JPS63247907A - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPS63247907A JPS63247907A JP8321987A JP8321987A JPS63247907A JP S63247907 A JPS63247907 A JP S63247907A JP 8321987 A JP8321987 A JP 8321987A JP 8321987 A JP8321987 A JP 8321987A JP S63247907 A JPS63247907 A JP S63247907A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- sliding surface
- adhesive layer
- head
- upper base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 24
- 239000012790 adhesive layer Substances 0.000 claims abstract description 24
- 239000010408 film Substances 0.000 claims abstract 5
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 239000000853 adhesive Substances 0.000 abstract description 6
- 230000001070 adhesive effect Effects 0.000 abstract description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052593 corundum Inorganic materials 0.000 abstract description 4
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 4
- 238000004299 exfoliation Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000012856 packing Methods 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000012762 magnetic filler Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、磁気記録媒体の記録再生に用いる薄膜磁気ヘ
ッドに関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a thin film magnetic head used for recording and reproducing magnetic recording media.
従来の技術
第４図に従って説明する。結晶化ガラスからなる下部支
持体１の上に、薄膜ヘッド素子部３がスパッタリング法
などを用いて形成される。この状態では薄膜ヘッド主要
部３を保護するための結晶化ガラスからなる上部支持体
６を接着する事ができないので、Ａ１２ｏ３や５ｌｏ２
からなる非磁性充填材４をスパッタリング法により形成
し、その上からラッピングにより平坦化し接着が可能な
形状とする。接着剤としてはエポキシ系の樹脂を使用し
、薄膜形成部２の上面に塗布後上部支持体６をこの上に
貼り合せ、約１５０℃の温度で加圧しながら接着剤を硬
化させる。硬化が終了したヘッド本体の摺動面側から研
摩を行い、所望の位置７ま ・・で研摩し最終仕上げ研
摩を行う。第４図から明らかなように、接着層先端６ａ
は、ヘッド摺動面に露出している事がわかる。The prior art will be explained with reference to FIG. A thin film head element section 3 is formed on a lower support 1 made of crystallized glass using a sputtering method or the like. In this state, the upper support 6 made of crystallized glass for protecting the main part 3 of the thin film head cannot be bonded, so A12o3 and 5lo2
A non-magnetic filler 4 is formed by a sputtering method, and is then flattened by lapping to form a shape that can be bonded. An epoxy resin is used as the adhesive, and after being applied to the upper surface of the thin film forming section 2, the upper support 6 is bonded thereon, and the adhesive is cured under pressure at a temperature of about 150°C. After hardening, start polishing from the sliding surface side of the head body, polish at desired position 7, and perform final finish polishing. As is clear from FIG. 4, the adhesive layer tip 6a
It can be seen that is exposed on the head sliding surface.
発明が解決しようとする問題点
第４図のようにヘッド摺動面７に接着層６ａが露出して
いるため接着層が摩耗してその摩耗粉がへラドギャップ
部に付着して、スペーシング損失の原因となったり、接
着層露出部６ａを起点として上部支持体６と下部支持体
１が接着層５を境として剥離を起こす等の問題があった
。Problems to be Solved by the Invention As shown in FIG. 4, since the adhesive layer 6a is exposed on the head sliding surface 7, the adhesive layer is abraded and the abrasion powder adheres to the spacing gap. There have been problems such as causing loss, and peeling between the upper support 6 and the lower support 1 starting from the adhesive layer exposed portion 6a with the adhesive layer 5 as a boundary.
問題点を解決するための手段
本発明は、前記問題点を解決するために接着層露出部を
含む上部支持体と下部支持体の非磁性充填部の一部を切
削除去し、これを含むヘッド摺動面側全面にＡｌ２Ｏ３
又はＳ １０２をスパッタリング法で形成した後、この
而を研摩する事によりヘッド摺動面に接着層が露出しな
いようにする。Means for Solving the Problems In order to solve the above-mentioned problems, the present invention removes a portion of the non-magnetic filling portion of the upper support and the lower support including the adhesive layer exposed portion, and provides a head including the same. Al2O3 on the entire sliding surface side
Alternatively, after S 102 is formed by sputtering, it is polished to prevent the adhesive layer from being exposed on the head sliding surface.
作 用
ヘッド摺動面接接着層が露出しない事によシ、接着層が
摩耗してその摩耗粉がヘッドギャップ部に付着してスペ
ーシング損失の原因となったり、接着層露出部を起点と
して上部支持体と下部支持体が接着層を境として剥離を
起こす等の問題を解決することができる。Because the adhesive layer on the sliding surface of the working head is not exposed, the adhesive layer will wear out and the abrasion powder will adhere to the head gap area, causing spacing loss, or the upper part will start from the exposed area of the adhesive layer. Problems such as peeling between the support and the lower support across the adhesive layer can be solved.
実施例
本発明の実施例を第１図に従って説明する。薄膜形成部
２はスパッタリング法等により、結晶化ガラスからなる
下部支持体１の上に形成されており、薄膜ヘッド素子部
３とＡｌ２Ｏ３からなる非磁性の充填材４から成って込
る。薄膜形成部２の上面は、これを保護するための上部
支持体６との接着層になるためラッピングにより平坦化
がなされている。この平坦化された面全体にエポキシ系
の樹脂からなる接着剤を塗布した後、上部支持体６が貼
り合せ接着される。次に接着層５を含む−Ｅ部支持体ｅ
と薄膜形成部２の一部を、摺動面側から機械加工等でた
とえば深さ約３１１ｍだけ、切削除去する。つづいてこ
の切削除去部を含むヘッド摺動面全面にわたり、スパッ
タリング法により非磁性のＡ１２０３８を厚さ約Ｉ Ｑ
１ｔｍ形成する。これをヘッド摺動面側から所望の位
置７まで研摩を行い、最終仕上げ研摩を行なう。これに
より接着層５がヘッド摺動面に露出しない構成の薄膜ヘ
ッドが得られる。第２図に示すのは、ヘッド摺動面から
見た図であり、摺動面にはヘッド部の他には、Ａｌ２Ｏ
３と結晶化ガラス以外のものは露出していない事がわか
る。本実施例では、上部支持体全面を切削除去したが、
第３図に示すように除去部を一部分にしても良い。又非
磁性充填材として、上記実施例では、Ａｌ２Ｏ３を用い
たが、Ｓ ｉＯ２等の酸化物、あるいはＳｉＮ等の窒化
物でも良い。Embodiment An embodiment of the present invention will be described with reference to FIG. The thin film forming portion 2 is formed on a lower support 1 made of crystallized glass by sputtering or the like, and includes a thin film head element portion 3 and a nonmagnetic filler 4 made of Al2O3. The upper surface of the thin film forming portion 2 is flattened by lapping to serve as an adhesive layer for protecting the upper support 6. After applying an adhesive made of epoxy resin to the entire flattened surface, the upper support body 6 is bonded and bonded. Next, the adhesive layer 5 is included - E part support e
Then, a part of the thin film forming portion 2 is removed by machining or the like from the sliding surface side to a depth of, for example, about 311 m. Next, non-magnetic A12038 was applied to a thickness of approximately IQ over the entire head sliding surface, including this cut and removed portion, by sputtering.
Form 1tm. This is polished from the head sliding surface side to a desired position 7, and final polishing is performed. As a result, a thin film head having a structure in which the adhesive layer 5 is not exposed on the head sliding surface can be obtained. Figure 2 shows a view from the head sliding surface, and the sliding surface has Al2O in addition to the head.
It can be seen that nothing other than 3 and crystallized glass is exposed. In this example, the entire surface of the upper support was removed.
As shown in FIG. 3, the removed portion may be made into a portion. In the above embodiment, Al2O3 was used as the nonmagnetic filler, but oxides such as SiO2 or nitrides such as SiN may also be used.
発明の効果
本発明によれば、ヘッド摺動面に接着層が露出しないた
めに、接着剤の摩耗粉がヘッドギャップ部に付着したり
露出した接着層を起点とした接着層からの剥離等の問題
を無くす事ができ、信頼性の良い薄膜磁気ヘッドを得る
事ができる。Effects of the Invention According to the present invention, since the adhesive layer is not exposed on the head sliding surface, it is possible to prevent abrasion particles of the adhesive from adhering to the head gap or peeling from the adhesive layer starting from the exposed adhesive layer. This problem can be eliminated and a highly reliable thin film magnetic head can be obtained.
第１．２．３図は本発明の一実施例における薄膜磁気ヘ
ッドの平面図、第４図は従来の薄膜磁気ヘッドの平面図
である。
１・・・・・下部支持体、２・・・・・・薄膜形成部、
３・・・・・薄膜ヘッド素子部、４・・・・・・非磁性
充填部、６・・・・・・接着層、６・・・・・・上部支
持体、７・・・・・・摺動面位置、８・・・・・・非磁
性充填材。
代理人の氏名 弁理士 中 尾 敏 男 ほか１名１−
ＴＩて乏杵伍
Ｅ−ｘ舛鉋外ゐ
７−・−帽す命信Ｊ
第 ２ｒｊＪ1.2.3 is a plan view of a thin film magnetic head according to an embodiment of the present invention, and FIG. 4 is a plan view of a conventional thin film magnetic head. 1... Lower support body, 2... Thin film forming part,
3...Thin film head element portion, 4...Nonmagnetic filling part, 6...Adhesive layer, 6...Upper support, 7...・Sliding surface position, 8...Non-magnetic filler. Name of agent: Patent attorney Toshio Nakao and 1 other person1-
TI Tepoki 5 E-x Masakigai ゐ7-・-Katsu Mikoto J 2nd rjJ
Claims (2)
子と、上記薄膜ヘッド素子を保護するために、接着層に
よって貼り合せられた上部支持体とからなり、上記接着
層の摺動面に露出した部分を含む所定の領域に摺動面か
ら所定の深さまで切込みが入れられており、上記切込み
部分に非磁性絶縁膜が形成されている事を特徴とする薄
膜磁気ヘッド。(1) Consisting of a lower support, a thin film head element formed thereon, and an upper support bonded together with an adhesive layer to protect the thin film head element, the sliding surface of the adhesive layer 1. A thin film magnetic head characterized in that a cut is made in a predetermined region including a portion exposed to a predetermined depth from a sliding surface to a predetermined depth, and a nonmagnetic insulating film is formed in the cut portion.
を特徴とする特許請求の範囲第（１）項記載の薄膜磁気
ヘッド。(2) The thin film magnetic head according to claim (1), wherein the nonmagnetic insulating film is made of oxide or nitride.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8321987A JPS63247907A (en) | 1987-04-03 | 1987-04-03 | Thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8321987A JPS63247907A (en) | 1987-04-03 | 1987-04-03 | Thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63247907A true JPS63247907A (en) | 1988-10-14 |
Family
ID=13796204
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8321987A Pending JPS63247907A (en) | 1987-04-03 | 1987-04-03 | Thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63247907A (en) |
-
1987
- 1987-04-03 JP JP8321987A patent/JPS63247907A/en active Pending
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