JPH01267834A - Production of thin-film magnetic recording medium - Google Patents

Production of thin-film magnetic recording medium

Info

Publication number
JPH01267834A
JPH01267834A JP9441588A JP9441588A JPH01267834A JP H01267834 A JPH01267834 A JP H01267834A JP 9441588 A JP9441588 A JP 9441588A JP 9441588 A JP9441588 A JP 9441588A JP H01267834 A JPH01267834 A JP H01267834A
Authority
JP
Japan
Prior art keywords
substrate
holding body
magnetic recording
recording medium
film magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9441588A
Other languages
Japanese (ja)
Inventor
Masanori Arayashiki
荒屋敷 政則
Hiroshi Yashiki
屋鋪 博
Shinji Abe
真治 阿部
Yoshiki Kato
加藤 義喜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9441588A priority Critical patent/JPH01267834A/en
Publication of JPH01267834A publication Critical patent/JPH01267834A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obviate the generation of burrs by sticking a polishing agent to a holding body having elasticity and pressing the holding body to a substrate surface or underlying film surface while relatively changing the positions of the substrate and the holding body, thereby forming fine ruggedness. CONSTITUTION:The fine concentrical ruggedness is formed to the substrate 5 or the underlying film provided on the substrate 5 surface. The formation of the fine ruggedness is executed by sticking the polishing agent 1 to the holding body having elasticity and pressing the holding body to the polishing agent 5 surface or the underlying film surface while relatively changing the positions of the substrate 1 and the holding body. The holding body to which the polishing agent 1 is stuck may be a holding body having elasticity and may be preferably, for example, a nonwoven fabric 4 or the like. The polishing agent 1 is stuck to the nonwoven fabric 4 without being fixed thereto and does not generate undue stress in cutting power. The thin-film magnetic disk is thereby produced without generating the burrs.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、磁気記録媒体の製造方法に係り、特に薄膜磁
気記録媒体の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a magnetic recording medium, and particularly to a method of manufacturing a thin film magnetic recording medium.

〔従来の技術〕[Conventional technology]

薄膜磁気記録媒体、特にスパッタディスク、メツキディ
スクは、従来の塗布型ディスクに比べ表面あらさがより
微細になっている。このため磁気ディスク上で磁気ヘッ
ドを停止させた時、磁気ヘッドが磁気ディスクに吸着す
ることがよく知られている。
Thin film magnetic recording media, particularly sputtered disks and plated disks, have finer surface roughness than conventional coated disks. For this reason, it is well known that when a magnetic head is stopped on a magnetic disk, the magnetic head is attracted to the magnetic disk.

これを防止するため、磁気ディスクの基板面あるいは基
板面上に設けられた下地膜面上に電磁気特性を劣下させ
ない程度に、基板の円周方向に同心円状の微細な面荒し
加工を施し、微細な凹凸を形成している。
In order to prevent this, fine concentric surface roughening is performed in the circumferential direction of the substrate on the substrate surface of the magnetic disk or on the surface of the base film provided on the substrate surface, to the extent that the electromagnetic characteristics are not degraded. It forms fine irregularities.

従来、この加工法として、研摩剤をテープに固定保持し
た研摩テープを用い、上記基板を回転させながら研摩テ
ープを基板に押し付け、研摩テープを送りながら加工す
ることが行なわれていた。
Conventionally, this processing method involves using an abrasive tape with an abrasive fixedly held on the tape, pressing the abrasive tape against the substrate while rotating the substrate, and processing the abrasive tape while feeding it.

なお、これに関連するものとしては特開昭59−117
735が挙げられる。
In addition, related to this, Japanese Patent Application Laid-Open No. 59-117
735 is mentioned.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術は″かえり″が残ることについて配慮がさ
れていなかった。すなわち上記従来技術に用いられてい
る研摩テープは第2図に示すように研摩剤が保持ベース
に任意の形状で保持されており、研摩剤が形成する凹凸
の大きさが不揃いである。この研摩テープで基板を加工
すると、研摩材が保持材により保持ベースに固定されて
いるので、均一な圧力で研摩材を加圧することになり、
各研摩材の切削力の大小にかかわらず一定の圧力が加え
られることより切味の劣下をまねき易い。
In the above-mentioned conventional technology, no consideration was given to the fact that "burrs" remain. That is, in the abrasive tape used in the above-mentioned prior art, as shown in FIG. 2, the abrasive is held on a holding base in an arbitrary shape, and the size of the unevenness formed by the abrasive is irregular. When processing a substrate with this abrasive tape, the abrasive material is fixed to the holding base by the holding material, so the abrasive material is applied with uniform pressure.
Regardless of the cutting force of each abrasive, a constant pressure is applied, which tends to deteriorate the cutting quality.

また研摩材が固定されているため切粉により目詰りを生
じ、切味の妨げとなり易い。このため、第3図に示すよ
うに、切粉の盛り上りやめくれ、いわゆるかえり6が生
じ易い。
In addition, since the abrasive is fixed, it tends to become clogged with chips, which can impede sharpness. For this reason, as shown in FIG. 3, the chips tend to bulge and bulge, so-called burrs 6.

この状態の基板上に磁性膜を形成した場合、かえりの部
分が盛り上りとして残り、突起を形成する。次に、バニ
ッシュ工程で上記突起を除去した場合、突起の大小によ
り磁性媒体に損傷を与え、電磁気特性を劣下させる。ま
た、磁気ヘッドを77上させた場合も同様であり、除去
できなかった残存突起との衝突により両者とも損傷する
。それ故、上記従来技術によって製造した薄膜磁気記録
媒体は電磁気特性、寿命について問題があった。
When a magnetic film is formed on the substrate in this state, the burrs remain as bulges and form protrusions. Next, when the protrusions are removed in a burnishing process, the size of the protrusions damages the magnetic medium and deteriorates the electromagnetic characteristics. The same thing happens when the magnetic head is raised 77, and both are damaged due to collision with the remaining protrusion that could not be removed. Therefore, the thin film magnetic recording medium manufactured by the above-mentioned conventional technique has problems with respect to electromagnetic characteristics and life span.

なお、−塵発生したかえりを仕上げ加工によって除去す
ることは、かえりが面荒し加工によって形成した溝に逃
げ込んでしまうため困雅である。
Note that it is troublesome to remove dust-generated burrs by finishing machining because the burrs escape into the grooves formed by surface roughening machining.

本発明の目的は、かえりを生じることなく、薄膜磁気記
録媒体を製造する方法を提供することにある。
An object of the present invention is to provide a method for manufacturing a thin film magnetic recording medium without causing burrs.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的は、薄膜磁気記録媒体の基板又は基板面上に設
けられた下地膜に同心円状の微細な凹凸を形成して後、
薄膜磁気記録膜を形成する薄膜磁気記録媒体の製造方法
において、上記微細な凹凸の形成は、研摩剤を弾力性を
有する保持体に付着させ、上記基板と該保持体との位置
を相対的に変化させながら、該保持体を基板面又は下地
膜面に押し付けることによって行なうことを特徴とする
薄膜磁気記録媒体の製造方法によって達成さ九る。
The above purpose is to form fine concentric irregularities on the substrate of a thin film magnetic recording medium or on the base film provided on the substrate surface, and then
In a method for manufacturing a thin film magnetic recording medium in which a thin film magnetic recording film is formed, the formation of the fine irregularities is achieved by attaching an abrasive to an elastic holder and adjusting the relative positions of the substrate and the holder. This is achieved by a method of manufacturing a thin film magnetic recording medium, which is characterized in that the holding body is pressed against the substrate surface or the underlying film surface while changing the magnetic field.

上記同心円状とは完全な同心円でなくともよく、また凹
凸の一つの溝は完全な円でなくて円の一部、すなわち円
弧であってもよいことを意味する。例えば一部が、ら旋
状であってもよい。前述の如くこの凹凸は磁気ヘッドの
磁気記録媒体への吸着を防止するためのものであるから
、同心円方向に凹凸が形成されていればよい。
The above-mentioned concentric circular shape does not have to be a perfect concentric circle, and also means that one groove of the unevenness may not be a perfect circle but a part of a circle, that is, a circular arc. For example, a portion may be spiral. As described above, since the unevenness is for preventing the magnetic head from adhering to the magnetic recording medium, it is sufficient that the unevenness is formed in the concentric direction.

研摩剤を付着する保持体は、弾力性のある保持体であれ
ばよく、例えば不織布の如きものが好ましい。不織布に
研摩剤を付着させた状態の一例を第1図に示す。研摩剤
1は不織布4に固定されることなく付着しており、切削
力に無理が生じることがなく、かつ切粉による目詰りも
生じない。保持体はテープ状とし、常に接触個所を更新
しながら使用することが好ましい。
The holder to which the abrasive is attached may be any elastic holder, and is preferably made of nonwoven fabric, for example. FIG. 1 shows an example of a state in which an abrasive is attached to a nonwoven fabric. The abrasive 1 is attached to the non-woven fabric 4 without being fixed, so that the cutting force does not become unreasonable and clogging due to chips does not occur. It is preferable that the holder is in the form of a tape and used while constantly updating the contact points.

本発明においては、さらに保持体若しくは基板又はその
両者を上記同心円の半径方向に振動させながら上記の凹
凸を形成することが好ましい。この加振により切粉によ
る目詰り等をより一層防ぐことができる。
In the present invention, it is preferable to form the above-mentioned irregularities while further vibrating the holding body, the substrate, or both in the radial direction of the above-mentioned concentric circles. This vibration can further prevent clogging caused by chips.

〔作用〕[Effect]

本発明においては、研摩剤が保持体で固定されていない
ので、研摩剤の切削力を軟らかく作用させることができ
、かえりが生じ難い。また、加振しながら加工すること
により切粉の排出をより容易にするため、さらにかえり
が生じ難い。
In the present invention, since the abrasive is not fixed by a holder, the cutting force of the abrasive can be applied softly, and burrs are less likely to occur. In addition, machining while excitation makes it easier to discharge chips, making it even more difficult for burrs to occur.

〔実施例〕〔Example〕

本発明の一実施例を第4図を用いて説明する。 An embodiment of the present invention will be described using FIG. 4.

第4図は、面荒し加工装置を示す。被加工物であるディ
スク基板5をスピンドル軸7に取り付け、所定の速度で
回転させる。研摩加工を施す保持テープ駆動ユニット8
は、送りリール9と巻取リリール10とを有する。保持
テープ14は送りリール9から巻取リリール10に所定
の速度で巻き取られる。
FIG. 4 shows a surface roughening device. A disk substrate 5, which is a workpiece, is attached to a spindle shaft 7 and rotated at a predetermined speed. Holding tape drive unit 8 for polishing
has a feed reel 9 and a take-up reel 10. The holding tape 14 is wound from the feed reel 9 onto the take-up reel 10 at a predetermined speed.

保持テープ14には研摩液タンク12から研摩液11゜
例えばダイヤモンド研摩液が一定量供給され、ノズル1
3から滴下される。研摩液を吸収し、研摩剤が付着した
保持テープ14は、板バネ15を介して加圧ガイド16
により加圧され、基板5の表面に接触する。なお、図面
右方の保持テープ14bも板バネと加圧ガイドにより基
板に接触しているが、これらの板バネと加圧ガイドはス
ピンドル軸7の奥にあるため図示されていない。
A fixed amount of polishing liquid 11°, for example, diamond polishing liquid, is supplied from the polishing liquid tank 12 to the holding tape 14, and the nozzle 1
It is dripped from 3. The holding tape 14 that has absorbed the abrasive liquid and has the abrasive agent attached thereto is moved to a pressurizing guide 16 via a leaf spring 15.
, and comes into contact with the surface of the substrate 5. Note that the holding tape 14b on the right side of the drawing is also in contact with the substrate by a leaf spring and a pressure guide, but these leaf springs and pressure guides are not shown because they are located at the back of the spindle shaft 7.

+1動ユニツト8はガイドピン20により、図において
紙面の手前から奥へ、またその逆に移動可能であり、こ
の移動によって保持テープ14を基板5の内外周に移動
させることができる。
The +1 movement unit 8 can be moved by the guide pin 20 from the front to the back of the drawing and vice versa, and by this movement, the holding tape 14 can be moved to the inner and outer peripheries of the substrate 5.

さらに超音波加振部17により、保持テープ14は、基
板の半径方向に所定の振動数で加振される。
Furthermore, the holding tape 14 is vibrated at a predetermined frequency in the radial direction of the substrate by the ultrasonic vibrator 17 .

第5図に、この装置を用いて加工した基板の、基板回転
数とかえりの大きさとの関係を示す。第5図は加振のな
い場合の結果である。砥粒径(平均粒径)にもよるが基
板回転数50Or p m以上でかえりの大きさが小ざ
くなる。なお、基板回転数の低い所、例えば100〜2
00ppmの所においてもかえりの大きさは小さいが、
基板に十分な量の凹凸を形成することができない。砥粒
径としては1〜5μrnのものを用いることが好ましい
FIG. 5 shows the relationship between the substrate rotation speed and the burr size of a substrate processed using this apparatus. Figure 5 shows the results without vibration. Although it depends on the abrasive grain size (average grain size), the size of the burrs becomes smaller when the substrate rotation speed is 50 Or p m or more. Note that the substrate rotation speed is low, for example, 100 to 2
Although the size of the burr is small even at 00 ppm,
It is not possible to form a sufficient amount of unevenness on the substrate. It is preferable to use an abrasive grain with a diameter of 1 to 5 μrn.

第6図は、加振を加えた場合の基板回転数とかえりの大
きさとの関係を示す図である。加振を加えると基板回転
数400rpm以上で使用できる。加振の周波数として
は10〜100トIzの範囲が好ましく。
FIG. 6 is a diagram showing the relationship between the number of rotations of the substrate and the size of the burr when vibration is applied. When vibration is applied, it can be used at a substrate rotation speed of 400 rpm or more. The frequency of excitation is preferably in the range of 10 to 100 to Iz.

10〜50I(zの範囲がより好ましい。10 to 50I (the range of z is more preferable).

第7図は、不織布への加圧力とかえりの大きさとの関係
を示す図である。加圧力が大になるとかえりの大きさが
犬になる。一方、加圧力が小すぎると凹凸の形成が困難
になるので0.2〜2kg/cm2の程度の加圧力が好
ましい。
FIG. 7 is a diagram showing the relationship between the pressure applied to the nonwoven fabric and the size of burrs. When the pressure increases, the burr becomes dog-sized. On the other hand, if the pressing force is too small, it will be difficult to form unevenness, so a pressing force of about 0.2 to 2 kg/cm2 is preferable.

」二記実施例で得られた面荒し載板を用い、浮上スライ
ダにピエゾ素子を塔載し浮上高さを変えながら突起物の
個数を検出結果、第8図に18として示すように浮上高
さが0.2〜0.05μmの範囲でも突起数が面当り0
個を示すものが得られることを確認した。
Using the surface roughening plate obtained in Example 2, a piezo element was mounted on the flying slider, and the number of protrusions was detected while changing the flying height. The number of protrusions per surface is 0 even when the diameter is in the range of 0.2 to 0.05 μm.
We confirmed that it is possible to obtain information that indicates the number of individuals.

又、比較として従来方法で面荒し加工を行なった基板で
は、同図に19として示すように浮上量が0.2μmで
も突起数が而当り10〜数IO個程度発生しており加工
法による差が顕著であることを確認した。又、ピエゾ素
子で接触した箇所を検出し、表面Reすると、研摩時の
パリによる突起であることが分かった。
In addition, as a comparison, in the case of a board whose surface was roughened by the conventional method, the number of protrusions was approximately 10 to several IO, as shown by 19 in the same figure, even when the flying height was 0.2 μm, and there were differences depending on the processing method. was confirmed to be significant. In addition, when the contact point was detected with a piezo element and the surface Re was performed, it was found that the protrusion was caused by paris during polishing.

又、上記と同様に下地膜を有する基板を加工した後、ス
パッタリング及びメツキ法により磁性膜、保護膜を形成
して磁気ディスクを製造し、上記ピエゾ素子塔載;・l
上スライダにより欠陥検査を行なったところ上記と同様
な結果が得られた。
Further, after processing a substrate having a base film in the same manner as above, a magnetic film and a protective film are formed by sputtering and plating methods to manufacture a magnetic disk, and the piezo element is mounted on it;
When defect inspection was performed using the upper slider, the same results as above were obtained.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、かえりを生ずることなく薄膜磁気ディ
スクを製造することができる。それ故、本発明によって
製造した磁気ディスクを用いるときは、磁気ヘッドの浮
上高さを低くすることができる。
According to the present invention, thin film magnetic disks can be manufactured without causing burrs. Therefore, when using the magnetic disk manufactured according to the present invention, the flying height of the magnetic head can be lowered.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に用いる研摩剤の付着した不織布の断面
図、第2図は従来の方法に用いる研摩テニプの断面図、
第3図は面荒し加工した基板の部分断面斜視図、第4図
は本発明を実施するための加工装置の一例の正面概略図
、第5図、第6図、第7図、第8図、は本発明を説明す
るための図である。 1・・研摩剤     2・・・研摩剤保持部3・・・
研磨剤保持ベース 4・・不織布     5・・基板 6 かえり     7 ・スピンドル軸8 保持テー
プ駆動ユニット 9・・送りリール   10・・巻取リリール11・・
・研摩液     12・・研摩液タンク13・・・ノ
ズル     14  保持テープ15・・加圧板バネ
   16・・・加圧ガイド17・超音波加振部  1
8・・・本発明19  従来例     20・・・ガ
イドピン代理人弁理士  中 村 純之助 第5図   第6図 第7図   第8図
FIG. 1 is a cross-sectional view of the nonwoven fabric to which the abrasive used in the present invention is attached, and FIG. 2 is a cross-sectional view of the abrasive tenip used in the conventional method.
FIG. 3 is a partial cross-sectional perspective view of a substrate subjected to surface roughening processing, FIG. 4 is a schematic front view of an example of a processing apparatus for carrying out the present invention, and FIGS. 5, 6, 7, and 8. , are diagrams for explaining the present invention. 1... Abrasive agent 2... Abrasive agent holding part 3...
Abrasive agent holding base 4...Nonwoven fabric 5...Substrate 6 Burr 7 - Spindle shaft 8 Holding tape drive unit 9...Feed reel 10...Take-up reel 11...
- Polishing liquid 12... Polishing liquid tank 13... Nozzle 14 Holding tape 15... Pressure plate spring 16... Pressure guide 17 - Ultrasonic vibration part 1
8... Present invention 19 Conventional example 20... Guide pin agent Junnosuke Nakamura Figure 5 Figure 6 Figure 7 Figure 8

Claims (1)

【特許請求の範囲】 1、薄膜磁気記録媒体の基板又は基板面上に設けられた
下地膜に同心円状の微細な凹凸を形成して後、薄膜磁気
記録膜を形成する薄膜磁気記録媒体の製造方法において
、上記微細な凹凸の形成は、研摩剤を弾力性を有する保
持体に付着させ、上記基板と該保持体との位置を相対的
に変化させながら、該保持体を基板面又は下地膜面に押
し付けることによって行なうことを特徴とする薄膜磁気
記録媒体の製造方法。 2、上記保持体若しくは基板又は両者を上記同心円の半
径方向に振動させながら上記凹凸の形成を行なう請求項
1記載の薄膜磁気記録媒体の製造方法。
[Claims] 1. Manufacturing of a thin film magnetic recording medium by forming fine concentric irregularities on the substrate of the thin film magnetic recording medium or on a base film provided on the substrate surface, and then forming a thin film magnetic recording film. In the method, the formation of the fine irregularities is achieved by attaching an abrasive to an elastic holder, and while relatively changing the position of the substrate and the holder, the holder is attached to the substrate surface or the base film. A method for manufacturing a thin film magnetic recording medium, characterized in that the method is carried out by pressing it against a surface. 2. The method of manufacturing a thin film magnetic recording medium according to claim 1, wherein the unevenness is formed while vibrating the holder or the substrate or both in the radial direction of the concentric circles.
JP9441588A 1988-04-19 1988-04-19 Production of thin-film magnetic recording medium Pending JPH01267834A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9441588A JPH01267834A (en) 1988-04-19 1988-04-19 Production of thin-film magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9441588A JPH01267834A (en) 1988-04-19 1988-04-19 Production of thin-film magnetic recording medium

Publications (1)

Publication Number Publication Date
JPH01267834A true JPH01267834A (en) 1989-10-25

Family

ID=14109609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9441588A Pending JPH01267834A (en) 1988-04-19 1988-04-19 Production of thin-film magnetic recording medium

Country Status (1)

Country Link
JP (1) JPH01267834A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0738186U (en) * 1992-11-16 1995-07-14 千代田株式会社 Hard disk texturing material
US7691500B2 (en) 2006-12-05 2010-04-06 Hitachi Global Storage Technologies Netherlands B.V. Perpendicular magnetic recording medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0738186U (en) * 1992-11-16 1995-07-14 千代田株式会社 Hard disk texturing material
US7691500B2 (en) 2006-12-05 2010-04-06 Hitachi Global Storage Technologies Netherlands B.V. Perpendicular magnetic recording medium

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