JPS6340591A - Blade - Google Patents
BladeInfo
- Publication number
- JPS6340591A JPS6340591A JP18623686A JP18623686A JPS6340591A JP S6340591 A JPS6340591 A JP S6340591A JP 18623686 A JP18623686 A JP 18623686A JP 18623686 A JP18623686 A JP 18623686A JP S6340591 A JPS6340591 A JP S6340591A
- Authority
- JP
- Japan
- Prior art keywords
- blade
- film
- metal film
- base metal
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 24
- 150000004767 nitrides Chemical class 0.000 claims description 19
- 239000010953 base metal Substances 0.000 claims description 18
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 10
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 229910017464 nitrogen compound Inorganic materials 0.000 claims description 10
- 150000002830 nitrogen compounds Chemical class 0.000 claims description 10
- 229910052719 titanium Inorganic materials 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 239000011651 chromium Substances 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- 229910052786 argon Inorganic materials 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 229910001873 dinitrogen Inorganic materials 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 4
- 208000019300 CLIPPERS Diseases 0.000 description 3
- 208000021930 chronic lymphocytic inflammation with pontine perivascular enhancement responsive to steroids Diseases 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- -1 2 is a target Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Dry Shavers And Clippers (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔発明の対象および目的〕
本発明は電気かみそりや電気バリカン等の刃の改良に係
り、耐摩耗性および耐食性に借れた刃を提供すること、
特に耐摩耗性および耐食性を付与するための窒素化合物
膜を、刃に対して確実に密着させて形成することを目的
とする。[Detailed description of the invention] [Object and purpose of the invention] The present invention relates to improving the blades of electric razors, electric hair clippers, etc., and provides a blade with excellent wear resistance and corrosion resistance.
In particular, the purpose is to form a nitrogen compound film in close contact with the blade to impart wear resistance and corrosion resistance.
従来の電気かみそりやバリカン等に用いられる刃は、ニ
ッケル電鋳やステンレス鋼薄板なとで作られているため
、長期間使用していると汗などで変色して製品価値が低
下する。特に外刃と内刃の摺動摩擦による摩耗により摺
動面のIIj’j積が増加し、その結果切れ味の低下と
ともに摩擦抵抗が大きく摺動負荷が大となり、消費電力
が増大してくるなどの欠点を有している。この欠点を改
良するため、例えば、特開昭52’−92655号公報
に示されるように酸化物や窒化物のコーティングが提案
されているが、このものは刃表面に直接被膜するもので
あって、直接これらをコーティングしても外刃表面に対
して充分な密着力は得られず、摺動等によりはがれ易い
ものであった。これは被膜形成時に、熱などの影響によ
ってNi電鋳刃ではイオウの表面拡散がまた、ステンレ
ス刃では炭素の局在が発生するためで、被膜と下地基板
との接着力が弱く、耐摩耗性、耐食性ともに充分ではな
かった。The blades used in conventional electric razors and hair clippers are made of electroformed nickel or thin stainless steel, so if used for a long time, they will discolor due to sweat and other factors, reducing the product's value. In particular, the IIj'j product of the sliding surface increases due to wear due to sliding friction between the outer cutter and inner cutter, resulting in a decrease in sharpness, a large frictional resistance, a large sliding load, and an increase in power consumption. It has its drawbacks. In order to improve this drawback, coatings of oxides and nitrides have been proposed, for example, as shown in Japanese Patent Application Laid-Open No. 52'-92655, but these coatings do not directly coat the blade surface. Even if these were directly coated, sufficient adhesion to the surface of the outer blade could not be obtained, and they were likely to peel off due to sliding or the like. This is because when the film is formed, sulfur diffuses on the surface of Ni electroformed blades and carbon localizes on stainless steel blades due to the effects of heat, resulting in weak adhesion between the film and the underlying substrate, resulting in poor wear resistance. Both the corrosion resistance and the corrosion resistance were insufficient.
この発明は上述した従来技術の欠点を解消するもので、
刃の少なくとも摺動面に、窒素化合物膜を形成するにあ
たり、刃の表面に下地金属膜を形成した後、該下地金属
膜上に上記窒素化合物膜を形成することによって、目的
を達成したものである。下地金属膜としてはチタン、ニ
ッケル、ジルコニウム、クロム、アルミニウムもしくは
これらの合金から選ばれるものを、また窒素化合物膜と
しては、チタン、ジルコニウム、クロム、ニッケル、ア
ルミニウムもしくはこれらの合金から選ばれるものを使
用することが最適である。This invention solves the above-mentioned drawbacks of the prior art.
In forming a nitrogen compound film on at least the sliding surface of the blade, the purpose is achieved by forming a base metal film on the surface of the blade and then forming the nitrogen compound film on the base metal film. be. The base metal film is selected from titanium, nickel, zirconium, chromium, aluminum, or an alloy thereof, and the nitrogen compound film is selected from titanium, zirconium, chromium, nickel, aluminum, or an alloy thereof. It is best to do so.
さらに、下地金属膜の作成法としては、真空蒸着法、イ
オンブレーティング法、直流スパッタ法、高周波スパッ
タ法、マグネトロンスパッタ法などの方法を採ることが
できる。一方、窒化膜はイオンブレーティング法、直流
スパッタ法、高周波スパッタ法、マグネトロンスパッタ
法、プラズマCVD法などの方法を採ることができ、ス
パッタ法では、アルゴンガスと窒素ガスの比率と電力を
制御することによって所望の窒素含率を得ることができ
る。一方、イオンブレーティング法では金属材料の析出
速度と窒素もしくはアンモニアとの比を制御することに
よって窒素含率を制御する。Further, as a method for forming the base metal film, methods such as a vacuum evaporation method, an ion blating method, a direct current sputtering method, a high frequency sputtering method, and a magnetron sputtering method can be adopted. On the other hand, the nitride film can be formed using methods such as ion blasting, direct current sputtering, high frequency sputtering, magnetron sputtering, and plasma CVD.In the sputtering method, the ratio of argon gas to nitrogen gas and the power are controlled. By this, a desired nitrogen content can be obtained. On the other hand, in the ion blating method, the nitrogen content is controlled by controlling the ratio between the precipitation rate of the metal material and nitrogen or ammonia.
特に、高周波スパッタ法を用いる場合、アルゴンおよび
窒素ガスの全ガス圧は0.003〜0.3Torrが望
ましく 、0.003 Torr以下では放電せず、Q
、3 Torr以上では放電が不安定となる。また高周
波電力は1〜5す/clrが望ましく、I W/cut
以下では析出速度が遅すぎて効率が悪い、5 tJ/c
nf以上では析出速度がほとんど増加せず、ターゲット
温度や基板温度が上昇するだけで、刃母材の機械的強度
を低下させる等の悪影響を与える。In particular, when using the high frequency sputtering method, the total gas pressure of argon and nitrogen gas is preferably 0.003 to 0.3 Torr, and discharge does not occur below 0.003 Torr, and Q
, 3 Torr or more, the discharge becomes unstable. In addition, the high frequency power is preferably 1 to 5 S/clr, and I W/cut
Below 5 tJ/c, the precipitation rate is too slow and the efficiency is poor.
At nf or more, the precipitation rate hardly increases, and the target temperature and substrate temperature only increase, which causes an adverse effect such as a decrease in the mechanical strength of the blade base material.
このような窒化膜の膜厚は耐食性および耐摩耗性の点か
ら、100〜300000人の範囲が好適であり、10
0Å以下では膜としての効果に乏しく、300000Å
以上にすると、外刃の変形が生じるため望ましくない。From the viewpoint of corrosion resistance and wear resistance, the thickness of such a nitride film is preferably in the range of 100 to 300,000.
Below 0 Å, the effect as a film is poor;
If it is more than that, the outer cutter will be deformed, which is not desirable.
特に300〜100000人の範囲が望ましい。In particular, a range of 300 to 100,000 people is desirable.
一方、下地金属膜の膜厚は接着性および耐摩耗性の点か
ら20〜20000人の範囲が好適であり、20Å以下
では膜としての効果に乏しく、20000Å以上にする
と、耐摩耗性を損なうため望ましくない。特に50〜1
0000人の範囲が望ましい。On the other hand, the thickness of the underlying metal film is preferably in the range of 20 to 20,000 from the viewpoint of adhesion and abrasion resistance; if it is less than 20 Å, it will not be effective as a film, and if it is more than 20,000 Å, the abrasion resistance will be impaired. Undesirable. Especially 50-1
A range of 0,000 people is desirable.
以下本発明の実施例について説明する。Examples of the present invention will be described below.
実施例1:第1図は実施例1に用いる高周波スパッタ装
置の概略構造図で、図中の1はアルゴンガス、2はター
ゲットで、Ni金属、3はニッケル電鋳刃からなる電気
かみそりの外刃、4は高周波電源、5はアルゴンガス、
6は窒素ガス、7はチタンターゲット、8はヒータ、9
゜9′は排気である。Example 1: Figure 1 is a schematic structural diagram of the high-frequency sputtering apparatus used in Example 1. In the figure, 1 is argon gas, 2 is a target, Ni metal, and 3 is an electric shaver consisting of a nickel electroformed blade. blade, 4 is a high frequency power supply, 5 is argon gas,
6 is nitrogen gas, 7 is titanium target, 8 is heater, 9
9' is the exhaust.
ニッケル電鋳刃からなる電気かみそりの外刃3を保持し
、処理容器10内を排気9することによって5 X 1
O−6Torr以下まで減圧状態とじた後、アルゴンガ
スを導入して、0,05Torr一定にし、高周波電源
4の出力を3W/cJの条件でスパッタし、0.2μ厚
さのニッケル膜を作り、次に処理容器11に移し、同様
に5 X 1O−6Torr以下まで減圧した後アルゴ
ンガスおよび窒素ガスを導入した。外刃3′をヒータ8
により約100℃に加熱し、高周波電力3W/crA、
アルゴンガス圧・2.7 X 1O−2Torr、窒素
ガス圧・3×1O−3TOrrの条件でスパッタを行い
、0.3μ厚さの窒化チタン膜を作った。なおこの膜の
チタンと窒素との組成比は1:0.7である。また第2
図に作製した外刃断面構造を示す。By holding the outer blade 3 of an electric shaver made of a nickel electroformed blade and evacuating the inside of the processing container 10, 5×1
After reducing the pressure to below O-6 Torr, argon gas was introduced to keep the pressure constant at 0.05 Torr, and sputtering was performed under the condition that the output of the high frequency power source 4 was 3 W/cJ to form a 0.2 μ thick nickel film. Next, the reactor was transferred to a processing container 11, and after the pressure was similarly reduced to 5×10−6 Torr or less, argon gas and nitrogen gas were introduced. Heater 8
heated to about 100℃, high frequency power 3W/crA,
Sputtering was performed under the conditions of argon gas pressure of 2.7 x 1O-2 Torr and nitrogen gas pressure of 3 x 1O-3 Torr to form a titanium nitride film with a thickness of 0.3μ. Note that the composition ratio of titanium and nitrogen in this film was 1:0.7. Also the second
The figure shows the cross-sectional structure of the outer blade.
実施例2:実施例1のターゲット2をNiに代えて、T
i、Cr、ZrおよびAI!を用いた以外は実施例1と
同様に下地金属膜および窒化膜を形成した。Example 2: Target 2 in Example 1 was replaced with Ni, and T
i, Cr, Zr and AI! A base metal film and a nitride film were formed in the same manner as in Example 1 except that .
実施例3:実施例1のチタンターゲット7に代えて、N
iターゲットを用い、アルゴンガス圧2.5 X 10
−2Torr、窒素ガス圧・5 X 1O−3Torr
に代えた以外は同様の条件で下地金属膜および窒化膜を
形成した。この窒化膜のCrと窒素との組成比は1:0
.8である。Example 3: In place of the titanium target 7 of Example 1, N
Using i target, argon gas pressure 2.5 x 10
-2 Torr, nitrogen gas pressure 5 X 1O-3 Torr
A base metal film and a nitride film were formed under the same conditions except that . The composition ratio of Cr and nitrogen in this nitride film is 1:0.
.. It is 8.
実施例4:実施例1のチタンターゲット7に代えて、N
iターゲットを用い、アルゴンガス圧2.5 Xl0−
2Torr、窒素ガス圧・5 Xl0−3Torrに代
えた以外は同様の条件で下地金属膜および窒化膜を形成
した。この窒化膜のNiと窒素との組成比は1:0.9
である。Example 4: In place of the titanium target 7 of Example 1, N
Using i target, argon gas pressure 2.5 Xl0-
A base metal film and a nitride film were formed under the same conditions except that the pressure was changed to 2 Torr and nitrogen gas pressure to 5 Xl0-3 Torr. The composition ratio of Ni and nitrogen in this nitride film is 1:0.9
It is.
実施例5:実施例1のチタンターゲット7に代えて、Z
rターゲットを用いた以外は同様の条件で下地金属膜お
よび窒化膜を形成した。この窒化膜のZrと窒素との比
は1:0.9である。Example 5: In place of the titanium target 7 of Example 1, Z
A base metal film and a nitride film were formed under the same conditions except that an r target was used. The ratio of Zr to nitrogen in this nitride film is 1:0.9.
実施例6:実施例1のチタンターゲット7に代えて、A
Aツタ−ットを用い、アルゴンガス圧2.6 X IF
2Torr、窒素ガス圧・4 x 1O−3Torr
に代えた以外は同様の条件で下地金属膜および窒化膜を
形成した。この窒化膜のAnと窒素との組成比は1:1
である。Example 6: In place of the titanium target 7 of Example 1, A
Argon gas pressure 2.6 x IF using A-tuber
2Torr, nitrogen gas pressure/4 x 1O-3Torr
A base metal film and a nitride film were formed under the same conditions except that . The composition ratio of An and nitrogen in this nitride film is 1:1.
It is.
比較例1:実施例1の下地金属膜を形成する工程を除い
た以外は、同様に窒化膜を形成した。Comparative Example 1: A nitride film was formed in the same manner as in Example 1 except that the step of forming the base metal film was omitted.
比較例2:実施例3の下地金属膜を形成する工程を除い
た以外は、同様に窒化膜を形成した。Comparative Example 2: A nitride film was formed in the same manner as in Example 3, except that the step of forming the base metal film was omitted.
比較例3:実施例4の下地金属膜を形成する工程を除い
た以外は、同様に窒化膜を形成した。Comparative Example 3: A nitride film was formed in the same manner as in Example 4, except that the step of forming the underlying metal film was omitted.
比較例4:実施例5の下地金属膜を形成する工程を除い
た以外は、同様に窒化膜を形成した。Comparative Example 4: A nitride film was formed in the same manner as in Example 5, except that the step of forming the underlying metal film was omitted.
比較例5:実施例6の下地金属膜を形成する工程を除い
た以外は、同様に窒化膜を形成した。Comparative Example 5: A nitride film was formed in the same manner as in Example 6, except that the step of forming the base metal film was omitted.
比較例6:実施例1に用いたNi電鋳刃のままを使用。Comparative Example 6: The Ni electroformed blade used in Example 1 was used as is.
上記作製した外刃を用いて電気かみそりを組み立て駆動
電流を測定し、更に150時間使用した後の駆動電流の
測定結果と比較した。その結果を表1に示す。An electric shaver was assembled using the outer cutter produced above, and the drive current was measured, and the results were compared with the measurement results of the drive current after using the shaver for 150 hours. The results are shown in Table 1.
表 1
この表かられかるように、下地金属膜を形成したものは
150時間使用してもほとんど駆動電流の増加が認めら
れず良好である。Table 1 As can be seen from this table, the products on which the underlying metal film was formed were in good condition with almost no increase in drive current observed even after 150 hours of use.
また、駆動面だけでなく、第3図に示すごとく皮膚と接
触する側にも窒化膜14を形成すると、ニッケル表面を
褪色、変色などがなくなるという効果がある。さらに、
外刃母材としてニッケル電鋳刃を用いたが、Ni−Co
合金電鋳やステンレス泪薄板などを用いても同様の効果
が得られる。Furthermore, if the nitride film 14 is formed not only on the drive surface but also on the side that comes into contact with the skin as shown in FIG. 3, there is an effect that the nickel surface will not fade or discolor. moreover,
A nickel electroformed blade was used as the outer blade base material, but Ni-Co
A similar effect can be obtained by using alloy electroforming or stainless steel thin plate.
また電気かみそりの外刃以外にも、内刃および電気バリ
カンの可動刃、固定刃や芝刈機の刃等に適用させること
もできる。In addition to the outer blade of an electric shaver, it can also be applied to the inner blade, the movable blade of an electric clipper, a fixed blade, a lawn mower blade, etc.
以上のように本発明によれば、刃の少なくとも摺動面に
、窒素化合物膜を形成するにあたり、刃の表面に下地金
属膜を形成した後、該下地金属膜上に上記窒素化合物膜
を形成したので、長時間使用しても駆動電流の増加を抑
制して、寿命の長い刃を提供することができる。As described above, according to the present invention, in forming a nitrogen compound film on at least the sliding surface of the blade, a base metal film is formed on the surface of the blade, and then the nitrogen compound film is formed on the base metal film. Therefore, even if the blade is used for a long time, an increase in drive current can be suppressed, and a blade with a long life can be provided.
第1図は本発明を実施するための高周波スパツタ装置の
一例の概略説明図、第2図は本発明を実施した電気かみ
そりの外刃の断面拡大図、第3図は本発明における他の
実施例の電気かみそりの外刃の断面拡大図である。
12・・・刃
13・・・下地金属膜
14・・・窒素化合物膜。
代表出願人 九州日立マクセル株式会社代表者 福
原 隆 −FIG. 1 is a schematic explanatory diagram of an example of a high-frequency sputtering device for implementing the present invention, FIG. 2 is an enlarged cross-sectional view of the outer blade of an electric shaver implementing the present invention, and FIG. 3 is another embodiment of the present invention. FIG. 3 is an enlarged cross-sectional view of the outer blade of the electric shaver as an example. 12...Blade 13...Base metal film 14...Nitrogen compound film. Representative applicant Kyushu Hitachi Maxell Co., Ltd. Representative Fuku
Takashi Hara −
Claims (3)
るにあたり、刃の表面に下地金属膜を形成した後、該下
地金属膜上に上記窒素化合物膜を形成したことを特徴と
する刃。(1) A blade characterized in that in forming a nitrogen compound film on at least the sliding surface of the blade, a base metal film is formed on the surface of the blade, and then the nitrogen compound film is formed on the base metal film. .
、クロム、アルミニウムもしくはこれらの合金から選ば
れるものを使用することを特徴とする特許請求の範囲第
1項記載の刃。(2) The blade according to claim 1, wherein the base metal film is selected from titanium, nickel, zirconium, chromium, aluminum, or an alloy thereof.
クロム、ニッケル、アルミニウムもしくはこれらの合金
からなる窒化物を使用したことを特徴とする特許請求の
範囲第1項記載の刃。(3) As the nitrogen compound film, titanium, zirconium,
The blade according to claim 1, characterized in that a nitride made of chromium, nickel, aluminum, or an alloy thereof is used.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18623686A JPS6340591A (en) | 1986-08-07 | 1986-08-07 | Blade |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18623686A JPS6340591A (en) | 1986-08-07 | 1986-08-07 | Blade |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6340591A true JPS6340591A (en) | 1988-02-20 |
Family
ID=16184735
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18623686A Pending JPS6340591A (en) | 1986-08-07 | 1986-08-07 | Blade |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6340591A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58103485A (en) * | 1981-12-15 | 1983-06-20 | 株式会社東芝 | Razor |
JPS60243267A (en) * | 1984-05-15 | 1985-12-03 | Seiko Epson Corp | Manufacture of outer edge for electric razor |
-
1986
- 1986-08-07 JP JP18623686A patent/JPS6340591A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58103485A (en) * | 1981-12-15 | 1983-06-20 | 株式会社東芝 | Razor |
JPS60243267A (en) * | 1984-05-15 | 1985-12-03 | Seiko Epson Corp | Manufacture of outer edge for electric razor |
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