JPS63247367A - イオンビ−ムスパツタ装置 - Google Patents

イオンビ−ムスパツタ装置

Info

Publication number
JPS63247367A
JPS63247367A JP8096387A JP8096387A JPS63247367A JP S63247367 A JPS63247367 A JP S63247367A JP 8096387 A JP8096387 A JP 8096387A JP 8096387 A JP8096387 A JP 8096387A JP S63247367 A JPS63247367 A JP S63247367A
Authority
JP
Japan
Prior art keywords
target
ion source
ion beam
ion
beam sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8096387A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0586476B2 (enrdf_load_stackoverflow
Inventor
Yasunori Ono
康則 大野
Yoshimi Hakamata
袴田　好美
Kenichi Natsui
健一 夏井
Yukio Nakagawa
中川　由岐夫
Tadashi Sato
忠 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8096387A priority Critical patent/JPS63247367A/ja
Publication of JPS63247367A publication Critical patent/JPS63247367A/ja
Publication of JPH0586476B2 publication Critical patent/JPH0586476B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP8096387A 1987-04-03 1987-04-03 イオンビ−ムスパツタ装置 Granted JPS63247367A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8096387A JPS63247367A (ja) 1987-04-03 1987-04-03 イオンビ−ムスパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8096387A JPS63247367A (ja) 1987-04-03 1987-04-03 イオンビ−ムスパツタ装置

Publications (2)

Publication Number Publication Date
JPS63247367A true JPS63247367A (ja) 1988-10-14
JPH0586476B2 JPH0586476B2 (enrdf_load_stackoverflow) 1993-12-13

Family

ID=13733168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8096387A Granted JPS63247367A (ja) 1987-04-03 1987-04-03 イオンビ−ムスパツタ装置

Country Status (1)

Country Link
JP (1) JPS63247367A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2745010A1 (fr) * 1996-02-20 1997-08-22 Serole Michelle Paparone Cible de pulverisation cathodique de forme tubulaire ou derivee, faite de plusieurs plaques longitudinales et sa methode de fabrication

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57174459A (en) * 1981-04-21 1982-10-27 Namiki Precision Jewel Co Ltd Formation of thin film
JPS6025212A (ja) * 1983-07-21 1985-02-08 Hitachi Ltd 磁性合金膜の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57174459A (en) * 1981-04-21 1982-10-27 Namiki Precision Jewel Co Ltd Formation of thin film
JPS6025212A (ja) * 1983-07-21 1985-02-08 Hitachi Ltd 磁性合金膜の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2745010A1 (fr) * 1996-02-20 1997-08-22 Serole Michelle Paparone Cible de pulverisation cathodique de forme tubulaire ou derivee, faite de plusieurs plaques longitudinales et sa methode de fabrication

Also Published As

Publication number Publication date
JPH0586476B2 (enrdf_load_stackoverflow) 1993-12-13

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