JPS6323654B2 - - Google Patents
Info
- Publication number
- JPS6323654B2 JPS6323654B2 JP58200556A JP20055683A JPS6323654B2 JP S6323654 B2 JPS6323654 B2 JP S6323654B2 JP 58200556 A JP58200556 A JP 58200556A JP 20055683 A JP20055683 A JP 20055683A JP S6323654 B2 JPS6323654 B2 JP S6323654B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- support
- rotation
- support points
- drive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000002093 peripheral effect Effects 0.000 claims description 8
- 235000012431 wafers Nutrition 0.000 description 69
- 238000000034 method Methods 0.000 description 6
- 238000007689 inspection Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58200556A JPS6091640A (ja) | 1983-10-25 | 1983-10-25 | ウエハの位置決め装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58200556A JPS6091640A (ja) | 1983-10-25 | 1983-10-25 | ウエハの位置決め装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6091640A JPS6091640A (ja) | 1985-05-23 |
JPS6323654B2 true JPS6323654B2 (US08063081-20111122-C00044.png) | 1988-05-17 |
Family
ID=16426269
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58200556A Granted JPS6091640A (ja) | 1983-10-25 | 1983-10-25 | ウエハの位置決め装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6091640A (US08063081-20111122-C00044.png) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4376482A (en) * | 1981-05-19 | 1983-03-15 | Tencor Instruments | Wafer orientation system |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5237835Y2 (US08063081-20111122-C00044.png) * | 1972-06-26 | 1977-08-27 | ||
JPS6175128U (US08063081-20111122-C00044.png) * | 1984-10-23 | 1986-05-21 |
-
1983
- 1983-10-25 JP JP58200556A patent/JPS6091640A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4376482A (en) * | 1981-05-19 | 1983-03-15 | Tencor Instruments | Wafer orientation system |
Also Published As
Publication number | Publication date |
---|---|
JPS6091640A (ja) | 1985-05-23 |
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