JPS63317912A - Production of thin film magnetic head - Google Patents

Production of thin film magnetic head

Info

Publication number
JPS63317912A
JPS63317912A JP15413087A JP15413087A JPS63317912A JP S63317912 A JPS63317912 A JP S63317912A JP 15413087 A JP15413087 A JP 15413087A JP 15413087 A JP15413087 A JP 15413087A JP S63317912 A JPS63317912 A JP S63317912A
Authority
JP
Japan
Prior art keywords
plating
film
conductor
magnetic pole
connection terminal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15413087A
Other languages
Japanese (ja)
Inventor
Yoshio Koshikawa
越川 誉生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15413087A priority Critical patent/JPS63317912A/en
Publication of JPS63317912A publication Critical patent/JPS63317912A/en
Pending legal-status Critical Current

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  • Magnetic Heads (AREA)

Abstract

PURPOSE:To obviate formation of a plating film to unnecessary parts by previously coating a step relieving layer on a front face except the front end part of a 2nd electrode prior to formation of a conductor film for plating. CONSTITUTION:The step relieving layer 31 is previously formed on the front face except the front end part of the 2nd magnetic pole 16 prior to the formation of connecting terminal pads 21 of lead-out conductor wires led out of a conductor coil 15. The conductor film 18 for plating is deposited thereon and is succession a resist pattern 19 for mask plating is formed on the film 18. With this pattern 18 as a mask, the connecting terminal pads 21 are formed by electroplating on the film 18 exposed in apertures 20. The resist film in the shoulder part and projecting part of the 2nd magnetic pole 16 is, therefore, reduced in thickness and the abnormal formation of the plating film is the unnecessary parts is prevented.

Description

【発明の詳細な説明】 〔概要〕 本発明は磁気ディスク装置に用いられる薄膜磁気ヘッド
の製造方法において、第二磁極を形成した後、該第二磁
極の先端部を除く上面に、熱硬化性樹脂からなる絶縁性
の段差緩和層を形成することにより、接続端子パッド形
成用のメッキ用導体膜及びレジストパターンを形成する
該第二磁極上を含む面の段差形状をなだらかにして、マ
スクメッキ法により接続端子パッドを形成する際に、段
差形状に起因する接続端子パッド形成予定領域以外の部
分へのメッキ膜の異常形成を防止したものである。
Detailed Description of the Invention [Summary] The present invention provides a method for manufacturing a thin film magnetic head used in a magnetic disk device, in which after forming a second magnetic pole, a thermosetting material is applied to the upper surface of the second magnetic pole except for the tip. By forming an insulating step-relaxing layer made of resin, the step shape on the surface including the second magnetic pole forming the conductor film for plating for forming the connection terminal pad and the resist pattern is smoothed, and the mask plating method is performed. This prevents abnormal formation of the plating film in areas other than the area where the connecting terminal pad is to be formed due to the stepped shape when forming the connecting terminal pad.

〔産業上の利用分野〕[Industrial application field]

本発明は磁気ディスク装置に用いられる薄膜磁気ヘッド
の製造方法に係り、特に接続端子パッド形成予定領域に
マスクメッキ法により接続端子パッドを形成する際に、
該パッド形成予定領域以外の部分にメッキ層が異常形成
されることを防止した接続端子パッドの形成方法に関す
るものである。
The present invention relates to a method for manufacturing a thin-film magnetic head used in a magnetic disk drive, and in particular, when forming connection terminal pads by mask plating in areas where connection terminal pads are to be formed,
The present invention relates to a method for forming a connection terminal pad that prevents abnormal formation of a plating layer in areas other than the area where the pad is intended to be formed.

磁気ディスク装置に□おいては、高密度記録化に伴って
高精度で信転性の高い薄膜磁気ヘッドが要求されている
In magnetic disk drives, thin-film magnetic heads with high precision and high reliability are required as recording density increases.

薄膜磁気ヘッドの製造において、導体コイル等における
引出し導体の接続端子パッドをマスクメッキ法により形
成する際に、該バッド形成予定領域以外の面に、磁極や
導体コイル等の積層構造による顕著な段差に起因して異
常メッキが生じる易い傾向があり、そのような異常メッ
キの発生を簡単に防止した接続端子パッドの形成方法が
必要とされている。
In manufacturing thin-film magnetic heads, when forming connection terminal pads for lead-out conductors in conductor coils, etc. by mask plating, there is a noticeable step difference due to the laminated structure of magnetic poles, conductor coils, etc. on surfaces other than the areas where the pads are planned to be formed. Therefore, there is a need for a method for forming connection terminal pads that easily prevents the occurrence of such abnormal plating.

〔従来の技術〕[Conventional technology]

従来の薄膜磁気ヘッドの製造方法としては、第2図(a
)の要部断面図に示すように、スライダとなる基板11
上に既に周知の方法により第一磁極12、ギヤツブ層1
3、層間絶縁層14により挟まれた導体コイル15及び
第二磁極16、そして該導体コイル15より導出する図
示しない(後述する)引出し導体線17を所定パターン
で順次形成する。
A conventional method for manufacturing a thin film magnetic head is shown in Figure 2 (a).
), a substrate 11 that becomes a slider is shown.
A first magnetic pole 12 and a gear layer 1 are formed on the top by a well-known method.
3. A conductor coil 15 and a second magnetic pole 16 sandwiched between the interlayer insulating layers 14, and a lead-out conductor wire 17 (not shown) led out from the conductor coil 15 (described later) are sequentially formed in a predetermined pattern.

その後、図示しない引出し導体線17を含む前記基板1
1上の全面に銅(Co)からなるメッキ用導体膜18を
被着形成する。
After that, the substrate 1 including the lead conductor wire 17 (not shown) is
A conductor film 18 for plating made of copper (Co) is deposited on the entire surface of the plating film 1 .

次に第2図(blに示すように引続きそのメッキ用導体
膜18上に、該引出し導体線17に対する接続端子バン
ド形成予定領域を画定する開口部20を有するレジスト
パターン19を形成する。
Next, as shown in FIG. 2 (bl), a resist pattern 19 having an opening 20 defining a region where a connection terminal band for the lead-out conductor wire 17 is to be formed is subsequently formed on the plating conductor film 18.

次に第2図(C)に示すように前記レジストパターン1
9をマスクにして、その開口部20に露出するメッキ用
導体膜18上に電解メッキ法により銅メッキ層からなる
接続端子パッド21を形成する。
Next, as shown in FIG. 2(C), the resist pattern 1 is
Using 9 as a mask, a connection terminal pad 21 made of a copper plating layer is formed on the plating conductor film 18 exposed in the opening 20 by electrolytic plating.

次に第3図の平面図及び該第3図に示すA−A”切断線
に沿った第4図の断面図に示すように、前記レジストパ
ターン19及び不要なメッキ用導体膜18を選択的に除
去し、引続き前記第二磁極16、層間絶縁層14、引出
し導体線17及び接続端子パッド21が形成された基板
11上の全面にスパッタリング法等により保護膜22を
被着形成する。
Next, as shown in the plan view of FIG. 3 and the cross-sectional view of FIG. 4 taken along the cutting line A-A'' shown in FIG. Then, a protective film 22 is deposited by sputtering or the like on the entire surface of the substrate 11 on which the second magnetic pole 16, interlayer insulating layer 14, lead conductor wire 17, and connection terminal pad 21 are formed.

しかる後、該保護膜22面を平面研磨加工して各接続端
子パッド21のバッド面を露出させ、外部リード線との
ボンディング接続を可能にしている。
Thereafter, the surface of the protective film 22 is polished to expose the pad surface of each connection terminal pad 21 to enable bonding connection with an external lead wire.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところで上記したような薄膜磁気ヘッドの製造方法にお
いては、マスクメッキ法により導体コイル15等から導
出する引出し導体線17の接続端子パッド21を形成す
るためにメッキ用導体膜1日を被着形成した面の一部が
、膜厚の厚い各磁極12.16や層間絶縁層14で挟ま
れた導体コイル15等の積層構造により、20μm程度
の段差がある形状となっている。
By the way, in the method for manufacturing a thin film magnetic head as described above, a conductor film for plating is formed by a mask plating method in order to form the connection terminal pad 21 of the lead-out conductor wire 17 led out from the conductor coil 15, etc. A part of the surface has a step difference of about 20 μm due to the laminated structure of the thick magnetic poles 12, 16, the conductor coil 15 sandwiched between the interlayer insulating layers 14, and the like.

このため、そのような段差面上にマスクメッキ用のレジ
ストパターン19を形成すると、例えば前記第二磁極1
6の段差部分、即ち、肩部分や突起部分上のレジスト膜
の膜厚が極度に薄くなったり、またその部分のメッキ用
導体膜18が露出するといった事態が生じ、マスクメッ
キ法により接続端子パッド21を形成した際に、前記肩
部分や突起部分にもal+ a2で示されるようにメッ
キ膜が異常形成されるといった欠点があった。
Therefore, if a resist pattern 19 for mask plating is formed on such a stepped surface, for example, the second magnetic pole 1
6, the thickness of the resist film on the shoulders and protrusions becomes extremely thin, and the conductive film 18 for plating is exposed at that part. When No. 21 was formed, there was a drawback that a plating film was abnormally formed on the shoulder portions and protrusion portions as shown by al+a2.

本発明は上記した従来の欠点に鑑み、マスクメッキ法に
より接続端子パッドを形成するためのメッキ用導体膜を
被着形成する面内の段差形状を緩和して、その面に被着
されたメッキ用導体膜上にマスクメッキ用のレジストパ
ターンを形成した際に、段差形状部分上のレジスト膜の
膜厚減少を防止し、マスクメッキによる接続端子パッド
の形成時に、不必要な部分にメッキ膜が異常形成される
ことを解消した薄膜磁気ヘッドの製造方法を提供するこ
とを目的とするものである。
In view of the above-mentioned conventional drawbacks, the present invention has been developed to reduce the step shape in the plane on which the plating conductor film for forming the connection terminal pad is deposited by the mask plating method, and to reduce the plating deposited on the surface. When a resist pattern for mask plating is formed on a conductive film, this prevents the thickness of the resist film from decreasing on the stepped portion, and prevents the plating film from being deposited on unnecessary areas when forming connection terminal pads by mask plating. It is an object of the present invention to provide a method for manufacturing a thin film magnetic head that eliminates abnormal formation.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は上記目的を達成するため、基板上に第一磁極、
ギャップ層、眉間絶縁層で挟まれた導体コイル、第二磁
極を順次積層し、該第二磁極上を含む接続端子パッド形
成予定領域上にメッキ用導体膜を形成するに先立って、
第二磁極の先端部を除く段差形状面上に、例えば熱硬化
性樹脂などからなる絶縁性の段差緩和層をあらかじめ被
覆しておき、その後、メッキ用導体膜及びマスクメッキ
用のレジストパターンを形成し、マスクメッキ法により
導体コイル等から導出する引出し導体線の接続端子パッ
ドを形成するようにする。
In order to achieve the above object, the present invention includes a first magnetic pole on a substrate,
Prior to sequentially laminating the gap layer, the conductor coil sandwiched between the eyebrow insulating layers, and the second magnetic pole, and forming a plating conductor film on the area where the connection terminal pad is to be formed, including the second magnetic pole,
The stepped surface excluding the tip of the second magnetic pole is coated in advance with an insulating step-relaxing layer made of, for example, thermosetting resin, and then a conductive film for plating and a resist pattern for mask plating are formed. Then, a connection terminal pad for a lead-out conductor wire led out from a conductor coil or the like is formed by a mask plating method.

〔作用〕[Effect]

本発明の薄膜磁気ヘッドの製造方法では、第二磁極上を
含む接続端子パッド形成予定領域上にメッキ用導体膜を
形成するに先立って、第二磁極の先端部を除く段差形状
面上に、熱硬化性樹脂などからなる絶縁性の段差緩和層
を被覆して、段差部分をなだらかにしているため、メッ
キ用導体膜及びマスクメッキ用のレジストパターンを形
成した際に、従来の如き段差形状によりレジスト膜の膜
厚が部分的に薄くなったり、メッキ用導体膜がレジスト
膜より露出するようなことが防止される。
In the method for manufacturing a thin film magnetic head of the present invention, prior to forming a conductor film for plating on the area where the connection terminal pad is to be formed, including the top of the second magnetic pole, on the step-shaped surface excluding the tip of the second magnetic pole, The step part is smoothed by coating with an insulating step-relaxing layer made of thermosetting resin, etc., so when forming a conductive film for plating and a resist pattern for mask plating, it will not be possible to create a step shape like the conventional step shape. This prevents the resist film from becoming partially thin or exposing the plating conductor film from the resist film.

この結果、マスクメッキ法による接続端子パッドの形成
時に、接続端子パッド形成予定領域以外の部分にメッキ
膜が異常形成されることが解消される。
As a result, when forming connection terminal pads by mask plating, it is possible to eliminate abnormal formation of a plating film in areas other than the area where the connection terminal pads are to be formed.

〔実施例〕〔Example〕

以下図面を用いて本発明の実施例について詳細に説明す
る。
Embodiments of the present invention will be described in detail below with reference to the drawings.

第1図(a)〜(d)は本発明に係る薄膜磁気ヘッドの
製造方法の一実施例を工程順に示す要部断面図である。
FIGS. 1(a) to 1(d) are sectional views of essential parts showing an embodiment of a method for manufacturing a thin film magnetic head according to the present invention in order of steps.

先ず第1図(a+に示すようにスライダとなる基板11
上に従来と同様の既に周知の方法により、第一磁極12
、ギヤツブ層13、層間絶縁層14により挟まれた導体
コイル15及び第二磁極16、そして該導体コイル15
より導出する図示しない引出し薄体線等を所定パターン
で順次形成した後、その第二磁極16の先端部を除く、
該第二磁極16と層間絶縁層14等による段差形状面上
に、例えば熱硬化性樹脂などからなる絶縁性の段差緩和
層31を選択的に塗着形成して前記段差部分をなだらか
にする。
First, as shown in FIG.
The first magnetic pole 12 is then
, a gear layer 13, a conductor coil 15 and a second magnetic pole 16 sandwiched between the interlayer insulating layer 14, and the conductor coil 15.
After sequentially forming thin drawer wires (not shown) derived from the above in a predetermined pattern, the tip of the second magnetic pole 16 is removed.
An insulating step-reducing layer 31 made of, for example, a thermosetting resin is selectively applied and formed on the step-shaped surface formed by the second magnetic pole 16, the interlayer insulating layer 14, etc., to smooth out the step portion.

次に従来の工程と同様に、第1図(blに示すように該
段差緩和層31及び図示しない引出し導体線等を含む前
記基板11上の全面に銅(Cu)からなるメッキ導体膜
18を被着形成し、該メッキ導体膜18上に第1図(C
1に示すように図示しない引出し導体線に対する接続端
子パッド形成予定領域を画定する開口部20を有するレ
ジストパターン19を形成する。
Next, in the same manner as in the conventional process, as shown in FIG. 1 (C) on the plated conductor film 18.
As shown in FIG. 1, a resist pattern 19 having an opening 20 defining a region where a connection terminal pad for a lead conductor wire (not shown) is to be formed is formed.

かくすれ1よ、従来の如き段差部分でのレジスト膜の膜
厚が薄くなったり、メッキ用導体膜18がレジスト膜よ
り露出することがなくなる。
Hidden feature 1: The thickness of the resist film at the stepped portion does not become thinner and the plating conductor film 18 does not become exposed from the resist film as in the conventional method.

従って、しかる後第1図(d)に示すように該レジスト
パターン19をマスクにして、その開口部20に露出す
るメッキ用導体膜18上に、銅(Cu)電解メンキを行
うことにより、接続端子パッド形成予定領域以外の部分
にCuメッキ膜を異常形成させることなり、Cuメッキ
層からなる接続端子パッド21を容易に形成することが
可能となる。
Therefore, as shown in FIG. 1(d), using the resist pattern 19 as a mask, copper (Cu) electrolytic coating is performed on the plating conductor film 18 exposed in the opening 20, thereby making the connection. Since the Cu plating film is abnormally formed in a portion other than the area where the terminal pad is to be formed, it becomes possible to easily form the connection terminal pad 21 made of the Cu plating layer.

以下、前記レジストパターン19及び不要なメッキ用導
体膜18を選択的に除去し、その基板11上の全面にス
パッタリング法等により保護膜を被着形成した後、該保
護膜面を平面研磨加工工程により各接続端子パッド21
のパッド面を露出させ、外部リード線とのポンディング
接続を可能にして完成させる。
Thereafter, the resist pattern 19 and unnecessary plating conductor film 18 are selectively removed, and a protective film is deposited on the entire surface of the substrate 11 by sputtering or the like, and then the surface of the protective film is subjected to a surface polishing process. Each connection terminal pad 21
The pad surface of the terminal is exposed to enable a bonding connection with an external lead wire.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように、本発明に係る薄膜磁気
ヘッドの製造方法によれば、接続端子バンド形成用のメ
ッキ用導体膜及びレジストパターンを形成する面の顕著
なる段差形状がなだらかに解消され、電解メッキ法によ
り接続端子パッドを形成する際に、接続端子バンド形成
予定領域以外の部分へのメッキ膜の異常形成が防止され
る。
As is clear from the above description, according to the method for manufacturing a thin film magnetic head according to the present invention, the noticeable step shape on the surface on which the plating conductor film and resist pattern for forming the connection terminal band are formed can be smoothly eliminated. When a connecting terminal pad is formed by electrolytic plating, abnormal formation of a plating film on a portion other than the area where a connecting terminal band is to be formed is prevented.

従って、製造歩留りを向上させる優れた利点を有し、こ
の種の薄膜磁気ヘッドの製造に適用して顕著なる効果を
奏する。
Therefore, it has an excellent advantage of improving the manufacturing yield, and when applied to the manufacturing of this type of thin film magnetic head, a remarkable effect can be achieved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)〜(d)は本発明に係る薄膜磁気ヘッドの
製造方法の一実施例を工程順に示す要 部断面図、 第2図は(al〜(C)は従来の薄膜磁気ヘッドの製造
方法の一例を工程順に示す要部断面図、第3図は従来の
薄膜磁気ヘッドの製造方法を説明するための要部平面図
、 第4図は第3図に示すA−A’切断線に沿った要部断面
図である。 第1図(a)〜(d)において、 11は基板、12は第一磁極、13はギャップ層、14
は層間絶縁層、15は導体コイル、16は第二磁極、1
8はメン用導体膜、19はレジストパターン、20は開
口部、21は接続端子パッド、31は段差緩和層をそれ
ぞれ示す。 td+ 不発ら証左れT倒ρ詠■相看血X 第1図 (C) 従兼4造方3ftIネ至’7島:氷7娑畜川面閃第2図 従来Iツfe*z4th ”91%平面cン1第3図 才3区に7F−すA−ハ′断面図 第4図
1(a) to 1(d) are cross-sectional views of main parts showing an embodiment of the method for manufacturing a thin film magnetic head according to the present invention in the order of steps; FIG. FIG. 3 is a plan view of the main parts for explaining the manufacturing method of a conventional thin film magnetic head; FIG. 1 is a cross-sectional view of the main part taken along the line. In FIGS. 1(a) to (d), 11 is a substrate, 12 is a first magnetic pole, 13 is a gap layer, and 14
1 is an interlayer insulating layer, 15 is a conductor coil, 16 is a second magnetic pole, 1
Reference numeral 8 denotes a conductive film for men, 19 a resist pattern, 20 an opening, 21 a connection terminal pad, and 31 a step relief layer. td+ Proof of misfire T inverted rho ■ Aikenketsu Plane C-1 Figure 3 Section 7F-A-HA' Cross section Figure 4

Claims (1)

【特許請求の範囲】 基板上に第一磁極(12)、ギャップ層(13)、層間
絶縁層(14)で挟まれた導体コイル(15)、第二磁
極(16)を順次積層した後、該第二磁極(16)上を
含む接続端子パッド形成予定領域上にメッキ用導体膜(
18)を形成し、該接続端子パッド形成予定領域上にマ
スクメッキ法により接続端子パッド(21)を形成する
薄膜磁気ヘッドの製造において、 上記メッキ用導体膜(18)を形成するに先立って、第
二磁極(16)の先端部を除く上面に、あらかじめ段差
緩和層(31)を被覆するようにしたことを特徴とする
薄膜磁気ヘッドの製造方法。
[Claims] After sequentially laminating a first magnetic pole (12), a gap layer (13), a conductor coil (15) sandwiched between an interlayer insulating layer (14), and a second magnetic pole (16) on a substrate, A plating conductor film (
18) and forming connection terminal pads (21) by mask plating on the area where the connection terminal pads are to be formed, prior to forming the conductive film for plating (18), A method for manufacturing a thin film magnetic head, characterized in that the upper surface of the second magnetic pole (16) except for the tip thereof is coated with a step relaxation layer (31) in advance.
JP15413087A 1987-06-19 1987-06-19 Production of thin film magnetic head Pending JPS63317912A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15413087A JPS63317912A (en) 1987-06-19 1987-06-19 Production of thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15413087A JPS63317912A (en) 1987-06-19 1987-06-19 Production of thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS63317912A true JPS63317912A (en) 1988-12-26

Family

ID=15577556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15413087A Pending JPS63317912A (en) 1987-06-19 1987-06-19 Production of thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS63317912A (en)

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