JPS63256367A - Abrasive material - Google Patents
Abrasive materialInfo
- Publication number
- JPS63256367A JPS63256367A JP8765087A JP8765087A JPS63256367A JP S63256367 A JPS63256367 A JP S63256367A JP 8765087 A JP8765087 A JP 8765087A JP 8765087 A JP8765087 A JP 8765087A JP S63256367 A JPS63256367 A JP S63256367A
- Authority
- JP
- Japan
- Prior art keywords
- micro
- base material
- fiber
- crystal
- abrasive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003082 abrasive agent Substances 0.000 title claims abstract description 18
- 239000013078 crystal Substances 0.000 claims abstract description 30
- 239000000463 material Substances 0.000 claims abstract description 26
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 4
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 claims abstract description 3
- -1 polyethylene terephthalate Polymers 0.000 claims description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 2
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 2
- 238000005498 polishing Methods 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 5
- 230000005611 electricity Effects 0.000 abstract description 2
- 230000003068 static effect Effects 0.000 abstract description 2
- 229920001410 Microfiber Polymers 0.000 abstract 7
- 239000003658 microfiber Substances 0.000 abstract 7
- 239000006061 abrasive grain Substances 0.000 description 11
- 239000010408 film Substances 0.000 description 10
- 239000000123 paper Substances 0.000 description 9
- 239000004744 fabric Substances 0.000 description 6
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000002356 single layer Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004439 roughness measurement Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Abstract
Description
【発明の詳細な説明】
(rg:梁上の利用分野)
本発明は研磨材に係り、更に詳細には微小t!A、m状
結晶の頂部により研磨面を形成した極めて高精度の仕上
げ研磨に好適なシート、状研唐材に関する。DETAILED DESCRIPTION OF THE INVENTION (rg: field of application on beams) The present invention relates to an abrasive material, and more particularly to micro-t! A. This invention relates to a sheet suitable for extremely high-precision finishing polishing, in which the polishing surface is formed from the top of m-shaped crystals, and to a polished material.
(従来の技術)
従来、シート状研磨材としては、寸法安定性及び強度に
優れた布帛、特殊紙等よりなるシート状基材の上に、研
磨用の砥粒を薄層状に固着せしめたものが知られている
。そして研磨に際してはこれら研磨布或いは研磨布を用
い手で被研磨体の表面を擦過・磨擦するのが一般的であ
る。このシート状研磨材に使用される砥粒は、炭化硅素
(8iC)酸化アルミニウム(Alton )等の微粉
末が主体でありこれ等を、基材となる布、紙、あるいは
特殊フィルム上に固着させる。固着させる手段としては
、布帛、紙、あるいはフィルム等の基材上に接着剤レジ
ンを薄層状に塗布したものの上に、砥粒を散布し単層状
に砥粒を固定せしめた後、レジンを硬化させる。(Prior art) Conventionally, sheet-like abrasive materials are made by fixing abrasive grains in a thin layer onto a sheet-like base material made of cloth, special paper, etc. with excellent dimensional stability and strength. It has been known. When polishing, it is common to use these polishing cloths or abrasive cloths to manually rub and abrade the surface of the object to be polished. The abrasive grains used in this sheet-like abrasive material are mainly fine powders such as silicon carbide (8iC) and aluminum oxide (Alton), which are fixed onto cloth, paper, or a special film as a base material. . The fixing method is to spread abrasive grains on a thin layer of adhesive resin applied to a base material such as cloth, paper, or film, fix the abrasive grains in a single layer, and then harden the resin. let
更に、基材としては、通常低番手のものに対しては、布
帛、紙、高番手具体的には400番以上様にして製造さ
れたシート状研磨材は、金属材料、木材、石材、プラス
チック、ガラス等の表面研削及び研磨に供せられる。そ
して表面に固定された砥粒が脱落したらそのライフはそ
れで終りである。Furthermore, as for the base material, cloth or paper can be used as a base material for low-count materials, and metal materials, wood, stone, and plastics can be used for sheet-like abrasive materials manufactured using high-count materials such as 400 or higher. , used for surface grinding and polishing of glass, etc. Once the abrasive grains fixed to the surface fall off, that's the end of its life.
前述の従来のシート状研磨材は上述の如き方法によって
製造されるため、比較的低番手のものは容易に製造しう
るが高番手のものは、その基材の上に均一に斑なく砥粒
を散布し単一層のものを得るのが難しく、従って良質な
ものを得る事が難しい。しかも高番手砥粒例えば4,0
00番のものであっても、その平均粒径が3μであり、
これで単一層を形成すると極めて作用面が限定され、良
質なものを得る事が出来ない。更に高番手のio、oo
。The conventional sheet-like abrasives mentioned above are manufactured by the method described above, so those with relatively low counts can be easily manufactured, but those with high counts can be produced by spreading the abrasive grains uniformly and evenly on the base material. It is difficult to obtain a single layer by spraying, and therefore it is difficult to obtain a good quality product. Moreover, high-count abrasive grains such as 4.0
Even if it is No. 00, its average particle size is 3μ,
If a single layer is formed with this, the surface of action will be extremely limited and it will not be possible to obtain a good quality product. Even higher count io, oo
.
番、20,000番に相当するものであればその傾向は
一層著しい。This tendency is even more remarkable if the number corresponds to the number 20,000.
(発明が解決しようとする問題点)
本発明者らは、既存のシート状研磨材が有する問題点に
鑑み鋭意研究を続けた結果本発明を完成したものであり
、その目的とするところは特定の繊維状結晶の頂部によ
り研磨面を形成し、精密研磨に適したシート状研磨材を
提供するにある。(Problems to be Solved by the Invention) The present inventors have completed the present invention as a result of intensive research in view of the problems that existing sheet-like abrasive materials have. An object of the present invention is to provide a sheet-like abrasive material suitable for precision polishing, in which a polishing surface is formed by the tops of the fibrous crystals.
(閂謹、薇&解九1多為つI友 )
上述の目的はシート状基材゛に炭化硅素、窒化硅素、チ
タン酸カリウム、酸化アルミニウム、酸化ジルコニウム
の群から選ばれた微小繊細状結晶を固着せしめ、該繊維
状結晶の頂部により研磨面を形成してなる研10材によ
り達成される。(Yuan, Ya & Ka91 Tatemetsu Ito) The purpose of the above is to prepare a sheet-like base material with micro-fine crystals selected from the group of silicon carbide, silicon nitride, potassium titanate, aluminum oxide, and zirconium oxide. This is achieved by a polishing material in which the fibrous crystals are fixed to each other and a polishing surface is formed by the tops of the fibrous crystals.
本発明に云う微小繊維状結晶とは、高温下気相反応によ
り成長する針状の単結晶、所arJウィスカーを意味し
、本発明においては、炭化硅景、窒化硅素、チタン酸カ
リウム、酸化アルミニウム、酸化ジルコニウムよりなる
微小XJA ft1A状結晶が適用されるが、就中炭化
硅素、窒化硅素及び酸化アルミニウムが好適である。The microfibrous crystals as used in the present invention refer to needle-shaped single crystals, such as ARJ whiskers, grown by high-temperature gas phase reactions. , fine XJA ft1A-like crystals made of zirconium oxide are applied, but silicon carbide, silicon nitride and aluminum oxide are particularly preferred.
これら微小yjl&紬状結晶は何れも市販されており、
また公知の製法により容易1こ製造し得るものである。These minute yjl & pongee crystals are all commercially available.
Moreover, it can be easily manufactured by a known manufacturing method.
例えば仄化硅素倣小癲維状結晶の場合、高温の反応管中
に硅素成分及び炭素成分を気相で供給しβ型のSIC単
結晶を成長せしめることによって得られるものであり、
形橡的には倣小識椹状であって、その径及び長さは反応
条件を適宜選択することにより制御できるものである。For example, in the case of small fibrous crystals imitating silicon oxide, it is obtained by supplying a silicon component and a carbon component in a gas phase into a high-temperature reaction tube to grow a β-type SIC single crystal.
It has a similar shape, and its diameter and length can be controlled by appropriately selecting reaction conditions.
また本発明に適用される基材としては、布帛、紙、フィ
ルム等何れも使用できるが、表面の平担性及び可撓性に
優れ、薄く均質な物性を有する点で合成樹脂フィルムが
好ましく、更に寸法安定性、耐水性、耐熱性等を考慮す
ると、二軸延伸を施したポリエチレンテレフタレート系
フィルムが特に好ましいものである。In addition, as the base material applied to the present invention, any fabric, paper, film, etc. can be used, but a synthetic resin film is preferable because it has excellent surface flatness and flexibility, and has thin and homogeneous physical properties. Furthermore, in consideration of dimensional stability, water resistance, heat resistance, etc., biaxially stretched polyethylene terephthalate films are particularly preferred.
本発明において重要なことは、微小繊維状結晶を基材面
に略垂直に固着し、該微小繊維状結晶の頂部により研磨
面を形成した点にある。What is important in the present invention is that the fine fibrous crystals are fixed substantially perpendicularly to the surface of the base material, and the tops of the fine fibrous crystals form the polished surface.
本発明に適用される微小繊維状結晶の形状は、被研磨体
の種類、仕上の程度等により異なり一概及びd細長の微
小繊維状結晶は、断面方向においては砥粒番手(JI8
几−6001’)で大略6,000番〜10,000#
の極めて高番手のものに相当する性質を有し、断面径の
略10倍の長さを備えているものである。そして、本発
明に係る研磨材は上把持′Rを有する微小繊維状結晶を
適用するため、粒状の砥粒を適用した研磨材に比し、縦
方向の長さく厚み)を有するため被研磨体に対する当り
が軟らかくなり、プラスチック類等の軟弱な被研磨体に
も適用でき、従来困難であったプラスチックの精密仕上
げも可能である。また、使用するにつれて、微小繊維状
結晶の先端が少量宛折損していく結果、研磨材としての
ライフが極ゆで長いと云う特長も有する。The shape of the fine fibrous crystals applied to the present invention varies depending on the type of the object to be polished, the degree of finishing, etc. Generally, the fine fibrous crystals with a length of d and slender have an abrasive grain count (JI8) in the cross-sectional direction.
-6001') approximately 6,000 to 10,000 #
It has properties equivalent to those of an extremely high-count material, and has a length approximately 10 times the cross-sectional diameter. Since the abrasive material according to the present invention uses fine fibrous crystals having an upper grip 'R, it has a longer length and thickness in the vertical direction than an abrasive material to which granular abrasive grains are applied. It is softer to the touch and can be applied to soft objects to be polished such as plastics, and precision finishing of plastics, which was previously difficult, is also possible. It also has the advantage that as it is used, the tips of the microfibrous crystals break off to a small extent, resulting in an extremely long life as an abrasive.
か\る本発明に係る研磨材は例えば次の様な方法で製造
できる。The abrasive material according to the present invention can be manufactured, for example, by the following method.
即ち一般的に静電植毛法と称せられるものであって、基
材に静電気を帯びさせ、その上5微小繊維状結晶を散布
し付着させるものであるが、この場合微小繊維状結晶は
その極性により一方の頂部を下にして立毛状に配向され
、基材上に、ブラシ状をこ立つ傾向があるのでこの状態
で固着される。That is, it is generally referred to as electrostatic flocking method, in which the base material is charged with static electricity, and 5 fine fibrous crystals are scattered and attached thereto, but in this case, the fine fibrous crystals are The brush is oriented in a nape-like manner with one top facing down, and is fixed in this state because it tends to stand up like a brush on the base material.
基材としては布帛、紙、フィルムのいずれも可であり特
に限定を受けるものではないが実際には、砥粒が微細で
あるため、基材表面に起伏の多いものは問題があり、従
って出来るだけ平担度にすぐれたフィルムを用いるのが
好ましい。これらフィルムとしては寸法安定性に優れ、
且つ可撓性にすぐれたものが更に好ましく、具体的には
、二軸延伸を施したフィルムを応用するのが特に好適で
ある。Fabric, paper, and film can be used as the base material, and there are no particular restrictions, but in reality, since the abrasive grains are fine, there is a problem if the base material surface has many undulations. It is preferable to use a film with excellent flatness. These films have excellent dimensional stability,
It is more preferable to use a film that has excellent flexibility, and specifically, it is particularly preferable to use a biaxially stretched film.
(発明の効果)
本発明に係る研磨材は従来の様々な研磨布紙とは様相を
異にする。即ち、従来の研磨布紙が基材ル(
上に砥粒が単i配列されている為、そのライフが極めて
短いのに対して、本発明に係る研磨材はある程度ロング
ライフが期待できる。(Effects of the Invention) The abrasive material according to the present invention is different from various conventional coated abrasive papers. That is, while conventional coated abrasive paper has extremely short life because abrasive grains are arranged on the base material, the abrasive material according to the present invention can be expected to have a long life to some extent.
また微小線維状結晶はその断面径が小さく、10.00
0番に相当する程度のものが容易に得られる為、従来、
比較的困難であった研磨布紙が容易に得られ、特にその
若干のクツシラン性の故に、プラスチック等の軟らかい
被研磨体の表面仕上げ研磨に極めて好ましい結果が得ら
れる。In addition, microfibrous crystals have a small cross-sectional diameter of 10.00
Since it is easy to obtain something equivalent to No. 0, conventionally,
A coated abrasive paper, which has been relatively difficult to obtain, can be easily obtained, and particularly because of its slight silane property, extremely favorable results can be obtained for surface finish polishing of soft objects to be polished such as plastics.
以下実施例をあげて本発明を具体的に説明する。The present invention will be specifically described below with reference to Examples.
(実施例)
平均断面径1.2μ、平均m細長15μのSiOウィス
カーを研磨材とし、二軸延伸を施したポリエステルフィ
ルム表面に接着剤としての熱硬化性ウレタン樹脂の薄I
Oをコーティングした基材上Iこ静電植毛し、熱処理に
よる固定を行なった。イ(メられた製品は、8iCウイ
スカーが極めて密に立毛した形態をなすものであり、ウ
ィスカーの固着状態も比較的強固であり容易には脱落し
ない状態でめった。(Example) Using SiO whiskers with an average cross-sectional diameter of 1.2μ and an average length of 15μ as an abrasive material, a thin film of thermosetting urethane resin as an adhesive was applied to the surface of a biaxially stretched polyester film.
The fibers were electrostatically flocked onto the base material coated with O, and fixed by heat treatment. (2) The product that was produced had a very densely raised form of 8iC whiskers, and the whiskers were relatively firmly fixed and did not fall off easily.
この製品をもって、酉μ(ポリメチルメタクリレート)
樹脂製の平板の表面を、乾式で手研磨を行なった結果、
はゾ鐘面に近い面が得られた。With this product, Tori μ (polymethyl methacrylate)
As a result of dry hand polishing the surface of the resin flat plate,
A surface close to that of a bell surface was obtained.
表面粗さを測定した結果Ra −0,0012Rmay
=0.015であり、特に深い条痕等は見られなかっ
た。Surface roughness measurement result Ra -0,0012Rmay
= 0.015, and no particularly deep streaks were observed.
更に同じ凶所を使って、同様の研磨を行なった結果、8
回まで使用する串が出来た。8回を過ぎると目がつぶれ
、研磨材としての使用は不可能であった。Furthermore, as a result of similar polishing using the same spot, 8
I made a skewer that can be used twice. After 8 times, the eyes closed and could not be used as an abrasive.
、−,−
Claims (3)
リウム、酸化アルミニウム、酸化ジルコニウムの群から
選ばれた少なく共1種の微小繊維状結晶を固着せしめ、
該繊維状結晶の頂部により研磨面を形成してなる研磨材
。(1) fixing at least one kind of microfibrous crystals selected from the group of silicon carbide, silicon nitride, potassium titanate, aluminum oxide, and zirconium oxide to a sheet-like base material;
An abrasive material having an abrasive surface formed by the tops of the fibrous crystals.
アルミニウムよりなるものである特許請求の範囲第(1
)項に記載の研磨材。(2) Claim No. 1 in which the microfibrous crystals are made of silicon carbide, silicon nitride, or aluminum oxide.
) The abrasive material described in section 2.
軸延伸フィルムである特許請求の範囲第(1)項又は第
(2)項に記載の研磨材。(3) The abrasive material according to claim (1) or (2), wherein the sheet-like base material is a biaxially stretched polyethylene terephthalate film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8765087A JPS63256367A (en) | 1987-04-09 | 1987-04-09 | Abrasive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8765087A JPS63256367A (en) | 1987-04-09 | 1987-04-09 | Abrasive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63256367A true JPS63256367A (en) | 1988-10-24 |
Family
ID=13920839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8765087A Pending JPS63256367A (en) | 1987-04-09 | 1987-04-09 | Abrasive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63256367A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03170270A (en) * | 1989-04-28 | 1991-07-23 | Norton Co | Grinding cloth paper material containing grinding filament |
JP2980682B2 (en) * | 1993-06-02 | 1999-11-22 | 大日本印刷株式会社 | Polishing tape and method of manufacturing the same |
-
1987
- 1987-04-09 JP JP8765087A patent/JPS63256367A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03170270A (en) * | 1989-04-28 | 1991-07-23 | Norton Co | Grinding cloth paper material containing grinding filament |
JP2528197B2 (en) * | 1989-04-28 | 1996-08-28 | ノートン カンパニー | Abrasive filament containing abrasive cloth paper material |
JP2980682B2 (en) * | 1993-06-02 | 1999-11-22 | 大日本印刷株式会社 | Polishing tape and method of manufacturing the same |
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