JPS63249331A - Microwave plasma cvd system - Google Patents

Abstract

PURPOSE:To enable larger plasma to be generated, by providing a reaction chamber at the distal end of a waveguide, the reaction chamber having a specific construction capable of increasing plasma sufficiently. CONSTITUTION:A vacuum vessel 8 for generating plasma is provided at the tip end of a waveguide 1 guiding plasma generating microwaves, and a reaction chamber 9 having therein a tapered guide 5 for gradually enlarging the electric field of microwaves is provided within the vacuum vessel 8. Within the reaction chamber 9, there is arranged a table 10 for holding a substrate and there is also provided a resonance plate 11 for causing plasma to be generated efficiently on the substrate. The resonance plate has fan adjuster 12 so that it can be adjusted in the direction along which microwaves advance. In this manner, it is possible to generate plasma of a size of phi100-200 mm.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a plasma CVD apparatus using microwaves.

[Summary of the invention]

Large microwave plasma CVD equipment that can generate larger plasma than conventional microwave plasma CVD equipment
This shows an invention regarding the D vt position.

[Conventional technology]

Conventionally, as shown in Fig. 1, a ventricle made of quartz tube 2 is provided in the center of a waveguide l, and microwaves oscillated from a microwave oscillator are guided through the waveguide, and the waveguide and quartz tube are connected. A microwave plasma CVD apparatus that generates plasma near the center of the intersection is known.
No. 98 discloses the structure of such a conventional microwave plasma CVD apparatus.

[Problem that the invention seeks to solve]

In the above-mentioned conventional technology, it is common to use microwaves of, for example, 2.450) lz, but at this frequency, the waveguide width is approximately 150 fins, and the waveguide can be penetrated to generate plasma. The diameter of the quartz tube used for this purpose is a maximum diameter of φ60 in order to prevent microwave leakage and efficiently generate plasma. It is generally said to be 1/3 of the waveguide width.

Therefore, as a result, the size of the plasma is limited to less than the diameter of the quartz tube, and the area that can be synthesized at the same time is at most φ601-
The following is true.

Such a synthesis apparatus poses a major problem in mass production when used to synthesize various thin films.

[Means for solving problems]

As mentioned above, it is difficult to increase the size of the plasma by making a hole in a part of the waveguide, passing through the sealed quartz tube, and generating plasma inside the quartz tube. In order to increase the size of the plasma, a reaction chamber that can make the plasma sufficiently large is provided, and the reaction chamber has a sample stage that holds the substrate on which the thin film will be synthesized. It has a tapered guide section extending from the end of the tube, and a resonant plate' which can be adjusted vertically so that plasma is generated on the sample stage and sufficiently wraps around the substrate.

[Effect]

The electric field of the microwave guided into the reaction chamber from the end of the waveguide is gradually expanded to a desired magnitude in both directions perpendicular to the direction of travel by the tapered guide section. At the same time, the resonant plate that reflects the microwaves passing through the substrate and returns to the substrate to cause resonance is adjusted in the direction of microwave travel so that the resonance effect is maximized, and the plate wraps around the substrate at the substrate position. A large enough plasma is generated.

〔Example〕

Embodiments of the present invention will be described below based on the drawings. Second
The figure shows a large microwave plasma C which is an embodiment of the present invention.
It is a VD device. At the end of the waveguide 1 for guiding microwaves for generating plasma, a tapered guide section 5 for gradually expanding the electric field of the microwaves is provided in the vacuum vessel 8 for generating plasma and the nuclear vacuum vessel. A reaction chamber 9 is provided. The waveguide, the vacuum container, and the reaction chamber are separated by a sealing plate 7 made of quartz or the like, and there is a vacuum in the reaction chamber that maintains the vacuum in the reaction chamber (vacuum container) and at the same time guides the microwaves into the reaction chamber without loss. A desired gas can be introduced from the outside through the gas inlet 6, and a vacuum and a predetermined gas pressure can be maintained by the exhaust port 14.

A sample stage 10 for holding a substrate is installed in the reaction chamber, and a resonance plate 11 is equipped with an adjuster 12 that can adjust the direction of microwave propagation in order to efficiently generate plasma on the substrate. . Furthermore, the waveguide and vacuum vessel 9 reaction chamber can be moved up and down apart from the base plate 15, allowing the substrate to be placed on the sample stage without difficulty.

〔Effect of the invention〕

By using the above-mentioned large-scale microwave plasma CVD equipment, the microwave plasma CVD equipment, which conventionally could only produce plasma with a maximum diameter of 60 m, can now produce plasma with a maximum diameter of 60 m.
It becomes possible to generate plasma with a size of 100 to 200 m, and the industrial value is very high.

[Brief explanation of drawings]

Figure 1 shows a conventional microwave plasma CVD apparatus,
The figure shows the large-scale microwave plasma CVD apparatus of the present invention. f11 large size my 70 liquid pump'' 7 Zuma CvDs 32 figure

Claims (1)

[Claims] In a CVD device that uses microwaves as the heating source, seal the microwave inlet of the vacuum container that seals the gas in vacuum,
A microwave plasma consisting of a resonator shell having a structure that induces microwave resonance in a vacuum container, and a resonator plate that controls the resonance and has a structure that prevents microwave leakage and slides along the resonator shell. CVD equipment.