JPS63279254A - Developing device - Google Patents
Developing deviceInfo
- Publication number
- JPS63279254A JPS63279254A JP11420587A JP11420587A JPS63279254A JP S63279254 A JPS63279254 A JP S63279254A JP 11420587 A JP11420587 A JP 11420587A JP 11420587 A JP11420587 A JP 11420587A JP S63279254 A JPS63279254 A JP S63279254A
- Authority
- JP
- Japan
- Prior art keywords
- master
- master disk
- development
- discharge port
- porous body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011148 porous material Substances 0.000 abstract description 7
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 11
- 239000007788 liquid Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000009826 distribution Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000009987 spinning Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Landscapes
- Photographic Processing Devices Using Wet Methods (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ビデオディスク、オーディオディスク、ある
いは、データファイル等の信号記録ガラスマスターの作
成のための、フォトレジストの現像装置の機構に関する
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the mechanism of a photoresist developing device for the production of signal recording glass masters of video discs, audio discs or data files, etc.
一般に、ディスク状原盤はガラス盤などであり、まずフ
ォトレジストがその上に塗布され、その後に記録すべき
信号に変調されたレーザービームを記録レンズで微小な
スポットに絞り込んでN光することによって記録が行な
われる。その原盤を現像することによってポジ釡のフォ
トレジストの場合であれば、レーザービームに露光され
た部分が融解し幾何額的なパターンの信号が得られるの
である。また上記の様なレーザーによる記録以外に電子
ビームによる記録された原盤にも適用される。またマス
クを介して紫外線を露光される半導体用のウェハーの現
像にも適用できる。Generally, the disk-shaped master is a glass disk or the like, and photoresist is first coated on it, and then a laser beam modulated to the signal to be recorded is focused into a minute spot with a recording lens and recorded by N beams. will be carried out. By developing the master, in the case of a positive photoresist, the portions exposed to the laser beam melt and a signal with a geometric pattern is obtained. In addition to laser recording as described above, this method is also applicable to master discs recorded using electron beams. It can also be applied to the development of semiconductor wafers that are exposed to ultraviolet light through a mask.
前記の様な原盤の現像処理としてスピニング法が現在よ
く用いられ・ている、スピニング法の従来の現像装置は
第4図に示すような構造である。これは、ターン・テー
ブル1上に固定された原盤2を回転させながら、その上
にノズル3から現像4を吐出して原盤回転による遠心力
によって現像液をほぼ均一に流布、現像を行う方法であ
る。The spinning method is currently often used as a developing treatment for master discs as described above, and a conventional developing apparatus for the spinning method has a structure as shown in FIG. This is a method in which a master disc 2 fixed on a turntable 1 is rotated, and a developer 4 is discharged from a nozzle 3 onto the master disc, and the developer is distributed almost uniformly by the centrifugal force caused by the rotation of the master disc, resulting in development. be.
しかし、前述の従来の技術では、第1に、現像液が上方
から一点で流出するため液を全面均一に流布することが
難しい、あるいは、原盤上に流布した現像液中に、ノズ
ルから吐出する際あるいは原盤と衝突した際発生した気
泡によって液の不均一な部分が発生する。などの原因に
より、局部的に現像が不十分な部分すなわち現像ムラが
発生した。However, with the above-mentioned conventional technology, firstly, the developer flows out from above at one point, making it difficult to spread the solution uniformly over the entire surface, or the developer is discharged from a nozzle into the developer that has flowed onto the master. Non-uniform areas of liquid occur due to bubbles generated during collision or collision with the master. Due to these reasons, locally insufficient development occurred, that is, uneven development occurred.
第2に、液の滴下位置の膜減りが大きく、膜厚のムラの
原因となった。Second, the film was significantly thinned at the position where the liquid was dropped, causing uneven film thickness.
などの問題点を有した。There were problems such as:
そこで本発明はこのような問題点を解決するもので、そ
の目的とするところは、現像工程における現像ムラと膜
厚ムラを撲滅し、現像工程の歩留を向上させて、更には
、高品質の製品を得ることにある。The present invention is intended to solve these problems, and its purpose is to eliminate uneven development and film thickness in the developing process, improve the yield of the developing process, and achieve high quality. The goal is to get the best product.
本発明の現像装置は、現像装置と、この櫂の中で原盤を
載置して回転させるターンテーブルを備えた現像装置に
おいて、現像の際に現像液の吐出口を被覆した多孔質体
を、原盤の上方に配置したことを特徴とする。The developing device of the present invention is equipped with a developing device and a turntable in which a master is placed and rotated in the paddle. It is characterized by being placed above the master.
第1図は本発明の実施例における現像装置の断面図であ
る。第1図で、原盤2は、ターン・テーブル1の上面に
固定され低速で回転している。この原盤の上方に、第2
図に示すように、表面に微細な穴を多数有する現像液の
吐出口5が、原盤の現像必要径と同一あるいは大きい径
で、原盤の面と平行な面を有する多孔質体すで被覆した
形で配置しである。多孔質体の径は、本実施例以外に第
3図に示すように原盤の半径とほぼ同一の径でも同等な
効果を有する。原盤と多孔質体との間隔は、現像液の吐
出口か・らの流出圧力によって異なり、圧力が高いとき
は広く、逆に、低いときには狭くとる。現像の際には、
この多孔質体は回転させる場合と回転させない場合の両
ケースがあり、一般には原盤が回転しているときは回転
させず、原盤が固定されているときには回転させる。こ
の多孔質体の具体的物質としては、焼結金属材料、アル
ミニウムのアルマイト処理体、あるいは、ポリビニール
ホルマール(PVF)などの高分子材料が考えられる。FIG. 1 is a sectional view of a developing device in an embodiment of the present invention. In FIG. 1, a master disc 2 is fixed to the upper surface of a turntable 1 and rotates at a low speed. Above this master, a second
As shown in the figure, the developer outlet 5, which has many fine holes on its surface, is covered with a porous material having a diameter that is the same as or larger than the diameter required for development of the master, and whose surface is parallel to the surface of the master. It is arranged in a shape. In addition to this embodiment, the diameter of the porous body may be approximately the same as the radius of the master as shown in FIG. 3, with the same effect. The distance between the master and the porous body varies depending on the pressure of the developer flowing out from the discharge port; it is wide when the pressure is high, and narrow when the pressure is low. When developing,
This porous body can be rotated or not rotated; generally, it is not rotated when the master is rotating, and it is rotated when the master is fixed. Specific materials for this porous body include sintered metal materials, alumite-treated aluminum, or polymeric materials such as polyvinyl formal (PVF).
このような構造、構成で現像を行なうと、吐出口から流
出した現像液、第1図の矢印の方向に移動し、多孔質体
の微細な穴を通過して、原盤との平行面から流出して原
盤の全面に均一に流布し現像処理を行う、また、現像液
の供給配管系から発生する気泡は、多孔質体を通過する
際に微細な穴によって分散され極微細な大きさの気泡と
なる。When developing with this structure and configuration, the developer flowing out from the discharge port moves in the direction of the arrow in Figure 1, passes through the fine holes in the porous material, and flows out from the plane parallel to the master. In addition, the air bubbles generated from the developer supply piping system are dispersed by minute holes as they pass through the porous material, and are dispersed evenly over the entire surface of the master disc to perform the development process. becomes.
更には、多孔質体を通過した現像液は、微細で高密度分
布をしているため、原盤に衝突した際に気泡が発生しな
いし、たまたま発生しても次から次に流布する微細な現
像液で破壊され、長時間に渡って原盤上に存在すること
がない。Furthermore, since the developer that has passed through the porous material has a fine and highly dense distribution, no bubbles are generated when it collides with the master, and even if bubbles are generated by chance, the developing solution is dispersed one after another. It is destroyed by liquid and does not remain on the master for a long time.
本発明の現像装置では、現像の際に現像液の吐出口を被
覆した多孔質体を、原盤の上方に配置したことにより、
多孔質体を通過した現像液が、原盤全面に均一に流布し
、現像処理をするため、不均一に流布する現像ムラや膜
厚ムラが発生しない、また、原盤上に流布した現像液中
に気泡が存在しないため、気泡による現像ムラも発生し
ない。In the developing device of the present invention, the porous body that covers the developer discharge port during development is placed above the master disk.
The developer that has passed through the porous material is distributed uniformly over the entire surface of the master for development processing, so uneven development or film thickness unevenness due to uneven distribution does not occur. Since there are no air bubbles, uneven development due to air bubbles does not occur.
以上のような理由により、現像ムラや膜厚ムラのない高
品質の原盤を、高歩留で作製することができる。また、
本発明は現像処理工程の中で、原盤を均一にぬらす目的
のプリウェット工程、及び、原像処理の終了後の純水に
よるリンス工程の、プリウェット液や純水の流布の際に
も適用できる。For the reasons described above, a high-quality master disk without uneven development or uneven film thickness can be produced at a high yield. Also,
The present invention can also be applied to the pre-wet process for uniformly wetting the master disc during the development process, and the rinsing process with pure water after the original image process, during which the pre-wet solution and pure water are distributed. can.
第1図は本発明の一実施例における現像装置の断面図、
第2図は同装置の現像液吐出口のA部拡大断面図、第3
図は本発明の他の実施例いおける現像装置の断面図、−
第4図は従来の現像装置の断面図。
l・・・・・・ターン・テーブル
2・・・・・・原盤
3・・・・・・ノズル
4・・・・・・現像液
5・・・・・・現像液の吐出口
6・・・・・・多孔質体
以上
出願人 セイコーエプソン株式会社
第斗図FIG. 1 is a sectional view of a developing device in an embodiment of the present invention;
Figure 2 is an enlarged cross-sectional view of section A of the developer discharge port of the same device;
The figure is a sectional view of a developing device according to another embodiment of the present invention.
FIG. 4 is a sectional view of a conventional developing device. l...Turn table 2...Master disc 3...Nozzle 4...Developer solution 5...Developer discharge port 6... ...Porous bodies and above Applicant: Seiko Epson Co., Ltd.
Claims (1)
ーン・テーブルを備えた現像装置において、現像の際に
、現像液の吐出口を被覆した多孔質体を原盤の上方に配
置したことを特徴とする現像装置。In a developing device equipped with a developing tank and a turntable for placing and rotating a master disc in the tank, a porous body covering the developer discharge port is placed above the master disc during development. A developing device characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11420587A JPS63279254A (en) | 1987-05-11 | 1987-05-11 | Developing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11420587A JPS63279254A (en) | 1987-05-11 | 1987-05-11 | Developing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63279254A true JPS63279254A (en) | 1988-11-16 |
Family
ID=14631841
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11420587A Pending JPS63279254A (en) | 1987-05-11 | 1987-05-11 | Developing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63279254A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0291645A (en) * | 1988-09-28 | 1990-03-30 | Konica Corp | Method and machine for processing photographic sensitive material |
WO2000016910A1 (en) * | 1998-09-21 | 2000-03-30 | Robi-Systemtechnik Ag | Device for coating disk-like substrates |
-
1987
- 1987-05-11 JP JP11420587A patent/JPS63279254A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0291645A (en) * | 1988-09-28 | 1990-03-30 | Konica Corp | Method and machine for processing photographic sensitive material |
WO2000016910A1 (en) * | 1998-09-21 | 2000-03-30 | Robi-Systemtechnik Ag | Device for coating disk-like substrates |
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