JPS63260021A - Projection aligner - Google Patents
Projection alignerInfo
- Publication number
- JPS63260021A JPS63260021A JP62092094A JP9209487A JPS63260021A JP S63260021 A JPS63260021 A JP S63260021A JP 62092094 A JP62092094 A JP 62092094A JP 9209487 A JP9209487 A JP 9209487A JP S63260021 A JPS63260021 A JP S63260021A
- Authority
- JP
- Japan
- Prior art keywords
- vibration
- laser
- exposure apparatus
- light shielding
- main body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 48
- 230000010355 oscillation Effects 0.000 abstract description 24
- 230000005540 biological transmission Effects 0.000 abstract description 2
- 230000000694 effects Effects 0.000 description 10
- 230000002411 adverse Effects 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明はマスク上の回路パターンを基板上に焼き付ける
投影露光装置に関し、特にレーザ光を露光光として用い
た投影露光装置のレーザ光源と露光装置本体との光学的
接続部の改良に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a projection exposure apparatus that prints a circuit pattern on a mask onto a substrate, and particularly relates to a laser light source and an exposure apparatus for a projection exposure apparatus that uses laser light as exposure light. This invention relates to improvement of the optical connection part with the main body.
［従来の技術］
近年、レーザを露光光源として用いた露光装置が注目さ
れてきている。[Prior Art] In recent years, exposure apparatuses that use a laser as an exposure light source have been attracting attention.
レーザ光を用いた露光装置においては、レーザを発振す
る光源が非常に大きいことと、レーザ電源部において冷
却用ファン等の振動が発生することや、レーザ発振の際
に光源において振動が発生することから、露光装置本体
とレーザ光源とを切り離して設置している場合がほとん
どである。更に、レーザ発振時の振動が床面を介して露
光装置本体に伝わらないように、露光装置本体を防振台
上に設置してこの振動に対処しているものもある。In exposure equipment that uses laser light, the light source that oscillates the laser is extremely large, vibrations occur in the cooling fan, etc. in the laser power supply, and vibrations occur in the light source during laser oscillation. Therefore, in most cases, the exposure apparatus main body and the laser light source are installed separately. Furthermore, in order to prevent the vibrations generated during laser oscillation from being transmitted to the exposure apparatus main body through the floor surface, some apparatuses install the exposure apparatus main body on a vibration isolating table to cope with this vibration.
しかし、このようなレーザを露光光光源として用いた露
光装置においては、仮にレーザ光源と露光装置本体の光
学的接続部からレーザ光が漏れると、周辺に配置された
機器等に悪影響を及ぼすおそれがあり、一層の安全性の
向上が要望されている。However, in an exposure apparatus that uses such a laser as an exposure light source, if the laser light leaks from the optical connection between the laser light source and the exposure apparatus main body, there is a risk that it will have an adverse effect on equipment etc. located in the surrounding area. There is a need for further improvement in safety.
これに対し、レーザ光源と露光装置本体との光学的接続
部の光路の周囲を遮光部材で包囲して、その接続部分か
らレーザ光の漏れを防ぐ等の処置方法が考えられる。To deal with this, a possible solution is to surround the optical path of the optical connection between the laser light source and the exposure apparatus main body with a light shielding member to prevent the laser light from leaking from the connection.
［発明が解決しようとする問題点］
しかし、上記のようにレーザ光源と露光装置本体とを分
離して設置した装置においては、光学的接続部を遮光部
材で包囲する方法をとりた場合に、光学的接続部に設け
られた遮光部材を介してレーザ光源において発生する振
動が露光装置本体に伝わってしまい、その結果露光装置
における投影等の種々のプロセスの精度が低下するとい
う問題点がある。[Problems to be Solved by the Invention] However, in an apparatus in which the laser light source and the exposure apparatus main body are installed separately as described above, when a method of surrounding the optical connection part with a light shielding member is adopted, There is a problem in that vibrations generated in the laser light source are transmitted to the exposure apparatus main body via the light shielding member provided at the optical connection part, and as a result, the accuracy of various processes such as projection in the exposure apparatus is reduced.
本発明は、かかる点に鑑みてなされたものであり、レー
ザ光による周辺機器への悪影響の除去及び安全性の向上
が図れるとともに、レーザ発振等に伴う振動を良好に除
去できる投影露光装置を得ることを目的とするものであ
る。The present invention has been made in view of the above points, and provides a projection exposure apparatus that can eliminate the adverse effects of laser light on peripheral equipment and improve safety, and can also satisfactorily eliminate vibrations associated with laser oscillation, etc. The purpose is to
［問題点を解決するための手段］
本発明にかかる投影露光装置は、レーザ光源と露光装置
本体との光学的接続部の光路の周囲に防振遮光手段を設
けたことを技術的要点としたものである。[Means for Solving the Problems] The technical point of the projection exposure apparatus according to the present invention is that an anti-vibration light shielding means is provided around the optical path of the optical connection between the laser light source and the exposure apparatus main body. It is something.
［作用］
本発明においては、レーザ光源と露光装置本体との光学
的接続部の光路の周囲に防振遮光手段を設けているため
、レーザ光の完全な遮光を行なえるとともに、レーザ光
源で発生する振動をこの防振遮光手段において吸収遮断
でき、振動が露光装置本体に伝わるという不都合が生じ
ないこととなる。[Function] In the present invention, since the anti-vibration light shielding means is provided around the optical path of the optical connection between the laser light source and the main body of the exposure apparatus, it is possible to completely shield the laser light and also prevent the vibration generated by the laser light source. This vibration-proofing and light-shielding means can absorb and block the vibrations caused by the exposure, and the inconvenience of the vibrations being transmitted to the main body of the exposure apparatus does not occur.
［実施例］ 以下、本発明の実施例を図面を参照しながら説明する。[Example] Embodiments of the present invention will be described below with reference to the drawings.
第１図は、本発明の一実施例であり、全体的な構成が示
されている。FIG. 1 shows one embodiment of the present invention, and shows the overall configuration.
図において、１０は床面上に設置された基台であり、該
基台１０の上にレーザ光源１２が載置されている。In the figure, reference numeral 10 denotes a base set on the floor, and a laser light source 12 is placed on the base 10.
レーザ光源１２から放射出力されたレーザ光ＬＡは、ミ
ラー１４で反射され、フライアイ・レンズ（はえの目レ
ンズ）１６に入射して照明むらが除去されるようになっ
ている。Laser light LA emitted from the laser light source 12 is reflected by a mirror 14 and enters a fly's eye lens 16 to remove uneven illumination.
フライアイ・レンズ１６を透過した光は、レーザ発振部
１８と露光装置本体部２０との光学的接続部２２を通過
して、露光装置本体部２０側に向かうように構成されて
いる。The light transmitted through the fly's eye lens 16 is configured to pass through an optical connection section 22 between the laser oscillation section 18 and the exposure apparatus main body section 20, and head toward the exposure apparatus main body section 20 side.
光学的接続部２２は、ここから漏れるレーザを遮光する
とともに、レーザ発振部１８、特にレーザ光源１２にお
いて発生ずる振動を吸収し、該振動がレーザ光の遮光部
材（図示せず）を介して露光装置本体部２０側に伝わら
ないような構成となっている。光学的接続部２２の構造
については後述する。なお、光学的接続部２２の近傍の
光路は、図示されない遮光部材で包囲されている。The optical connection part 22 blocks the laser beam leaking therefrom, and also absorbs vibrations generated in the laser oscillation part 18, especially the laser light source 12, and the vibrations are exposed to light through a laser light shielding member (not shown). The configuration is such that the signal is not transmitted to the device main body 20 side. The structure of the optical connection section 22 will be described later. Note that the optical path near the optical connection portion 22 is surrounded by a light shielding member (not shown).
次に、光学的接続部２２を通過した光は、レンズ２４及
びレンズ２６を透過し、ミラー２８で反射されて、メイ
ンコンデンサレンズ３０に入射するようになっている。Next, the light that has passed through the optical connection section 22 is transmitted through a lens 24 and a lens 26, is reflected by a mirror 28, and enters a main condenser lens 30.
メインコンデンサレンズ３０を透過した光は、ここで照
度が一定となるように調整されて、レチクル３２を照明
することとなる。更に、レチクル３２を透過した光は、
投影レンズ３４を介してウェハ３６上にレチクル３２上
の回路パターンを投影するようになっている。The light transmitted through the main condenser lens 30 is adjusted here so that the illuminance is constant, and illuminates the reticle 32. Furthermore, the light transmitted through the reticle 32 is
The circuit pattern on the reticle 32 is projected onto the wafer 36 through the projection lens 34.
ウェハ３６は、防振台３８上に載置されたＸＹステージ
４０上に真空チャック（図示せず）によってチャッキン
グされている。なお、露光装置本体部２０内の装置は全
て防振台３８の上に設置されているものとする。The wafer 36 is chucked onto an XY stage 40 placed on a vibration isolating table 38 by a vacuum chuck (not shown). It is assumed that all the devices in the exposure apparatus main body section 20 are installed on the vibration isolation table 38.
次に、本実施例の特徴である光学的接続部２２の構造に
ついて、第２図及び第３図を参照しながら説明する。Next, the structure of the optical connection section 22, which is a feature of this embodiment, will be explained with reference to FIGS. 2 and 3.
第２図には、光学的接続部２２の第１の態様が示されて
いる。A first embodiment of the optical connection 22 is shown in FIG.
図において、５０は第１図には示されていないレーザ光
路の遮光部材（の断面）であり、レーザ発振部１８と露
光装置本体部２０との光学的接続部２２の内部には、振
動を吸収できるように、蛇腹状の蛇腹接続部５２が遮光
部材５０と一体に形成されている。蛇腹接続部５２は、
微妙な振動をも吸収できる程度の硬度であるとともに、
レーザを完全に遮光できる材質によって成形されている
。In the figure, reference numeral 50 denotes (a cross-section of) a light shielding member for the laser optical path, which is not shown in FIG. A bellows-shaped bellows connecting portion 52 is formed integrally with the light shielding member 50 so as to absorb light. The bellows connection part 52 is
It is hard enough to absorb even the slightest vibrations, and
It is made of a material that can completely block laser light.
また、右側の遮光部材５０がレーザ発振部１８側のもの
であり、左側の遮光部材５０が露光装置本体部２０側の
ものである。Further, the light shielding member 50 on the right side is on the laser oscillation section 18 side, and the light shielding member 50 on the left side is on the exposure apparatus main body section 20 side.
第２図中、（Ａ）はレーザ発振前の基準位置を示したも
のであり、（Ｂ）はレーザ発振等に伴う振動により基準
位置からずれた時のものか示されている。In FIG. 2, (A) shows the reference position before laser oscillation, and (B) shows the state when the reference position is deviated from the reference position due to vibrations accompanying laser oscillation.
次に、上記第１の態様による実施例の動作及び作用につ
いて、第１図及び第２図を参照しながら説明する。Next, the operation and effect of the embodiment according to the first aspect will be explained with reference to FIGS. 1 and 2.
レーザ光源１２から放射出力されたレーザ光は、ミラー
１４で反射されて、フライアイ・レンズ１６を透過し、
レーザ発振部１８と露光装置本体部２０との光学的接続
部２２人入射る。The laser light emitted from the laser light source 12 is reflected by the mirror 14 and transmitted through the fly's eye lens 16.
22 people enter the optical connection section between the laser oscillation section 18 and the exposure apparatus main body section 20.
光学的接続部２２には、レーザ光とともに、レーザ発振
に伴いレーザ光源１２において発生した振動が伝わる。Vibration generated in the laser light source 12 due to laser oscillation is transmitted to the optical connection portion 22 along with the laser light.
この時、レーザ発振前の光学的接続部２２の状態は、第
２図（Ａ）のような基準の状態となっているが、光学的
接続部２２に上記のように振動が伝わると、第２図（Ｂ
）のように、レーザ発振部１８側の右側の遮光部材５０
がずれを生しることとなる。At this time, the state of the optical connection part 22 before laser oscillation is the standard state as shown in FIG. 2(A), but when the vibration is transmitted to the optical connection part 22 as described above, Figure 2 (B
), the right light shielding member 50 on the laser oscillation unit 18 side
This will cause a discrepancy.
このような場合に、（Ｂ）に示すように、蛇腹接続部５
２によって振動を吸収して、左側の遮光部材５０のずれ
を防ぎ、更に露光装置本体部２０側へ振動が伝わること
を防ぐ。In such a case, as shown in (B), the bellows connection part 5
2 absorbs vibrations, prevents the left light shielding member 50 from shifting, and further prevents vibrations from being transmitted to the exposure apparatus main body 20 side.
次に、光学的接続部２２を通過した光は、レンズ２４．
レンズ２６．ミラー２８及びメインコンデンサレンズ３
０の各光学素子の各作用によって、レクル３２を照明す
る。更に、投影レンズ３４を介し、レチクル３２上の回
路パターンをウェハ３６に投影露光する。Next, the light passing through the optical connection 22 is transmitted through the lens 24 .
Lens 26. Mirror 28 and main condenser lens 3
The rectangle 32 is illuminated by each action of each optical element. Further, the circuit pattern on the reticle 32 is projected and exposed onto the wafer 36 through the projection lens 34 .
このように、光学的接続部２２に蛇腹接続部５２を用い
ているため、露光装置本体部２０側（左側）に振動か伝
わることを防止できるという効果がある。In this way, since the bellows connection part 52 is used as the optical connection part 22, there is an effect that vibrations can be prevented from being transmitted to the exposure apparatus main body part 20 side (left side).
第３図には、光学的接続部２２の第２の態様が示されて
いる。A second embodiment of the optical connection 22 is shown in FIG.
図において、レーザ発振部１８と露光装置本体部２０と
の光学的接続部２２は、筒状の第１遮光部材５４と、該
第１４光部材よりも径の小さな筒状の第２遮光部材５６
とから構成されており、第１４光部材５４と第２遮光部
材５６とは分離された状態で所定の空間的余裕をもった
二重筒状に形成されている。In the figure, the optical connection section 22 between the laser oscillation section 18 and the exposure apparatus main body section 20 includes a cylindrical first light shielding member 54 and a cylindrical second light shielding member 56 having a smaller diameter than the fourteenth optical member.
The fourteenth light member 54 and the second light shielding member 56 are separated and formed into a double cylinder shape with a predetermined space.
この第１遮光部材と第２遮光部材との空間的余裕は、レ
ーザ発振等による振動の変位に基いて、両遮光部材が振
動により接触しない程度に設定されている。The spatial margin between the first light shielding member and the second light shielding member is set to such an extent that the two light shielding members do not come into contact with each other due to vibrations based on vibrational displacement due to laser oscillation or the like.
なお、第２図と同様に、図中（Ａ）はレーザ発振前の基
準位置、（Ｂ）はレーザ発振等に伴う振動により基準位
置からずれた時のものが示されている。Note that, similarly to FIG. 2, (A) in the figure shows the reference position before laser oscillation, and (B) shows the state when the reference position is shifted from the reference position due to vibration accompanying laser oscillation.
次に、上記第２の実施態様による実施例の動作及び作用
について、第３図を参照しながら説明する。Next, the operation and effects of the second embodiment will be explained with reference to FIG. 3.
上述した上記第１の実施態様と同様に、レーザ光源１２
から放射出力されると、光学的接続部２２には、レーザ
光が入射するとともに、レーザ光源１２において発生し
た振動が伝わる。Similar to the first embodiment described above, the laser light source 12
When the laser beam is emitted from the laser beam source 12, the laser beam enters the optical connection portion 22, and vibrations generated in the laser light source 12 are transmitted to the optical connection portion 22.
この時、レーザ発振前の光学的接続部２２の状態は、第
３図（Ａ）のような基準の状態となっているが、光学的
接続部２２に上記のように振動が伝わると、第３図（Ｂ
）のように、レーザ発振部１８側の第１遮光部材５４が
ずれを生じることとなる。At this time, the state of the optical connection part 22 before laser oscillation is the standard state as shown in FIG. 3(A), but when the vibration is transmitted to the optical connection part 22 as described above, Figure 3 (B
), the first light shielding member 54 on the laser oscillation unit 18 side will be displaced.
このような場合に、レーザ発振部１８側の第１遮光部材
５４と露光装置本体部側の第２′ａ光部材５６とは、上
述したように分離された状態で空間的余裕をもって設置
されているため、（Ｂ）に示すように第１遮光部材５４
がずれを生じても第２４光部材５６に接触することはな
く、露光装百本体部２０側へ振動が伝わることを完全に
防止できる。In such a case, the first light shielding member 54 on the side of the laser oscillation section 18 and the second'a light member 56 on the side of the main body of the exposure apparatus are installed in a separated state with sufficient space as described above. Therefore, as shown in (B), the first light shielding member 54
Even if the second optical member 56 is displaced, it will not come into contact with the twenty-fourth optical member 56, and vibrations can be completely prevented from being transmitted to the exposure device main body 20 side.
次に、光学的接続部２２を通過した光は、更に上記第１
の実施態様と同様な構成及び同様な作用によって、投影
露光を行なう。Next, the light that has passed through the optical connection section 22 is further
Projection exposure is performed using the same configuration and the same operation as in the embodiment.
このように、光学的接続部２２を第１遮光部材５４との
第２遮光部材５６とによって、二重筒状に分熱して形成
しているため、露光装置本体部２０側（左側）に振動か
伝わることを防げるという効果がある。In this way, since the optical connection part 22 is formed by dividing heat into a double cylinder shape by the first light shielding member 54 and the second light shielding member 56, vibrations are generated on the exposure apparatus main body 20 side (left side). This has the effect of preventing information from being transmitted.
なお、本発明は上記実施例に限定されるものではなく、
光学的接続部２２は、第１図に示した位置に限定される
ものではなく、防振台３８に支えられている部分と、そ
の他のレーザ光源１２側の部分との接続部であれば同様
な効果を得られるものである。Note that the present invention is not limited to the above embodiments,
The optical connection portion 22 is not limited to the position shown in FIG. 1, but may be the same as long as it is a connection portion between a portion supported by the vibration isolation table 38 and another portion on the side of the laser light source 12. It is possible to obtain a great effect.
更に、振動が伝わることにより不都合が生じる他の装置
にも充分適用可能なものである。Furthermore, it is fully applicable to other devices in which inconveniences occur due to the transmission of vibrations.
［発明の効果］
以上のように、本発明によれば、レーザ光源と露光装置
本体との光学的接続部の光路の周囲に防振遮光手段を設
けているため、レーザ光による周辺機器への悪影響の除
去及び安全性の向上を図れるとともに、レーザ光源で発
生する振動を露光装置本体に伝えずに精密な投影露光を
行なえるという効果がある。[Effects of the Invention] As described above, according to the present invention, since the anti-vibration light shielding means is provided around the optical path of the optical connection between the laser light source and the exposure apparatus main body, it is possible to prevent laser light from affecting peripheral equipment. This has the effect of eliminating adverse effects and improving safety, as well as allowing precise projection exposure to be performed without transmitting vibrations generated by the laser light source to the main body of the exposure apparatus.
第１図は、本発明の一実施例を示す構成図、第２図及び
第３図は本発明の実施態様を示す断面図である。
［主要部分の符号の説明］
ＬＡ・・・レーザビーム、１２・・・レーザ光源、１８
・・・レーザ発振部、２０・・・露光装置本体部、２２
・・・光学的接続部、３８・・・防振台、FIG. 1 is a block diagram showing one embodiment of the present invention, and FIGS. 2 and 3 are sectional views showing embodiments of the present invention. [Explanation of symbols of main parts] LA...Laser beam, 12...Laser light source, 18
. . . Laser oscillation unit, 20 . . . Exposure device main unit, 22
... optical connection part, 38 ... vibration isolation table,
Claims (3)
装置本体とを分離して設置した投影露光装置において、 前記レーザ装置と露光装置本体との光学的接続部の光路
の周囲に防振遮光手段を設けたことを特徴とする投影露
光装置。(1) In a projection exposure apparatus in which a laser device is used as an exposure light source and the laser device and the exposure device main body are installed separately, an anti-vibration light shield is provided around the optical path of the optical connection between the laser device and the exposure device main body. A projection exposure apparatus characterized by comprising means.
特徴とする特許請求の範囲第１項記載の投影露光装置。(2) The projection exposure apparatus according to claim 1, wherein the vibration-proof light-shielding means is bellows-shaped.
空間的余裕をもって分離した状態で２重の筒状に形成し
たものであることを特徴とする特許請求の範囲第１項記
載の投影露光装置。(3) The vibration-proof light-shielding means is characterized in that two light-shielding members are formed in a double cylindrical shape separated by a predetermined space margin. projection exposure equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62092094A JPH0770460B2 (en) | 1987-04-16 | 1987-04-16 | Projection exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62092094A JPH0770460B2 (en) | 1987-04-16 | 1987-04-16 | Projection exposure device |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP09243249A Division JP3121567B2 (en) | 1997-09-08 | 1997-09-08 | Exposure apparatus and exposure method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63260021A true JPS63260021A (en) | 1988-10-27 |
| JPH0770460B2 JPH0770460B2 (en) | 1995-07-31 |
Family
ID=14044860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62092094A Expired - Lifetime JPH0770460B2 (en) | 1987-04-16 | 1987-04-16 | Projection exposure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0770460B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6961113B1 (en) | 1999-05-28 | 2005-11-01 | Nikon Corporation | Exposure method and apparatus |
| JP2011049528A (en) * | 2009-08-27 | 2011-03-10 | Samsung Mobile Display Co Ltd | Connection unit, and laser oscillation apparatus including the same |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5372575A (en) * | 1976-12-10 | 1978-06-28 | Thomson Csf | Pattern transfer optical device |
| JPS60176888U (en) * | 1984-04-27 | 1985-11-22 | 三菱電機株式会社 | Optical path duct of laser processing equipment |
-
1987
- 1987-04-16 JP JP62092094A patent/JPH0770460B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5372575A (en) * | 1976-12-10 | 1978-06-28 | Thomson Csf | Pattern transfer optical device |
| JPS60176888U (en) * | 1984-04-27 | 1985-11-22 | 三菱電機株式会社 | Optical path duct of laser processing equipment |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6961113B1 (en) | 1999-05-28 | 2005-11-01 | Nikon Corporation | Exposure method and apparatus |
| JP2011049528A (en) * | 2009-08-27 | 2011-03-10 | Samsung Mobile Display Co Ltd | Connection unit, and laser oscillation apparatus including the same |
| US8761226B2 (en) | 2009-08-27 | 2014-06-24 | Samsung Display Co., Ltd. | Connection unit and laser oscillating apparatus having the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0770460B2 (en) | 1995-07-31 |
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