JPS6336034U - - Google Patents
Info
- Publication number
- JPS6336034U JPS6336034U JP1986129917U JP12991786U JPS6336034U JP S6336034 U JPS6336034 U JP S6336034U JP 1986129917 U JP1986129917 U JP 1986129917U JP 12991786 U JP12991786 U JP 12991786U JP S6336034 U JPS6336034 U JP S6336034U
- Authority
- JP
- Japan
- Prior art keywords
- mask
- alignment mark
- light
- substrate
- alignment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986129917U JPH0241862Y2 (en:Method) | 1986-08-26 | 1986-08-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986129917U JPH0241862Y2 (en:Method) | 1986-08-26 | 1986-08-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6336034U true JPS6336034U (en:Method) | 1988-03-08 |
| JPH0241862Y2 JPH0241862Y2 (en:Method) | 1990-11-08 |
Family
ID=31026924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986129917U Expired JPH0241862Y2 (en:Method) | 1986-08-26 | 1986-08-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0241862Y2 (en:Method) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010147253A (ja) * | 2008-12-18 | 2010-07-01 | Nippon Telegr & Teleph Corp <Ntt> | 位置合わせ方法、ホトマスクおよびウエハ |
| JP2012242576A (ja) * | 2011-05-19 | 2012-12-10 | V Technology Co Ltd | フォトマスク及び露光装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5011668A (en:Method) * | 1973-06-01 | 1975-02-06 | ||
| JPS52144973A (en) * | 1976-05-28 | 1977-12-02 | Hitachi Ltd | Positioning method of semiconductor wafers |
| JPS53109080A (en) * | 1977-03-03 | 1978-09-22 | Fujitsu Ltd | Positioning device |
| JPS60110119A (ja) * | 1983-11-21 | 1985-06-15 | Canon Inc | 位置合わせ方法 |
-
1986
- 1986-08-26 JP JP1986129917U patent/JPH0241862Y2/ja not_active Expired
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5011668A (en:Method) * | 1973-06-01 | 1975-02-06 | ||
| JPS52144973A (en) * | 1976-05-28 | 1977-12-02 | Hitachi Ltd | Positioning method of semiconductor wafers |
| JPS53109080A (en) * | 1977-03-03 | 1978-09-22 | Fujitsu Ltd | Positioning device |
| JPS60110119A (ja) * | 1983-11-21 | 1985-06-15 | Canon Inc | 位置合わせ方法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010147253A (ja) * | 2008-12-18 | 2010-07-01 | Nippon Telegr & Teleph Corp <Ntt> | 位置合わせ方法、ホトマスクおよびウエハ |
| JP2012242576A (ja) * | 2011-05-19 | 2012-12-10 | V Technology Co Ltd | フォトマスク及び露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0241862Y2 (en:Method) | 1990-11-08 |