JPS6332178B2 - - Google Patents

Info

Publication number
JPS6332178B2
JPS6332178B2 JP55053668A JP5366880A JPS6332178B2 JP S6332178 B2 JPS6332178 B2 JP S6332178B2 JP 55053668 A JP55053668 A JP 55053668A JP 5366880 A JP5366880 A JP 5366880A JP S6332178 B2 JPS6332178 B2 JP S6332178B2
Authority
JP
Japan
Prior art keywords
particles
resist layer
beryllium
layer
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55053668A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55149942A (en
Inventor
Baatoko Jon
Erio Fueriisu Patoritsuku
Donarudo Buraisu Fuiritsupu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Westinghouse Electric Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of JPS55149942A publication Critical patent/JPS55149942A/ja
Publication of JPS6332178B2 publication Critical patent/JPS6332178B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP5366880A 1979-04-24 1980-04-24 Treatment for forming pattern on resist layer Granted JPS55149942A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3279779A 1979-04-24 1979-04-24

Publications (2)

Publication Number Publication Date
JPS55149942A JPS55149942A (en) 1980-11-21
JPS6332178B2 true JPS6332178B2 (enrdf_load_stackoverflow) 1988-06-28

Family

ID=21866854

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5366880A Granted JPS55149942A (en) 1979-04-24 1980-04-24 Treatment for forming pattern on resist layer

Country Status (2)

Country Link
JP (1) JPS55149942A (enrdf_load_stackoverflow)
DE (1) DE3015866A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3069341D1 (en) * 1979-05-31 1984-11-08 Western Electric Co Accelerated particle lithographic processing

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3801390A (en) * 1970-12-28 1974-04-02 Bell Telephone Labor Inc Preparation of high resolution shadow masks

Also Published As

Publication number Publication date
JPS55149942A (en) 1980-11-21
DE3015866A1 (de) 1980-11-06

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