JPH0762894B2 - Base substrate for magnetic disk - Google Patents

Base substrate for magnetic disk

Info

Publication number
JPH0762894B2
JPH0762894B2 JP60292275A JP29227585A JPH0762894B2 JP H0762894 B2 JPH0762894 B2 JP H0762894B2 JP 60292275 A JP60292275 A JP 60292275A JP 29227585 A JP29227585 A JP 29227585A JP H0762894 B2 JPH0762894 B2 JP H0762894B2
Authority
JP
Japan
Prior art keywords
substrate
film
magnetic
magnetic disk
base substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60292275A
Other languages
Japanese (ja)
Other versions
JPS62154218A (en
Inventor
孝雄 中村
賢司 古澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60292275A priority Critical patent/JPH0762894B2/en
Publication of JPS62154218A publication Critical patent/JPS62154218A/en
Publication of JPH0762894B2 publication Critical patent/JPH0762894B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は板面に薄膜磁性媒体を形成する磁気ディスク用
下地基板にかかわり、特に、磁気ヘッドに対する耐摺動
強度を向上させた磁気ディスク用下地基板に関する。
Description: FIELD OF THE INVENTION The present invention relates to a base substrate for a magnetic disk on which a thin film magnetic medium is formed on a plate surface, and particularly to a base for a magnetic disk having improved sliding resistance against a magnetic head. Regarding the substrate.

〔発明の背景〕[Background of the Invention]

従来の板面に薄膜磁性媒体を形成する磁気ディスク用下
地基板は、Al陽極酸化処理をしたAl基板や、Ni−P系の
めっき処理をした基板が用いられていた。これらの基板
は、表面の硬さがHv≒200〜600の硬質皮膜処理をした表
面を、ダイヤモンド旋削やポリシング等の機械加工によ
って、表面粗さ0.1μmRmax以下に仕上げている。この基
板上に薄膜磁性媒体を形成した、例えば、厚さ0.1μm
以下のNi−Co−Pの磁性めっきを施し、あるいは厚さ約
0.2μmのγ−Fe2O3をスパッタ形成したディスク基板で
は、磁気ヘッドに対するCSS(Contact−Start−Stop)
特性等の耐摺動強度を十分満足できないという問題があ
った。
As a base substrate for a magnetic disk for forming a thin film magnetic medium on a conventional plate surface, an Al substrate subjected to Al anodization treatment or a substrate subjected to Ni-P system plating treatment has been used. These substrates have a surface hardness of Hv≈200 to 600, which has been subjected to a hard coating treatment, and is finished by machine processing such as diamond turning or polishing to have a surface roughness of 0.1 μmRmax or less. A thin film magnetic medium is formed on this substrate, for example, a thickness of 0.1 μm
The following Ni-Co-P magnetic plating is applied, or the thickness is approximately
For a disk substrate with 0.2 μm γ-Fe 2 O 3 formed by sputtering, CSS (Contact-Start-Stop) for the magnetic head
There is a problem that the sliding resistance such as characteristics cannot be sufficiently satisfied.

〔発明の目的〕[Object of the Invention]

本発明の目的は、磁気ヘッドに対する耐摺動強度を向上
させた磁気ディスク用下地基板を提供することにある。
An object of the present invention is to provide a base substrate for a magnetic disk having improved sliding resistance against a magnetic head.

〔発明の概要〕[Outline of Invention]

本発明は、磁気ディスク用下地基板において、板面に硬
質膜を形成したAl基板を研磨して、この上に中間膜を形
成し、該中間膜中に前記硬質膜の突起部が、中間膜の形
成面の表面から該突起部の頂部までの距離が0.01〜0.05
μmの高さで点在させることによって、磁気ヘッドに対
する対摺動強度の向上を図ったもので、以下にその原理
を説明する。
According to the present invention, in a base substrate for a magnetic disk, an Al substrate having a hard film formed on a plate surface is polished, and an intermediate film is formed on the Al substrate, and the protrusion of the hard film has an intermediate film in the intermediate film. The distance from the surface of the forming surface to the top of the protrusion is 0.01 to 0.05.
It is intended to improve the sliding resistance against the magnetic head by being scattered at the height of μm, and the principle thereof will be described below.

最初に、磁気ディスクの摺動強度について説明する。磁
気ディスク装置では、面記録密度を高めるため、磁気ヘ
ッドとディスク表面との間隙が微小化し、磁気ヘッドと
ディスク表面との接触頻度が激増してきており、このた
めディスク表面の耐摺動強度を高くする必要がある。現
在、一般に使用されている塗布型磁気ディスクでは、第
4図に示すように、針状微粒子であるγ−Fe2O3の磁性
材7と、補強材としてアルミナ微粒子8と、バインダと
して樹脂9とを混合したものをAl基板1に塗布した構造
を有しており、この塗膜中のアルミナ微粒子8が基板表
面に分散していて、磁気ヘッドとの接触に基づく摩擦摩
耗に対する耐久性を向上させ、磁気ディスクの耐久性を
高めている。
First, the sliding strength of the magnetic disk will be described. In magnetic disk devices, in order to increase the areal recording density, the gap between the magnetic head and the disk surface has become smaller, and the frequency of contact between the magnetic head and the disk surface has increased dramatically. Therefore, the sliding resistance of the disk surface is increased. There is a need to. As shown in FIG. 4, in the coating type magnetic disk generally used at present, magnetic material 7 of γ-Fe 2 O 3 which is needle-shaped fine particles, alumina fine particles 8 as a reinforcing material, and resin 9 as a binder are used. It has a structure in which a mixture of and is applied to the Al substrate 1, and the alumina fine particles 8 in this coating film are dispersed on the substrate surface to improve durability against friction and wear due to contact with the magnetic head. This improves the durability of the magnetic disk.

一方、本発明がかかわる板面に薄膜磁性媒体を形成する
薄膜磁気ディスクでは、磁性層が0.05〜0.2μmと極め
て薄いため、面精度や硬度は基板の影響を大きく受け、
基板との密着強度、基板硬度などが耐久性に大きく影響
を及ぼす。また、薄膜磁性媒体の磁気特性、機械的特性
も、下地基板の性質に大きく影響される。このような観
点から、本願発明者らは、鏡面研磨加工した陽極酸化処
理のAl基板、あるいはNi−Pめっき処理基板上にMo,Ti,
Cr等の中間膜を形成し、この中間膜上に薄膜磁性媒体を
形成するプロセスを研究しているが、この研究過程にお
いて、Ni−Pめっき面に形成したTi中間膜上に分散して
いる直径5〜50μmの結晶粒が存在していることを見い
だした。この結晶粒の硬さは、中間膜の他の部分の硬さ
より大きく、また結晶粒は、表面から高さが0.01〜0.1
μmの凸部を形成していた。本発明は、このような知見
と、研究の結果に基づいてなされたものである。
On the other hand, in the thin film magnetic disk in which the thin film magnetic medium is formed on the plate surface according to the present invention, since the magnetic layer is extremely thin at 0.05 to 0.2 μm, the surface accuracy and hardness are greatly affected by the substrate,
Adhesion strength with the substrate, substrate hardness, etc. greatly affect durability. In addition, the magnetic properties and mechanical properties of the thin film magnetic medium are greatly influenced by the properties of the underlying substrate. From such a point of view, the inventors of the present invention have found that Mo, Ti, and Ni are deposited on a mirror-polished anodized Al substrate or a Ni-P plated substrate.
We are studying the process of forming an intermediate film such as Cr and forming a thin film magnetic medium on this intermediate film. In this research process, it is dispersed on the Ti intermediate film formed on the Ni-P plated surface. It was found that crystal grains having a diameter of 5 to 50 μm were present. The hardness of this crystal grain is larger than the hardness of other parts of the interlayer film, and the crystal grain has a height of 0.01 to 0.1 from the surface.
The convex portion of μm was formed. The present invention has been made based on such findings and the results of research.

本発明では、前述のように、突起部の高さを0.01〜0.05
μmとしているが、これは次の理由による。すなわち、
磁気ディスク装置の高記録密度化とともに、磁気ヘッド
とディスク表面との間隙が微小化し、近年では、この間
隙は0.1μm以下となっており、そのため、ディスク面
での突起部の高さは、磁気ヘッドの振れや外乱を考える
と、0.05μm以下が要求される。また、後述する比較例
では、鏡面加工した基板を用いた磁気ディスクに対して
得られたCSS特性が悪い例が述べられているが、この磁
気ディスクでの凸部の高さが0.01μm以下であった。こ
れらのことから、突起部の高さの上限を0.05μmとし、
下限を0.01μmとしたものである。
In the present invention, as described above, the height of the protrusion is 0.01 to 0.05.
μm, which is due to the following reason. That is,
With the increase in recording density of magnetic disk devices, the gap between the magnetic head and the disk surface has become smaller, and in recent years this gap has become less than 0.1 μm. Therefore, the height of the protrusion on the disk surface is Considering head shake and disturbance, 0.05 μm or less is required. Further, in a comparative example described later, an example in which the CSS characteristics obtained for a magnetic disk using a mirror-finished substrate is poor is described. However, when the height of the convex portion of this magnetic disk is 0.01 μm or less, there were. From these things, the upper limit of the height of the protrusion is set to 0.05 μm,
The lower limit is 0.01 μm.

なお、中間層については、これまでに、基板と磁性媒体
との間にCrやTi,Mn等を形成する発明が提案されており
(特開昭49−74912号公報)、これは磁性媒体の磁気特
性が中間膜によって向上することを示している。しか
し、それに開示された技術は、基板と磁性媒体との密着
力や、中間膜に存在する結晶粒、さらにこの結晶粒と耐
摺動強度との関係についての問題を認識した上でなされ
たものではない。
For the intermediate layer, an invention has heretofore been proposed in which Cr, Ti, Mn or the like is formed between the substrate and the magnetic medium (JP-A-49-74912). It shows that the magnetic properties are improved by the interlayer film. However, the technology disclosed therein was made after recognizing the problem of the adhesion between the substrate and the magnetic medium, the crystal grains existing in the intermediate film, and the relationship between the crystal grains and the sliding resistance. is not.

〔発明の実施例〕Example of Invention

本発明の一実施例を図面を用いて説明する。第1図は該
実施例の磁気ディスク用下地基板の断面をモデル化して
示した図であり、厚さが約2mmのAl合金円板からなるAl
基板1の両面に、厚さ約20μmのNi−Pめっき膜2を形
成し、鏡面研磨後、スパッタリング法により中間膜3を
形成し、さらに表面仕上げした下地基板を示す。なお、
符号4は突起部である。また、第2図は上記下地基板
に、酸化鉄を厚さ約0.2μmにスパッタ形成して磁性媒
体5を設け、その表面に厚さ1nm以下の潤滑膜6を形成
した磁気ディスクの断面をモデル化して示した図であ
る。
An embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a view showing a model of a cross section of a base substrate for a magnetic disk of the example, and an Al alloy disk made of an Al alloy disk having a thickness of about 2 mm.
A base substrate is shown in which a Ni-P plated film 2 having a thickness of about 20 μm is formed on both surfaces of a substrate 1, mirror-polished, and then an intermediate film 3 is formed by a sputtering method, and the surface is finished. In addition,
Reference numeral 4 is a protrusion. Further, FIG. 2 is a model of a cross section of a magnetic disk in which iron oxide is sputtered to a thickness of about 0.2 μm on the above-mentioned base substrate to provide a magnetic medium 5 and a lubricating film 6 having a thickness of 1 nm or less is formed on the surface thereof. FIG.

以下、上記磁気ディスク用下地基板の製造方法を詳しく
述べる。まず、外径210mm、内径100mm、板厚2mmのAl合
金円板であるAl基板1の両面を研磨した後、両面にNi−
Pめっき膜2を厚さ約20μm形成した。このNi−Pめっ
きを施した基板の両面を研磨し、表面粗さ0.01μmRa以
下の鏡面とした。次に、該基板の両面に、TiをArガス圧
5mTorr、下地基板温度200℃、投入電力2kWの条件ではス
パッタ形成し、厚さ0.05μmの中間膜3を作成した。こ
の中間膜3を形成した表面には、第1図に示すように、
高さが約0.02〜0.03μm、大きさが約10〜20μmの突起
部4が全面に点在していた。この突起部4は、中間膜3
の他の部分であるTi膜よりも硬質であり、中間膜3表面
を研磨布で表面仕上げしても、低下しなかった。次に、
上記基板上に、Ar−O2ガス中にて酸化鉄の磁性媒体5を
厚さ0.2μm形成し、さらにフッ素系の潤滑膜6を厚さ1
nm以下で形成した。この表面の断面形状は、第3図に示
すように、約0.02μmの突起が形成されており、中間膜
3を形成したときの突起部4が表面に残っていることを
示している。この試料に対し、磁気ヘッドによるCSS特
性試験を行ったが、良好な結果を得た。
Hereinafter, a method for manufacturing the above-mentioned magnetic disk base substrate will be described in detail. First, after polishing both surfaces of an Al substrate 1 which is an Al alloy disk having an outer diameter of 210 mm, an inner diameter of 100 mm and a plate thickness of 2 mm, Ni-on both surfaces.
The P plating film 2 was formed to a thickness of about 20 μm. Both surfaces of this Ni-P plated substrate were polished to give a mirror surface having a surface roughness of 0.01 μmRa or less. Next, Ti is applied to both surfaces of the substrate by Ar gas pressure.
Under the conditions of 5 mTorr, substrate temperature of 200 ° C., and input power of 2 kW, sputtering was performed to form an intermediate film 3 having a thickness of 0.05 μm. On the surface on which the intermediate film 3 is formed, as shown in FIG.
The projections 4 having a height of about 0.02 to 0.03 μm and a size of about 10 to 20 μm were scattered all over the surface. The protrusion 4 is formed on the intermediate film 3
It is harder than the Ti film which is the other part, and even if the surface of the intermediate film 3 was surface-finished with a polishing cloth, it did not decrease. next,
An iron oxide magnetic medium 5 having a thickness of 0.2 μm is formed on the substrate in Ar—O 2 gas, and a fluorine-based lubricating film 6 having a thickness of 1 μm.
It was formed with a thickness of nm or less. As shown in FIG. 3, the cross-sectional shape of this surface shows that a projection of about 0.02 μm is formed, and the projection 4 when the intermediate film 3 is formed remains on the surface. A CSS characteristic test using a magnetic head was performed on this sample, and good results were obtained.

一方、上記実施例の下地基板と比較のために、Ni−Pめ
っきを施した基板の両面を研磨して、表面粗さ0.01μmR
a以下の鏡面加工をした基板に、Ar−O2ガス中にて酸化
鉄の磁性媒体を厚さ約0.2μm形成し、さらにフッ素系
潤滑膜を厚さ約1nm以下に形成した試料をつくり、この
試料に対して前述と同様のCSS特性試験を行ったが、そ
の結果は前記実施例に比べて悪く、約1桁低い特性値し
か得られなかった。
On the other hand, for comparison with the base substrate of the above example, both surfaces of the Ni-P plated substrate were polished to obtain a surface roughness of 0.01 μmR.
On a mirror-finished substrate of a or less, a magnetic medium of iron oxide was formed in Ar-O 2 gas to a thickness of about 0.2 μm, and a fluorine-based lubricating film was formed to a thickness of about 1 nm or less to prepare a sample. This sample was subjected to the same CSS characteristic test as described above, but the result was worse than that of the above example, and only a characteristic value lower by about one digit was obtained.

〔発明の効果〕〔The invention's effect〕

本発明によれば、磁気ディスク用下地基板において、基
板表面に硬質でかつ微小高さの突起部が均一に分散して
いるので、磁気ヘッドのスライダ部によるCSS特性等の
耐摺動強度を大幅に向上するという効果がある。また、
この微小突起部は、電磁変換特性のノイズエラーに影響
を与えず、さらに微小突起部の高さを0.03μm以下にす
ることにより、磁気ヘッドの浮上特性に影響を及ぼさな
いので、磁気ディスクの大幅な信頼性向上を達成するこ
とができる。
According to the present invention, in the magnetic disk base substrate, since the hard and minute height protrusions are uniformly dispersed on the substrate surface, the sliding resistance strength such as CSS characteristics due to the slider portion of the magnetic head is significantly increased. Has the effect of improving. Also,
This minute protrusion does not affect the noise error in the electromagnetic conversion characteristics, and the height of the minute protrusion is 0.03 μm or less, which does not affect the flying characteristics of the magnetic head. It is possible to achieve great reliability improvement.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例の磁気ディスク用下地基板の
断面をモデル化して示した図、第2図は該基板に磁性媒
体および潤滑膜を形成した磁気ディスクの断面をモデル
化して示した図、第3図は本発明による下地基板表面の
断面曲線を示す図、第4図は従来の塗布磁気ディスクの
断面図である。 符号の説明 1……Al基板、2……Ni−Pめっき膜 3……中間膜、4……突起部 5……磁性媒体、6……潤滑膜
FIG. 1 is a diagram showing a model of a cross section of a base substrate for a magnetic disk according to an embodiment of the present invention, and FIG. 2 is a model showing a cross section of a magnetic disk having a magnetic medium and a lubricating film formed on the substrate. FIG. 3 is a diagram showing a sectional curve of the surface of the base substrate according to the present invention, and FIG. 4 is a sectional view of a conventional coated magnetic disk. Explanation of symbols 1 ... Al substrate, 2 ... Ni-P plating film 3 ... Intermediate film, 4 ... Protrusions 5 ... Magnetic medium, 6 ... Lubrication film

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】スパッタリングやめっき処理によって薄膜
磁性媒体が板面に形成される磁気ディスク用下地基板に
おいて、板面に硬質膜を形成したアルミニューム基板を
研磨して、この上に中間膜を形成し、該中間膜中に前記
硬質膜の突起部が、該中間膜の形成面の表面から該突起
部の頂部までの距離が0.01〜0.05μmの高さで点在する
ことを特徴とする磁気ディスク用下地基板。
1. A base substrate for a magnetic disk in which a thin film magnetic medium is formed on a plate surface by sputtering or plating, an aluminum substrate having a hard film formed on the plate surface is polished, and an intermediate film is formed thereon. The magnetic film is characterized in that the projections of the hard film are scattered in the intermediate film at a height of 0.01 to 0.05 μm from the surface of the surface on which the intermediate film is formed to the top of the projections. Base substrate for disks.
【請求項2】特許請求の範囲第1項に記載の磁気ディス
ク用下地基板において、硬質膜が、Ni−Pめっき処理に
より形成されたことを特徴とする磁気ディスク用下地基
板。
2. A base substrate for a magnetic disk according to claim 1, wherein the hard film is formed by a Ni-P plating process.
【請求項3】特許請求の範囲第1項に記載の磁気ディス
ク用下地基板において、中間膜がTi,Mo,Crのうちいずれ
か1つからなることを特徴とする磁気ディスク用下地基
板。
3. A base substrate for a magnetic disk according to claim 1, wherein the intermediate film is made of any one of Ti, Mo and Cr.
JP60292275A 1985-12-26 1985-12-26 Base substrate for magnetic disk Expired - Lifetime JPH0762894B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60292275A JPH0762894B2 (en) 1985-12-26 1985-12-26 Base substrate for magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60292275A JPH0762894B2 (en) 1985-12-26 1985-12-26 Base substrate for magnetic disk

Publications (2)

Publication Number Publication Date
JPS62154218A JPS62154218A (en) 1987-07-09
JPH0762894B2 true JPH0762894B2 (en) 1995-07-05

Family

ID=17779641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60292275A Expired - Lifetime JPH0762894B2 (en) 1985-12-26 1985-12-26 Base substrate for magnetic disk

Country Status (1)

Country Link
JP (1) JPH0762894B2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6018817A (en) * 1983-07-12 1985-01-30 Nec Corp Magnetic storage medium
JPS6085417A (en) * 1983-10-14 1985-05-14 Matsushita Electric Ind Co Ltd Thin film type magnetic recording medium

Also Published As

Publication number Publication date
JPS62154218A (en) 1987-07-09

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