JPS6347226B2 - - Google Patents
Info
- Publication number
- JPS6347226B2 JPS6347226B2 JP4152082A JP4152082A JPS6347226B2 JP S6347226 B2 JPS6347226 B2 JP S6347226B2 JP 4152082 A JP4152082 A JP 4152082A JP 4152082 A JP4152082 A JP 4152082A JP S6347226 B2 JPS6347226 B2 JP S6347226B2
- Authority
- JP
- Japan
- Prior art keywords
- extraction electrode
- electrons
- insulator
- ion beam
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000605 extraction Methods 0.000 claims description 41
- 239000012212 insulator Substances 0.000 description 25
- 238000010884 ion-beam technique Methods 0.000 description 24
- 150000002500 ions Chemical class 0.000 description 15
- 238000009826 distribution Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 5
- 230000001133 acceleration Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 229910001338 liquidmetal Inorganic materials 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4152082A JPS58158843A (ja) | 1982-03-16 | 1982-03-16 | イオン銃 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4152082A JPS58158843A (ja) | 1982-03-16 | 1982-03-16 | イオン銃 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58158843A JPS58158843A (ja) | 1983-09-21 |
| JPS6347226B2 true JPS6347226B2 (de) | 1988-09-21 |
Family
ID=12610651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4152082A Granted JPS58158843A (ja) | 1982-03-16 | 1982-03-16 | イオン銃 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58158843A (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62167357U (de) * | 1986-04-14 | 1987-10-23 | ||
| US6977384B2 (en) * | 2003-08-27 | 2005-12-20 | Fei Company | Shaped sputter shields for improved ion column operation |
| DE102010041156B9 (de) | 2010-09-21 | 2018-01-25 | Carl Zeiss Microscopy Gmbh | Blendeneinheit für ein Teilchenstrahlgerät sowie Teilchenstrahlgerät |
| JP2014102980A (ja) * | 2012-11-20 | 2014-06-05 | Gigaphoton Inc | ターゲット供給装置 |
-
1982
- 1982-03-16 JP JP4152082A patent/JPS58158843A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58158843A (ja) | 1983-09-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4388560A (en) | Filament dispenser cathode | |
| US7067821B2 (en) | Flood gun for charge neutralization | |
| US4541890A (en) | Hall ion generator for working surfaces with a low energy high intensity ion beam | |
| EP0346458A1 (de) | Elektrostatische ionentriebwerke. | |
| US4549082A (en) | Synthetic plasma ion source | |
| JPH0418417B2 (de) | ||
| US4766320A (en) | Apparatus for ion implantation | |
| US5841235A (en) | Source for the generation of large area pulsed ion and electron beams | |
| US20040146133A1 (en) | Ultra-short ion and neutron pulse production | |
| US3999072A (en) | Beam-plasma type ion source | |
| EP0261198B1 (de) | Elektronenkanone mit plasmaanode | |
| US4760262A (en) | Ion source | |
| US4471224A (en) | Apparatus and method for generating high current negative ions | |
| Kistemaker | On ion sources with high efficiency and intensity | |
| JPS6347226B2 (de) | ||
| JPH07169425A (ja) | イオン源 | |
| US3514666A (en) | Charged particle generator yielding a mono-energetic ion beam | |
| US3157784A (en) | Ion source for a mass spectrometer | |
| JPH10275566A (ja) | イオン源 | |
| JPH0665200B2 (ja) | 高速原子線源装置 | |
| JPS6323876Y2 (de) | ||
| JP2778227B2 (ja) | イオン源 | |
| EP0095879B1 (de) | Verfahren und Vorrichtung zur Oberflächenbehandlung mit einem Niederenergie- und Hochintensitätsionenbündel | |
| US3912930A (en) | Electron beam focusing system | |
| JP3105931B2 (ja) | 電子ビーム照射装置及び電子ビーム照射方法 |