JPS6327537A - 低温プラズマ処理装置における給電構造 - Google Patents
低温プラズマ処理装置における給電構造Info
- Publication number
- JPS6327537A JPS6327537A JP16943386A JP16943386A JPS6327537A JP S6327537 A JPS6327537 A JP S6327537A JP 16943386 A JP16943386 A JP 16943386A JP 16943386 A JP16943386 A JP 16943386A JP S6327537 A JPS6327537 A JP S6327537A
- Authority
- JP
- Japan
- Prior art keywords
- shield wire
- low
- temperature plasma
- wire connector
- shield
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009832 plasma treatment Methods 0.000 title 1
- 238000001816 cooling Methods 0.000 claims abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 13
- 239000004020 conductor Substances 0.000 abstract description 7
- 238000009413 insulation Methods 0.000 abstract description 6
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 239000011347 resin Substances 0.000 abstract description 4
- 229920005989 resin Polymers 0.000 abstract description 4
- 239000004809 Teflon Substances 0.000 abstract description 2
- 229920006362 Teflon® Polymers 0.000 abstract description 2
- 239000000498 cooling water Substances 0.000 abstract 4
- 230000004927 fusion Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 description 7
- -1 polyethylene Polymers 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Treatment Of Fiber Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16943386A JPS6327537A (ja) | 1986-07-18 | 1986-07-18 | 低温プラズマ処理装置における給電構造 |
US07/071,889 US4829189A (en) | 1986-07-18 | 1987-07-10 | Apparatus for low-temperature plasma treatment of sheet material |
DE19873723865 DE3723865A1 (de) | 1986-07-18 | 1987-07-18 | Reaktor fuer eine plasmabehandlung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16943386A JPS6327537A (ja) | 1986-07-18 | 1986-07-18 | 低温プラズマ処理装置における給電構造 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6327537A true JPS6327537A (ja) | 1988-02-05 |
JPH0560494B2 JPH0560494B2 (enrdf_load_stackoverflow) | 1993-09-02 |
Family
ID=15886505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16943386A Granted JPS6327537A (ja) | 1986-07-18 | 1986-07-18 | 低温プラズマ処理装置における給電構造 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6327537A (enrdf_load_stackoverflow) |
-
1986
- 1986-07-18 JP JP16943386A patent/JPS6327537A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0560494B2 (enrdf_load_stackoverflow) | 1993-09-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103718653B (zh) | 放射线产生装置和放射线成像装置 | |
CN105580128B (zh) | 具有射频施加器的可旋转的基板支撑件 | |
JP2002339070A (ja) | Cvd反応室を洗浄する高周波プラズマ装置 | |
US9343269B2 (en) | Plasma processing apparatus | |
GB2516903A (en) | Electrode for a system for heating biological tissue via RF energy | |
JP2001347566A (ja) | 熱収縮チューブ及び熱収縮シート及びそれらの収縮方法 | |
JPS6327537A (ja) | 低温プラズマ処理装置における給電構造 | |
TWI301039B (enrdf_load_stackoverflow) | ||
CA2958400C (en) | Microwave wire mesh oven | |
CN111867225B (zh) | 一种基于等离子体的电场分离装置 | |
CN212013083U (zh) | 一种石墨烯工业电热膜 | |
EA024404B1 (ru) | Электрод для плазменной обработки диэлектрическим барьерным разрядом | |
CN209759571U (zh) | 蒸发源加热电导入装置及真空蒸发镀膜设备 | |
JPH10241893A (ja) | マイクロ波プラズマ発生装置 | |
KR20210109482A (ko) | 냉각부를 구비한 플라즈마 발생 장치 및 이를 이용한 피부 처리 장치 | |
CN113099599A (zh) | 一种滑动弧放电反应装置及杀菌方法 | |
JP3269904B2 (ja) | 進行波管用電源装置 | |
JP2502632B2 (ja) | 低温プラズマ処理装置 | |
CN212278492U (zh) | 一种石墨烯理疗柔性发热膜 | |
CN113318560B (zh) | 一种臭氧处理装置 | |
CN219778139U (zh) | 一种用于半导体设备的板状温度控制装置 | |
US6291937B1 (en) | High frequency coupler, and plasma processing apparatus and method | |
JP2641886B2 (ja) | オゾン発生装置 | |
JP2568253B2 (ja) | 高周波誘導結合プラズマ質量分析装置 | |
EP4394842A1 (en) | Inductive coupling antenna unit and plasma treatment apparatus |