JPS6341923B2 - - Google Patents
Info
- Publication number
- JPS6341923B2 JPS6341923B2 JP58049690A JP4969083A JPS6341923B2 JP S6341923 B2 JPS6341923 B2 JP S6341923B2 JP 58049690 A JP58049690 A JP 58049690A JP 4969083 A JP4969083 A JP 4969083A JP S6341923 B2 JPS6341923 B2 JP S6341923B2
- Authority
- JP
- Japan
- Prior art keywords
- solution
- polyvinyl alcohol
- group
- exchange resin
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4969083A JPS59176303A (ja) | 1983-03-26 | 1983-03-26 | 感光性樹脂水溶液の精製方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4969083A JPS59176303A (ja) | 1983-03-26 | 1983-03-26 | 感光性樹脂水溶液の精製方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59176303A JPS59176303A (ja) | 1984-10-05 |
JPS6341923B2 true JPS6341923B2 (enrdf_load_stackoverflow) | 1988-08-19 |
Family
ID=12838176
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4969083A Granted JPS59176303A (ja) | 1983-03-26 | 1983-03-26 | 感光性樹脂水溶液の精製方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59176303A (enrdf_load_stackoverflow) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2560267B2 (ja) * | 1987-03-25 | 1996-12-04 | 日本合成ゴム株式会社 | 感放射線性樹脂の製造方法 |
JP2771076B2 (ja) * | 1991-09-03 | 1998-07-02 | オリン・マイクロエレクトロニツク・ケミカルズ・インコーポレイテツド | レジスト成分からの金属不純物の除去方法 |
JP2771075B2 (ja) * | 1991-09-03 | 1998-07-02 | オリン・マイクロエレクトロニツク・ケミカルズ・インコーポレイテツド | レジスト成分からの金属不純物除去方法 |
US5378802A (en) * | 1991-09-03 | 1995-01-03 | Ocg Microelectronic Materials, Inc. | Method for removing impurities from resist components and novolak resins |
JP2998095B2 (ja) * | 1992-12-07 | 2000-01-11 | ジェイエスアール株式会社 | レジスト塗布組成物溶液 |
SE0303041D0 (sv) * | 2003-06-23 | 2003-11-18 | Ecsibeo Ab | A liquid crystal device and a method for manufacturing thereof |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5928571B2 (ja) * | 1981-08-05 | 1984-07-13 | 工業技術院長 | 光不溶性高分子材料とその製造法 |
-
1983
- 1983-03-26 JP JP4969083A patent/JPS59176303A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59176303A (ja) | 1984-10-05 |
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