JPS6346620A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS6346620A JPS6346620A JP19969887A JP19969887A JPS6346620A JP S6346620 A JPS6346620 A JP S6346620A JP 19969887 A JP19969887 A JP 19969887A JP 19969887 A JP19969887 A JP 19969887A JP S6346620 A JPS6346620 A JP S6346620A
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic
- plating
- projecting
- plating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims description 4
- 238000007747 plating Methods 0.000 abstract description 36
- 239000010419 fine particle Substances 0.000 abstract description 16
- 238000000034 method Methods 0.000 abstract description 12
- 238000009713 electroplating Methods 0.000 abstract description 6
- 230000001681 protective effect Effects 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 5
- 239000002245 particle Substances 0.000 abstract description 3
- 239000006185 dispersion Substances 0.000 abstract description 2
- 238000007772 electroless plating Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 abstract 2
- 229910044991 metal oxide Inorganic materials 0.000 abstract 1
- 150000004706 metal oxides Chemical class 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 239000007788 liquid Substances 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005554 pickling Methods 0.000 description 3
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 2
- 229940044175 cobalt sulfate Drugs 0.000 description 2
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
本発明はメツキ形磁気記録媒体及びその製造方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a plated magnetic recording medium and a method for manufacturing the same.
近年、磁気記録媒体と記録再生ヘッドとの間隔は記録密
度の増加に伴ない、次第に小さくなってきている。また
、最近の磁気ディスク装置では、磁気ヘッドがディスク
停止時にディスクと接触しているコンタクトスタート／
ストップ方式が用いられている。このため、磁気ディス
クにはますます耐摩耗性が要求されている。In recent years, the distance between a magnetic recording medium and a recording/reproducing head has gradually become smaller as recording density increases. In addition, in recent magnetic disk drives, there is a contact start mode in which the magnetic head is in contact with the disk when the disk is stopped.
A stop method is used. For this reason, magnetic disks are increasingly required to have wear resistance.
メツキ膜磁性体を用いる磁気ディスクでは、一般に、磁
性メツキ膜の表面に二酸化珪素（Ｓ ｉ Ｏ２）あるい
はクローム（Ｃｒ）等の保護膜を被着させて耐摩耗性を
得ている。しかし、この方法では、保護膜形成のために
一工程必要であること、保護膜の表面が非常に滑らかで
あるため、磁気ヘッドと磁気ディスクの開に水等の流体
が侵入すると、その表面張力により両者が密、ｎして磁
気記録媒体に損傷が生じる等の欠点がある。In a magnetic disk using a plating film magnetic material, wear resistance is generally obtained by coating the surface of the magnetic plating film with a protective film such as silicon dioxide (S i O 2 ) or chromium (Cr). However, this method requires one step to form the protective film, and the surface of the protective film is very smooth, so if a fluid such as water enters the opening between the magnetic head and the magnetic disk, the surface tension This has disadvantages such as the fact that both are dense and the magnetic recording medium is damaged.
本発明は従来の磁気記録媒体の上述のような欠点をなく
し、磁性メツキ膜上の保護膜を必要とせず、磁気ヘット
との密着の少ない磁気記録媒体及びその製造方法を提供
することを目的とする。It is an object of the present invention to eliminate the above-mentioned drawbacks of conventional magnetic recording media, to provide a magnetic recording medium that does not require a protective film on a magnetic plating film, and has less close contact with a magnetic head, and a method for manufacturing the same. do.
本発明は、以上の目的を達成するために、磁性膜の下地
層を磁性膜より厚くし下地層面上の突起が磁性膜面から
突出した構造とした。以下具体例により詳細に説明する
。非磁性基板上に金、４酸化物、炭化物、硼化物などの
耐摩耗性微粒子が均一に分散された非磁性の分散メツキ
膜を無電Ｄ′ツメツキ法たは電気メツキ法により設け、
このメッキ膜を研磨してその表面から前記耐摩耗性微粒
子の一部を突出させた後、この突出した耐摩耗性徴Ｆ！
７子部分を除き、前記非磁性メツキ膜上に前記突出した
耐摩耗性微粒子の突出高さより薄い膜厚の磁性膜を電気
メツキ法により形成するようにしたものである。このよ
うにすれば、磁性メツキ）摸から突出した耐摩耗性微粒
子によって磁性メツキ１漠と磁気ヘッドとの直接の接触
を防ぐことができるので、従来技術のように磁性股上に
保護膜を必要とせず、しかも磁気記録媒体の摩耗もほと
んど起らない。In order to achieve the above object, the present invention has a structure in which the underlayer of the magnetic film is made thicker than the magnetic film so that the protrusions on the underlayer surface protrude from the magnetic film surface. This will be explained in detail below using specific examples. A nonmagnetic dispersion plating film in which wear-resistant fine particles such as gold, tetraoxide, carbide, and boride are uniformly dispersed is provided on a nonmagnetic substrate by an electroless D' plating method or an electroplating method,
After polishing this plated film to make some of the wear-resistant fine particles protrude from its surface, this protruding wear-resistance feature F!
A magnetic film having a thickness thinner than the protrusion height of the protruding wear-resistant fine particles is formed on the non-magnetic plating film by electroplating except for the seventh part. In this way, direct contact between the magnetic plating and the magnetic head can be prevented by the wear-resistant fine particles protruding from the magnetic plating, so there is no need for a protective film on the magnetic crotch as in the prior art. Furthermore, there is almost no wear on the magnetic recording medium.
以下に本発明を実施例によって詳細に説明する。The present invention will be explained in detail below by way of examples.
第１図は本発明による磁気記録媒体の断面図を示し、同
図を用いて本発明による同記録媒体の製造方法を説明す
る。FIG. 1 shows a cross-sectional view of a magnetic recording medium according to the present invention, and a method for manufacturing the magnetic recording medium according to the present invention will be explained using the figure.
アルミニウム等からなる金属基板１を用、行し、これに
下記浴条件で（ｉ）アルカル脱脂と（ｉｉ）酸洗いの前
処理を施こす。A metal substrate 1 made of aluminum or the like is used and pretreated with (i) alkaline degreasing and (ii) pickling under the following bath conditions.
（ｉ）アルカリ脱脂
苛性ソーダ ｌ ＯＯｇ ／ Ｑ炭酸ソーダ
２０ ｇ ／ Ｑ液晶塵
６０’Ｃ
処理時間 ２分
（ｉｉ）酸洗い
硝酸 ５０ ｍ Ｑ ／ Ｑフッ酸
５０ ｍ Ｑ ／ Ｑ液温度
室 温
処理時間 ０．５分
ついで、基板１の上に下記浴条件で粒径１〜３μのＡΩ
２０３微粒末２を含む非磁性ニッケル膜３を無電解メツ
キ法または電気メツキにより厚さ２０〜３０μｍ程度に
形成する。(i) Alkaline degreased caustic soda l OOg / Q soda carbonate 20 g / Q liquid crystal dust
60'C Processing time 2 minutes (ii) Pickling Nitric acid 50 m Q/Q Hydrofluoric acid 50 m Q/Q liquid temperature
After 0.5 minutes of room temperature treatment, AΩ particles with a particle size of 1 to 3 μm were placed on the substrate 1 under the following bath conditions.
A non-magnetic nickel film 3 containing the 203 fine particles 2 is formed to a thickness of about 20 to 30 μm by electroless plating or electroplating.
（ｉ）無電解メツキ
硫酸ニッケル ３０ ｇ ／ Ｑ次亜リン酸
ソーダ ２０ ｇ ／ Ｑクエン酸ソーダ
３ Ｑ ｇ ／ ＱＡＩ２２０３
５ｇ／Ｑ液温度 ９０℃
ｐＨ５，０
液撹拌 連 続
メツキ時間 ２００分
（ｉｉ）電気メツキ
硝酸ニッケル ２００ｇ／Ｑ
塩化ニッケル ６０ ｇ ／ Ｑ硼 酸
３０ ｇ ／ Ｑラウリル硫酸ソーダ
０．１ｇ／Ｑ
Ａ２２０３ ５ｇ／Ｑ液温度
５０℃
ｐＨ５，０
液撹拌 連 続
電流密度 ３００ｍＡ／ｃｍ２メツキ時間
２００分
（市）電気メツキ
スルファミン准ニッケル ５００ ｇ／ Ｑ塩化ニッケ
ル １５ ｇ／ Ｑ硼 酸
５０ ｇ ／ Ｑサッカリンソーダ Ｉｇ／
Ｑ
ラウリル硫酸ソーダ ０．１ｇ／Ｑ
ＡＱ２０３ １０ ｇ ／ Ｑ液温度
６０’Ｃ
ｐＨ５，０
液撹拌 連 続
電流密度 ２００ｍＡ／ｃｍ２メツキ時間
１５０分
つぎに、以上のようにして得た非磁性ニッケルメッキ膜
３の表面を研磨して平滑にする。このときの研磨量は、
研磨後に、メツキ膜３中に均一に分散して含まれている
ＡＱ２０３微粒子２の一部が、メツキ膜３の表面から突
出するようにする。メツキ膜３はＡＱ２０３微粒子２よ
りも加工されやすいので、このような状態にすることは
容易である。(i) Electroless nickel methoxysulfate 30 g / Q sodium hypophosphite 20 g / Q sodium citrate
3 Q g / QAI2203
5g/Q liquid temperature 90℃ pH5.0 Liquid stirring Continuous plating time 200 minutes (ii) Electroplated nickel nitrate 200g/Q Nickel chloride 60g/Q boric acid
30 g/Q sodium lauryl sulfate
0.1g/Q A2203 5g/Q Liquid temperature
50℃ pH5.0 Liquid stirring Continuous current density 300mA/cm2 plating time
200 minutes (city) Electrometukisulfamine associate nickel 500 g/Q nickel chloride 15 g/Q boric acid
50g/Q Saccharin Soda Ig/
Q Sodium lauryl sulfate 0.1g/Q AQ203 10g/Q Liquid temperature
60'C pH5.0 Liquid stirring Continuous current density 200mA/cm2 plating time
After 150 minutes, the surface of the non-magnetic nickel plating film 3 obtained as described above is polished to make it smooth. The amount of polishing at this time is
After polishing, a part of the AQ203 fine particles 2 contained uniformly dispersed in the plating film 3 is made to protrude from the surface of the plating film 3. Since the plating film 3 is easier to process than the AQ203 fine particles 2, it is easy to achieve such a state.
その後、以上の研磨処理をしたＮｉメツキ膜に↓１
下記浴条件で（ｉ）アルカル脱脂と（’＝）ａ洗いの前
処理を施こす。Thereafter, the Ni plating film subjected to the above polishing treatment is subjected to pretreatment of (i) alkaline degreasing and ('=)a washing under the following bath conditions.
（ｉ）アルカリ脱脂
苛性ソーダ ５０ ｇ ／ ｆ２炭酸ソー
ダ ２５ ｇ ／ Ｑ液温度
６０’Ｃ
処理時間 ２分
（ｉｉ）酸洗い
フッ酸 ５０ ｍ Ｑ ／ Ｑつい
で、下記浴条件で磁性膜の電気メツキまた化学メツキを
行なう。(i) Alkaline degreased caustic soda 50 g / f2 soda carbonate 25 g / Q liquid temperature
60'C Processing time 2 minutes (ii) Pickling hydrofluoric acid 50 m Q/Q Next, the magnetic film is electroplated or chemically plated under the following bath conditions.
（１）電気メツキ
（ｉ）メツキ液組成
硫酸ニッケル ５６ ｇ ／ Ｑ液化コバルト
４７ｇ／Ｑ
硫酸コバルト ２８ ｇ ／ Ｑホウ酸
３０ ｇ ／ Ｑ次亜リン酸ナトリウム
３ｇ／Ω
（ｉｉ）メツキ条件
電流密度 ３０ ｍ Ａ ／ ｃ ｍ ２Ｐ
Ｈ４，０
液温度 ３０℃
メツキ膜厚 ０．１〜０．５μｍ（ｎ）化学メツ
キ
硫酸コバルト ３０ ｇ ／ Ｑ次亜リン酸ナ
トリウム １０ ｇ ／ ｎ塩化アンモニウム １
５ｇ／Ｑ
クエン酸アンモニウム ３０ ｇ ／ Ｑｐ Ｈ８，０
このとき、磁性メツキ膜４は電気伝導性のあるＮｉメツ
キ膜３の表面のみに付着し、ＡＱ２０３微粒子２の表面
には付着せず、ＡＱ２０３微粒子２は第１図に示すよう
に磁性メツキ膜４の表面から突出したままで残る。たと
えば、ＡＱ２０３微粒子２のＮｉメツキ膜３からの突出
量を０．２μｍ、°０、。(1) Electroplating (i) Plating liquid composition Nickel sulfate 56 g / Q Liquefied cobalt 47 g / Q Cobalt sulfate 28 g / Q Boric acid
30 g/Q sodium hypophosphite
3g/Ω (ii) Plating condition current density 30 mA/cm 2P
H4.0 Liquid temperature 30℃ Plating film thickness 0.1-0.5 μm (n) Chemical plating Cobalt sulfate 30 g/Q Sodium hypophosphite 10 g/n Ammonium chloride 1
5g/Q ammonium citrate 30g/Qp H8,0 At this time, the magnetic plating film 4 adheres only to the surface of the electrically conductive Ni plating film 3, does not adhere to the surface of the AQ203 fine particles 2, and the AQ203 fine particles 2 remains protruding from the surface of the magnetic plating film 4 as shown in FIG. For example, the amount of protrusion of the AQ203 fine particles 2 from the Ni plating film 3 is 0.2 μm and °0.
写翫Ｎ ｉメツキ膜３上の磁性メツキ膜４の膜厚突出し
ていることになる。そのため、磁気ヘッド５は磁性メツ
キ膜４に接触せず、以上の方法で得た磁気記録媒体にお
いて摩耗はほとんで認められなかった。This means that the thickness of the magnetic plating film 4 on the photographic lens Ni plating film 3 is protruding. Therefore, the magnetic head 5 did not come into contact with the magnetic plating film 4, and almost no wear was observed in the magnetic recording medium obtained by the above method.
以上においては、非磁性メツキ膜３中の分散剤である耐
摩耗性微粒子としてＡＱ２０３微粉を用いたが、この他
のＺｒＯ２、ＳｉＣ等の高硬度材料微粉であれば同様な
効果が得られる。In the above, AQ203 fine powder was used as the wear-resistant fine particles which are the dispersant in the non-magnetic plating film 3, but the same effect can be obtained by using fine powder of other high hardness materials such as ZrO2 and SiC.
また、下地の非磁性メツキ膜、その上の磁性メツキ膜に
ついても上記以外の種々のものを使用しうろことは明ら
かである。It is also obvious that various materials other than those described above may be used for the underlying non-magnetic plating film and the magnetic plating film thereon.
第１図は本発明による磁気記録媒体の断面図である。 図において、 １：非磁性金属基板 ２：ＡＱ２０３微粒子 ４：磁性金属メツキ膜 ５：磁気ヘッド 代理人弁理士 小 川 勝 男 ゛ ゛−１／′ FIG. 1 is a cross-sectional view of a magnetic recording medium according to the present invention. In the figure, 1: Non-magnetic metal substrate 2: AQ203 fine particles 4: Magnetic metal plating film 5: Magnetic head Representative Patent Attorney Katsutoshi Ogawa ゛-1/'
Claims (1)
磁性体である磁気記録媒体において、上記下地面を構成
する材料の厚さは上記磁性膜の厚さより大きく、かつ上
記下地面は突起を有し、当該突起は上記磁性膜表面より
突出していることを特徴とする磁気記録媒体。1. In a magnetic recording medium in which the materials constituting the magnetic film and the underlying surface of the magnetic film are non-magnetic, the thickness of the material constituting the underlying surface is greater than the thickness of the magnetic film, and A magnetic recording medium having a protrusion, the protrusion protruding from the surface of the magnetic film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19969887A JPS6346620A (en) | 1987-08-12 | 1987-08-12 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19969887A JPS6346620A (en) | 1987-08-12 | 1987-08-12 | Magnetic recording medium |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP989378A Division JPS54104305A (en) | 1978-02-02 | 1978-02-02 | Magnetic recording medium and production of the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6346620A true JPS6346620A (en) | 1988-02-27 |
Family
ID=16412125
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19969887A Pending JPS6346620A (en) | 1987-08-12 | 1987-08-12 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6346620A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54104305A (en) * | 1978-02-02 | 1979-08-16 | Hitachi Ltd | Magnetic recording medium and production of the same |
-
1987
- 1987-08-12 JP JP19969887A patent/JPS6346620A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54104305A (en) * | 1978-02-02 | 1979-08-16 | Hitachi Ltd | Magnetic recording medium and production of the same |
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