JPS6345467B2 - - Google Patents
Info
- Publication number
- JPS6345467B2 JPS6345467B2 JP28472485A JP28472485A JPS6345467B2 JP S6345467 B2 JPS6345467 B2 JP S6345467B2 JP 28472485 A JP28472485 A JP 28472485A JP 28472485 A JP28472485 A JP 28472485A JP S6345467 B2 JPS6345467 B2 JP S6345467B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- vacuum
- chamber
- processing
- preliminary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 205
- 238000012545 processing Methods 0.000 claims description 132
- 238000012546 transfer Methods 0.000 claims description 59
- 230000007246 mechanism Effects 0.000 claims description 18
- 230000032258 transport Effects 0.000 claims description 13
- 238000009434 installation Methods 0.000 claims description 10
- 230000007723 transport mechanism Effects 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims 1
- 238000001312 dry etching Methods 0.000 description 4
- 238000003780 insertion Methods 0.000 description 4
- 230000037431 insertion Effects 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28472485A JPS62142791A (ja) | 1985-12-18 | 1985-12-18 | 真空処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28472485A JPS62142791A (ja) | 1985-12-18 | 1985-12-18 | 真空処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62142791A JPS62142791A (ja) | 1987-06-26 |
| JPS6345467B2 true JPS6345467B2 (zh) | 1988-09-09 |
Family
ID=17682162
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28472485A Granted JPS62142791A (ja) | 1985-12-18 | 1985-12-18 | 真空処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62142791A (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003168712A (ja) * | 2001-11-30 | 2003-06-13 | Japan Steel Works Ltd:The | ロードロック装置の基板搬送方法及びその装置 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0394070A (ja) * | 1989-09-05 | 1991-04-18 | Kokusai Electric Co Ltd | Ｃｖｄ装置 |
| JP2002198411A (ja) * | 2000-12-26 | 2002-07-12 | Tokyo Electron Ltd | 圧力制御方法、搬送装置およびクラスタツール |
| JP2006324367A (ja) * | 2005-05-18 | 2006-11-30 | Disco Abrasive Syst Ltd | プラズマエッチング装置 |
| JP2010089014A (ja) * | 2008-10-08 | 2010-04-22 | Jpe:Kk | プラズマ洗浄装置 |
| CN103866282B (zh) * | 2012-12-14 | 2016-12-21 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Pecvd设备 |
| WO2014103677A1 (ja) * | 2012-12-26 | 2014-07-03 | 麒麟麦酒株式会社 | 薄膜の成膜装置 |
-
1985
- 1985-12-18 JP JP28472485A patent/JPS62142791A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003168712A (ja) * | 2001-11-30 | 2003-06-13 | Japan Steel Works Ltd:The | ロードロック装置の基板搬送方法及びその装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62142791A (ja) | 1987-06-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |