JPS6342365Y2 - - Google Patents

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Publication number
JPS6342365Y2
JPS6342365Y2 JP13035881U JP13035881U JPS6342365Y2 JP S6342365 Y2 JPS6342365 Y2 JP S6342365Y2 JP 13035881 U JP13035881 U JP 13035881U JP 13035881 U JP13035881 U JP 13035881U JP S6342365 Y2 JPS6342365 Y2 JP S6342365Y2
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JP
Japan
Prior art keywords
tank
pipe
chemical solution
paraffin
cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13035881U
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Japanese (ja)
Other versions
JPS5836358U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP13035881U priority Critical patent/JPS5836358U/en
Priority to US06/426,573 priority patent/US4483270A/en
Publication of JPS5836358U publication Critical patent/JPS5836358U/en
Application granted granted Critical
Publication of JPS6342365Y2 publication Critical patent/JPS6342365Y2/ja
Granted legal-status Critical Current

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  • Investigating Or Analysing Biological Materials (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Separation Of Gases By Adsorption (AREA)

Description

【考案の詳細な説明】 この考案は、一槽式包埋装置における廃ガス処
理装置に関し、顕微鏡標本に作製すべき生物組織
片を多くの薬液、溶融パラフインに順次浸漬処理
する間に薬液、パラフインから放出される廃ガス
が室内に放散されるのを防止することを目的とし
た考案である。
[Detailed description of the invention] This invention relates to a waste gas treatment device in a single-tank embedding device. The idea is to prevent waste gas from being released into the room.

この考案を説明するに先立つて、先ず、一槽式
包埋装置の概要を説明すると次の通りである。即
ち、第1図に略示するように、処理槽1の底部は
管2によりゲート弁3aを経てロータリ弁3に通
じており、ロータリ弁3には複数の薬液槽4a,
4b、パラフイン槽5a,5bに挿入した管6
a,6b,7a,7bが連結されていて、減速モ
ータ8によりロータリ弁3のロータを駆動するこ
とにより管6a,6b,7a,7bをゲート弁3
aを経て選択的に管2に連通させる。溶融したパ
ラフインを入れるパラフイン槽5a,5bや加温
して使用される薬液(例えばホルマリン)の槽5
c,5dはオーブン9に入れられており、処理槽
1もパラフインその他の加温薬液を供給されると
きこれらを加熱するためにヒータ10を装置さ
れ、ロータリ弁3、管2,7a等も必要に応じて
保温、加熱の処置が構ぜられる。処理槽1の上部
は、管11により切換弁12を経て空気ポンプ1
3の吸入側に通じたり、切換弁12の切換えによ
り大気に通じたりするようにされている。
Before explaining this invention, an overview of the one-tank embedding device will first be explained as follows. That is, as schematically shown in FIG. 1, the bottom of the processing tank 1 is connected to the rotary valve 3 via a gate valve 3a by a pipe 2, and the rotary valve 3 has a plurality of chemical tanks 4a,
4b, tube 6 inserted into paraffin baths 5a, 5b
a, 6b, 7a, 7b are connected, and by driving the rotor of the rotary valve 3 with a deceleration motor 8, the pipes 6a, 6b, 7a, 7b are connected to the gate valve 3.
selectively communicates with tube 2 via a. Paraffin tanks 5a and 5b for storing melted paraffin and a tank 5 for a chemical solution (for example, formalin) used by heating.
c and 5d are placed in an oven 9, and the processing tank 1 is also equipped with a heater 10 to heat paraffin and other heating chemicals when they are supplied, and a rotary valve 3, pipes 2 and 7a, etc. are also required. Depending on the situation, heat retention or heating measures may be taken. The upper part of the treatment tank 1 is connected to the air pump 1 through a pipe 11 and a switching valve 12.
3, or to the atmosphere by switching the switching valve 12.

このように構成される一槽式包埋装置は、下記
のように操作される。
The one-tank embedding apparatus constructed in this way is operated as follows.

先ず、顕微鏡標本に作製しようとする生物組織
片を入れた通液性の試料篭14を処理槽1に入
れ、気密蓋1aを密閉した後、下記に例示するよ
うな操作により包埋処理を開始する。即ち、ロー
タリ弁3を駆動して処理槽1に最初に供給すべき
薬液の槽4aに通じる管6aを、閉じられている
ゲート弁3aを隔てて処理槽に通じる管2に合致
させ、ゲート弁3aを開き、空気ポンプ13を始
動して処理槽1内の空気を吸引して槽内を低圧に
する。これにより槽4a内の薬液は処理槽1に吸
込まれ篭14を浸漬する。次にゲート弁3aを閉
じ、ポンプ13を停止させる。所定時間(1〜2
時間)の浸漬を終つたならば、切換弁12を切換
えて処理槽1内を大気に通じさせる(薬液槽4a
等が処理槽1より下にある場合。薬液槽等の位置
が処理槽より低くない場合は、ポンプ13の吐出
側を処理槽1内に連通させる。)と、処理槽内の
薬液は元の薬液槽4a内に還流し、処理槽1は空
になる。そこで、ロータリ弁3を駆動して第二の
薬液槽4bを管2に通じるようにしてポンプ13
を始動させる。これにより第二の薬液槽4b内の
薬液が処理槽1に入り、試料篭14を浸漬するか
ら、ゲート弁3aを閉じポンプ13を停止させ
て、所定時間生物組織片を処理する。この操作を
各薬液槽について順次行ない、最後に溶融パラフ
インで同様に処理して組織片にパラフインを浸透
させ、包埋処理を終るのである。
First, a liquid-permeable sample basket 14 containing a biological tissue piece to be prepared as a microscopic specimen is placed in the processing tank 1, and after sealing the airtight lid 1a, the embedding process is started by the operations illustrated below. do. That is, the rotary valve 3 is driven to align the pipe 6a leading to the tank 4a of the chemical solution to be first supplied to the processing tank 1 with the pipe 2 leading to the processing tank across the closed gate valve 3a, and the gate valve 3a is opened, the air pump 13 is started, and the air inside the processing tank 1 is sucked to lower the pressure inside the tank. As a result, the chemical solution in the tank 4a is sucked into the processing tank 1 and immerses the basket 14 therein. Next, the gate valve 3a is closed and the pump 13 is stopped. Predetermined time (1 to 2
After completing the immersion (time), switch the switching valve 12 to allow the inside of the treatment tank 1 to be exposed to the atmosphere (chemical solution tank 4a
etc. are located below treatment tank 1. If the chemical solution tank or the like is not lower than the processing tank, the discharge side of the pump 13 is communicated with the processing tank 1. ), the chemical solution in the processing tank flows back into the original chemical solution tank 4a, and the processing tank 1 becomes empty. Therefore, the rotary valve 3 is driven to connect the second chemical tank 4b to the pipe 2, and the pump 13
start. As a result, the chemical solution in the second chemical solution tank 4b enters the processing tank 1 and immerses the sample basket 14, so the gate valve 3a is closed, the pump 13 is stopped, and the biological tissue piece is processed for a predetermined period of time. This operation is performed sequentially for each chemical bath, and finally, the tissue piece is treated in the same manner with molten paraffin to penetrate the paraffin into the tissue piece, thereby completing the embedding process.

これらの操作は、連動カム、タイマ、コンピユ
ータ等による機械的または電気的制御により、順
を追つて自動的に行なわれる。
These operations are automatically performed in sequence under mechanical or electrical control using an interlocking cam, a timer, a computer, or the like.

このような包埋処理には、ホルマリン等の固定
液、アルコール等の脱水脱脂剤、キシレン等の中
間溶剤および溶融パラフインが使用され、これら
は例えば14個の薬液槽に分け入れて順次使用され
る。包埋処理を終つた装置の各部は、キシレンを
流通させてパラフインを溶し、アルコールを通し
てキシレンを除き洗浄される。
In this embedding process, a fixative such as formalin, a dehydrating and degreasing agent such as alcohol, an intermediate solvent such as xylene, and molten paraffin are used, and these are divided into, for example, 14 chemical baths and used sequentially. . After the embedding process, each part of the apparatus is cleaned by passing xylene through it to dissolve the paraffin and passing alcohol through it to remove the xylene.

薬液槽4a,4b、パラフイン槽5a,5b等
の容積は、その内容液の全部を処理槽1に移し入
れたとき、処理槽内の液面が所定の高さになつて
試料篭14を浸漬するように決められる。
The volumes of the chemical solution tanks 4a, 4b, paraffin tanks 5a, 5b, etc. are such that when all of their contents are transferred to the processing tank 1, the liquid level in the processing tank reaches a predetermined height and the sample basket 14 is immersed. It is decided to do so.

このように構成され操作される一槽式包埋装置
においては、使用薬液からクロロホルム、キシレ
ン、アルコール等のガスが放出されるので、これ
が室内にこもると人体に有害である。
In the one-tank embedding apparatus constructed and operated in this manner, gases such as chloroform, xylene, and alcohol are released from the chemical solution used, and if these gases remain indoors, they are harmful to the human body.

従来の包埋装置では、これらの廃ガスを特に捕
集することは考えられていなかつたが、室を閉切
つた状態で長時間連続して包埋処理作業をしてい
ると、廃ガス量も多くなるのでこれを放置してお
いたのでは危険である。
Conventional embedding equipment has not been designed to specifically capture these waste gases, but when embedding operations are performed continuously for long periods with the chamber closed, the amount of waste gas increases. It is dangerous to leave this as it is, as it will increase in number.

本考案は、これらの廃ガスを捕集して作業環境
を健康的にするようにした包埋装置における廃ガ
ス処理装置を得たものである。
The present invention provides a waste gas treatment device for an embedding device that collects these waste gases and makes the working environment healthier.

以下第2図に示す実施例により本考案を説明す
る。第1図と同等部分には同符号を付して説明を
省略する。第2図は、一槽式包埋装置の一例を示
す略図で、本考案の廃ガス処理装置の実施例が組
込まれているものである。
The present invention will be explained below with reference to an embodiment shown in FIG. Components equivalent to those in FIG. 1 are given the same reference numerals and their explanations will be omitted. FIG. 2 is a schematic diagram showing an example of a one-tank embedding device, in which an embodiment of the waste gas treatment device of the present invention is incorporated.

第2図において、各薬液槽4a,4bには密閉
蓋を施し、これを気密に貫通する管16a,16
bにより各槽の上部を受筒17のA部に連通させ
ている。処理槽1の上部に通じる管11は溢流槽
15に入り、槽15の上部は管11aにより切換
弁12に通じている。また複数の薬液槽4a,4
bの上部は管16a,16bにより受筒17に通
じている。
In FIG. 2, each chemical liquid tank 4a, 4b is provided with a hermetically sealed lid, and the tubes 16a, 16 are hermetically penetrated through the lid.
b allows the upper part of each tank to communicate with part A of the receiving tube 17. A pipe 11 leading to the upper part of the treatment tank 1 enters an overflow tank 15, and the upper part of the tank 15 communicates with the switching valve 12 by a pipe 11a. Also, a plurality of chemical liquid tanks 4a, 4
The upper part of b communicates with the receiving cylinder 17 through pipes 16a and 16b.

処理槽1には、薬液供給時の液面を検知する超
音波センサ18を取付け、溢流槽15の側面には
この槽内に流入する薬液を検知する超音波センサ
19を取付け、受筒17にはこの筒内への薬液の
流入を検知する超音波センサ20を取付けてい
る。受筒17内は隔壁21によりA部とB部とに
区画し、A部は管22により洗浄筒23内に入れ
た水24の底部に導通させ、洗浄筒23の上部空
間は管25により受筒のB部に通じさせる。B部
は管26により吸着筒27に入れた活性炭28の
底部に通じさせる。吸着筒27の上部空間は管2
9により大気に通じている。管11aに接続され
た三方口の切換弁12の残りの口の一方は管30
により吸着筒27の活性炭の底に通じさせ、切換
弁12の他方の口は管31により空気ポンプ13
の吸入側に通じさせるが、ポンプ13の前後には
三方口の切換弁32,33が接続されており、切
換弁32の残りの口は管34によりオーブン9内
に通じ、切換弁33の一方の口は管35により管
31に通じ、他方の口は管36により、管37に
接続される。管37は、一端は洗浄筒23の水中
に通じ、他端は圧力調整弁38を経て管11aに
通じている。管11aには、0.1気圧で作動する
圧力スイツチ39、0.35気圧で作動する圧力スイ
ツチ40、圧力計41が接続されている。なお、
オーブン9は、僅かな漏洩を持つものであるが、
これを密閉したときは、管42によりオーブン内
を管30に通じさせる。
An ultrasonic sensor 18 is attached to the processing tank 1 to detect the liquid level when the chemical solution is supplied, an ultrasonic sensor 19 is attached to the side surface of the overflow tank 15 to detect the chemical solution flowing into this tank, and the receiving tube 17 An ultrasonic sensor 20 is attached to the cylinder to detect the inflow of chemical liquid into the cylinder. The inside of the receiving cylinder 17 is divided into a part A and a part B by a partition wall 21. The part A is connected to the bottom of the water 24 put into the cleaning cylinder 23 through a pipe 22, and the upper space of the cleaning cylinder 23 is received by a pipe 25. Pass it through part B of the tube. Portion B is communicated through a pipe 26 to the bottom of activated carbon 28 placed in an adsorption cylinder 27. The upper space of the adsorption cylinder 27 is the pipe 2
9 communicates with the atmosphere. One of the remaining ports of the three-way switching valve 12 connected to the pipe 11a is connected to the pipe 30.
The other port of the switching valve 12 is connected to the air pump 13 through a pipe 31.
However, three-way switching valves 32 and 33 are connected to the front and rear of the pump 13, and the remaining ports of the switching valve 32 communicate with the oven 9 through a pipe 34, and one side of the switching valve 33 The mouth of the tube 31 is connected to the tube 31 by a tube 35, and the other mouth is connected to the tube 37 by a tube 36. One end of the pipe 37 communicates with the water in the washing cylinder 23, and the other end communicates with the pipe 11a via a pressure regulating valve 38. A pressure switch 39 that operates at 0.1 atm, a pressure switch 40 that operates at 0.35 atm, and a pressure gauge 41 are connected to the pipe 11a. In addition,
Oven 9 has slight leakage, but
When this is sealed, the inside of the oven is communicated with the tube 30 through the tube 42.

このように構成されるから、ポンプ13を駆動
して処理槽1内の空気を、管11、溢流槽15、
管11a、切換弁12、管31、切換弁32を経
てポンプ13に吸引させ、ポンプ13の排気を、
切換弁33、管36,37、洗浄筒23、管2
5、受筒のB部、管26、吸着筒27、管29を
経て大気中に放出することができる。これにより
第1図の従来例と同様に、処理槽1内に薬液槽4
a,4b等の薬液や溶融パラフインが吸入され
る。
With this configuration, the pump 13 is driven to pump the air in the processing tank 1 to the pipe 11, the overflow tank 15,
The pump 13 suctions through the pipe 11a, the switching valve 12, the pipe 31, and the switching valve 32, and the exhaust from the pump 13 is
Switching valve 33, pipes 36, 37, cleaning cylinder 23, pipe 2
5. It can be released into the atmosphere through part B of the receiving cylinder, pipe 26, adsorption cylinder 27, and pipe 29. As a result, similarly to the conventional example shown in FIG.
Chemical solutions such as a and 4b and molten paraffin are inhaled.

処理槽1内の薬液等を排出するには、切換弁1
2を切換えて管11a,30を導通させれば、大
気が管29、吸着筒27、管30、切換弁12、
管11a、溢流槽15、管11を通つて処理槽1
に入り、処理槽内の薬液等を流下させることがで
きる。薬液槽等の位置が処理槽1より高いような
ときは、切換弁32,33を切換えてポンプ13
の吸入側をオーブン9に通じさせ、排気側を管3
5,31を経て切換弁12に通じさせることによ
りポンプ13の吐出する加圧空気を管35,3
1、切換弁12、管11a、溢流槽15、管11
を経て処理槽1に送り、処理槽内の薬液等を元の
薬液槽等に押し戻すことができる。処理槽1から
の薬液等の押出しは、これの流出状態を適当に保
つため、この実施例では空気圧を0.35気圧として
行つている。空気圧がこの値より高いときは調整
弁38が余分の空気を管37へ放出してこの空気
圧を維持する。薬液等の排出が終り、薬液等が薬
液槽4a等に戻ると処理槽内の圧力が急速に0.1
気圧になるから、圧力スイツチ39が働いてポン
プ13を停止させ、ロータリ弁3を駆動して次の
処理行程へ進ませる。上記の0.35気圧、0.1気圧
等の値は装置設計により異なるから、その装置に
最適の値を採るべきである。なおこの実施例で
は、0.1気圧で作動する圧力スイツチ39と、
0.35気圧で作動する圧力スイツチ40との2個の
圧力スイツチを使用したが、0.35気圧で作動し
0.1気圧で復帰する1個の複動式圧力スイツチを
使用してもよい。
To drain the chemicals and the like from the treatment tank 1, the switching valve 1
When the switch 2 is switched to open the pipes 11a and 30, the atmosphere flows through the pipe 29, the adsorption tube 27, the pipe 30, the switching valve 12,
Through the pipe 11a, the overflow tank 15, and the pipe 11,
When the chemical tank is located higher than the treatment tank 1, the switching valves 32 and 33 are switched to the pump 13.
The intake side of the pipe is connected to the oven 9, and the exhaust side is connected to the pipe 3.
5, 31 to the switching valve 12, the compressed air discharged from the pump 13 is
1, switching valve 12, pipe 11a, overflow tank 15, pipe 11
to the processing tank 1, and the chemicals etc. in the processing tank can be pushed back into the original chemical tank etc. In this embodiment, the air pressure is set to 0.35 atm to push the chemicals etc. out of the processing tank 1 in order to maintain an appropriate outflow state. When the air pressure is higher than this value, the regulating valve 38 releases excess air into the pipe 37 to maintain this air pressure. When the discharge of the chemicals etc. is completed and the chemicals etc. have returned to the chemical tank 4a etc., the pressure inside the processing tank rapidly drops to 0.1
Since the pressure reaches atmospheric pressure, the pressure switch 39 operates to stop the pump 13 and drive the rotary valve 3 to proceed to the next processing step. The above values of 0.35 atmospheres, 0.1 atmospheres, etc. vary depending on the design of the equipment, so the optimum value for the equipment should be selected. In this embodiment, the pressure switch 39 operates at 0.1 atmospheres,
Two pressure switches were used, one for pressure switch 40 operating at 0.35 atmospheres, and the other for pressure switch 41 operating at 0.35 atmospheres.
A single double acting pressure switch reset at 0.1 atmospheres may be used.

本考案の装置においては、上記実施例に見るよ
うに処理槽1、薬液槽4a,4b,5c,5d、
パラフイン槽5a,5b等を出入する空気は総て
吸着槽27内の活性炭28を通つて大気中に排出
され、また各槽は密閉蓋やオーブン(僅少の漏洩
があつても実際上は差支ない。)のため外気と隔
離されているから、各薬液やパラフインに含有さ
れた有害ガスがそのまま装置外に排出されること
がなく、包埋処理を安全に行なうことができる。
In the apparatus of the present invention, as shown in the above embodiment, a processing tank 1, chemical liquid tanks 4a, 4b, 5c, 5d,
All the air entering and exiting the paraffin tanks 5a, 5b, etc. is discharged into the atmosphere through the activated carbon 28 in the adsorption tank 27, and each tank is connected to a closed lid or an oven (even if there is a slight leakage, there is no practical difference). ), and is isolated from the outside air, the harmful gases contained in the various chemical solutions and paraffin are not discharged to the outside of the device, allowing safe embedding.

また、活性炭が有害ガスを吸着する能力はガス
温度が高いと低下するが、パラフインやホルマリ
ンのように温度を高くして用いるものでは、これ
から放出される有害ガスの温度も高くなるので、
これを直接吸着槽27の活性炭に通すことは不利
である。本考案では吸着槽27の前に洗浄槽23
を置いて、水に溶ける有害ガス(例えばアルコー
ル)を除くと同時にガス温度を下げるので、活性
炭の吸着能力を高めることができる。
In addition, the ability of activated carbon to adsorb harmful gases decreases when the gas temperature is high, but when using materials such as paraffin and formalin at high temperatures, the temperature of the harmful gases that are released also increases.
It is disadvantageous to pass it directly through the activated carbon in the adsorption tank 27. In the present invention, the cleaning tank 23 is placed before the adsorption tank 27.
The adsorption capacity of activated carbon can be increased by removing harmful gases (such as alcohol) that are soluble in water and lowering the gas temperature at the same time.

以上のようにこの廃ガス処理装置は、包埋装置
に使用される薬液、パラフインから出るクロロホ
ルム、キシレン、アルコール等の廃ガスを捕集し
て室内に放出させないから、作業者が有害ガスを
吸う心配をなくし、作業環境を健康的にする効果
が大きい。
As mentioned above, this waste gas treatment equipment collects waste gases such as chloroform, xylene, and alcohol emitted from the chemicals and paraffin used in the embedding equipment and does not release them into the room, so workers can breathe in harmful gases. It has a great effect on eliminating worries and making the work environment healthier.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は通常の一槽式包埋装置の概要を示す略
図、第2図は本考案の廃ガス処理装置の実施例を
組込んだ一槽式包埋装置を示す略図である。 1:処理槽、1a:蓋、2:管、3:ロータリ
弁、3a:ゲート弁、4a,4b:薬液槽、5
a,5b:パラフイン槽、6,7:管、8:減速
モータ、9:オーブン、10:ヒータ、11,1
1a:管、12:切換弁、13:空気ポンプ、1
4:試料篭、15:溢流槽、16a,16b:
管、17:受筒、18,19,20:超音波セン
サ、21:隔壁、22:管、23:洗浄槽、2
4:水、25,26:管、27:吸着槽、28:
活性炭、29,30,31:管、32,33:切
換弁、34,35,36,37:管、38:圧力
調整弁、39,40:圧力スイツチ、41:圧力
計。
FIG. 1 is a schematic diagram showing an outline of a conventional one-tank embedding device, and FIG. 2 is a schematic diagram showing a one-tank embedding device incorporating an embodiment of the waste gas treatment device of the present invention. 1: Processing tank, 1a: Lid, 2: Pipe, 3: Rotary valve, 3a: Gate valve, 4a, 4b: Chemical tank, 5
a, 5b: paraffin bath, 6, 7: tube, 8: deceleration motor, 9: oven, 10: heater, 11, 1
1a: pipe, 12: switching valve, 13: air pump, 1
4: Sample basket, 15: Overflow tank, 16a, 16b:
Pipe, 17: Receiver, 18, 19, 20: Ultrasonic sensor, 21: Partition, 22: Pipe, 23: Cleaning tank, 2
4: Water, 25, 26: Pipe, 27: Adsorption tank, 28:
Activated carbon, 29, 30, 31: pipe, 32, 33: switching valve, 34, 35, 36, 37: pipe, 38: pressure regulating valve, 39, 40: pressure switch, 41: pressure gauge.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 一槽式包埋装置において、各薬液槽4a,4
b、パラフイン槽5a,5bを密閉蓋またはオー
ブンにより外気と遮断すると共に、各薬液槽、オ
ーブン内の上部を、水を入れ密閉した洗浄筒23
の水の底部に管により通じさせ、洗浄筒23の上
部空間を、活性炭を充填し上部を大気に通じさせ
た吸着筒28の活性炭底部に管により通じさせて
成る一槽式包埋装置における廃ガス処理装置。
In the one-tank embedding device, each chemical solution tank 4a, 4
b. The paraffin tanks 5a and 5b are isolated from the outside air with airtight lids or ovens, and the upper parts of each chemical solution tank and oven are filled with water and sealed with a cleaning cylinder 23.
waste in a one-tank embedding device, in which the upper space of the washing cylinder 23 is connected to the bottom of activated carbon of an adsorption cylinder 28 filled with activated carbon and whose upper part is open to the atmosphere. Gas treatment equipment.
JP13035881U 1981-09-03 1981-09-03 Waste gas treatment equipment for single-tank embedding equipment Granted JPS5836358U (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP13035881U JPS5836358U (en) 1981-09-03 1981-09-03 Waste gas treatment equipment for single-tank embedding equipment
US06/426,573 US4483270A (en) 1981-09-03 1982-09-29 Apparatus for embedding biological specimens in paraffin or the like preparatory to microscopical examination

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13035881U JPS5836358U (en) 1981-09-03 1981-09-03 Waste gas treatment equipment for single-tank embedding equipment

Publications (2)

Publication Number Publication Date
JPS5836358U JPS5836358U (en) 1983-03-09
JPS6342365Y2 true JPS6342365Y2 (en) 1988-11-07

Family

ID=29923990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13035881U Granted JPS5836358U (en) 1981-09-03 1981-09-03 Waste gas treatment equipment for single-tank embedding equipment

Country Status (1)

Country Link
JP (1) JPS5836358U (en)

Also Published As

Publication number Publication date
JPS5836358U (en) 1983-03-09

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