JPS6340308B2 - - Google Patents

Info

Publication number
JPS6340308B2
JPS6340308B2 JP3994981A JP3994981A JPS6340308B2 JP S6340308 B2 JPS6340308 B2 JP S6340308B2 JP 3994981 A JP3994981 A JP 3994981A JP 3994981 A JP3994981 A JP 3994981A JP S6340308 B2 JPS6340308 B2 JP S6340308B2
Authority
JP
Japan
Prior art keywords
mount
printed
printing
manuscript
paper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3994981A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57154244A (en
Inventor
Yoji Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP3994981A priority Critical patent/JPS57154244A/ja
Publication of JPS57154244A publication Critical patent/JPS57154244A/ja
Publication of JPS6340308B2 publication Critical patent/JPS6340308B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP3994981A 1981-03-19 1981-03-19 Simplified printing system Granted JPS57154244A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3994981A JPS57154244A (en) 1981-03-19 1981-03-19 Simplified printing system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3994981A JPS57154244A (en) 1981-03-19 1981-03-19 Simplified printing system

Publications (2)

Publication Number Publication Date
JPS57154244A JPS57154244A (en) 1982-09-24
JPS6340308B2 true JPS6340308B2 (OSRAM) 1988-08-10

Family

ID=12567206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3994981A Granted JPS57154244A (en) 1981-03-19 1981-03-19 Simplified printing system

Country Status (1)

Country Link
JP (1) JPS57154244A (OSRAM)

Also Published As

Publication number Publication date
JPS57154244A (en) 1982-09-24

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