JPS63232932A - Polishing method and device therefor - Google Patents

Polishing method and device therefor

Info

Publication number
JPS63232932A
JPS63232932A JP6259287A JP6259287A JPS63232932A JP S63232932 A JPS63232932 A JP S63232932A JP 6259287 A JP6259287 A JP 6259287A JP 6259287 A JP6259287 A JP 6259287A JP S63232932 A JPS63232932 A JP S63232932A
Authority
JP
Japan
Prior art keywords
polishing
polishing tool
tool
polished
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6259287A
Other languages
Japanese (ja)
Other versions
JPH05171B2 (en
Inventor
Manabu Ando
学 安藤
Nobuo Nakamura
宣夫 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP6259287A priority Critical patent/JPS63232932A/en
Publication of JPS63232932A publication Critical patent/JPS63232932A/en
Priority to US07/401,477 priority patent/US4956944A/en
Publication of JPH05171B2 publication Critical patent/JPH05171B2/ja
Granted legal-status Critical Current

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  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

PURPOSE:To enable removal of a ripple produced during polishing of an optical element, by a method wherein a ring beltform polishing tool is scanned in a swung state over a workpiece, and the scanning range of the tool is controlled by a position detecting means as a relative speed therebetween is suppressed within a given value. CONSTITUTION:By means of a control device 39, a motor 26 rotates a work support body 14 and a workpiece 12, a motor 30 rotates a polishing tool 28, a motor 34 exerts scanning movement on a column 32, and the polishing tool 28 is swung by a crank mechanism, rotated by a swing motor, and a swing arm. A position detecting means 37 detects the position in a scanning direction of the polishing tool 28 to the workpiece 12 to feed a signal to a control device 39, and a control device 37 controls the scanning range of the polishing tool 28 by means of the feed signal. In which case, the workpiece 12 is rotated at (a) rpm and the polishing tool 28 is rotated at (b) rpm. A given magnitude of swing movement is exerted in a direction C on the polishing tool 28, further, scanning movement in a distance from a position (d) to a position (e) is exerted on the polishing tool 28, a ripple on the surface of a lens and the like can be removed with high efficiency.

Description

【発明の詳細な説明】 (産業上の利用分野〕 本発明は研磨方法およびその装置に関し、特に光学素子
の高精度研磨に好適な研磨方法および研磨装置に関する
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a polishing method and apparatus, and more particularly to a polishing method and apparatus suitable for high-precision polishing of optical elements.

〔従来の技術〕[Conventional technology]

従来、光学素子たとえばレンズ、プリズムまたは反射鏡
等の表面精度を極めて高精度に仕上げるためには、一旦
ある程度の積度に研磨された表面を小径の研磨パッドに
より部分的に修正研磨する方法がとられている。
Conventionally, in order to finish the surface of optical elements such as lenses, prisms, or reflective mirrors with extremely high precision, a method has been used in which the surface, which has been polished to a certain degree, is partially corrected and polished using a small-diameter polishing pad. It is being

第5図は、この様な修正研磨の具体例を示す概略斜視図
である。図において被研磨物12は円板状の光学ガラス
平行面板であって、下面がワーク支持体14に接着され
て固定指示されている。ワーク支持体14はワーク回転
軸25に回転可能に支持されており、被研磨物I2はワ
ーク回転軸25に関し回転対称となる様にワーク支持体
14に固定されている。被研磨物12の上面は、前加工
により予め鏡面研磨されている。但し、この前加工によ
って図示された輪帯Yの部分が凸状になっているとする
。修正研磨においては、被研磨物12の径の大きさに比
べて小さい径を有する研磨バッド16が用いられる。研
磨バッド16は工具支持体18の下面に接着されて固定
支持されており、工具支持体18の上面中央部には、棒
体20の一端が突当てられている。棒体20は矢印Aで
示すように被研磨物12の半径方向に適宜の幅で揺動可
能である。研磨物12と研磨バッド16の間には研磨液
がノズル22により供給される。ノズル22から被研磨
物12の上面へ研磨液を供給しながらワーク支持体14
を矢印B方向に回転させ、同時に工具支持体18を矢印
C方向に回転させるとともに矢印へ方向に揺動させるこ
とによって被研磨物12の修正研磨が行なわれる。
FIG. 5 is a schematic perspective view showing a specific example of such correction polishing. In the figure, the object to be polished 12 is a disk-shaped optical glass parallel plate, and its lower surface is bonded and fixed to a workpiece support 14. The work support 14 is rotatably supported by a work rotation shaft 25, and the object to be polished I2 is fixed to the work support 14 so as to be rotationally symmetrical about the work rotation shaft 25. The upper surface of the object to be polished 12 is mirror-polished in advance by pre-processing. However, it is assumed that the illustrated ring zone Y has a convex shape due to this pre-processing. In the correction polishing, a polishing pad 16 having a diameter smaller than that of the object 12 to be polished is used. The polishing pad 16 is bonded and fixedly supported on the lower surface of the tool support 18, and one end of the rod 20 is abutted against the center of the upper surface of the tool support 18. The rod 20 is swingable in the radial direction of the object to be polished 12 with an appropriate width as shown by arrow A. A polishing liquid is supplied between the polishing object 12 and the polishing pad 16 through a nozzle 22 . While supplying the polishing liquid from the nozzle 22 to the upper surface of the workpiece 12,
Corrective polishing of the object to be polished 12 is performed by rotating the tool support 18 in the direction of arrow B and simultaneously rotating the tool support 18 in the direction of arrow C and swinging it in the direction of the arrow.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

被研磨物か軸対称形状の時には通常その軸を中心に被研
磨物を回転させながら研磨加工を行なうが、被研磨物が
大きな時には回転中心を中心とした同心円状の微小な凸
部と四部が交互に発生することがある。(以下、この同
心円状の微小な凸部と四部が交互に発生した状態をリッ
プルと呼ぶ。)−上述した従来の研磨方法はその目的が
大きな同心円状のうねりの除去が目的であるので、その
まま上述したリップルを除去しようとしても、被研磨物
の除去は進むが、リップルはそのまま残ってしまうとい
う欠点がある。
When the object to be polished has an axially symmetrical shape, the polishing process is usually performed while rotating the object around the axis. However, when the object is large, there are four small convex parts concentrically centered around the center of rotation. May occur alternately. (Hereinafter, the state in which these concentric minute convex portions and four portions occur alternately is called a ripple.) - The purpose of the conventional polishing method described above is to remove large concentric undulations, so it is Even if an attempt is made to remove the above-mentioned ripples, the object to be polished is removed, but the ripples remain as they are, which is a drawback.

本発明は、光学素子の研磨加工における被研磨物のリッ
プルを除去する研磨方法および研磨装置を提供すること
を目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a polishing method and a polishing apparatus for removing ripples from an object to be polished during polishing of an optical element.

(問題点を解決するための手段〕 本発明の研磨方法は、輪帯状に形成された研磨工具を被
研磨物上で所定の方向に揺動運動させながら別に定めた
方向に走査運動させることを特徴とし、また被研磨物と
研磨工具が相互になす運動によって生じる相対速度の構
成における被研磨物の回転方向の速度成分が所定値を超
えないように設定されている。また、本発明め研磨装置
は研磨工具を所定の方向に揺動させながら別に定めた方
向に走査させる送り手段と、走査方向に対する位置検出
手段を有し、位置検出手段の信号により研磨工具の走査
範囲を制御できる制御装置を備えている。
(Means for Solving the Problems) The polishing method of the present invention includes performing a scanning motion in a separately determined direction while swinging a polishing tool formed in an annular shape in a predetermined direction on the workpiece to be polished. In addition, the velocity component in the rotational direction of the object to be polished in the configuration of the relative velocity caused by the mutual movement between the object to be polished and the polishing tool is set so as not to exceed a predetermined value. The device includes a feeding means for swinging the polishing tool in a predetermined direction and scanning in a separately determined direction, and a position detection means with respect to the scanning direction, and a control device that can control the scanning range of the polishing tool based on a signal from the position detection means. It is equipped with

(作用) 微小なリップルを除去するために必要な工具の運動条件
、そして工具の条件を詳細に検討した。
(Operation) We have examined in detail the motion conditions of the tool and the conditions of the tool necessary to remove minute ripples.

以下にその内容を記す。The contents are described below.

この検討で使用したテストピースは外径170mm、曲
率半径490mmの石英ガラス製のレンズであり、その
球面には事前にピッチ6〜7 mm、凹凸の差約0.1
4のリップルを発生させである。また、工具の外径は2
0+nmとし、当り面がそれぞれ工具Aは直径20mm
全面あたり被加工物の曲率と等しい凹面になっている。
The test piece used in this study was a quartz glass lens with an outer diameter of 170 mm and a radius of curvature of 490 mm.
This causes a ripple of 4. Also, the outside diameter of the tool is 2
0+nm, and the contact surface is 20mm in diameter for tool A.
The entire surface has a concave surface equal to the curvature of the workpiece.

(以下、B、Cも当り部分は同様の凹面)、工具Bは外
径20mm、内径10mmの輪帯あたり、工具Cは外径
20mm、内径15mmの輪帯あたりとし、当り面はす
べてビリチにて作成しである。検討には図1に示す研磨
装置を使用した。
(Hereinafter, B and C also have similar concave contact areas). Tool B has an outer diameter of 20 mm and an inner diameter of 10 mm, and tool C has an outer diameter of 20 mm and an inner diameter of 15 mm. The contact surfaces are all flat. It was created by The polishing device shown in Figure 1 was used for the study.

■、のI!l−、の 丸 それぞれ被研磨物の中心から60mm〜80+nmの区
間に対して検討を行なった。また、表1中の速度成分比
は被研磨物上70mmでの平均した値である。検討1.
は従来例の例、検討2.は主要な研磨運動を構成する被
研磨物の回転、工具の回転、工具の揺動の3要素をほぼ
均等にした場合、検討3.は被研磨物の回転の割合を1
0%以下とした例である。この時、工具はBを使用した
。なお、走査は検討1.〜3、に共通な条件であり、I
IIIm/minの速度で被研磨物上60mm〜80m
mの区間の走査とした。
■I of! The study was carried out on a section of 60 mm to 80+ nm from the center of the object to be polished, respectively. Further, the velocity component ratios in Table 1 are average values at a distance of 70 mm above the object to be polished. Consideration 1.
is an example of the conventional example, study 2. In consideration 3., when the three elements of the main polishing motion, namely rotation of the object to be polished, rotation of the tool, and rocking of the tool, are made approximately equal. is the rotation rate of the polished object 1
This is an example where it is 0% or less. At this time, tool B was used. Note that scanning is based on consideration 1. 〜3, which is a common condition for I
60mm to 80m above the object to be polished at a speed of IIIm/min
The scan was performed over an interval of m.

検討1.では除去量は多いが、リップルはそのまま残り
除去が進まない。
Consideration 1. Although the removal amount is large, the ripple remains and the removal does not progress.

検討2.ではリップルの除去は多少進むが、その除去量
自体が少ないので、リップルを除去するには非常に長い
時間がかかる。
Consideration 2. In this case, the ripples are removed to some extent, but the amount of removal itself is small, so it takes a very long time to remove the ripples.

検討3.では、リップルの除去は進んだ。Consideration 3. So, the ripple removal has progressed.

この検討内容から次のことを導き出せる。オなわち、相
対速度の構成に占める被研磨物の回転の割合は低い方が
よい。この時、他の要素のうち、工具の走査は、リップ
ルの除去を連続して被加工物上の広い部分にわたり行な
うための要素なので、相対速度の構成において工具の走
査が高い割合を占めることはない。また、工具の揺動に
は通常図1に示されるようにクランク機構を用いるが、
クランク部から振動が発生しやすく、また、揺動する部
分の重量の制約、クランク機構の負荷、から揺動の単位
時間内の回数はあまり大きくできない。モして揺動のス
トロークも、クランク機構の大きさ、負荷からあまり長
くできない。従フて、相対速度の構成において工具の揺
動が極端に高い割合を占めることは、相対速度の絶対値
がある程度大きくなると困難となる。工具の回転はその
自由度は大きく、相対速度の大きな割合を占めることは
可能であり、検討3.のようにある程度大きな相対速度
の中でも87%を占めることができる。
The following can be derived from this study. In other words, the ratio of rotation of the object to be polished in the composition of the relative speed is preferably low. At this time, among other factors, tool scanning is an element for continuously removing ripples over a wide area on the workpiece, so tool scanning does not account for a high proportion of the relative speed configuration. do not have. Additionally, a crank mechanism is usually used to swing the tool, as shown in Figure 1.
Vibrations are likely to occur from the crank portion, and the number of times the crankshaft can be oscillated per unit time cannot be increased due to restrictions on the weight of the oscillating parts and the load on the crank mechanism. The swing stroke cannot be too long due to the size and load of the crank mechanism. Therefore, it becomes difficult for the swing of the tool to occupy an extremely high proportion in the configuration of the relative speed when the absolute value of the relative speed becomes large to a certain extent. The rotation of the tool has a large degree of freedom and can account for a large proportion of the relative speed. It can account for 87% even at relatively high relative speeds such as .

m形吠辺鳳I 検討3.の条件で工具A、BそしてCのリップル除去能
力の差を検討した。この時、あたり血tl′1位面積に
かかる荷重はそれぞれ等しくなるようにした。その結果
、工具B、Cのリップル除去能力が良好であり、工具A
の能力は低いものであった。
M-type Hobeho I Study 3. The difference in ripple removal ability of tools A, B, and C was examined under the following conditions. At this time, the loads applied to the blood tl' 1 area were made equal to each other. As a result, the ripple removal ability of tools B and C was good, and tool A
ability was low.

また、工具BとCでは工具Cの方が良好であった。工具
AとB、Cとの差は工具の被加工物上における運動時の
安定性の差と考えることができる。すなわち、安定性の
悪い工具では、研磨加工中の、とくに揺動時に、リップ
ルの谷の部分にも工具があたってしまい、ソップル山部
を選択的に除去しようという意図に反した状態の研磨に
なると考えられる。
Moreover, among tools B and C, tool C was better. The difference between tools A, B, and C can be considered to be a difference in stability during movement of the tools on the workpiece. In other words, if a tool with poor stability is used, the tool will hit the valley of the ripple during polishing, especially during rocking, and the polishing will be in a state contrary to the intention of selectively removing the sopple peak. It is considered to be.

以上のことから、工具は輪帯形状であることと検討3.
の条件、言い換えるなら、リップルの法線方向の相対速
度を主とし、リップルの接線方向の相対速度成分をなる
べく減じたものとすることをともに満たすことが、リッ
プルを除去するのに必要なことがわかった。また、工具
の接触面の外径はリップルの少なくとも2倍以上あるこ
とが好ましい。
From the above, it is assumed that the tool has a ring shape.3.
In other words, what is necessary to remove ripples is to satisfy both of the following conditions: the relative velocity in the normal direction of the ripple should be the main one, and the relative velocity component in the tangential direction of the ripple should be reduced as much as possible. Understood. Further, it is preferable that the outer diameter of the contact surface of the tool is at least twice the ripple.

なお、研磨装置は、研磨工具を所定の方向に揺動させな
がら別の方向に走査運動させるとともに、走査方向を位
置検出手段により検出し、制御装置により位置検出手段
からの信号を受けて研磨工具の走査範囲を制御する。所
定値以下におさえると一層研磨効率が向上する。
Note that the polishing device swings the polishing tool in a predetermined direction while making a scanning motion in another direction, detects the scanning direction by a position detection means, and receives a signal from the position detection means by a control device to control the polishing tool. control the scanning range. If it is kept below a predetermined value, the polishing efficiency will be further improved.

〔実16例) 次に、本発明の実施例について図面を参照して説明する
[16 Examples] Next, examples of the present invention will be described with reference to the drawings.

第1図(a)は本発明の研磨装置の一実施例の縦断面図
、第1図(b)は第1図(a)のI−I矢視図である。
FIG. 1(a) is a longitudinal sectional view of one embodiment of the polishing apparatus of the present invention, and FIG. 1(b) is a view taken along the line II in FIG. 1(a).

また、第2図(a)は研磨工具の斜視図、第2図(6)
は研磨工具取付状態の断面図である。
In addition, Fig. 2(a) is a perspective view of the polishing tool, Fig. 2(6)
is a cross-sectional view of the polishing tool installed.

被研磨物12は円板状の光学ガラス平面で、その下面は
ワーク支持体14に接着固定されている。ワーク支持体
14は機枠】0に軸承されたワーク回転軸25は機枠l
Oに固定された駆動モータ26から歯車体27を介して
回転を与えられるよう連結されている。
The object to be polished 12 is a disc-shaped optical glass plane, and its lower surface is adhesively fixed to a workpiece support 14 . The workpiece support 14 is the machine frame; the workpiece rotating shaft 25 supported on the machine frame 0 is the machine frame l.
It is connected to be rotated via a gear body 27 from a drive motor 26 which is fixed to O.

研磨工具28は、アーム31の頭部31aに軸承され、
頭部31.aに固定されたモータ30に連結された工具
回転軸29と連結されている。アーム31は送りコラム
:)2にピン33および金具33aを介してピン33を
中心に回動自在に連結され、垂直方向のビン42により
金具33aに揺動可能に取付けられている。アーム31
の頭部31aには、別に揺動アーム41の一端が取付け
られ、揺動アーム41の他端は送りコラム32の上部に
設けられたクランク機構40の外周部にビン40aによ
って取付けられ、クランク機構40の軸の下側に直結さ
れた不図示のモータにより駆動される。送りコラム32
は、機枠lOに固定されたスライド案内36に滑合して
おり、機枠IOに固定された送りモータ34と、このモ
ータ34に連結され機枠lOに軸承された送りねじ35
、および送りねじ35がねし込まわる送りコラム32に
固定された不図示のナツトにより第1図(b)の矢印A
方向に送られる。光学的または磁気的なりニヤスケール
、もしくはインダクトシン等の送り位置検出ユニット3
7は、スライド案内36と送りコラム32に固定されて
いる。被研磨物12の上部空間には研磨液供給ノズル2
2が設けられており、被研磨物12およびワーク支持体
14の外周には、供給された研磨液の飛散を防止して集
めるための筐体38が機枠IOに固定されている。制御
装置39はモータ26,30.送りモータ34、不図示
の揺動用モータ位置検出ユニット37より信号を入力し
、研磨工具28に揺動運動と走査運動と回動運動を与え
、かつ、研磨工具28の走査範囲を制御する。
The polishing tool 28 is rotatably supported on the head 31a of the arm 31,
Head 31. It is connected to a tool rotating shaft 29 that is connected to a motor 30 fixed to a. The arm 31 is rotatably connected to the feed column 2 via a pin 33 and a metal fitting 33a, and is swingably attached to the metal fitting 33a by a vertical pin 42. Arm 31
One end of a swinging arm 41 is separately attached to the head 31a, and the other end of the swinging arm 41 is attached to the outer periphery of a crank mechanism 40 provided at the top of the feed column 32 with a pin 40a. It is driven by a motor (not shown) directly connected to the lower side of the shaft of 40. Feed column 32
is slidably fitted to a slide guide 36 fixed to the machine frame IO, and includes a feed motor 34 fixed to the machine frame IO, and a feed screw 35 connected to this motor 34 and supported on the machine frame IO.
, and a nut (not shown) fixed to the feed column 32 into which the feed screw 35 is screwed into the arrow A in FIG. 1(b).
sent in the direction. Feed position detection unit 3 such as optical or magnetic linear scale or inductosin
7 is fixed to the slide guide 36 and the feed column 32. A polishing liquid supply nozzle 2 is provided in the space above the object to be polished 12.
2, and a housing 38 is fixed to the machine frame IO around the outer periphery of the object to be polished 12 and the work support 14 to prevent and collect the supplied polishing liquid from scattering. The control device 39 controls the motors 26, 30 . Signals are input from the feed motor 34 and a swinging motor position detection unit 37 (not shown) to give the polishing tool 28 a swinging motion, a scanning motion, and a rotational motion, and to control the scanning range of the polishing tool 28.

研磨工具は第2図(a)に示したように、円筒状の本体
の2箇所に、工具回転軸29の柚と直角方向に挿入され
たドライブピン29aによって駆動される切欠28aを
備え、下端には輪体状の研磨工具28bが固着されてい
る。本実施例では研磨工具28の材質としてピッチを用
いているが、発泡ポリウレタン材であってもよい。
As shown in FIG. 2(a), the polishing tool has two notches 28a in its cylindrical body that are driven by drive pins 29a inserted perpendicularly to the axis of rotation of the tool 29, and a lower end. A ring-shaped polishing tool 28b is fixed to. In this embodiment, pitch is used as the material for the polishing tool 28, but it may also be made of foamed polyurethane material.

次に、本実施例の装置の動作について説明する。先ず、
被研磨物12がワーク支持体14上に接着固定され、回
転軸25に嵌着される。次に、工具回転軸29が被研磨
物12と垂直になるようにアーム31がセットされ、工
具回転軸29の先端に研磨工具28が取付けられる。次
に、研磨液供給ノズル22から研磨液が供給される。つ
づいて制御装置39によりモータ26,30.34およ
び不図示の揺動モータに回転が与えられる。モータ26
はワーク支持体14および被研磨物12を回転させ、モ
ータ30は研磨工具28を回転させ、モータ34は送り
コラム32に走査運動を与え、研磨工具28は、揺動モ
ータに回転されたクランク機構40と揺動アーチ41に
より揺動する。位置検出手段37は、被研磨物12に対
する研磨工具28の走査方向の位置を検出して信号を制
御装置39に送り、制御装置37は送られた信号により
研磨工具28の走査範囲を制御する。
Next, the operation of the apparatus of this embodiment will be explained. First of all,
The object to be polished 12 is adhesively fixed onto the work support 14 and fitted onto the rotating shaft 25 . Next, the arm 31 is set so that the tool rotation shaft 29 is perpendicular to the object to be polished 12, and the polishing tool 28 is attached to the tip of the tool rotation shaft 29. Next, polishing liquid is supplied from the polishing liquid supply nozzle 22 . Subsequently, the control device 39 applies rotation to the motors 26, 30, 34 and a swing motor (not shown). motor 26
rotates the workpiece support 14 and the object to be polished 12, the motor 30 rotates the polishing tool 28, the motor 34 provides a scanning motion to the feed column 32, and the polishing tool 28 is driven by a crank mechanism rotated by an oscillating motor. 40 and a swinging arch 41. The position detection means 37 detects the position of the polishing tool 28 in the scanning direction with respect to the object to be polished 12 and sends a signal to the control device 39, and the control device 37 controls the scanning range of the polishing tool 28 based on the sent signal.

第3図(a) 、 (b)は、本発明の研磨装置により
修正しようとする被研磨物I2の修正前の断面形状と修
正語の形状を示した図で、修正前の被研磨物12の表面
にはピッチp、深さhのリップルがある。
FIGS. 3(a) and 3(b) are diagrams showing the cross-sectional shape and the shape of the correction words of the object I2 to be polished before correction, which is to be corrected by the polishing apparatus of the present invention. There are ripples with pitch p and depth h on the surface.

第4図は、被研磨物12に対する研磨工具28の相体運
動の方向を示したもので、被研磨物12がarpm、研
磨工具28がbrpmだけそれぞれ回転する。
FIG. 4 shows the direction of the relative movement of the polishing tool 28 with respect to the object 12, in which the object 12 rotates by ARPM, and the polishing tool 28 rotates by BRPM.

研磨工具28にはC方向に所定の大きさの揺動運動が与
えられ、さらに研磨工具28は位置dからeの長さの走
査運動が与えられる。ここに、加工条件の1例を面述の
検討に準じてあげる。被研磨物12を外径170mm 
、極子半径490mmの石英ガラス製の凸レンズとする
。研磨工具28をピッチ材で成形された外径20mm、
内径17 、5mmの切れ目のない輪帯とし、被加工材
の回転数をa=2rpm、研磨工具の回転数をb = 
200rpm、揺動を100サイクル/minでストロ
ークc = 1001111、走査位置d = 401
11[11,e =70mm、走査速度=  1mm/
minとし、研磨液を6重量パーセントの酸化セリウム
とした。この加工条件の下でピッチp=5〜7mm、凸
凹の差h=0.1−のリップルを有する材料を2回研磨
したところリップルの深さはh =0.06−に減り、
さらにもう3回研磨して計5回の研磨を行なったところ
h=0.03pとなってほぼ満足する結果が得られた。
The polishing tool 28 is given a swinging motion of a predetermined magnitude in the direction C, and furthermore, the polishing tool 28 is given a scanning motion of a length from position d to e. Here, an example of machining conditions will be given based on the surface discussion. The object to be polished 12 has an outer diameter of 170 mm.
, a convex lens made of quartz glass with a pole radius of 490 mm. The polishing tool 28 is made of pitch material and has an outer diameter of 20 mm.
An unbroken ring zone with an inner diameter of 17 mm and 5 mm, the rotation speed of the workpiece is a = 2 rpm, and the rotation speed of the polishing tool is b =
200 rpm, oscillation at 100 cycles/min, stroke c = 1001111, scanning position d = 401
11[11,e = 70mm, scanning speed = 1mm/
min, and the polishing liquid was 6 weight percent cerium oxide. Under these processing conditions, when a material with ripples with pitch p = 5 to 7 mm and unevenness difference h = 0.1- was polished twice, the ripple depth was reduced to h = 0.06-.
When polishing was performed three more times for a total of five times, h=0.03p, which was an almost satisfactory result.

これを、従来の方法と比較した場合を第2表に示す。Table 2 shows a comparison with the conventional method.

なお、研磨工具の輪帯に所定の間隔でスリットを設けて
もよい。
Note that slits may be provided at predetermined intervals in the annular zone of the polishing tool.

(発明の効果ン 以上説明したように本発明は、接触面が輪帯形状をもつ
研磨工具を被研磨物上で所定の方向に揺動運動させなが
ら、別に定めた方向に走査運動させ、これら研磨工具と
被研磨物の相対速度の速度成分を所定値以下におさえる
という研磨方法とこの方法を用いた研磨工具に揺動運動
と走査運動を与え、位置検出手段によ)て研磨工具の走
査範囲を制御できる制御装置を備えた研磨装置により、
レンズ等の光学素子の表面のリップルを高能率で除去で
きるという効果がある。
(Effects of the Invention) As explained above, the present invention involves making a polishing tool whose contact surface has an annular shape swing motion in a predetermined direction on the workpiece to be polished and scanning motion in a separately determined direction. A polishing method in which the velocity component of the relative speed of the polishing tool and the object to be polished is suppressed to a predetermined value or less, and a polishing method using this method, which gives swinging motion and scanning motion to the polishing tool, and scans the polishing tool by using a position detection means. Polishing equipment equipped with a control device that can control the range,
This has the effect that ripples on the surface of optical elements such as lenses can be removed with high efficiency.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)は本発明の研磨装置の一実施例の縦断面図
、第1図(b)は第1図(a)のI−I矢視図、第2図
(a)は研磨工具の斜視図、第2図(b)は研磨工具の
取付状態の断面図、第3図(a) 、 (b)はそれぞ
れ被研磨物の修正前と修正後の形状を示した断面図、第
4図は被研磨物に対する研磨工具の相対運動を示した上
面図、第5図は従来の研磨方法の1例を示した斜視図で
ある。 10・・・・・・・・・機枠、    12−・・・・
・・−被研磨物、14・・・・・・・・・ワーク支持体
、22−・・・・・・・・研磨液供給ノズル、26.3
0.34・・・・・・・・・モータ、27・・・・・・
・・・歯車体、28−・・・・・・・・研磨工具、  
29−・・・・・・・・工具回転軸、31−−−−−−
−−−アーム、    32・・・・・・・・・送りコ
ラム、33.42−・・ビン、     35・・・・
・・・・・送りねじ、36−−−−−−−−−スライド
案内、37・・・・・・・・・位置検出ユニット、38
−・・・・・・・・筐体、    39−・・・・・・
・・制御装置、40・・・・・・・・・クランク機構、
41−−−−−−−・・揺動アーム。
FIG. 1(a) is a longitudinal cross-sectional view of one embodiment of the polishing apparatus of the present invention, FIG. 1(b) is a view taken along the line II in FIG. 1(a), and FIG. 2(a) is a polishing device. A perspective view of the tool, FIG. 2(b) is a cross-sectional view of the polishing tool in its installed state, and FIGS. 3(a) and (b) are cross-sectional views showing the shape of the object to be polished before and after modification, respectively. FIG. 4 is a top view showing the relative movement of the polishing tool with respect to the object to be polished, and FIG. 5 is a perspective view showing an example of a conventional polishing method. 10......Machine frame, 12-...
...-Object to be polished, 14... Work support, 22-... Polishing liquid supply nozzle, 26.3
0.34...Motor, 27...
...Gear body, 28-... Polishing tool,
29--... Tool rotation axis, 31--
---Arm, 32...Feed column, 33.42--Bin, 35...
...Feed screw, 36-----Slide guide, 37...Position detection unit, 38
-... Housing, 39-...
...Control device, 40...Crank mechanism,
41---------... Swinging arm.

Claims (1)

【特許請求の範囲】 1、被研磨物との有効接触面が輪帯状に形成された回転
可能な研磨工具を回転可能な被研磨物に対向圧接して被
研磨物を研磨する研磨方法において、 前記研磨工具を前記被研磨物上で所定の方向に揺動運動
させながら、別に定めた方向に走査運動させることを特
徴とする研磨方法。 2、前記被研磨物と研磨工具とが相互になす運動によっ
て生じる相対速度の構成における被研磨物の回転によっ
て生じる速度成分が所定値を超えない特許請求の範囲第
1項記載の研磨方法。 3、被研磨物との有効接触面が輪体状に形成された研磨
工具と、該研磨工具を回転させる駆動手段と、前記被研
磨物を回転させる駆動手段と、前記研磨工具を所定の方
向に揺動させる駆動手段を有する研磨装置において、 前記研磨工具を所定の方向に揺動させながら別に定めた
方向に走査させる送り手段と、該走査方向に対する位置
検出手段を有し、該位置検出手段の信号により前記研磨
工具の走査範囲を制御できる制御装置を備えたことを特
徴とする研磨装置。
[Scope of Claims] 1. A polishing method in which a rotatable polishing tool whose effective contact surface with the polished object is formed in an annular shape is pressed against the rotatable polished object to polish the polished object, A polishing method characterized in that the polishing tool is moved in a scanning motion in a separately determined direction while swinging the polishing tool in a predetermined direction on the object to be polished. 2. The polishing method according to claim 1, wherein a velocity component generated by rotation of the object to be polished in a configuration of relative velocity caused by mutual movement between the object to be polished and the polishing tool does not exceed a predetermined value. 3. A polishing tool whose effective contact surface with the object to be polished is formed in a ring shape, a drive means for rotating the polishing tool, a drive means for rotating the object to be polished, and a drive means for rotating the polishing tool in a predetermined direction. A polishing apparatus having a drive means for swinging the polishing tool in a predetermined direction, and a feeding means for scanning in a separately determined direction while swinging the polishing tool in a predetermined direction, and a position detection means with respect to the scanning direction, the position detection means A polishing apparatus comprising a control device that can control the scanning range of the polishing tool based on a signal.
JP6259287A 1987-03-19 1987-03-19 Polishing method and device therefor Granted JPS63232932A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP6259287A JPS63232932A (en) 1987-03-19 1987-03-19 Polishing method and device therefor
US07/401,477 US4956944A (en) 1987-03-19 1989-08-29 Polishing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6259287A JPS63232932A (en) 1987-03-19 1987-03-19 Polishing method and device therefor

Publications (2)

Publication Number Publication Date
JPS63232932A true JPS63232932A (en) 1988-09-28
JPH05171B2 JPH05171B2 (en) 1993-01-05

Family

ID=13204748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6259287A Granted JPS63232932A (en) 1987-03-19 1987-03-19 Polishing method and device therefor

Country Status (1)

Country Link
JP (1) JPS63232932A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0788759A (en) * 1993-09-20 1995-04-04 Nec Corp Wafer polishing device
EP0865874A2 (en) * 1997-03-21 1998-09-23 Canon Kabushiki Kaisha Polishing apparatus and method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101866438B1 (en) * 2012-06-29 2018-06-11 동우 화인켐 주식회사 Adhesive composition

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS618269A (en) * 1984-06-22 1986-01-14 Canon Inc Curved-face polishing machine
JPS6133665A (en) * 1984-07-27 1986-02-17 新技術開発事業団 Collapse elimination apparatus in artificial lung apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS618269A (en) * 1984-06-22 1986-01-14 Canon Inc Curved-face polishing machine
JPS6133665A (en) * 1984-07-27 1986-02-17 新技術開発事業団 Collapse elimination apparatus in artificial lung apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0788759A (en) * 1993-09-20 1995-04-04 Nec Corp Wafer polishing device
EP0865874A2 (en) * 1997-03-21 1998-09-23 Canon Kabushiki Kaisha Polishing apparatus and method
EP0865874A3 (en) * 1997-03-21 2000-05-17 Canon Kabushiki Kaisha Polishing apparatus and method
US6299506B2 (en) 1997-03-21 2001-10-09 Canon Kabushiki Kaisha Polishing apparatus including holder and polishing head with rotational axis of polishing head offset from rotational axis of holder and method of using

Also Published As

Publication number Publication date
JPH05171B2 (en) 1993-01-05

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