JPS6328425B2 - - Google Patents
Info
- Publication number
- JPS6328425B2 JPS6328425B2 JP60047100A JP4710085A JPS6328425B2 JP S6328425 B2 JPS6328425 B2 JP S6328425B2 JP 60047100 A JP60047100 A JP 60047100A JP 4710085 A JP4710085 A JP 4710085A JP S6328425 B2 JPS6328425 B2 JP S6328425B2
- Authority
- JP
- Japan
- Prior art keywords
- general formula
- reaction
- platinum
- group
- same
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000001875 compounds Chemical class 0.000 claims description 21
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 19
- -1 platinum vinyl siloxane Chemical class 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 229910052697 platinum Inorganic materials 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 7
- 229920000642 polymer Chemical group 0.000 claims description 7
- 239000003054 catalyst Substances 0.000 claims description 6
- 229920002554 vinyl polymer Polymers 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 claims description 3
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 claims description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 2
- 150000002170 ethers Chemical class 0.000 claims description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 2
- 239000007809 chemical reaction catalyst Substances 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 20
- CADCNNHHORDDSG-UHFFFAOYSA-N ethenyl(silyl)silane Chemical compound [SiH3][SiH2]C=C CADCNNHHORDDSG-UHFFFAOYSA-N 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 239000000543 intermediate Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 238000005580 one pot reaction Methods 0.000 description 2
- 238000003822 preparative gas chromatography Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 238000010517 secondary reaction Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229910008045 Si-Si Inorganic materials 0.000 description 1
- 229910006411 Si—Si Inorganic materials 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001793 charged compounds Chemical class 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000007701 flash-distillation Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 238000003797 solvolysis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Catalysts (AREA)
Description
〔産業上の利用分野〕
本発明は、種々の化合物合成の中間体として有
用な新規シラン化合物の製法に関し、ポリマー化
合物の架橋方法としても有用な方法に関する。
〔従来の技術〕
従来、ビニルジシランのSi−Si結合の開裂を伴
なう反応としては、一般式:
〔式中、Vi:ビニル基、Me:メチル基、L:リ
ガンド〕
で表わされるモノビニルジシランとジシラシクロ
ペンタンとのパラジウム触媒による不均化反応、
および次式:
で表わされるモノビニルジシランとエタノールと
の白金触媒によるソルボリシス反応が知られてい
るのみである(Advances in Organometallic
Chemistry、19(1981)213〜255)。
本発明の製法に用いられる反応はビニルジシラ
ンの開裂を伴なう反応であるが、従来の反応とは
まつたく異なる反応で、ビニルシラン化合物に対
するビニルジシランの付加を内容とするものであ
る。
〔発明の目的〕
本発明の目的は、種々の化合物合成の中間体等
として有用な新規トリシリルエタン誘導体化合物
を1段階の反応で合成できる製法を提供すること
にある。
本発明の別の目的は、化合物に官能基を導入す
る方法、ポリマーの架橋方法としても有用なビニ
ルシラン化合物に対するビニルジシランの付加方
法を提供することにある。
〔発明の構成〕
本発明は、
一般式():
〔式中、Rは、同一でも異なつてもよく、エチニ
ル基を除く一価の置換もしくは非置換の炭化水素
基、ハロゲン原子、シロキシ基、またはポリマー
残基であり;R′は同一でも異なつてもよく、低
級アルキル基である〕。
で表わされるトリシリルエタン誘導体化合物の製
法であつて、
一般式():
(R)3SiCH=CH2 …()
〔式中、Rは同一でも異なつてもよく、前記一般
式()で定義のとおりである〕
で表わされるとビニルシランと、
一般式()
CH2=CH−Si(R′)2−Si(R′)2(R) …()
〔式中、R′は同一でも異なつてもよく、Rおよ
びR′は一般式()で定義のとおりである〕
で表わされるビニルジシランとを、白金系触媒の
存在下で反応させることからなる方法を提供する
ものである。
本発明において、置換基Rが表わす1価炭化水
素基としては、例えばメチル、エチル、プロピ
ル、ブチル、ビニル、アリル等の脂肪族炭化水素
基;シクロヘキシル基、メチルシクロヘキシル
基、シクロペンチル基等の脂環式炭化水素基;フ
エニル、トリル、キリシル、ベンジル等の芳香族
炭化水素基などが挙げることができ、これらはフ
ツ素、塩素、臭素、ヨウ素のハロゲン、アルコキ
シ基、シリル基、シロキン基等により置換されて
いてもよい。Rは、さらにフツ素、塩素、臭素、
ヨウ素のハロゲン原子;トリメチルシロキシ基、
トリエチルシロキシ基等のシロキシ基;並びにオ
ルガノポリシロキサン、ポリエーテル等の各種高
分子化合物の残基であつてもよい。
また、R′としては、メチル、エチル、プロピ
ル、ブチル、ヘキシル等の低級アルキル基を挙げ
ることができる。
上記の製法に用いられる白金系触媒は特に限定
されず、例えば、塩化白金酸、アルコール変性塩
化白金酸、白金ビニルシロキサン、白金黒、塩化
白金酸とオルフインもしくはアルデヒドとの錯体
等を挙げることができ、特に塩化白金酸およびア
ルコール変性塩化白金酸、白金ビニルシロキサン
が高活性で好ましい。反応に用いられる白金系触
媒の適量は反応液全体に対し白金分で5〜50ppm
の範囲である。5ppmより少ないと反応が遅く能
率的でなく、50ppmより多くしてもそれ以上の効
果は期待できず経済的でない。
上記製法は、通常有機溶媒中で行われ、好まし
い有機溶媒としては、n−ヘキサン、n−ヘプタ
ン、n−オクタン等の脂肪族炭化水素;ベンゼ
ン、トルエン、キシレン等の芳香族炭化水素;テ
トラヒドロフラン、ジオキサン、ジブチルエーテ
ル等のエーテル類を挙げることができる。溶媒の
使用量は、特に限定されないが反応成分である一
般式()および()の化合物の濃度が5〜80
重量%であることが良好な収率が得られる点で一
般に好ましい。
反応成分である一般式()の化合物と一般式
()の化合物の使用割合(モル比、()/
())は、1〜5の範囲で適宜選択することが望
ましい。一般式()のケイ素原子にビニル基が
2以上結合している場合には、()/()の
モル比が1程度でも好収率で一般式()の化合
物が得られるが、ビニル基が1個のみである場合
には()/()のモル比を大きく選択した方
が好収率が得られる。このように、一般式()
のケイ素原子に結合するビニル基の数によつても
一般式()と一般式()の化合物の使用割合
を変えることが望ましい。
反応の適温は約50〜200℃、好ましくは80〜140
℃の範囲であり、通常2〜5時間で原料化合物が
消滅し反応は終了する。反応温度が低すぎると反
応に長時間を要する。反応温度が高すぎると反応
成分である一般式()および()の化合物が
副反応に消費されたり、生成した一般式()の
化合物が2次的反応で失われるため収率が低下す
る。前記の適温範囲において、反応が完了する必
要にして十分な範囲において反応時間は可能な限
り短かくすることが望ましい。
長時間の反応は、生成した一般式()の化合
物が2次的な反応により失われ、収率が低下する
原因となる。
なお、反応は窒素、アルゴン等の乾燥した不活
性雰囲気下で実施することが望ましい。
上記の反応により得られる反応混合物から、生
成した一般式()の化合物が比較的低分子量の
ものである場合には、蒸留または分取ガスクロマ
トグラフイーにより分離することができる。
〔実施例〕
以下、実施例により本発明をより詳細に説明す
るが本発明の範囲をこれら実施例に限定するもの
ではない。特記しない限り部は重量部を意味す
る。
実施例 1
窒素ガスで置換した反応器の中に下記の式(ii)で
表わされるビニルシランまたはビニルシロキサン
と、下記の式(iii)で表わされるビニルジシランと
を、第1表に示す割合で仕込み、溶媒としてトル
エンを式(ii)の化合物1モル当り1000gの量で用い
た。また、触媒として白金ビニルシロキサンを反
応混合物中20ppm(白金分)の濃度で仕込んだ。
各実験における式(ii)および式(iii)の置換基R1、R2、
R3およびR4も第1表に示す。110℃の温度で2時
間反応させた。得られた反応混合物を真空下フラ
ツシユ蒸留して生成物を分離した後、分取ガスク
ロマトグラフイーにより精製した。得られた生成
化合物を、NMRスペクトル分析、GC/MASS
分析および元素分析に供した。分析結果より、下
記式(i)の化合物が生成していることがわかつた。
(ii) R1R2R3SiCH=CH2
H2C=CHSiMe2SiMe2R4
(i)
分析結果は次のとおりであつた。
(1) NMRスペクトル:第1表に示すとおり。
(2) 元素分析:各実験とも、H、C、Siについて
の分析値は理論値の誤差内に入る値であつた。
(3) GC/MASS分析:各実験とも、分子イオン
のピークが観測できた。
[Industrial Field of Application] The present invention relates to a method for producing a novel silane compound useful as an intermediate in the synthesis of various compounds, and also to a method useful as a method for crosslinking polymer compounds. [Prior Art] Conventionally, the reaction involving the cleavage of the Si-Si bond in vinyldisilane has the general formula: [In the formula, Vi: vinyl group, Me: methyl group, L: ligand] Palladium-catalyzed disproportionation reaction between monovinyldisilane and disilacyclopentane,
and the following formula: The only known platinum-catalyzed solvolysis reaction between monovinyldisilane and ethanol (Advances in Organometallic
Chemistry, 19 (1981) 213-255). The reaction used in the production method of the present invention is a reaction that involves the cleavage of vinyldisilane, but it is a reaction that is completely different from conventional reactions, and involves the addition of vinyldisilane to a vinylsilane compound. [Object of the Invention] An object of the present invention is to provide a manufacturing method capable of synthesizing a novel trisilylethane derivative compound useful as an intermediate for the synthesis of various compounds in a one-step reaction. Another object of the present invention is to provide a method for adding vinyldisilane to a vinylsilane compound, which is useful as a method for introducing a functional group into a compound and a method for crosslinking a polymer. [Structure of the Invention] The present invention is based on the general formula (): [Wherein, R may be the same or different and is a monovalent substituted or unsubstituted hydrocarbon group other than an ethynyl group, a halogen atom, a siloxy group, or a polymer residue; R′ may be the same or different It is also a lower alkyl group]. A method for producing a trisilylethane derivative compound represented by the general formula (): (R) 3 SiCH=CH 2 ... () [wherein R may be the same or different and defined in the general formula () above] [In the formula, R' may be the same or different. and R and R' are as defined in the general formula ()] in the presence of a platinum-based catalyst. In the present invention, the monovalent hydrocarbon group represented by the substituent R includes, for example, aliphatic hydrocarbon groups such as methyl, ethyl, propyl, butyl, vinyl, and allyl; alicyclic groups such as cyclohexyl group, methylcyclohexyl group, and cyclopentyl group; Formula hydrocarbon group: Aromatic hydrocarbon groups such as phenyl, tolyl, xylicyl, benzyl, etc. can be mentioned, and these can be substituted with halogens such as fluorine, chlorine, bromine, and iodine, alkoxy groups, silyl groups, siloquine groups, etc. may have been done. R further represents fluorine, chlorine, bromine,
Halogen atom of iodine; trimethylsiloxy group,
It may be a siloxy group such as a triethylsiloxy group; or a residue of various polymer compounds such as organopolysiloxane or polyether. Furthermore, examples of R' include lower alkyl groups such as methyl, ethyl, propyl, butyl, and hexyl. The platinum-based catalyst used in the above production method is not particularly limited, and examples thereof include chloroplatinic acid, alcohol-modified chloroplatinic acid, platinum vinyl siloxane, platinum black, and a complex of chloroplatinic acid and olefin or aldehyde. In particular, chloroplatinic acid, alcohol-modified chloroplatinic acid, and platinum vinyl siloxane are highly active and preferred. The appropriate amount of platinum-based catalyst used in the reaction is 5 to 50 ppm of platinum based on the entire reaction solution.
is within the range of If it is less than 5 ppm, the reaction is slow and inefficient, and if it is more than 50 ppm, no further effect can be expected and it is not economical. The above production method is usually carried out in an organic solvent, and preferred organic solvents include aliphatic hydrocarbons such as n-hexane, n-heptane, and n-octane; aromatic hydrocarbons such as benzene, toluene, and xylene; tetrahydrofuran, Ethers such as dioxane and dibutyl ether can be mentioned. The amount of solvent used is not particularly limited, but the concentration of the compounds of general formulas () and () as reaction components is 5 to 80%.
% by weight is generally preferred since a good yield can be obtained. The usage ratio (mole ratio, ()/
()) is desirably selected from a range of 1 to 5. When two or more vinyl groups are bonded to the silicon atom of the general formula (), the compound of the general formula () can be obtained in good yield even if the molar ratio of ()/() is about 1, but the vinyl group When there is only one, a higher yield can be obtained by selecting a larger molar ratio of ()/(). In this way, the general formula ()
It is desirable to vary the proportions of the compounds of general formula () and general formula () depending on the number of vinyl groups bonded to the silicon atom. The appropriate temperature for the reaction is about 50-200℃, preferably 80-140℃.
℃ range, and the raw material compound usually disappears in 2 to 5 hours and the reaction is completed. If the reaction temperature is too low, the reaction will take a long time. If the reaction temperature is too high, the reaction components, compounds of general formulas () and (), are consumed in side reactions, or the generated compounds of general formula () are lost in secondary reactions, resulting in a decrease in yield. It is desirable that the reaction time be as short as possible within the above-mentioned appropriate temperature range and within a necessary and sufficient range for the reaction to be completed. A prolonged reaction causes the generated compound of general formula () to be lost through secondary reactions, resulting in a decrease in yield. Note that the reaction is preferably carried out under a dry inert atmosphere such as nitrogen or argon. If the generated compound of general formula () has a relatively low molecular weight, it can be separated from the reaction mixture obtained by the above reaction by distillation or preparative gas chromatography. [Examples] Hereinafter, the present invention will be explained in more detail with reference to Examples, but the scope of the present invention is not limited to these Examples. Parts mean parts by weight unless otherwise specified. Example 1 In a reactor purged with nitrogen gas, vinylsilane or vinylsiloxane represented by the following formula (ii) and vinyldisilane represented by the following formula (iii) were charged in the ratio shown in Table 1. , toluene was used as a solvent in an amount of 1000 g per mole of compound of formula (ii). Additionally, platinum vinyl siloxane was added as a catalyst to the reaction mixture at a concentration of 20 ppm (platinum content).
Substituents R 1 , R 2 of formula (ii) and formula (iii) in each experiment,
R 3 and R 4 are also shown in Table 1. The reaction was carried out at a temperature of 110°C for 2 hours. The resulting reaction mixture was subjected to flash distillation under vacuum to separate the product, which was then purified by preparative gas chromatography. The obtained product compound was subjected to NMR spectrum analysis, GC/MASS
It was subjected to analysis and elemental analysis. The analysis results revealed that a compound of the following formula (i) was produced. (ii) R 1 R 2 R 3 SiCH=CH 2 H 2 C=CHSiMe 2 SiMe 2 R 4 (i) The analysis results were as follows. (1) NMR spectrum: As shown in Table 1. (2) Elemental analysis: In each experiment, the analytical values for H, C, and Si were within the error of the theoretical values. (3) GC/MASS analysis: In each experiment, molecular ion peaks could be observed.
【表】【table】
本発明の製法によるとビニルシラン化合物にビ
ニル基、ハロゲン原子、アルコキシ基等の官能基
を一段階の反応で容易に導入することができ、得
られる本発明の新規化合物は種々の化合物合成の
中間体として有用である。また、この製法はポリ
マーへの官能基の導入方法として、ポリマー同士
の架橋方法としても利用することができる。
According to the production method of the present invention, functional groups such as vinyl groups, halogen atoms, alkoxy groups, etc. can be easily introduced into vinylsilane compounds in one step reaction, and the resulting new compounds of the present invention can be used as intermediates for the synthesis of various compounds. It is useful as This production method can also be used as a method for introducing functional groups into polymers and as a method for crosslinking polymers.
Claims (1)
ル基を除く一価の置換もしくは非置換の炭化水素
基、ハロゲン原子、シロキシ基、またはポリマー
残基であり;R′は同一でも異なつてもよく、低
級アルキル基である。] で表わされるトリシリルエタン誘導体化合物の製
法であつて、 一般式(): (R)3SiCH=CH2 …() [式中、Rは同一でも異なつてもよく、前記一般
式()で定義のとおりである] で表わされるビニルシランと、 一般式(): CH2=CH−Si(R′)2−Si(R′)2(R) …() [式中、R′は同一でも異なつてもよく、Rおよ
びR′は一般式()で定義のとおりである] で表わされるビニルジシランとを、白金系触媒の
存在下で反応させることからなる方法。 2 特許請求の範囲第1項記載の方法であつて、
反応触媒として、脂肪族炭化水素、芳香族炭化水
素およびエーテル類から選ばれる少なくとも1つ
の有機溶媒が用いられる方法。 3 特許請求の範囲第1項記載の方法であつて、
白金系触媒が塩化白金酸、アルコール変性塩化白
金酸および白金ビニルシロキサンから選ばれたも
のである方法。[Claims] 1 General formula (): [Wherein, R may be the same or different and is a monovalent substituted or unsubstituted hydrocarbon group other than an ethynyl group, a halogen atom, a siloxy group, or a polymer residue; R' may be the same or different It is also a lower alkyl group. ] A method for producing a trisilylethane derivative compound represented by the general formula (): (R) 3 SiCH=CH 2 ...() [wherein R may be the same or different, and in the general formula () Vinylsilane represented by the general formula (): CH 2 =CH−Si(R′) 2 −Si(R′) 2 (R) …() [In the formula, even if R′ is the same, and R and R' are as defined in the general formula ()] in the presence of a platinum-based catalyst. 2. The method according to claim 1, comprising:
A method in which at least one organic solvent selected from aliphatic hydrocarbons, aromatic hydrocarbons, and ethers is used as a reaction catalyst. 3. The method according to claim 1, comprising:
A method in which the platinum-based catalyst is selected from chloroplatinic acid, alcohol-modified chloroplatinic acid, and platinum vinyl siloxane.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60047100A JPS61207391A (en) | 1985-03-09 | 1985-03-09 | Production of trisilylethane derivative compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60047100A JPS61207391A (en) | 1985-03-09 | 1985-03-09 | Production of trisilylethane derivative compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61207391A JPS61207391A (en) | 1986-09-13 |
JPS6328425B2 true JPS6328425B2 (en) | 1988-06-08 |
Family
ID=12765756
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60047100A Granted JPS61207391A (en) | 1985-03-09 | 1985-03-09 | Production of trisilylethane derivative compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61207391A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0378430B1 (en) * | 1989-01-13 | 1995-02-01 | Director-General Of The Agency Of Industrial Science And Technology | Novel organosilicon compound and process for producing organosilicon compound |
JP6994037B2 (en) * | 2016-09-22 | 2022-01-14 | ダウ シリコーンズ コーポレーション | SiH-free vinyl disilane |
-
1985
- 1985-03-09 JP JP60047100A patent/JPS61207391A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61207391A (en) | 1986-09-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6265518B1 (en) | Organosilicon endcapper having one silicon-bonded hydrogen atom | |
JP5115729B2 (en) | Organosilicon compound containing acetoacetate group protected with trialkylsilyl group and process for producing the same | |
EP1013656A2 (en) | A cyclic organosilicon endcapper having one siliconbonded hydrogen atom | |
EP1149837B1 (en) | Organosilicon compounds | |
US3654332A (en) | Organofunctional-silicon materials | |
JPS6328425B2 (en) | ||
JPH0448797B2 (en) | ||
EP0586241B1 (en) | Azasilacycloalkyl functional alkoxysilanes and azasilacycloalkyl functional tetramethyldisiloxanes | |
JP3291081B2 (en) | Method for preparing cyclic organohydrosiloxane | |
JP4344936B2 (en) | Method for producing organosilicon compound containing amino groups at both ends | |
JP3915883B2 (en) | Organosilicon compound | |
EP0378430A1 (en) | Novel organosilicon compound and process for producing organosilicon compound | |
EP0195997B1 (en) | Chlorosilane compounds | |
EP1668018B9 (en) | Preparation of a halosilylated chain hydrocarbon | |
JP3137439B2 (en) | 1-aza-2-silacyclobutane compound and method for producing the same | |
KR20000052521A (en) | A cyclic organosilicon endcapper having one aliphatic unsaturation | |
JPH082911B2 (en) | 1,3-Bis (p-hydroxybenzyl) -1,1,3,3-tetramethyldisiloxane and method for producing the same | |
JPH03150382A (en) | Preparation of organosilicone compound | |
JPH05202068A (en) | Method for silylformylation of alkyne, and product obtained therewith | |
JP4276805B2 (en) | Novel silazane compound and method for producing the same, and novel silazane compound polymer and method for producing the same | |
JPS61207390A (en) | Method of causing redistribution reaction of 2-vinyltetraalkyldisilanyl group-containing compound | |
JPS6358835B2 (en) | ||
KR101631132B1 (en) | New (triorganosilyl)alkynes and their derivatives and a new catalytic method for obtaining new and conventional substituted (triorganosilyl)alkynes and their derivatives | |
JP7153337B2 (en) | Spirosiloxane compound, ordered polysiloxane having a spirosiloxane structure in its main chain, and method for producing the same | |
JPH06107671A (en) | Organosilicon compound and its production |