JPS6331346B2 - - Google Patents
Info
- Publication number
- JPS6331346B2 JPS6331346B2 JP56025676A JP2567681A JPS6331346B2 JP S6331346 B2 JPS6331346 B2 JP S6331346B2 JP 56025676 A JP56025676 A JP 56025676A JP 2567681 A JP2567681 A JP 2567681A JP S6331346 B2 JPS6331346 B2 JP S6331346B2
- Authority
- JP
- Japan
- Prior art keywords
- aqueous solution
- abrasive
- cleaning
- solution tank
- containing aqueous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007864 aqueous solution Substances 0.000 claims description 55
- 238000004140 cleaning Methods 0.000 claims description 24
- 239000007788 liquid Substances 0.000 claims description 21
- 238000000108 ultra-filtration Methods 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 239000012466 permeate Substances 0.000 claims description 6
- 239000007921 spray Substances 0.000 claims description 4
- 238000000926 separation method Methods 0.000 claims description 3
- 239000006228 supernatant Substances 0.000 claims description 3
- 239000000243 solution Substances 0.000 claims description 2
- 239000003082 abrasive agent Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000009291 secondary effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C3/00—Abrasive blasting machines or devices; Plants
- B24C3/32—Abrasive blasting machines or devices; Plants designed for abrasive blasting of particular work, e.g. the internal surfaces of cylinder blocks
- B24C3/322—Abrasive blasting machines or devices; Plants designed for abrasive blasting of particular work, e.g. the internal surfaces of cylinder blocks for electrical components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B24C1/08—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for polishing surfaces, e.g. smoothing a surface by making use of liquid-borne abrasives
- B24C1/083—Deburring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C9/00—Appurtenances of abrasive blasting machines or devices, e.g. working chambers, arrangements for handling used abrasive material
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Description
【発明の詳細な説明】
本発明は液体ホーニングの循環処理装置に係
り、特に研摩材含有水溶液及び洗浄水を処理装置
内で完全に循環せしめるようにした処理装置に関
するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a circulation processing apparatus for liquid honing, and more particularly to a processing apparatus in which an aqueous solution containing an abrasive and cleaning water are completely circulated within the processing apparatus.
半導体装置の製造工程の一つに、モールドタイ
プのICのモード後のバリ取り工程である。第４
図はモールドタイプのICの製造途中の平面図で
ある。１００はリードフレーム、１０１はモード
部で、モールド後は１０３に示すようなモールド
の流れ出しによるバリが形成される。このバリ１
０３を除去するバリ取り工程では、通常、アルミ
ナ等の粒子よりなる研摩材を含有する水溶液を圧
縮空気と共に衝突せしめて行なつている。 One of the manufacturing processes for semiconductor devices is the deburring process after mold-type IC mode. Fourth
The figure is a plan view of a mold-type IC in the process of being manufactured. 100 is a lead frame, 101 is a mode part, and after molding, burrs are formed due to the mold flowing out as shown at 103. This burr 1
The deburring process for removing 03 is usually carried out by colliding an aqueous solution containing an abrasive material made of particles such as alumina with compressed air.
第１図は従来の液体ホーニングの処理装置の全
体の構成を示す図である。この装置によれば、研
摩材含有水溶液１を貯留した研摩材含有水溶液槽
２から圧送ポンプ３を付設した移送管４を介して
水溶液を加圧し、圧縮空気５と共に、ターンテー
ブル６に設定した被加工物であるIC７に衝突せ
しめている。そうすることにより、IC７のバリ
１０３が除去される。このようにして液体ホーニ
ングされたIC７は、その表面に付着した研摩材
等を洗い流すために、洗浄水８のシヤワー９を浴
びる。 FIG. 1 is a diagram showing the overall configuration of a conventional liquid honing processing apparatus. According to this device, the aqueous solution is pressurized from an abrasive-containing aqueous solution tank 2 in which an abrasive-containing aqueous solution 1 is stored, through a transfer pipe 4 equipped with a pressure pump 3, and the aqueous solution is pressurized together with compressed air 5 to a target set on a turntable 6. It is colliding with IC7, which is the workpiece. By doing so, the burr 103 on the IC 7 is removed. The IC 7 that has been liquid honed in this manner is exposed to a shower 9 of cleaning water 8 in order to wash away abrasive materials and the like adhering to its surface.
液体ホーニング時に使用された研摩材含有水溶
液は、水溶液槽２に回収され、再度利用される。
また洗浄処理で利用した洗浄液は、少量ながらも
研摩材を含有し、貯留槽１０に回収された後水溶
液槽２に流入される。水溶液槽２では水溶液１の
含有する研摩材の割合を一定に保つべく、オーバ
ーフローにより廃液口１１より廃液処理してい
る。 The abrasive-containing aqueous solution used during liquid honing is collected into the aqueous solution tank 2 and used again.
Further, the cleaning liquid used in the cleaning process contains abrasive material, albeit in a small amount, and is collected in the storage tank 10 and then flows into the aqueous solution tank 2. In the aqueous solution tank 2, in order to keep the proportion of abrasive contained in the aqueous solution 1 constant, waste liquid is disposed of through a waste liquid port 11 by overflow.
上述した従来の処理装置は以下の様な欠点を有
していた。すなわち、第１に一度使用された洗浄
水８は水溶液槽２よりオーバーフローにより排出
されるため、大量の洗浄水が必要であつた。そし
てそれに伴う大量の廃液を処理する必要があつ
た。第２に洗浄水が常に外部から供給されるた
め、水溶液中の研摩材の濃度の制御が煩雑であつ
た。 The conventional processing apparatus described above had the following drawbacks. That is, first, the once-used cleaning water 8 is discharged from the aqueous solution tank 2 by overflow, so a large amount of cleaning water is required. In addition, it was necessary to dispose of a large amount of waste liquid associated with this process. Second, since cleaning water is always supplied from the outside, controlling the concentration of abrasive in the aqueous solution is complicated.
本発明は上記従来の欠点を除去することを目的
とし、その特徴は、研摩材含有水溶液槽の研摩材
含有水溶液を加圧し被加工物に圧縮空気と共に衝
突せしめて液体ホーニング加工を行ない、加工後
の被加工物を該研摩材含有水溶液の分別手段によ
り分別された洗浄液にて洗浄処理し、該分別手段
により分別される研摩材含有水溶液及び該洗浄液
を該水溶液槽に回収循環するようにした処理装置
において、該研摩材含有水溶液槽の上澄部分の水
溶液に開口する、圧送ポンプを付設した水溶液管
を限外ろ過装置に連通し、該限外ろ過装置の濃縮
水溶液管を該水溶液槽に連通して濃縮水溶液の流
入により該水溶液槽を撹拌し、該限外ろ過装置の
透過液管を前記洗浄処理の洗浄スプレーに接続
し、該研摩材含有水溶液及び洗浄水を処理装置内
で循環するようにしたことにある。 The purpose of the present invention is to eliminate the above-mentioned conventional drawbacks, and its characteristics are as follows: The abrasive-containing aqueous solution in the abrasive-containing aqueous solution tank is pressurized and impinged on the workpiece together with compressed air to perform liquid honing. A process in which the workpiece is cleaned with a cleaning liquid separated by the abrasive-containing aqueous solution separation means, and the abrasive-containing aqueous solution separated by the separation means and the cleaning liquid are collected and circulated in the aqueous solution tank. In the apparatus, an aqueous solution pipe equipped with a pressure pump that opens into the supernatant aqueous solution of the abrasive-containing aqueous solution tank is connected to an ultrafiltration device, and a concentrated aqueous solution pipe of the ultrafiltration device is connected to the aqueous solution tank. The aqueous solution tank is stirred by the inflow of the concentrated aqueous solution, and the permeate pipe of the ultrafiltration device is connected to the cleaning spray of the cleaning treatment, so that the abrasive-containing aqueous solution and the cleaning water are circulated within the treatment device. It's because I did it.
以下本発明の一実施例を図面に従つて詳細に説
明する。 An embodiment of the present invention will be described in detail below with reference to the drawings.
第２図は本実施例の装置の全体を示す図で、第
１図と同じ部分には同一番号を付した。本実施例
では、従来に対し、圧送ポンプ１３を付設した水
溶液管１２を介して水溶液槽２の上澄部分の水溶
液を限外ろ過装置１４に圧入し、その結果得られ
た濃縮水溶液を濃縮水溶液管１５を介して水溶液
槽２に流入し、それにより水溶液槽２内を撹拌し
ている。一方限外ろ過装置１４から得られる清浄
な透過液は、圧送ポンプ１７を付設した透過液管
を介して洗浄スプレー９に移送され、再度洗浄液
として利用される。 FIG. 2 is a diagram showing the entire apparatus of this embodiment, and the same parts as in FIG. 1 are given the same numbers. In this embodiment, the aqueous solution in the supernatant portion of the aqueous solution tank 2 is pressurized into the ultrafiltration device 14 through an aqueous solution pipe 12 equipped with a pressure pump 13, and the concentrated aqueous solution obtained as a result is converted into a concentrated aqueous solution. It flows into the aqueous solution tank 2 through the pipe 15, thereby stirring the inside of the aqueous solution tank 2. On the other hand, the clean permeate obtained from the ultrafiltration device 14 is transferred to the cleaning spray 9 via a permeate pipe equipped with a pressure pump 17, and is used again as a cleaning liquid.
本実施例では、液体ホーニングの処理装置にお
ける水溶液中の研摩材が単に装置内で循環してい
るにすぎず、全体としてみると研摩材の量は不変
である点に注目し、洗浄水についても閉ループ内
で循環させるようにしている。 In this example, we focused on the fact that the abrasive material in the aqueous solution in the liquid honing processing equipment is simply circulating within the equipment, and the amount of abrasive material remains unchanged overall, and we also discuss the cleaning water. It is circulated in a closed loop.
こうすることにより、外部から補給水が供給さ
れることがなく、研摩材と共にそれを含有する水
及び洗浄水の量が不変となる。従つて、大量の廃
水処理が不用になるばかりでなく、研摩材の濃度
の変化がほとんどなくなり、その制御がきわめて
容易になつた。しかも限外ろ過装置１４からの濃
縮液を水溶液槽２内に流入せしめることにより槽
内を撹拌させることができ、さらにそれに伴いホ
ーニング時のスタートアツプ時間が不必要になつ
た。なお限外ろ過装置１４は第３図に示す様に、
ウルトラフイルトレーシヨン膜を筒状にしたもの
で、その中に水溶液を圧入することにより濃縮液
と透過液に分離する。この透過液は非常に清浄で
あるため、洗浄液として十分利用できる。 By doing this, make-up water is not supplied from the outside, and the amount of water containing the abrasive and cleaning water remains unchanged together with the abrasive. Therefore, not only does a large amount of wastewater treatment become unnecessary, but the concentration of the abrasive hardly changes, and its control becomes extremely easy. Moreover, by allowing the concentrated liquid from the ultrafiltration device 14 to flow into the aqueous solution tank 2, the inside of the tank can be agitated, and furthermore, the start-up time during honing becomes unnecessary. In addition, the ultrafiltration device 14 is as shown in FIG.
A cylindrical ultrafiltration membrane into which an aqueous solution is forced and separated into a concentrated liquid and a permeated liquid. Since this permeate is very clean, it can be fully used as a cleaning solution.
装置内全体の水の量と研摩材の量及び研摩材の
濃度等を考慮して、限外ろ過装置１４へ圧入する
水溶液の量、通液圧力等につきシステムの最適状
態が得られるように設計する必要がある。 The system is designed so that the optimum state of the system can be obtained in terms of the amount of aqueous solution to be pressurized into the ultrafiltration device 14, the flow pressure, etc., taking into consideration the amount of water, the amount of abrasive material, the concentration of the abrasive material, etc. in the entire device. There is a need to.
以上詳述した様に、本発明によれば、大量の洗
浄水が必要なく、廃液処理を施こす必要もないた
め経済的であり、さらに研摩材の濃度の制御が容
易であるため作業性が向上し、しかも水溶液槽内
の撹拌を同時に行なうことができるという二次的
な効果も得られる。 As described in detail above, the present invention is economical because it does not require a large amount of washing water and does not require waste liquid treatment, and furthermore, the concentration of the abrasive can be easily controlled, resulting in improved workability. Moreover, the secondary effect of being able to stir the aqueous solution tank at the same time can also be obtained.
第１図は従来の液体ホーニング装置の全体を示
す構造図、第２図は本発明の一実施例の処理装置
の全体を示す構成図、第３図は限外ろ過装置の主
要部断面図、第４図はモールドタイプのICの平
面図である。
図中、１は研摩材含有水溶液、２は研摩材含有
水溶液槽、５は圧縮空気、７は被加工物、８は洗
浄水、９は洗浄スプレー、１２は水溶液管、１３
は圧送ポンプ、１４は限外ろ過装置、１５は濃縮
水溶液管、１６は透過液管である。
FIG. 1 is a structural diagram showing the entire conventional liquid honing device, FIG. 2 is a structural diagram showing the entire processing device according to an embodiment of the present invention, and FIG. 3 is a sectional view of the main parts of the ultrafiltration device. FIG. 4 is a plan view of a mold type IC. In the figure, 1 is an abrasive-containing aqueous solution, 2 is an abrasive-containing aqueous solution tank, 5 is compressed air, 7 is a workpiece, 8 is cleaning water, 9 is a cleaning spray, 12 is an aqueous solution tube, 13
14 is a pressure pump, 14 is an ultrafiltration device, 15 is a concentrated aqueous solution tube, and 16 is a permeate tube.
Claims (1)
圧し被加工物に圧縮空気と共に衝突せしめて液体
ホーニング加工を行ない、加工後の被加工物を該
研摩材含有水溶液の分別手段により分別された洗
浄液にて洗浄処理し、該分別手段により分別され
る研摩材含有水溶液及び該洗浄液を該水溶液槽に
回収循環するようにした処理装置において、該研
摩材含有水溶液槽の上澄部分の水溶液に開口す
る、圧送ポンプを付設した水溶液管を限外ろ過装
置に連通し、該限外ろ過装置の濃縮水溶液管を該
水溶液槽に連通して濃縮水溶液の流入により該水
溶液槽を撹拌し、該限外ろ過装置の透過液管を前
記洗浄処理の洗浄スプレーに接続し、該研摩材含
有水溶液及び洗浄水を処理装置内で循環するよう
にしたことを特徴とする液体ホーニングの循環処
理装置。1 The abrasive-containing aqueous solution in the abrasive-containing aqueous solution tank is pressurized and impinged on the workpiece together with compressed air to perform liquid honing, and the processed workpiece is separated into a cleaning solution by the abrasive-containing aqueous solution separation means. In the processing apparatus, the abrasive-containing aqueous solution separated by the separating means and the cleaning liquid are collected and circulated to the aqueous solution tank, and an opening is opened to the aqueous solution in the supernatant portion of the abrasive-containing aqueous solution tank. , an aqueous solution pipe equipped with a pressure pump is connected to an ultrafiltration device, a concentrated aqueous solution pipe of the ultrafiltration device is connected to the aqueous solution tank, the aqueous solution tank is stirred by the inflow of the concentrated aqueous solution, and the ultrafiltration is carried out by 1. A circulation treatment device for liquid honing, characterized in that a permeate pipe of the device is connected to a cleaning spray for the cleaning treatment, so that the abrasive-containing aqueous solution and cleaning water are circulated within the treatment device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2567681A JPS57144667A (en) | 1981-02-24 | 1981-02-24 | Circulation processing unit for liquid honing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2567681A JPS57144667A (en) | 1981-02-24 | 1981-02-24 | Circulation processing unit for liquid honing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57144667A JPS57144667A (en) | 1982-09-07 |
| JPS6331346B2 true JPS6331346B2 (en) | 1988-06-23 |
Family
ID=12172382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2567681A Granted JPS57144667A (en) | 1981-02-24 | 1981-02-24 | Circulation processing unit for liquid honing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57144667A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07124865A (en) * | 1991-12-24 | 1995-05-16 | Kawasaki Heavy Ind Ltd | Feeding method for supply of grinding material for abrasive water jet |
-
1981
- 1981-02-24 JP JP2567681A patent/JPS57144667A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57144667A (en) | 1982-09-07 |
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