JPS633139U - - Google Patents
Info
- Publication number
- JPS633139U JPS633139U JP9574986U JP9574986U JPS633139U JP S633139 U JPS633139 U JP S633139U JP 9574986 U JP9574986 U JP 9574986U JP 9574986 U JP9574986 U JP 9574986U JP S633139 U JPS633139 U JP S633139U
- Authority
- JP
- Japan
- Prior art keywords
- exhaust passage
- plasma reaction
- reaction processing
- processing apparatus
- lower electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012212 insulator Substances 0.000 claims description 2
- 239000002184 metal Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986095749U JPH0514507Y2 (enExample) | 1986-06-23 | 1986-06-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986095749U JPH0514507Y2 (enExample) | 1986-06-23 | 1986-06-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS633139U true JPS633139U (enExample) | 1988-01-11 |
| JPH0514507Y2 JPH0514507Y2 (enExample) | 1993-04-19 |
Family
ID=30960683
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986095749U Expired - Lifetime JPH0514507Y2 (enExample) | 1986-06-23 | 1986-06-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0514507Y2 (enExample) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52123173A (en) * | 1976-04-08 | 1977-10-17 | Fuji Photo Film Co Ltd | Sputter etching method |
| JPS5582438A (en) * | 1978-12-15 | 1980-06-21 | Nec Corp | Plasma etching device |
-
1986
- 1986-06-23 JP JP1986095749U patent/JPH0514507Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52123173A (en) * | 1976-04-08 | 1977-10-17 | Fuji Photo Film Co Ltd | Sputter etching method |
| JPS5582438A (en) * | 1978-12-15 | 1980-06-21 | Nec Corp | Plasma etching device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0514507Y2 (enExample) | 1993-04-19 |