JPS63312056A - Polishing device for magnetic head - Google Patents

Polishing device for magnetic head

Info

Publication number
JPS63312056A
JPS63312056A JP14554387A JP14554387A JPS63312056A JP S63312056 A JPS63312056 A JP S63312056A JP 14554387 A JP14554387 A JP 14554387A JP 14554387 A JP14554387 A JP 14554387A JP S63312056 A JPS63312056 A JP S63312056A
Authority
JP
Japan
Prior art keywords
magnetic head
cylinder
polishing
tape
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14554387A
Other languages
Japanese (ja)
Inventor
Noriyasu Echigo
紀康 越後
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14554387A priority Critical patent/JPS63312056A/en
Publication of JPS63312056A publication Critical patent/JPS63312056A/en
Pending legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To eliminate difference in level between different types of materials generated at the time of polishing a magnetic head by projecting out a magnetic head from the outer peripheral face of a cylinder for a defined quantity and jetting out a liquid outward from the inside of the cylinder while running a polishing tape along the outer periphery of the magnetic head. CONSTITUTION:Water jet-out nozzles 15 are provided on the face with which a polishing tape 3 is brought into contact of a cylinder 14 to feed water to the nozzles 15 from a body side and a rotary cylinder 2 to which a magnetic head 1 is fixed is installed on the hub 16 which is interlocked with a motor of the fixed cylinder 14. And, by running the polishing tape 3, as the rotary cylinder 2 is rotated while jetting water out of the nozzles 15, the magnetic head 1 is polished by the polishing tape 3 which is floated up from the fixed cylinder 14 due to the pressure of water, thereby, without causing difference in level between different materials exposed on the sliding face of the medium, eliminating the need for varying the projecting quantity of the magnetic tape or the tension of the tape.

Description

【発明の詳細な説明】 産業上の利用分野 本発明はVTR等で用いられる回転シリンダー用磁気ヘ
ッドの媒体摺動面の研磨装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an apparatus for polishing a medium sliding surface of a magnetic head for a rotating cylinder used in a VTR or the like.

従来の技術 従来、磁気ヘッドの媒体摺動面を、媒体の走行状態に適
した形状にあわせ1.かつ磁気ヘッドの主要部分、特に
磁気ギャップ近傍に前加工等で生じた微細な凹凸を少な
くするために、有機フィルム上に研磨材が撒布された研
磨シートや研磨テープを用いて、磁気ヘッドの媒体摺動
面を鏡面研磨する事が行われている。その−例を第5図
に示す。
BACKGROUND OF THE INVENTION Conventionally, the medium sliding surface of a magnetic head is shaped to suit the running condition of the medium. In addition, in order to reduce fine irregularities caused by pre-processing in the main parts of the magnetic head, especially near the magnetic gap, a polishing sheet or polishing tape with an abrasive material sprinkled on an organic film is used to polish the magnetic head's medium. The sliding surface is mirror polished. An example thereof is shown in FIG.

同図はVTR等で用いられている回転シリンダー用磁気
ヘッド1の研磨方法を模式的に示した平面図である。同
図において、磁気ヘッド1を回転シリンダー2の研磨テ
ープ3摺動面の円周から距離tだけ突き出すように回転
シリンダー2へ固定する。この状態で回転シリンダー2
を回転系に取り付ける。巻出しリール4からテープガイ
ド6及び回転シリンダー2に沿う様に研磨テープ3を取
り付は巻き取りリール7へ巻き取られるようにする。こ
の状態で回転シリンダー2を回転させながら研磨テープ
3を走行させ、磁気ヘッド1を研磨する。これにより磁
気ヘッド1の媒体摺動面を、媒体の走行状態に適した形
状にあわせ、かつ磁気ヘッド1の主要部分、特に磁気ギ
ャップ近傍に前加工等で生じた凹凸を少な(することが
出来る。
This figure is a plan view schematically showing a method of polishing a magnetic head 1 for a rotary cylinder used in a VTR or the like. In the figure, a magnetic head 1 is fixed to a rotating cylinder 2 so as to protrude a distance t from the circumference of the sliding surface of the polishing tape 3 of the rotating cylinder 2. In this state, rotating cylinder 2
Attach to the rotating system. The polishing tape 3 is attached so as to be wound from the unwinding reel 4 to the take-up reel 7 along the tape guide 6 and the rotating cylinder 2. In this state, the magnetic head 1 is polished by running the polishing tape 3 while rotating the rotary cylinder 2. As a result, the media sliding surface of the magnetic head 1 can be adjusted to a shape suitable for the running condition of the medium, and unevenness caused by pre-processing etc. can be reduced in the main parts of the magnetic head 1, especially in the vicinity of the magnetic gap. .

通常、研磨開始時において、撒布されている研磨材の粒
径が大、きい研磨テープ3が用いられ、これによって磁
気ヘッド1の摺動面形状を形成し、研磨段階が進むにつ
れて粒径が小さいものが選ばれる。また研磨テープ3に
撒布されている研磨材は、磁気ヘッド1の摺動面に露出
している材料に応じて選ばれ、一般にFe2O3,Al
2O3゜Cr0z等が用いられる。
Usually, at the start of polishing, the particle size of the abrasive being spread is large, and a large abrasive tape 3 is used, which forms the shape of the sliding surface of the magnetic head 1, and as the polishing stage progresses, the particle size becomes smaller. Things are chosen. The abrasive material spread on the abrasive tape 3 is selected depending on the material exposed on the sliding surface of the magnetic head 1, and is generally Fe2O3, Al, etc.
2O3°Cr0z etc. are used.

近年磁気記録装置の高密度化に伴い、磁気ヘッド1も、
その磁路のほとんどがフェライトで構成され、磁気ギャ
ップ近傍のみにCO系やFe系のメタル材料が蒸着やス
パッタ法によって形成されている様な、異種材料で構成
されている磁気ヘッド1が実用化されつつある。このよ
うな異種材料からなる磁気ヘッド1を従来例で示した研
磨方法で研磨すると、各材料間で磨耗特性が異なるため
それらの間で数百Aないし数千人の段差が生じる場合が
多い。そのような段差が生じた例を第6図に示す。この
図は、磁気ヘッド1の媒体摺動面に、基板8及びカバー
9の材料の結晶化ガラス、磁性体10のCO系アモルフ
ァス、ギャップ材11の5102、保護層12のA l
 20 s、及び接着層13の各々が露出している場合
について、触針式粗さ計で媒体摺動方向に測定した例を
示している。この図かられかるように、基板8と磁性体
10の間に、450Aの段差が生じている。仮に、この
段差が分離長dに相当するとして、再生過程で生じる分
離損失を計算する。この磁気ヘッド1が用いられている
磁気記録装置の使用波長λが1μmである場合、Wal
laceの式から、次のように求められる。
In recent years, with the increase in the density of magnetic recording devices, the magnetic head 1 has also become
A magnetic head 1 made of different materials has been put into practical use, with most of the magnetic path being made of ferrite, and a CO-based or Fe-based metal material being formed by vapor deposition or sputtering only in the vicinity of the magnetic gap. It is being done. When the magnetic head 1 made of such different materials is polished by the polishing method shown in the conventional example, a step difference of several hundred to several thousand amps often occurs between the materials because the wear characteristics differ between the materials. FIG. 6 shows an example in which such a step occurs. This figure shows that the medium sliding surface of the magnetic head 1 is made of crystallized glass as the substrate 8 and cover 9, CO-based amorphous as the magnetic material 10, 5102 as the gap material 11, and Al as the protective layer 12.
20 s and when each of the adhesive layer 13 is exposed, an example is shown in which measurements were taken in the medium sliding direction with a stylus roughness meter. As can be seen from this figure, there is a step difference of 450 A between the substrate 8 and the magnetic body 10. Assuming that this step corresponds to the separation length d, the separation loss occurring during the regeneration process will be calculated. When the working wavelength λ of the magnetic recording device in which this magnetic head 1 is used is 1 μm, Wal
From the formula for lace, it can be obtained as follows.

損失=54.8Xd/λ =54.8X0.045/1 =2.47  [dB] さらに記録時においても、はぼ同等の損失があると考え
られるから、記録と再生の分離損失の総和は、5dB程
度はあるものと考えられる。このために、S/N比の低
下や、エラー率の増加が起こることは容易に想像される
Loss = 54.8Xd/λ = 54.8X0.045/1 = 2.47 [dB] Furthermore, since it is thought that there is approximately the same loss during recording, the total separate loss between recording and reproduction is: It is thought that there is a level of about 5 dB. It is easy to imagine that this causes a decrease in the S/N ratio and an increase in the error rate.

従来の研磨方法でも、磁気ヘッド1の研磨テープ3に対
する突き出し量を変えたり、研磨テープ3のテンション
を変化させることで、このような異種材料間の段差を数
十%小さくすることができる。その例を第7図に示す。
Even in the conventional polishing method, by changing the amount of protrusion of the magnetic head 1 with respect to the polishing tape 3 or by changing the tension of the polishing tape 3, it is possible to reduce such a difference in level between different materials by several tens of percent. An example is shown in FIG.

この図は、第6図に比べ研磨テープ3に対する磁気ヘッ
ド1の突き出し量を100μm増やして研磨したときの
摺動面凹凸状態である。測定条件は第6図と同じである
。第6図に比べ、基板8と磁性体10の間の段差は44
%小さくなっている。
This figure shows the uneven state of the sliding surface when polishing is performed with the amount of protrusion of the magnetic head 1 relative to the polishing tape 3 increased by 100 μm compared to FIG. 6. The measurement conditions are the same as in FIG. Compared to FIG. 6, the height difference between the substrate 8 and the magnetic body 10 is 44.
% smaller.

発明が解決しようとする問題点 しかしこれ以上磁気ヘッド1の突き出し量を変化させて
もこの段差は小さくならなかった。また、巻出しリール
4と巻き取りリール7の回転数を若干食い違わせるなど
の方法で、研磨テープ3のテンションを変化させて同様
の検討を行ったが、この様な段差はこれ以上小さくなら
なかった。従って、磁気ヘッド1の突き出し量やテープ
テンションを変えることでは根本的に異種材料間の段差
を解消することは出来ない。更に、この様な方法では磁
気ヘッド1の先端形状が大きく変化してしまうため、実
際に磁気媒体と磁気ヘッド1を摺動させた場合、媒体の
走行状態に適した磁気ヘッド1の先端形状から掛は離れ
てしまい、逆に磁気ギャップ近傍が媒体と摺動しに(く
なり、むしろ磁気ヘッド1からの出力が低下してしまう
ことが多い。
Problems to be Solved by the Invention However, even if the amount of protrusion of the magnetic head 1 was changed further, this difference in level could not be reduced. In addition, similar studies were conducted by changing the tension of the polishing tape 3 by slightly different rotational speeds between the unwinding reel 4 and the take-up reel 7, but if the difference in level could be made any smaller, There wasn't. Therefore, by changing the amount of protrusion of the magnetic head 1 or the tape tension, it is not possible to fundamentally eliminate the difference in level between different materials. Furthermore, with this method, the tip shape of the magnetic head 1 changes greatly, so when the magnetic medium and the magnetic head 1 are actually slid, the tip shape of the magnetic head 1 will change from the shape that is suitable for the running condition of the medium. The hooks become separated, and the vicinity of the magnetic gap ends up sliding against the medium, which often results in a decrease in the output from the magnetic head 1.

以上述べてきたように、従来の技術では磁気ヘッドの先
端形状を従来通りに保ちつつ、異種材料間の凹凸が十分
に小さくなる様に研磨することが困難であった。
As described above, with the conventional techniques, it is difficult to maintain the tip shape of the magnetic head as before while polishing the magnetic head so that the unevenness between different materials is sufficiently reduced.

問題点を解決するための手段 磁気ヘッドをシリンダーの外周より所定の量だけ突出せ
しめて回転させる機構と、フレキシブルな基板上に研磨
材が撒布された研磨テープを前記シリンダーの外周に沿
って走行させる機構と、前記研磨テープの走行径路に沿
って前記シリンダーの内側から外側へ液体を噴出させる
機構を具備した磁気ヘッドの研磨装置を構成する。
Means for Solving the Problems A mechanism is provided in which a magnetic head is rotated by protruding from the outer periphery of a cylinder by a predetermined amount, and an abrasive tape on which abrasive material is spread on a flexible substrate is run along the outer periphery of the cylinder. A polishing device for a magnetic head is provided, including a mechanism and a mechanism for ejecting liquid from the inside of the cylinder to the outside along the travel path of the polishing tape.

作用 水の具体的な作用は不明であるが、この装置を用いるこ
とによって、摩耗特性の異なる異種材料によって構成さ
れる磁気ヘッドでも、異種材料間の段差が極めて少ない
状態に研磨することが可能である。また研磨媒体に対す
る磁気ヘッドの突き出し量や研磨媒体のテンションを変
化させないで研磨できるため、磁気ヘッドの摺動面形状
を従来通りに保つことが出来る。
Although the specific action of the working water is unknown, by using this device, it is possible to polish magnetic heads made of different materials with different wear characteristics to a state where there are extremely few differences in level between the different materials. be. Further, since polishing can be performed without changing the amount of protrusion of the magnetic head relative to the polishing medium or the tension of the polishing medium, the shape of the sliding surface of the magnetic head can be maintained as before.

実施例 以下本発明の具体的な実施例を図を用いて説明する。Example Hereinafter, specific embodiments of the present invention will be described using the drawings.

第1図は本発明の第1実施例を示すシリンダ一部分の斜
視図である。同図において、固定シリンダー14には、
研磨テープ3の当接面に水の吹き出しノズル15が設け
られており、固定シリンダー14が取り付けられる本体
側からこの水の吹き出しノズル15に水が供給できるよ
うに予めされている。固定シリンダー14の中央部に回
転モーターと連動するハブ16を設け、これに磁気ヘッ
ド1が固定された回転シリンダー2を取り付ける。この
様に取り付けられたシリンダーを、第5図と同じ研磨テ
ープ走行系にかける。磁気ヘッド1を研磨する際に、吹
き出しノズル15から水を吹き出しながら回転シリンダ
ー2を回転させる。
FIG. 1 is a perspective view of a portion of a cylinder showing a first embodiment of the present invention. In the figure, the fixed cylinder 14 includes:
A water blowing nozzle 15 is provided on the abutting surface of the polishing tape 3, and is designed in advance so that water can be supplied to the water blowing nozzle 15 from the main body side to which the fixed cylinder 14 is attached. A hub 16 interlocked with a rotary motor is provided in the center of a fixed cylinder 14, and a rotary cylinder 2 to which a magnetic head 1 is fixed is attached to the hub 16. The cylinder thus installed is applied to the same abrasive tape running system as shown in FIG. When polishing the magnetic head 1, the rotating cylinder 2 is rotated while blowing out water from the blowing nozzle 15.

この様な研磨方法を用いると、磁気ヘッド1は水が付着
された研磨テープ3によって研磨されるため、磁気ヘッ
ド1の媒体摺動面に露出している異種材料間では段差が
起こらない。本実施例の研磨方法で研磨された磁気ヘッ
ド1の媒体摺動面の凹凸状態を第2図に示す。ただし磁
気ヘッド1の研磨テープ3に対する突き出し量や研磨テ
ープ3のテンション、及び測定条件は第7図と同一であ
る。第7図と比較すると、大幅に基板8と磁性体10の
間の段差が解消されていることがわかる。
When such a polishing method is used, the magnetic head 1 is polished by the polishing tape 3 to which water is attached, so that no difference in level occurs between different materials exposed on the medium sliding surface of the magnetic head 1. FIG. 2 shows the unevenness of the medium sliding surface of the magnetic head 1 polished by the polishing method of this embodiment. However, the amount of protrusion of the magnetic head 1 relative to the polishing tape 3, the tension of the polishing tape 3, and the measurement conditions are the same as in FIG. A comparison with FIG. 7 shows that the level difference between the substrate 8 and the magnetic body 10 has been largely eliminated.

従って、本実施例の研磨方法が施された磁気ヘッド1で
は、異種材料間で生じた段差が原因となる分離損失はほ
とんど起こらないものと考えられる。またこの方法では
、研磨テープ3に対する磁気ヘッド1の突き出し量やテ
ープテンションを変化させる必要がなく、磁気ヘッド1
の摺動面形状を従来通りに保つことが出来る。通常回転
シリンダー2や固定シリンダー14の研磨テープ3当接
面は極めて凹凸の少ない状態に仕上げられている。この
ため、水などの液体等が研磨テープ3の研磨面に付着す
ると、研磨テープ3が固定シリンダー14や回転シリン
ダー2に強固に付着してしまい、研磨テープ3が滑らか
に走行しなくなるばかりか、甚だしい場合、研磨テープ
3が巻き取りリールの回転力で切断されてしまう場合も
ある。
Therefore, in the magnetic head 1 subjected to the polishing method of this embodiment, it is considered that separation loss caused by the step difference between different materials hardly occurs. In addition, with this method, there is no need to change the amount of protrusion of the magnetic head 1 with respect to the polishing tape 3 or the tape tension.
The shape of the sliding surface can be maintained as before. Normally, the abrasive tape 3 abutting surfaces of the rotating cylinder 2 and the stationary cylinder 14 are finished with extremely few irregularities. Therefore, if liquid such as water adheres to the polishing surface of the polishing tape 3, the polishing tape 3 will firmly adhere to the fixed cylinder 14 or the rotating cylinder 2, and not only will the polishing tape 3 not run smoothly. In extreme cases, the polishing tape 3 may be cut by the rotational force of the take-up reel.

本実施例では、この様な状態になることを防ぐために、
固定シリンダー14から水を吹き出すことにより、これ
の圧力によって研磨テープ3を固定シリンダー14から
若干浮上させる。これにより、研磨テープ3はシリンダ
ーに張り付(ことがなく、滑らかにシリンダー面を走行
ことができる。
In this embodiment, in order to prevent such a situation,
By blowing out water from the fixed cylinder 14, the polishing tape 3 is slightly floated from the fixed cylinder 14 due to its pressure. As a result, the polishing tape 3 does not stick to the cylinder and can run smoothly on the cylinder surface.

次に、本発明の第2実施例を第3図を用いて説明する。Next, a second embodiment of the present invention will be described using FIG. 3.

同図は回転シリンダー2側に、水の吹き出しノズル15
を設けた例を示した斜視図である。同図において、回転
シリンダー2の磁気ヘッド1取り付は面に水受は溝17
を設け、水吹き出しノズル15をこの水受は溝17へつ
なぐ。このように加工された回転シリンダー2を、水吹
き出しノズル15が加工されている面が上側になるよう
、固定シリンダー14を通して研磨機本体に取り付ける
。固定シリンダー14には回転シリンダー2を回転する
ハブ16の他に、水受は溝17へ水を供給するノズルを
予め設けておく。この様に準備されたシリンダー系と第
5図で示した研磨テープ3の走行系を用いて磁気ヘッド
1を研磨する。研磨開始前に予め水を適量水受は溝17
に貯でおきその後回転シリンダー2を回転させ、研磨テ
ープ3を走行させる。研磨開始と同時に研磨機本体側か
ら水受は溝17に水を供給する。
The figure shows a water blowing nozzle 15 on the rotating cylinder 2 side.
FIG. 3 is a perspective view showing an example in which a In the same figure, the magnetic head 1 of the rotary cylinder 2 is attached to the surface and the water receiver is grooved 17.
A water spout nozzle 15 is connected to the water receptacle groove 17. The rotating cylinder 2 processed in this way is attached to the polishing machine body through the fixed cylinder 14 so that the surface on which the water blowing nozzle 15 is processed faces upward. In addition to the hub 16 that rotates the rotary cylinder 2, the fixed cylinder 14 is provided with a nozzle that supplies water to the groove 17 of the water receiver. The magnetic head 1 is polished using the cylinder system prepared in this way and the running system for the polishing tape 3 shown in FIG. Before starting polishing, add an appropriate amount of water to the water receiver in groove 17.
After that, the rotating cylinder 2 is rotated and the abrasive tape 3 is run. At the same time as the polishing starts, the water receiver supplies water to the groove 17 from the polishing machine main body side.

本実施例の場合、磁気ヘッド1の直前で研磨テープ3に
水を供給することができるので、磁気ヘッド1の近傍に
おける水の供給むらが起こりにくい。第3図では、磁気
ヘッド1に加わる研磨テープ3からの圧力が磁気ヘッド
1の主要部分を中心にして対称になるようにするため、
水の吹き出しノズル15は、磁気ヘッド1の取り付は位
置の前後に設けた例を示した。第1実施例で述べたよう
に、研磨テープ3のシリンダーへの張り付きが強い場合
、水の吹き出しノズル15の数を増して、これを防ぐと
よい。
In the case of this embodiment, since water can be supplied to the polishing tape 3 immediately before the magnetic head 1, uneven supply of water in the vicinity of the magnetic head 1 is less likely to occur. In FIG. 3, in order to make the pressure from the polishing tape 3 applied to the magnetic head 1 symmetrical about the main part of the magnetic head 1,
The water blowing nozzle 15 is shown as an example in which the magnetic head 1 is attached before and after the position. As described in the first embodiment, if the abrasive tape 3 sticks strongly to the cylinder, it is advisable to increase the number of water blowing nozzles 15 to prevent this.

さらに、水受は溝17を回転シリンダー2における磁気
ヘッド1の取り付は面の反対側に設けたものが第3図で
ある。この例の場合、水受は溝17が磁気ヘッド1と反
対側に設けられているため水の吹き出しノズル15が断
面図に示したように、斜めに設けられる。水の作用のし
かたは、第3図と同様であるので、説明は省略する。
Furthermore, FIG. 3 shows a water receptacle in which a groove 17 is provided on the opposite side of the rotary cylinder 2 to which the magnetic head 1 is attached. In this example, since the groove 17 of the water receiver is provided on the opposite side of the magnetic head 1, the water blowing nozzle 15 is provided obliquely as shown in the cross-sectional view. The manner in which water acts is the same as that shown in FIG. 3, so a description thereof will be omitted.

また、第1実施例と第2実施例を組み合わせて磁気ヘッ
ド1を研磨しても同様の効果が期待できる。
Moreover, similar effects can be expected even if the magnetic head 1 is polished by combining the first embodiment and the second embodiment.

以上述べてきた実施例では、シリンダーから噴出する液
体の例として水の場合について説明してきたが、他の液
体についても同様に検討した結果、メタノール、エタノ
ール、ラッピングオイ、ル(例えばMobi I社製J
HON CRANE LAPPING VEIICLE
No、3)を用いても、異種材料間の段差を低減する効
果があることがわかった。
In the embodiments described above, the case of water has been explained as an example of the liquid ejected from the cylinder, but as a result of similar studies on other liquids, methanol, ethanol, wrapping oil, J
HON CRANE LAPPING VEIICLE
It was found that even if No. 3) was used, there was an effect of reducing the level difference between different materials.

発明の効果 本発明によれば、固さの異なる異種材料によって構成さ
れる磁気ヘッドでも、研出後に生じる異種材料間の段差
を解消することができる。また研磨媒体に対する、磁気
ヘッドの突き出し量やテンションを変化させないで研磨
できるため、磁気ヘッドの慴動面形状を従来通りに保つ
ことが出来る。更に、シリンダー側から液体を研磨媒体
に吹き付けるために、研磨媒体をシリンダー上で極僅か
浮き上がらせることが出来るので、液体が研磨媒体に付
着したために起こる研磨媒体のシリンダーへの張り付き
を防ぐことが出来る。
Effects of the Invention According to the present invention, even in a magnetic head made of different materials having different hardnesses, it is possible to eliminate the level difference between the different materials that occurs after polishing. Furthermore, since polishing can be performed without changing the amount of protrusion or tension of the magnetic head relative to the polishing medium, the shape of the sliding surface of the magnetic head can be maintained as before. Furthermore, since the liquid is sprayed onto the polishing medium from the cylinder side, the polishing medium can be raised slightly above the cylinder, which prevents the polishing medium from sticking to the cylinder due to the liquid adhering to the polishing medium. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の第1実施例を示すシリンダ一部分の分
解斜視図、第2図は本発明の研磨方法を施した磁気ヘッ
ドの摺動面凹凸状態を示す図、第3図は本発明の第2実
施例を示す回転シリンダーの斜視図、第4図(a)及び
(b)は各々、本発明の第3実施例を示す回転シリンダ
ーの平面図と断面図、第5図は従来例を示す模式図、第
6図及び第7図は従来の研磨方法を施した磁気ヘッドの
摺動面凹凸状態を示す図である。 1・・・磁気ヘッド、2・・・回転シリンダー、14・
・・固定シリンダー、15・・・水吹き出しノズル、1
6・・・ハブ。 代理人の氏名 弁理士 中尾敏男 ばか1名/ −−一
眉1気へ、yド 2−一一回転シリンク゛− 14−置火シリンダー ツ6−71<1欠きtしノス゛ル /6−11 gシワンダー巨1云用ハ“フ゛第1図 第2図 第3図 第4図 ((L)      2 (b)       /7 亀 A−A’前山 第5図
FIG. 1 is an exploded perspective view of a portion of a cylinder showing a first embodiment of the present invention, FIG. 2 is a diagram showing the uneven state of the sliding surface of a magnetic head subjected to the polishing method of the present invention, and FIG. 3 is a diagram showing the present invention. FIGS. 4(a) and 4(b) are respectively a plan view and a sectional view of the rotating cylinder showing the third embodiment of the present invention, and FIG. 5 is a conventional example. 6 and 7 are diagrams showing the uneven state of the sliding surface of a magnetic head subjected to a conventional polishing method. 1... Magnetic head, 2... Rotating cylinder, 14.
・・Fixed cylinder, 15 ・・Water blowing nozzle, 1
6...Hub. Agent's name: Patent attorney Toshio Nakao 1 idiot/--One eyebrow, 1 ki, y do 2-11 rotation cylinder 14-ignition cylinder 6-71<1 missing t no suru/6-11 Figure 1 Figure 2 Figure 3 Figure 4 ((L) 2 (b) /7 Turtle A-A' Maeyama Figure 5)

Claims (1)

【特許請求の範囲】[Claims] 磁気ヘッドをシリンダーの外周より所定の量だけ突出せ
しめて回転させる機構と、フレキシブルな基板上に研磨
材が撒布された研磨テープを前記シリンダーの外周に沿
って走行させる機構と、前記研磨テープの走行径路に沿
って前記シリンダーの内側から外側へ液体を噴出させる
機構を具備したことを特徴とする磁気ヘッドの研磨装置
A mechanism for causing a magnetic head to protrude from the outer periphery of a cylinder by a predetermined amount and rotating it; a mechanism for running an abrasive tape with an abrasive material spread on a flexible substrate along the outer periphery of the cylinder; and a mechanism for causing the abrasive tape to run. A magnetic head polishing device comprising a mechanism for ejecting liquid from the inside of the cylinder to the outside along a path.
JP14554387A 1987-06-11 1987-06-11 Polishing device for magnetic head Pending JPS63312056A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14554387A JPS63312056A (en) 1987-06-11 1987-06-11 Polishing device for magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14554387A JPS63312056A (en) 1987-06-11 1987-06-11 Polishing device for magnetic head

Publications (1)

Publication Number Publication Date
JPS63312056A true JPS63312056A (en) 1988-12-20

Family

ID=15387614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14554387A Pending JPS63312056A (en) 1987-06-11 1987-06-11 Polishing device for magnetic head

Country Status (1)

Country Link
JP (1) JPS63312056A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0650804A1 (en) * 1993-10-29 1995-05-03 Shin-Etsu Handotai Company Limited Apparatus for polishing the notch of a wafer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0650804A1 (en) * 1993-10-29 1995-05-03 Shin-Etsu Handotai Company Limited Apparatus for polishing the notch of a wafer
US5733181A (en) * 1993-10-29 1998-03-31 Shin-Etsu Handotai Co., Ltd. Apparatus for polishing the notch of a wafer

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