JPS6340308B2 - - Google Patents
Info
- Publication number
- JPS6340308B2 JPS6340308B2 JP3994981A JP3994981A JPS6340308B2 JP S6340308 B2 JPS6340308 B2 JP S6340308B2 JP 3994981 A JP3994981 A JP 3994981A JP 3994981 A JP3994981 A JP 3994981A JP S6340308 B2 JPS6340308 B2 JP S6340308B2
- Authority
- JP
- Japan
- Prior art keywords
- mount
- printed
- printing
- manuscript
- paper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 7
- 238000000926 separation method Methods 0.000 claims description 4
- 239000004744 fabric Substances 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 230000000873 masking effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 241000238633 Odonata Species 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009432 framing Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000001915 proofreading effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3994981A JPS57154244A (en) | 1981-03-19 | 1981-03-19 | Simplified printing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3994981A JPS57154244A (en) | 1981-03-19 | 1981-03-19 | Simplified printing system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57154244A JPS57154244A (en) | 1982-09-24 |
| JPS6340308B2 true JPS6340308B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-08-10 |
Family
ID=12567206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3994981A Granted JPS57154244A (en) | 1981-03-19 | 1981-03-19 | Simplified printing system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57154244A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
-
1981
- 1981-03-19 JP JP3994981A patent/JPS57154244A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57154244A (en) | 1982-09-24 |
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