cleaning described above, and cleaning small and precise parts such as optical parts and magnetic head parts, intermediate parts, etc. If a post-process such as thin film formation is required after cleaning for a finished product, the surface is required to have the same level of cleanliness as a semiconductor wafer.
従来上記のような小型部品や小型加工成品の洗浄は、特
開昭48−41553号発明のように金属またはプラス
チックスの筒状の洗浄容器に多数個収容して、蒸気洗浄
ないし超音波洗浄を実施するものが知られている。Conventionally, the above-mentioned small parts and small processed products have been cleaned by storing a large number of them in a cylindrical cleaning container made of metal or plastic and performing steam cleaning or ultrasonic cleaning, as in the invention of JP-A No. 48-41553. What is known is what is done.
上記のように従来技術においては、超音波洗浄を主体と
するものが多いため、より高い清浄度が要求される場合
は洗浄能力の限界が問題点であった。本発明は上記の問
題点を解決するためになされたもので、ブラシ洗浄、高
圧ジェット、オゾン洗浄等各種の洗浄手段の選択と組合
せが可能な。As mentioned above, many of the conventional techniques mainly use ultrasonic cleaning, and therefore, when higher cleanliness is required, the problem is that the cleaning ability is limited. The present invention was made to solve the above-mentioned problems, and it is possible to select and combine various cleaning means such as brush cleaning, high-pressure jet, and ozone cleaning.
高度の清浄能力を有する洗浄装置を提供することを目的
とする。The purpose of the present invention is to provide a cleaning device having a high degree of cleaning ability.
上記の目的は、回転軸付台板にその回転中心から等距離
の円周上に被洗浄物を着脱自在に固定することが可能な
平板を設置することによって達成される。The above object is achieved by installing a flat plate on the circumference equidistant from the center of rotation of the base plate with a rotating shaft to which the object to be cleaned can be detachably fixed.
小型の被洗浄物は上記回転軸付台板上に洗浄面を上にし
て円周に沿って固定されているから、半導体ウェハと同
様に上記各種の洗浄を1回転させながら実施することが
できる。Since the small object to be cleaned is fixed along its circumference on the rotating shaft-equipped base plate with the surface to be cleaned facing upward, the various types of cleaning described above can be performed while rotating the object once, similar to semiconductor wafers. .
以下1本発明の実施例を第1〜10図によって説明する
。An embodiment of the present invention will be described below with reference to FIGS. 1 to 10.
第1〜2図は機械的固定方法による本発明の実施例図で
ある。第1図(a)において平板1上に被洗浄物2より
も大きい縦横寸法を有する凹部11aを具備する固定板
11を配置し、被洗浄物2は前記固定板11の凹部11
aに収納され、固定ねじ12により被洗浄物2の側面に
押し当てられ固定される。1 and 2 are illustrations of an embodiment of the present invention using a mechanical fixing method. In FIG. 1(a), a fixing plate 11 having a recess 11a having larger vertical and horizontal dimensions than the object 2 to be cleaned is arranged on a flat plate 1, and the object 2 to be cleaned is attached to the recess 11a of the fixing plate 11.
a, and is pressed and fixed against the side surface of the object 2 to be cleaned by a fixing screw 12.
また、第1図(b)に示すように固定ねじ12の代りに
ピン26.バネ27を用いて固定してもよい。この実施
例ではその他のチャッキングを含む機械的固定を包含す
るものである。Also, as shown in FIG. 1(b), instead of the fixing screw 12, a pin 26. It may be fixed using a spring 27. This embodiment includes other mechanical fixings including chucking.
第3〜4図は真空吸着により固定した実施例図である。Figures 3 and 4 show examples of fixing by vacuum suction.
同図において被洗浄物2は、平板1上に被洗浄物2より
も大きい縦横寸法を有する凹部22と真空吸着用の真空
引穴25により吸着固定される。真空吸着時には回転軸
付台板3の真空引穴25を介して吸引され、被洗浄物2
は底部22aに接合して気密的に保持され、平板1と共
に回転軸付台板3上に固定される。In the figure, an object 2 to be cleaned is suctioned and fixed on a flat plate 1 by a recess 22 having larger vertical and horizontal dimensions than the object 2 and a vacuum hole 25 for vacuum suction. During vacuum suction, the object to be cleaned 2 is suctioned through the vacuum hole 25 of the base plate 3 with a rotating shaft.
is joined to the bottom portion 22a and held airtight, and is fixed together with the flat plate 1 on the base plate 3 with a rotating shaft.
第5〜6図は磁力固定による実施例図である。Figures 5 and 6 are illustrations of an embodiment using magnetic force fixation.
同図において平板1はマグネットシート31とベース3
2により構成され互いに接着されている。In the figure, flat plate 1 is composed of magnet sheet 31 and base 3.
2 and are bonded to each other.
被洗浄物2はマグネットシート31上に配置され磁力に
より固定されている。The object 2 to be cleaned is placed on a magnet sheet 31 and fixed by magnetic force.
第7〜8図は接着剤等での固定による実施例図である。Figures 7 and 8 show examples of fixing with adhesive or the like.
同図において平板1上に被洗浄物2は接着剤、ワックス
、粘着テープ等により固定されている。In the figure, an object to be cleaned 2 is fixed onto a flat plate 1 with adhesive, wax, adhesive tape, or the like.
上記各実施例とも被洗浄物2は平板1上の円周に沿って
配置固定される。In each of the above embodiments, the object to be cleaned 2 is arranged and fixed along the circumference of the flat plate 1.
次に、本発明の洗浄作業の実施例を第9〜10図によっ
て説明する。洗浄槽4内の回転軸付台板3上に被洗浄物
2が固定される。ブラシ洗浄の場合は洗浄槽4付近に設
置されたブラシ5をブラシアーム5aにより被洗浄物2
上に密着させる。ブラシ5はブラシアーム5bを介して
回転を与えられた被洗浄物2の表面を擦り、汚れを除去
する。Next, an embodiment of the cleaning operation of the present invention will be described with reference to FIGS. 9 and 10. The object to be cleaned 2 is fixed on a base plate 3 with a rotating shaft inside the cleaning tank 4 . In the case of brush cleaning, the brush 5 installed near the cleaning tank 4 is moved to the object 2 by the brush arm 5a.
Stick it on top. The brush 5 scrubs the surface of the object 2 rotated via the brush arm 5b to remove dirt.
このとき被洗浄物2は回転軸付台板3を回転させること
により、全数がブラシ5を全面的に接触する。ブラシ5
は円筒状で半径方向に植毛されているため、被洗浄物2
に円周方向に連なる溝の凹面を清浄化するのに好適であ
る。At this time, all the objects 2 to be cleaned come into full contact with the brush 5 by rotating the base plate 3 with a rotating shaft. brush 5
has a cylindrical shape and is flocked in the radial direction, so the object to be cleaned 2
It is suitable for cleaning the concave surfaces of grooves that are continuous in the circumferential direction.
6はリンスノズルであって、洗浄液6aを被洗浄物2上
に放散する。Reference numeral 6 denotes a rinse nozzle, which sprays a cleaning liquid 6a onto the object 2 to be cleaned.
また、ジェット洗浄の際は高圧ジェットノズル7を被洗
浄物2の上方に位置させ、高圧の洗浄液7aを噴射させ
被洗浄物2を洗浄する。この場合も回転軸付台板3を回
転させ、更に高圧ジェットノズル7を往復運動させるこ
とにより、被洗浄物2の全数を全面的に洗浄することが
できる。Further, during jet cleaning, the high-pressure jet nozzle 7 is positioned above the object 2 to be cleaned, and the object 2 to be cleaned is sprayed with high-pressure cleaning liquid 7a. In this case as well, all the objects 2 to be cleaned can be completely cleaned by rotating the base plate 3 with a rotating shaft and further reciprocating the high-pressure jet nozzle 7.
上記のほか状況によっては洗浄槽4に超音波振動子を取
付けると共に、洗浄槽4内に洗浄液を満たすことにより
、従来小型の洗浄物に対して適用していた超音波洗浄を
実施することも可能であり、また、洗浄槽上方に紫外線
ランプを配置することにより、オゾン洗浄を実施するこ
とも可能である。In addition to the above, depending on the situation, by attaching an ultrasonic vibrator to the cleaning tank 4 and filling the cleaning tank 4 with cleaning liquid, it is also possible to perform ultrasonic cleaning, which was conventionally applied to small-sized cleaning items. It is also possible to perform ozone cleaning by placing an ultraviolet lamp above the cleaning tank.
ブラシ洗浄、ジェット洗浄、超音波洗浄を実施したのち
、被洗浄物2の表面に付着している液体は、そのまま回
転軸付台板3を高速回転させることにより、遠心力で液
体を除去する高速スピンを付与することも可能である。After performing brush cleaning, jet cleaning, and ultrasonic cleaning, the liquid adhering to the surface of the object to be cleaned 2 is removed by centrifugal force by rotating the base plate 3 with a rotating shaft at high speed. It is also possible to impart spin.
なお、平板は上記各実施例では円板状のものを図示して
いるが、多角形状であっても良く、また。In addition, although the flat plate is shown in the shape of a disk in each of the above embodiments, it may also be polygonal.
平板上面は被洗浄物の固定に支障のないかぎり流水溝を
設置することも可能である。It is also possible to install a running water groove on the upper surface of the flat plate as long as it does not interfere with fixing the object to be cleaned.
また、平板と回転軸付台板との固定の手段は被洗浄物と
平板との固定と同様に、機械的固定、真空吸着、磁力及
び接着剤の何れも使用することが可能である。Further, as the means for fixing the flat plate and the base plate with a rotating shaft, any of mechanical fixing, vacuum suction, magnetic force, and adhesive can be used, as in the case of fixing the object to be cleaned and the flat plate.
さらにまた上記実施例では、平板1の回転軸の方向は垂
直方向のものを示したが、水平、垂直またはそれ以外の
方向であってもよい。Furthermore, in the above embodiment, the direction of the rotation axis of the flat plate 1 is vertical, but it may be horizontal, vertical, or any other direction.
本発明の実施により、磁気ヘッドなどの電子部品やセラ
ミックスの成品のように小型の被洗浄物を回転軸付台板
と一体に固定した平板に着脱自在に装着して、ブラシ洗
浄、高圧ジェット及び超音波洗浄などの洗浄を一貫して
実施することが可能となり、清浄度の高い洗浄効果が得
られるものである。By carrying out the present invention, small objects to be cleaned, such as electronic components such as magnetic heads and ceramic products, can be removably attached to a flat plate that is integrally fixed to a base plate with a rotating shaft, and can be cleaned with a brush, high-pressure jet, etc. It becomes possible to perform cleaning such as ultrasonic cleaning consistently, and a cleaning effect with a high degree of cleanliness can be obtained.
第1図(a)、(b)は本発明に係る平板に被洗浄物を
機械的に固定した平面図、第2図は第1図(a)の縦断
面図、第3図は本発明に係る平板に被洗浄物を真空吸着
により固定した平面図、第4図は第3図の縦断面図、第
5図は本発明に係る平板に被洗浄物磁力により固定した
平面図、第6図は第5図の縦断面図、第7図は本発明に
係る平板に被洗浄物を接着剤により固定した平面図、第
8図は第7図の縦断面図、第9図は本発明に係る洗浄装
置の一実施例の作業状況を示す平面図、第1([1は第
9図の側面図である。
l・・・平板、2・・・被洗浄物、3・・・回転軸付台
板、4・・・洗浄槽、5・・・ブラシ、6・・・リンス
ノズル、7・・・高圧ジェットノズル。
嶋1 図
(α)
も3図
第卯口
2z −m−亡シ fp
篤5 図
浩6図
?
η″″1図
も8図
活9 図
も10図
5 −−− T つ ゛ンFIGS. 1(a) and (b) are plan views of an object to be cleaned mechanically fixed to a flat plate according to the present invention, FIG. 2 is a longitudinal cross-sectional view of FIG. 1(a), and FIG. 3 is a plan view of the present invention. 4 is a vertical sectional view of FIG. 3, FIG. 5 is a plan view of an object to be cleaned fixed to a flat plate according to the present invention by magnetic force, and FIG. The figure is a longitudinal sectional view of Fig. 5, Fig. 7 is a plan view of an object to be cleaned fixed to a flat plate with adhesive according to the present invention, Fig. 8 is a longitudinal sectional view of Fig. 7, and Fig. 9 is a longitudinal sectional view of the present invention. 1 is a side view of FIG. 9. 1... flat plate, 2... object to be cleaned, 3... rotating Base plate with shaft, 4...Cleaning tank, 5...Brush, 6...Rinse nozzle, 7...High pressure jet nozzle. C fp Atsushi 5 Figure Hiroshi 6? η'''' Figure 1 is also 8 Figure 9 Figure is also 10 Figure 5 --- T tsun
Claims (1)
を前記回転軸付台板に固定する手段と、この平板の回転
中心から等距離にある円周上の複数個所に小型部品を着
脱自在に固定する手段とを備えることを特徴とする小型
部品の洗浄装置。 2、前記平板の回転中心から等距離にある円周上の複数
個所に小型部品を固定する手段は、機械的な固定による
ことを特徴とする特許請求の範囲第1項記載の小型部品
の洗浄装置。 3、前記平板の回転中心から等距離にある円周上の複数
個所に小型部品を固定する手段は、真空吸着によること
を特徴とする特許請求の範囲第1項記載の小型部品の洗
浄装置。 4、前記平板の回転中心から等距離にある円周上の複数
個所に小型部品を固定する手段は、磁力によることを特
徴とする特許請求の範囲第1項記載の小型部品の洗浄装
置。 5、前記平板の回転中心から等距離にある円周上の複数
個所に小型部品を固定する手段は、接着剤によることを
特徴とする特許請求の範囲第1項記載の小型部品の洗浄
装置。[Claims] 1. A base plate with a rotating shaft, a flat plate in contact with the base plate, means for fixing the flat plate to the base plate with a rotating shaft, and a circumference equidistant from the center of rotation of the flat plate. 1. A cleaning device for small parts, comprising means for detachably fixing small parts at a plurality of locations on the top. 2. Cleaning of small parts according to claim 1, wherein the means for fixing the small parts at a plurality of locations on the circumference equidistant from the center of rotation of the flat plate is mechanical fixation. Device. 3. The cleaning apparatus for small parts according to claim 1, wherein the means for fixing the small parts at a plurality of positions on the circumference equidistant from the center of rotation of the flat plate is vacuum suction. 4. The cleaning device for small parts according to claim 1, wherein the means for fixing the small parts at a plurality of positions on the circumference equidistant from the center of rotation of the flat plate is based on magnetic force. 5. The apparatus for cleaning small parts according to claim 1, wherein the means for fixing the small parts at a plurality of positions on the circumference equidistant from the center of rotation of the flat plate is an adhesive.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14693486A JPS634890A (en) | 1986-06-25 | 1986-06-25 | Washer for small-sized part |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14693486A JPS634890A (en) | 1986-06-25 | 1986-06-25 | Washer for small-sized part |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS634890A true JPS634890A (en) | 1988-01-09 |
Family
ID=15418874
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14693486A Pending JPS634890A (en) | 1986-06-25 | 1986-06-25 | Washer for small-sized part |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS634890A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02251288A (en) * | 1989-03-22 | 1990-10-09 | Toshiba Corp | Washing apparatus |
JP2014534610A (en) * | 2011-09-22 | 2014-12-18 | エーシーエム リサーチ (シャンハイ) インコーポレーテッド | Flip chip assembly cleaning method and apparatus |
-
1986
- 1986-06-25 JP JP14693486A patent/JPS634890A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02251288A (en) * | 1989-03-22 | 1990-10-09 | Toshiba Corp | Washing apparatus |
JP2014534610A (en) * | 2011-09-22 | 2014-12-18 | エーシーエム リサーチ (シャンハイ) インコーポレーテッド | Flip chip assembly cleaning method and apparatus |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6345630B2 (en) | Method and apparatus for cleaning the edge of a thin disc | |
US5906687A (en) | Ultrasonic cleaning apparatus and method | |
US4401131A (en) | Apparatus for cleaning semiconductor wafers | |
US6012470A (en) | Method of drying a wafer | |
US6299698B1 (en) | Wafer edge scrubber and method | |
JPS6064436A (en) | Spin drier | |
US6200201B1 (en) | Cleaning/buffer apparatus for use in a wafer processing device | |
JPS6116528A (en) | Cleaning device for wafer | |
JPS634890A (en) | Washer for small-sized part | |
JP2002079461A (en) | Polishing device | |
JP2001121096A (en) | Roll brush cleaning device | |
US6751824B2 (en) | Cleaning apparatus for semiconductor wafer | |
KR102620817B1 (en) | wafer cleaning device | |
JP2976542B2 (en) | Foreign matter removal equipment for semiconductor devices | |
KR20050047147A (en) | Apparatus for cleaning a wafer | |
CN213781994U (en) | Wafer cleaning brush and wafer cleaning device | |
JPS61181134A (en) | Cleansing apparatus | |
CN213601840U (en) | Wafer cleaning brush and wafer cleaning device | |
JPH07136572A (en) | Rotary cup type liquid supplying device | |
JP3393459B2 (en) | Substrate cleaning apparatus and substrate cleaning method | |
JPH0319337A (en) | Removing device for wafer contamination | |
JPH0453684A (en) | Support device for wafer | |
JPS6362585A (en) | Brush scrubber washer | |
JP2559653B2 (en) | Separator / dryer for thin leaf pieces | |
JPH01287808A (en) | Precision cleaning equipment |