JPS63313672A - Plasma arc working method - Google Patents

Plasma arc working method

Info

Publication number
JPS63313672A
JPS63313672A JP14881687A JP14881687A JPS63313672A JP S63313672 A JPS63313672 A JP S63313672A JP 14881687 A JP14881687 A JP 14881687A JP 14881687 A JP14881687 A JP 14881687A JP S63313672 A JPS63313672 A JP S63313672A
Authority
JP
Japan
Prior art keywords
plasma arc
light
marked
filter
working
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14881687A
Other languages
Japanese (ja)
Other versions
JP2581081B2 (en
Inventor
Hideyuki Yamamoto
英幸 山本
Shoji Harada
原田 章二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daihen Corp
Original Assignee
Daihen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daihen Corp filed Critical Daihen Corp
Priority to JP62148816A priority Critical patent/JP2581081B2/en
Publication of JPS63313672A publication Critical patent/JPS63313672A/en
Application granted granted Critical
Publication of JP2581081B2 publication Critical patent/JP2581081B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

PURPOSE:To accurately perform plasma arc working with the high accuracy by noting a notation line by fluorescent material to generate fluorescence by a plasma arc beam and performing the working while observing the notation line via a filter to pass only a desired wavelength band of the fluorescences to generate at the time of working. CONSTITUTION:The notation line 2 is noted on a work 1 by the fluorescent material. Since the notation line 2 is stimulated by the plasma arc beam to generate fluorescence and the filter 4 passes only the desired wavelength band of fluorescences, the notation line 2 becomes brightest to a visual field of a worker. By this method, a state in the vicinity of the working position can be clearly grasped by a light and dark state of apart to be observed and the plasma arc working with high accuracy can be accurately performed.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、被加工物に表記した表記線に沿ってプラズマ
アーク加工具を移動させつつ加工するプラズマアーク加
工方法に関する。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a plasma arc processing method in which a workpiece is processed while moving a plasma arc processing tool along marked lines marked on the workpiece.

〈従来の技術〉 一般tこ、プラズマアーク加工作業、例えばプラズマア
ーク切断作業を行う場合、切断作業に先だつて、被切断
線に相当する。いわゆるケガキ線と祢される表記線を表
記するためのケガキ作業が行なわれている。
<Prior Art> Generally, when performing plasma arc machining work, for example plasma arc cutting work, prior to the cutting work, a wire is used to form a line to be cut. A marking operation is being carried out to mark the marking lines to be marked as so-called marking lines.

従来、このケガキ線は石灰石や鋭利金具などにより表記
されていた。
Traditionally, these marking lines were marked with limestone or sharp metal tools.

〈発明が解決しようとする問題点〉 ところが、プラズマアーク切断時tCは、作業者の眼を
保護するための、いわゆる遮光面が用いられているが、
この遮光面は、アーク発生近傍の高輝度のアーク光を遮
へいするものであるから、4光面を介して観察する場合
、プラズマアークから離れた位置は極端に暗(なる。こ
のため1石灰石や鋭利金具などにより表記されたケガキ
線は、遮光面を介して観察する場合1こは、暗くて見え
ないのが実情であり、高精度のプラズマアーク加工を行
えないという欠点があった。
<Problems to be Solved by the Invention> However, during tC during plasma arc cutting, a so-called light-shielding surface is used to protect the eyes of the operator;
This light-shielding surface blocks the high-intensity arc light near the arc generation, so when observing through the four-light surface, the position far from the plasma arc is extremely dark. The fact is that the marking lines marked with sharp metal tools or the like are too dark to be seen when observed through a light-shielding surface, which has the disadvantage that high-precision plasma arc processing cannot be performed.

〈問題点を解決するための手段〉 上記欠点を解消するために、本発明の構成は、被加工物
に表記した表記線に沿ってプラズマアーク加−工具を移
動させつつ加工するプラズマアーク加工方法において、
プラズマアーク光により螢光を発光する蛍光体で前記表
記線を表記し、プラズマアーク加工時に発生する前記螢
光のうちの所望の波長帯域のみを透過させるフィルタを
介して前記表記線を観察しつつ加工することを特徴とす
る。
<Means for Solving the Problems> In order to solve the above-mentioned drawbacks, the present invention provides a plasma arc machining method in which a workpiece is machined while moving a plasma arc machining tool along a marked line marked on the workpiece. In,
The marked line is marked with a phosphor that emits fluorescent light by plasma arc light, and the marked line is observed through a filter that transmits only a desired wavelength band of the fluorescent light generated during plasma arc processing. Characterized by processing.

く作用〉 上記蛍光体で表記した表記線がプラズマアーク光により
刺激されて螢光を発光し、この螢光のうちの所望の波長
帯域のみを透過させるため、作業者の視野には、プラズ
マアーク光tCより発光された表記線部が最も明るくな
る。すなわち、プラズマアーク光を基準とすれば、プラ
ズマアーク光近傍の上記表記線部が明かるく、かつプラ
ズマ加工具が暗く感じられる。上記のごとく披am部の
明暗状態1こより加工位置近傍の状況を明確に把握する
ことができる。従って、高精度のプラズマアーク加工を
適確IC行うことができる。
The marking line marked with the phosphor described above is stimulated by plasma arc light to emit fluorescent light, and only the desired wavelength band of this fluorescent light is transmitted, so that the operator's visual field does not see the plasma arc The marked line portion emitted by the light tC becomes the brightest. That is, if the plasma arc light is used as a reference, the marked line portion near the plasma arc light appears bright, and the plasma processing tool appears dark. As described above, the situation in the vicinity of the processing position can be clearly grasped from the bright and dark state of the beam part. Therefore, high-precision plasma arc processing can be performed accurately.

〈実施例〉 以下1本発明を図示の実施例を参照して詳細に説明する
<Examples> The present invention will be described in detail below with reference to illustrated embodiments.

第1図および第2図において、1は被加工物。In FIG. 1 and FIG. 2, 1 is a workpiece.

例えば被切断物、2は被切断物1に表記された表記線で
、例えば液状の螢光塗料を吹きつけて形成されている。
For example, the object to be cut 2 is a marking line marked on the object to be cut 1, and is formed by spraying liquid fluorescent paint, for example.

3はプラズマアーク用加工具1例えば手動操作用のプラ
ズマアーク切断トーチ、4は所望の波長帯の光のみを透
過させるフィルタである。
Reference numeral 3 designates a plasma arc processing tool 1, such as a manually operated plasma arc cutting torch, and 4 a filter that transmits only light in a desired wavelength band.

第2図1c示される実線は、プラズマアーク加工時に発
生するプラズマアーク光の分光強度分布を測定した結果
を示したもので横軸−こ波長を、縦軸に比強度をとっで
ある。
The solid line shown in FIG. 2 1c shows the results of measuring the spectral intensity distribution of plasma arc light generated during plasma arc processing, with the horizontal axis representing the wavelength and the vertical axis representing the specific intensity.

第2図に示される点線は、螢光塗料により表記された表
記線が、プラズマアーク光に照射されて発光する蛍光の
分光強度分布を測定した結果を示したものである。図示
の場合、螢光塗料、すなわ゛ち蛍光体は種々の螢光物質
が混合して形成されている。なお、フィルタ4はプラズ
マアーク光の分光強度が比較的弱(、かつ前記螢光の分
光強度が比較的強い波長帯域のみを透過させる。上記の
ごとく種々の螢光物質の混合Iこより蛍光体が形成され
ている場合、プラズマアーク光により種々の波長の螢光
が発光されるが、例えば1図示の場合、600mμ前後
の波長帯域の光がフィルタ4を透過するようにフィルタ
4が選定されている。すなわち、プラズマアーク光の分
光強度は波長が550mμ位までの短波長側では強いか
ら1作業者の眼を保護するためIここの短波長側のプラ
ズマアーク光をフィルタ4により遮断する。なお、プラ
ズマアーク光の分光強度が比較的弱い波長帯域の光をフ
ィルタ4を透過させて観察するが、波長が570m凪上
の可視光線は、黄、橙および赤のごとく眼で判別し易い
ため観察を容易に行うことができる。
The dotted line shown in FIG. 2 shows the result of measuring the spectral intensity distribution of fluorescence emitted when the marked line marked with fluorescent paint is irradiated with plasma arc light. In the illustrated case, the fluorescent paint, ie, the phosphor, is formed by mixing various fluorescent substances. The filter 4 transmits only the wavelength band in which the spectral intensity of the plasma arc light is relatively weak (and the spectral intensity of the fluorescent light is relatively strong). In the case where the plasma arc light is formed, fluorescent light of various wavelengths is emitted by the plasma arc light. For example, in the case shown in Figure 1, the filter 4 is selected so that light in a wavelength band of around 600 mμ is transmitted through the filter 4. That is, the spectral intensity of the plasma arc light is strong on the short wavelength side up to about 550 mμ, so in order to protect the eyes of one worker, the plasma arc light on the short wavelength side is blocked by the filter 4. Light in a wavelength band where the spectral intensity of the plasma arc light is relatively weak is transmitted through the filter 4 and observed, but visible light with wavelengths above 570 m is not observed because it is easy to distinguish with the eye, such as yellow, orange, and red. It can be done easily.

今1例えば日本真空光学株式会社@MIF−3型のフィ
ルタ600mμ±13mμ (半値幅)を使用して切断
部近傍を観察した場合、プラズマアーク部は橙色で、切
断部近傍の上記表記線はプラズマアーク部よりも鮮明な
橙色として把握することができた。このため、加工位置
近傍の状況を明@sこ把握しつつプラズマ加工を適確コ
こ行うことができた。
For example, when observing the vicinity of the cut using a filter 600 mμ ± 13 mμ (half-value width) manufactured by Japan Vacuum Optical Co., Ltd. @MIF-3, the plasma arc is orange, and the above marked line near the cut is plasma arc. It was possible to understand it as a clearer orange color than the arc part. For this reason, it was possible to accurately perform plasma processing while clearly grasping the situation near the processing position.

上記において1表記線を表記するための蛍光体は、螢光
チョークや熱硬化性の粉末などの固体状としたり、ある
いはペン状の液体状とすることができる。勿論、プラズ
マアーク光シこより発光される螢光は、蛍光体の含有物
質により異なるため。
In the above, the phosphor for marking one marking line can be in a solid state such as fluorescent chalk or thermosetting powder, or in a pen-like liquid state. Of course, the fluorescent light emitted from the plasma arc light source differs depending on the substance contained in the phosphor.

フィルタの透過波長帯域を570mμ以上の適宜の領域
に選定することができる。こ、の場合、透過波長帯域が
700mμに可及的に近いときには、所歪の波長帯以上
の光を通過させるフイ?レタ、いわゆるカットオンフィ
ルタを使用することができる。
The transmission wavelength band of the filter can be selected in an appropriate range of 570 mμ or more. In this case, when the transmission wavelength band is as close as possible to 700 mμ, is it possible to pass light in the wavelength band with a certain distortion? A so-called cut-on filter can be used.

なお、必要に応じて視野を適[SC暗くする、いわゆる
遮光具を併用した方が好ましい。
Note that it is preferable to use a so-called light shielding device to darken the field of view as necessary.

また、上記表記線はプラズマアーク溶接線とすることが
できる。、ざらI(プラズマアーク加工員を案内治具曇
こ支持し、この案内治具を移動させて加工する場合、案
内治具の確認用として上記表記線を用いることができる
Moreover, the above-mentioned marking line can be a plasma arc welding line. , Rough I (When a plasma arc machining worker is supported by a guide jig and the guide jig is moved during processing, the above marking line can be used to confirm the guide jig.

〈発明の効果〉 以上の説明で明らかなように、所望の波長帯域のみがフ
ィルタを透過し、プラズマアーク光とプラズマアーク光
により発光された表記線部とを観察することにより加工
位置近傍の状況を明611こ把復することができる。こ
のため、高清度のプラズマアーク加工を適確に行うこと
ができる。
<Effects of the Invention> As is clear from the above explanation, only the desired wavelength band passes through the filter, and by observing the plasma arc light and the marked line portion emitted by the plasma arc light, the situation near the processing position can be determined. It is possible to understand 611 details. Therefore, high-purity plasma arc processing can be performed appropriately.

【図面の簡単な説明】[Brief explanation of drawings]

Claims (1)

【特許請求の範囲】[Claims] (1)被加工物に表記した表記線に沿つてプラズマアー
ク加工具を移動させつつ加工するプラズマアーク加工方
法において、プラズマアーク光により螢光を発光する蛍
光体で前記表記線を表記し、プラズマアーク加工時に発
生する前記螢光のうちの所望の波長帯域のみを透過させ
るフィルタを介して前記表記線を観察しつつ加工するプ
ラズマアーク加工方法。
(1) In a plasma arc machining method in which a plasma arc machining tool is moved along a marking line marked on a workpiece while processing, the marking line is marked with a phosphor that emits fluorescence by plasma arc light, and the marking line is marked with a A plasma arc processing method in which processing is performed while observing the marking line through a filter that transmits only a desired wavelength band of the fluorescent light generated during arc processing.
JP62148816A 1987-06-15 1987-06-15 Plasma arc processing method Expired - Lifetime JP2581081B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62148816A JP2581081B2 (en) 1987-06-15 1987-06-15 Plasma arc processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62148816A JP2581081B2 (en) 1987-06-15 1987-06-15 Plasma arc processing method

Publications (2)

Publication Number Publication Date
JPS63313672A true JPS63313672A (en) 1988-12-21
JP2581081B2 JP2581081B2 (en) 1997-02-12

Family

ID=15461360

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62148816A Expired - Lifetime JP2581081B2 (en) 1987-06-15 1987-06-15 Plasma arc processing method

Country Status (1)

Country Link
JP (1) JP2581081B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001081037A1 (en) * 2000-04-26 2001-11-01 Connell Dennis James O Aid for welding or cutting

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5968603A (en) * 1982-10-14 1984-04-18 Maakutetsuku:Kk Method and device for detecting and following up weld line of welded steel pipe

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5968603A (en) * 1982-10-14 1984-04-18 Maakutetsuku:Kk Method and device for detecting and following up weld line of welded steel pipe

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001081037A1 (en) * 2000-04-26 2001-11-01 Connell Dennis James O Aid for welding or cutting

Also Published As

Publication number Publication date
JP2581081B2 (en) 1997-02-12

Similar Documents

Publication Publication Date Title
US5883389A (en) Distinguishing natural from synthetic diamonds
EP0911110A3 (en) Method and apparatus for monitoring laser weld quality via plasma size measurements
EP0911109A3 (en) Method an apparatus for monitoring laser weld quality via plasma light intensity measurements
KR840000536B1 (en) Method for monitoring arc welding
DE19534590A1 (en) Scanning ablation of ceramic materials, plastics and biological hydroxyapatite materials, especially hard tooth substance
DE60209159D1 (en) Method and apparatus for laser welding two or more overlapping sheets and clamping the sheets
JPS5892920A (en) Measuring device for diamond color
DE69821460D1 (en) Grinding process and device
WO2022168531A1 (en) Laser processing machine
JPS63313672A (en) Plasma arc working method
OKUNO Measurement of ultraviolet radiation from welding arcs
AU2005100981A4 (en) Aid for cutting or welding
DE10005592C1 (en) Manually- or machine-guided laser for welding cutting, coating or hardening, includes optics directing beam for oblique angle of incidence and reflection
Kanicky et al. Use of internal standardization to compensate for a wide range of absorbance in the analysis of glasses by UV laser ablation inductively coupled plasma atomic emission spectrometry
JPS569088A (en) Bead shaping method and welding torch for laser welding
JP2006504536A (en) Method and apparatus for temporary welding with thin jet of fluid in laser welding, laser processing or laser overlaying
US20030160038A1 (en) Aid for welding or cutting
JPH09314333A (en) Device for judging life of electrode in gta welding
AU3011900A (en) Aid for welding or cutting
DE3440636A1 (en) ARRANGEMENT FOR MONITORING AND / OR PROTECTING PLASMA TORCHES
JPH039312A (en) Adjusting device for optical characteristic of laser light emission system
WO2002002267A1 (en) Aids for welding or cutting
JPH05337675A (en) Laser beam machine
Nazarov et al. Gas Tungsten Arc Welding
DE59107822D1 (en) Method and device for positioning and controlling a high-performance energy source, in particular a laser, relative to a workpiece