JPS63269531A - Charged particle beam device - Google Patents

Abstract

PURPOSE:To enhance a processing speed by a method wherein, when a pattern data is supplied to a charged particle beam generation source, it is transferred via more than two data storage means so that the waiting time of the data at the charged beam generation source is eliminated. CONSTITUTION:If the information designed by a controller CAD is sent out to a one- chip pattern generator PG, the generator PG divides the drawing information on one chip into the drawing information for an upper half and that for a lower half and sends these two pieces of information to individual 1/2 chip memories MU, ML alternately. Because the memories MU, ML are used alternately in this manner, it is possible to substantially eliminate a loss of the time during a data transfer from the generator PG. While each EB source is defelected by its X-direction deflecting electrodes X1, X2 in an X-direction and executes a drawing operation in the X-direction within a range to be covered by a deflection on the basis of the drawing information for the upper half from the memories MU, ML, a wafer WF and a head MB are continuously shifted relatively in a Y-direction. By this setup, all picture elements in the Y-direction in a 1/2 region are drawn. If the drawing operation is repeated while the wafer WF and the head MB are intermittently shifted relatively in the X-direction in the same manner, one chip row in the Y-direction can be drawn.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a charged beam device, and in particular to a device that emits an electron beam from a thin substrate to directly draw an actual device pattern on a square or the like. The present invention relates to a preferred charged beam device.

[Prior Art] As an electron generation source in a charged beam device, one that utilizes thermionic emission from a hot cathode has conventionally been used. Electron emission using such a hot cathode has the disadvantages that there is a large energy loss due to heating, that it is necessary to form a heating means, that it takes a considerable amount of time for preheating, and that the system is easily destabilized by heat. There was a problem with that.

Therefore, research into electron-emitting devices that do not rely on heating is progressing, and several types of devices have been proposed.

For example, a type in which a reverse bias voltage is applied to a PN junction to cause an electron avalanche breakdown phenomenon and emit electrons to the outside of the device (Japanese Unexamined Patent Publication No. 111272/1983, U.S. Patent No. 425
9678) or has a metal-insulator layer-metal layer structure, and by applying a voltage between the two metals, the electrons pass through the insulator layer due to the tunnel effect and are transferred from the metal layer to the device. There are CMI type (CMI M type) that emit electrons to the outside, and surface conduction type that emit electrons from the surface of the thin film to the outside of the element by applying a voltage to a high-resistance thin film in a direction perpendicular to the film thickness direction. Field-effect type (FE type) devices that apply a voltage to a metal shape that tends to cause electric field concentration to locally generate a high-density electric field and emit electrons from the metal to the outside of the element, and other devices. is proposed.

As an application example of these electron-emitting devices, an electron-emitting device is constructed by arranging a plurality of electron-emitting sources, and by controlling the ON-FF of electron emission from each electron-emitting source, electrons are emitted in a desired pattern. It is conceivable to perform surface processing or surface alteration by colliding the medium with the surface of the workpiece, for example, and exposing it to an electron beam. A conceivable example of such an electron-emitting device is one in which a large number of electron-emitting elements are densely arranged. According to such an electron-emitting device, the surface of the workpiece can be exposed to electron beam in a two-dimensional pattern by simply placing the workpieces facing each other and controlling each electron-emitting element on and off. .

[Problems to be Solved by the Invention] However, at present, it is difficult to mass-produce such an electron-emitting device in which a large number of electron-emitting sources are densely arranged with a high yield. In addition, there are problems such as heat generation and interference between adjacent electron beams.

Furthermore, in the above-mentioned conventional example, an improvement in accuracy could not be expected because the device became larger or more complex, and the individual parts were separated.

On the other hand, for example, in electron beam lithography of semiconductor wafers, etc., there is a demand for an electron beam device that can more efficiently and accurately perform beam irradiation, etc. in order to cope with the increasing integration of circuits.

Based on this viewpoint, an object of the present invention is to further improve processing speed in a charged beam device by eliminating data waiting time at a charged beam generation source.

[Means and operations for solving the problem] In order to achieve the above object, the present invention provides a charged beam device that irradiates a sensitive medium with a charged beam based on data of a pattern in which the sensitive medium is to be irradiated with a charged beam. When data is supplied to the charged beam source, the data is transferred alternately through two or more data storage means.

Therefore, by transferring other data to the other data storage means while data is being transferred from one data storage means to the charged electric beam generation source, data is continuously supplied to the charged electric beam generation source. be able to.

[Example] The present invention will be explained below with reference to the drawings.

FIG. 1 is a schematic diagram showing the configuration of a charged beam device according to an embodiment of the present invention applied to exposure of a semiconductor wafer. In the figure, WF is a wafer made of a semiconductor such as silicon or gallium, and is coated with a resist that is sensitive to (exposure to) an electron beam. CPI to CPn indicate a plurality of exposure areas, which are cut out into one chip after completion of drawing. M1 to M8 are marks for pre-alignment or fine alignment provided on the sea urchin AWF. MB is a head for generating an electron beam (hereinafter referred to as EB), and is mounted on and attracted to the stage MS. The alignment marks M1 to M8 are drawn by the EB of this head during the first drawing process. The stage MS is a piezoelectric element Px such as a piezo.

py and pθ allow movement in the x, y, and θ (rotation) directions, respectively. Each element Px, Py.

Pθ is used for alignment with the wafer WF. Head M
EB generation sources ESO to E S 15 are provided at B.

EB sources ESO and E S 15 are for positioning only, and E
The B generation sources ESI to E S 14 are used exclusively for exposure or for alignment. Here, the exposure EB generation source ES
Two of I to E S 14 are allocated for drawing each chip row in the X direction of the wafer WF.

That is, for example, the upper half region CPIU of the chip (exposure region) CPI is drawn by the EB generation source ESI, and the lower half region CPIL is drawn by the EB generation source ES2. Similarly, the upper half of each of the exposure areas CP2 to CP5 is connected to the EB generation source ES.
According to I, the lower half is drawn by the EB generation source ES2. , each EB generation source ESO-ES15 has EB deflection electrodes Xi, X2 . Y1. Y2 is prepared. Further, sensors S1 to S59, etc. are provided. These sensors may be photosensitive or electronically sensitive.

KB is a keyboard, DP is a display, and CAD is a controller. When a circuit pattern of one chip is designed by these and the information is sent to the one-chip pattern generator PG, the pattern generator PG divides the drawing information of one chip into the drawing information of the upper half and the lower half. Send to memory MU, ML. Each memory MU
.

ML sends this drawing information to EB source E, which is in charge of the upper half of the chip.
SI, ES3. ES5 to ES13 and EB source ES2 in charge of the lower half. ES4. It is sent to each of ES6 to ES14 at the same time. However, the memory MU and ML are each 2
By using them alternately, data transfer time loss from the pattern generator PG is substantially eliminated.

Based on the writing information from the memories MU and ML, each EB source is deflected in the X direction by its X direction deflection electrodes Xi and X2, thereby performing writing in the X direction within the range that can be covered by the deflection, while drawing on the wafer WF and the head. 'M B is continuously moved relatively in the Y direction to draw all pixels in the Y direction of the tail area. However, since the movement in the Y direction is continuous, a shift in the Y direction occurs when drawing in the X direction for each pixel in the Y direction, so the deflection electrode Yl in the Y direction
, Y2 to correct this. Then, one chip row in the Y direction is drawn by repeating this drawing while moving the wafer WF and the head MB relatively in the X direction intermittently eight times.

In this way, each EB source substantially simultaneously targets one chip column in the Y direction of the wafer WF, for example CF2°CPI3. C.P.
2O, CF27. Since CF34 is drawn, high-speed drawing is possible.

The deflection electrodes Xi, X2. Yl and Y2 are commonly used for initial alignment of the EB (7) axis and alignment with the wafer or chip. For example, alignment mark M4 of chip CP1. The position of M5 is determined by sensor S4. S5 reads, and based on the read information, X of each of the EB source ESI and ES2.
, Y deflection electrode Xi, X2. The EB irradiation position is corrected by correction driving of Yl and Y2. This chip alignment mark may be shared by chips CP6 and CPI3, such as mark M6, for example.

On the other hand, as a pre-alignment mark, mark M1.
M2. M7. M8 etc. are provided.

Then, for example, the position of the mark M1 is read by a sensor S1, and the position of the mark M2 is read by a sensor (not shown), and based on this, the initial positioning of the head MB is performed by the piezoelectric elements Px, Py, and Pθ. Then, in this state, the amount of deviation is measured using the chip alignment mark M3, sensor S3, etc., and based on the measurement result, the deflection electrode
i.

X2. Drawing is performed with the position corrected by Yl and Y2. Also, pause and mark during drawing.

M7. Realignment may be performed using M8.

Although various mark detection methods are possible in these cases, for example, a well-known reflection or secondary electron detection method can be used. That is, for example, the position of the mark M7 can be known by emitting EB from the EB source ESO toward the mark M7 and detecting its reflection or secondary electrons by the sensor S7. As the sensor 7, for example, a semiconductor PN junction is used.

However, in the case of mark detection using such EB, E
The intensity and irradiation time of B need to be set to values that do not interfere with mark reading.

Furthermore, when detecting multiple marks at once, it is preferable to perform EB heat irradiation on each mark at different timings and detect them at different timings.
B thermal irradiation can be easily differentiated and detected by a single signal processing means.

Furthermore, when a photosensitive element such as a COD is used as a sensor, it is obvious that a light source may be provided instead of the EB source.

FIG. 2(a) is a partial bottom view showing an example of the EB emission head MB, and shows one EB emission source. Figure 2 (
b) and FIG. 2(C) are a BB sectional view and a CC sectional view, respectively.

In FIG. 2, GL is an insulating substrate, and the substrate is made of, for example, glass, ceramics, crystal, or the like. The substrate GL
On the bottom surface of the B-
A large number of them are arranged in one row in the B direction. This EB emission source consists of a high resistance thin film R3 attached to the lower surface of the substrate GL and an electrode D.
i, D2. The high resistance thin film RS is, for example, pt,
^U%MO1C, metal thin film such as Pd, SnO,, In2
It is formed by applying high temperature current to a thin film of a metal oxide such as O3 or TiO to cause the film to break. The high resistance thin film RS
The thickness is, for example, about 100 to 10,000, and the resistance is, for example, about several Ω to several hundred MΩ. As shown in the figure, electrodes DI and D2 are connected to both ends of the high-resistance thin 1iiRs in the CC direction. The electrode is made of, for example, Pt,
This is a general thin film electrode made of metal such as Au or Ag.

An insulating layer I is formed on the lower surface of the substrate GL so as to cover the electrodes DI and D2, except for the lower part of the high-resistance thin layer 11iRs.
s is formed. The insulating layer is, for example, 5in2, Si
It consists of N, Si, N, , AIN%BN, etc. On the lower surface of the insulating layer Is, a high resistance thin film R3 is formed between B-B and C-C.
a pair of deflection electrodes X1-X2 and Yl parallel to each direction;
-Y2 is placed. The deflection electrode is also the electrode D1.
Made of the same material as D2.

39, SIO is the aforementioned optical sensor or electronic sensor. These sensors may be further provided one pair in the Y direction, or may be provided in an annular shape. When the EB generation source and the sensor are integrally formed in this manner, the positional relationship between the sensor and the EB generation source is fixed, thereby improving detection accuracy. When using an optical sensor, it is preferable that an alignment light source LP is also built into the head MB, as shown in FIG. 2(C).

When using a solid state device such as a light emitting diode as the light source LP, semiconductor manufacturing technology, thick film
They can be molded simultaneously using thin film manufacturing technology.

Further, when an ultraviolet or even far ultraviolet light source is used as the light source LP, it can also be used for stimulating the resist WR on the wafer WF. If this is done before the EB exposure, a thin, hard-to-dissolve layer will be formed on the surface of the resist WR, which is
B It becomes even more difficult to dissolve due to the dew point. According to this, the ratio of the film thickness to the drawn line width can be increased, which improves sensitivity or resolution (aspect ratio), which is preferable. As a resist, for example, the product name r RD
200ON J (manufactured by Hitachi Chemical) can be used. Moreover, if the light source LP is built into the head MB, preliminary exposure can be performed during relative movement with the wafer WF, which has the advantage that the entire apparatus can be made smaller.

Furthermore, the thin film RS (electron emitting part) may be irradiated with this far ultraviolet light source LP during exposure. This is preferable because the number of emitted electrons increases. Further, when the light source LP is a visible light source, the same effect can be obtained if the thin film R3 is made of a so-called light shade rod material. As photocathode materials, for example, alkali metals, Bi, Sb
A material that exhibits semiconducting properties as a composite material with silver-cesium material,
Various antimony-cesium materials, bismuth-cesium materials, and multi-alkali materials can be used.

In addition, as an EB source, there are also
A material made of a semiconductor disclosed in Publication No. 1272 (USP No. 4259678) may also be used. Alternatively, the thin film RS may be irradiated with the light source LP only when drawing a thick line width.

Figure 3 shows multiple EB generation sources ESI and ES2 as one unit of E
FIG. 3 is a partial cross-sectional view showing an example of an EB emission head set as a B generation source. According to this example, a large amount of electrons can be emitted even when driven at a low voltage, which is preferable.

Also here, if light irradiation is added as before, the efficiency will be even better. Also, the thin line indicates a single EB source, and the thick line indicates multiple EB sources.
By drawing with the B source, the drawing speed can be improved.

Further, a focusing lens FC, a deflection electrode AD, etc. may be attached. Furthermore, if the member to which the lens FC and the electrode AD are attached has a multi-chamber structure and the degree of vacuum is gradually lowered, EB exposure in the atmosphere becomes possible. That is, as shown in the figure, members Vl, V2. Forming multiple chambers with V3 etc., 1st.

The degree of vacuum may be lowered in the order of 2nd and 3rd. In this way, the vacuum chuck V can be used for suctioning the wafer WF.
C can also be used. Also, at this time, the sensor Sl
1 and S12 may be attached to the lower surface of the member vl or the like.

FIG. 4 is a partial sectional view showing yet another example of an EB emission head. In the same figure, BG is the EB emission source as explained above, but as mentioned above, when the electron beam EB is irradiated from here toward the wafer mark WM, secondary electrons and reflected electrons 2E are generated from the wafer WF. do. and,
A sensor, for example P/
Wafer mark WM is detected by receiving at N junction PN. However, here, in order to detect electrons efficiently, annular electrodes C1 and C2 are attached to the substrate MB side. Further, a voltage Vex is applied between the electrode C1 and the EB generation source BG, a voltage Vd is applied to the electrode C2, and an EB generation source B
A voltage Vc is connected between G and wafer WF as shown.

Therefore, for example, Vex=10 to 100 V.

By applying Vc=1 to 10 KV and Vd=100 V, respectively, the secondary electrons and reflected electrons 2E can be efficiently collected at the P/N junction part PN and transferred.

FIG. 5 is a schematic diagram showing a modification of the device shown in FIG. 1.

In the figure, the head MBI has four EBs per chip.
Sources ESI to ES4 were made to correspond to each other. Each E
The B source is equipped with X and Y deflection electrodes similar to the apparatus of FIG. In this case, for all chips, each 4
Since the two divided areas can be drawn simultaneously by the X and Y deflection electrodes using the same principle as in the case of FIG. 1, the drawing speed is further improved. Further, the head MHI is provided with an alignment mark MM, and the alignment between this mark and the wafer alignment mark WMR is performed by light irradiation.

After this alignment, drawing is first performed on all the chips in the Y-direction chip row located below the head MBI at this time. Then, the other chip rows are also intermittent (
Repeat the same positioning and drawing step by step).

However, since the wafer WF is usually circular, the wafer alignment mark WMR may not be provided for all the Y-direction chip rows. At this time, alignment may be performed for only one row at the center of the wafer, and then exposure may be performed without feedback. Or first wafer WF
After alignment using the mark WMR in the center of
Exposure is advanced in the right direction, and when the right half is completed, it is reversed to the left, and the mark WMR is used again, or alignment is performed again using the alignment mark WML in the unexposed area, and then the exposure is performed in the left direction. It's okay.

In order to show still another alignment exposure method, a head MB2 is shown in FIG.

In this case, the head MB2 is initially located at the left end portion of the wafer WF, and first, the mark SM provided on the wafer stage is detected by the sensor s1 to perform pre-alignment. Next, in this state, mark Ml, M2 and sensor S
2. In S3, the total deviation is measured. Then, during exposure, the exposure is performed while correcting the amount of deviation using both or either of the X and Y deflection electrodes. In the next column, the amount of deviation is measured using the mark M3 in the same manner as before, and exposure is performed based on the result. Further, the displacement amount measurement and exposure are performed in the same manner in the next column, but before that, re-prealignment may be performed using the mark WML.

In addition, the amount of deviation of the head positioned in that row is measured using mark M4, and after exposing the area covered by each EB source ES and electrodes Xi and X2 at that position, the head or square is continuously moved. Exposure is performed while moving the chip, and when the chip row is completed, mark the head or wafer with mark M.
It is also possible to stop at position 5 and perform the same operation as before. This can be said to be an intermediate type between the so-called step-and-repeat and step-and-scan exposure methods.

FIG. 6 shows another modification of the device of FIG.

FIG. 5A shows an example in which a plurality of heads MBI and MB2 are provided, and each head is responsible for the right half and left half of the wafer WF. According to this, the throughput can be further improved.

FIG. 2B shows an example in which small-diameter wafers WFI and WF2 are exposed with a single head MB, and the throughput can also be improved.

The figure (C) is suitable for cases where it is difficult to manufacture a long head or for large diameter wafers WF of 8 inches or more.
Short head MHI, MB2. This is an example in which MB3s are arranged in the Y direction. At this time, since each end usually requires an alignment mark detection part, a strength reinforcement part, etc. as described above, it is preferable to arrange them in a staggered manner as shown in the figure.

In the same figure (d), multiple EB sources are provided in a single head MB,
In addition, the caliber of the emitted EB is made different. In other words, the EB sources ESI and ES2 are large diameter, EB@t
Es3. ES4 is medium diameter, EB source ES5 to ES8...
is a small diameter EB source, and usually first EB@ES5~ES
8... is used to expose the medium and large line width portions for the time being, and then the medium and large line width portions are exposed using an EB source ES4.8. Expose using ES2 or the like. At this time, the head or wafer is moved 8 times so that the corresponding line width portion of each chip can be exposed.

FIG. 7 is a schematic diagram showing still another modification. This E
The B emission head detects the wafer mark based on the magnitude of the current absorbed by the wafer WF, rather than using a sensor provided on the head side.

In the figure, WF is a wafer containing a semiconductor. GL
is a single substrate provided with respective generation sources BGI to BG7 of a plurality of electron beams EBI to EB7.
The substrates made of glass, semiconductor, etc. described in the above publication can be used. BS is a selection drive circuit for the electron beam generation sources BGI to BG7, CC is an overall control section, and AS is an electron beam absorption current detection circuit for detecting alignment marks WMI to WM7 on the wafer WF. Also, if necessary, a second
and an electron lens, a deflection electrode, or a blanking electrode (not shown) as explained using FIG.

In this configuration, the alignment mark on the wafer WF is now marked by the solid line WM2. At the position of WM6, the actual circuit element pattern is inside it. Therefore, in this case, first,
Electron beam EB3. for drawing actual circuit element patterns. E
B4. EB5 is an electron beam EB2. for alignment mark detection. EB6 is selected by selection circuit BS. Next, electron beam EB2. Emits EBB and wafer WF
By detecting the magnitude of the current by a well-known method, mark WM2. Detects the position of WM6.

However, as mentioned above, the electron beams EB2 and EB6 are
They are emitted and detected at different timings so that they can be distinguished.

Based on this, the wafer WF is aligned, and then the electron beam EB3. EB4. By EB5, a circuit pattern is exposed as shown in FIG. 1 or FIG.

On the other hand, when the alignment mark is the broken line WM3°WM5, the electron beam EB3. EB5 is used, electron beam EB4 and/or EBI, EB2
．． EB6. EB7 is used for exposure. Also, the broken line WM
1. When WM7 is an alignment mark, it is an electron beam EBI.

EB7 is used for alignment, and electron beams EB2 to EB6 are used for exposure.

[Scope of Application of the Invention] The present invention is applicable not only to exposure (drawing) of a semiconductor circuit pattern using an electron beam as explained in the above embodiments, but also to data writing to a recording medium using a charged beam sensitive medium. , it can be applied to reading such data in combination with a charged particle sensor.

Specifically, it can be used for writing and reading purposes, for example, in recording and tracking of magneto-optical recording media such as optical disks and optical cards, or microfilm.

Further, it can be used as an electron beam probe tester for testing semiconductor functions by selecting an electron beam generation source depending on the chip size and measurement point. At this time, it is sufficient to prohibit the output of all electron beam sources other than the measurement electron beam source.

In addition, when the present invention is used for a plurality of applications, it is easy to make the output energy different for each application or even for each electron beam source, and this is suitable for use in the previous embodiment.

[Effect of the invention] As explained above, the present invention has the following effects.

(1) Exposure, etc. can be performed using a plurality of charged beam sources, so processing is quick.

(2) By appropriately arranging a plurality of charged beam generation sources, problems of heat generation and interference between beams can be avoided. Furthermore, since heat generation can be minimized, the durability of the device is excellent.

(3) Since a plurality of electron sources etc. can be integrally molded on a single substrate, it is possible to realize miniaturization and high precision of the device.

(4) Processing speed can be further improved by transferring drawing (irradiation) pattern data to each charged beam generation source without interruption by alternately using a plurality of buffers.

(5) Processing speed can be further improved by arranging a plurality of single substrates having a plurality of charged beam generation sources in parallel.

(6) By arranging a plurality of single substrates having a plurality of charged beam generation sources in series, it is possible to further improve the processing speed for large media.

(7) By irradiating the sensitive medium with ultraviolet rays or the like in advance, the aspect ratio of drawn or written information can be increased.

(8) When emitting an electron beam, by irradiating the electron beam emitting part of the electron beam source with ultraviolet rays, etc.
The efficiency of electron beam generation can be increased. Moreover, the beam intensity can also be adjusted by this.

(9) By configuring one charged beam generation source with a plurality of charged beam emission parts, a large amount of electrons can be emitted even when driven at a low voltage. Furthermore, the beam intensity can be easily adjusted, and for example, the drawing speed can be improved by making it compatible with drawing thin lines and thick lines.

By providing a vacuum barrier at the (lO) charged beam source, the device can be placed in the atmosphere and thus a vacuum chuck can be used, for example, for media adsorption. Further, problems caused by contamination can be avoided by providing a sensor or the like in the high vacuum section.

(11) By providing a plurality of types of charged beam generating sources with different sizes of emitted beams, each charged beam generating source can be selectively used depending on the required beam size.

(12) By providing each charged beam generation source with a deflection means, a wide range can be irradiated with the charged beam even in a stationary state, and fine adjustment of the beam direction can be performed accurately and easily.

(13) By detecting alignment marks and the like using charged beams emitted in a time-series manner, alignment can be achieved without interference between charged beams, and detection beams can be easily distinguished.

(14) By providing a means for detecting the charged beam or the secondary or reflected electrons of the charged beam, alignment can be performed without providing a special light source and its detection means, making the device more compact and simple. can be converted into

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram showing the configuration of a charged beam device according to an embodiment of the present invention applied to semiconductor wafer exposure, and FIG. 2 shows a specific example of a head that can be used in the device shown in FIG. The figure (a) is a bottom view, and the figure (b) is a partial view.
BB sectional view of a), the same figure (C) is CC of the same figure (a)
3 and 4 are partial sectional views showing other examples of heads that can be used in the device shown in FIG. 1; FIG. 5 is a schematic view showing a modified example of the device shown in FIG. 1; This figure is a schematic diagram showing another modification of the device shown in FIG. 1, and FIG. 7 is a schematic diagram showing still another modification of the device shown in FIG. MB, MBI, MB2. MB3: Electron beam emission head, ES, ESONES15: Electron beam generation source, WF
, WFI, WF2: wafer, Ml to M8. W.M., W.M.
MI NWM7. WMR: Alignment mark, S1~
S12: Sensor, Xi, X2. Yl, Y2. AD: Deflection electrode, CP 1 to CP34. CPn: exposure area corresponding to one chip, MS: stage, Px, Py. PG: piezoelectric element, CPIU: upper half region, CPIL: lower half region, PG: 1 chip pattern generator, MU
, ML: memory, GL: substrate, R5: high resistance thin film, Di
, D2: electrode, ■S: insulating layer, LP: light source, wR resist, FC: focusing lens, 'PN: P/N
Junction, EB, EBI to EB7: Electron beam, CC: Control section, As: Detection circuit.

Claims (1)

[Scope of Claims] 1. A data source that supplies pattern data to a medium sensitive to a charged electric beam, a charged beam generation source that irradiates the medium with a charged electric beam based on data from the data source, and from the data source 1. A charged beam device comprising two or more data storage means for temporarily storing data and alternately transmitting the data to the charged beam generating source. 2. The charging device according to claim 1, further comprising deflection means for changing the irradiation direction of the charged beam from each of the charged beam generation sources, the deflection means being controlled based on data supplied by the data source. Beam device. 3. The charged beam device according to claim 1, further comprising position control means for controlling the relative positional relationship between the charged beam generation source and the medium. 4. A charged beam device according to claim 1, further comprising a detection means for detecting a charged beam from said charged beam generation source. 5. The charged beam device according to claim 1, wherein a plurality of said charged beam generation sources are arranged on a single substrate.