JPS6322173B2 - - Google Patents

Info

Publication number
JPS6322173B2
JPS6322173B2 JP59047651A JP4765184A JPS6322173B2 JP S6322173 B2 JPS6322173 B2 JP S6322173B2 JP 59047651 A JP59047651 A JP 59047651A JP 4765184 A JP4765184 A JP 4765184A JP S6322173 B2 JPS6322173 B2 JP S6322173B2
Authority
JP
Japan
Prior art keywords
pump
gas
exhaust gas
reduced pressure
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59047651A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59197141A (ja
Inventor
Akira Kojima
Hisayoshi Yamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP59047651A priority Critical patent/JPS59197141A/ja
Publication of JPS59197141A publication Critical patent/JPS59197141A/ja
Publication of JPS6322173B2 publication Critical patent/JPS6322173B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP59047651A 1984-03-13 1984-03-13 減圧反応装置に於ける排気処理方法 Granted JPS59197141A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59047651A JPS59197141A (ja) 1984-03-13 1984-03-13 減圧反応装置に於ける排気処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59047651A JPS59197141A (ja) 1984-03-13 1984-03-13 減圧反応装置に於ける排気処理方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP10732878A Division JPS5534158A (en) 1978-09-01 1978-09-01 Vacuum reaction apparatus

Publications (2)

Publication Number Publication Date
JPS59197141A JPS59197141A (ja) 1984-11-08
JPS6322173B2 true JPS6322173B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-05-11

Family

ID=12781155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59047651A Granted JPS59197141A (ja) 1984-03-13 1984-03-13 減圧反応装置に於ける排気処理方法

Country Status (1)

Country Link
JP (1) JPS59197141A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04138376U (ja) * 1991-06-19 1992-12-25 憲治 平 傘置き用ブロツク

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2581955B2 (ja) * 1988-07-11 1997-02-19 富士写真フイルム株式会社 半導体デバイスの熱処理装置
FR2727692A1 (fr) * 1994-12-05 1996-06-07 Europ Propulsion Dispositif d'extraction de gaz pour four d'infiltration ou depot chimique en phase vapeur dans une installation de fabrication de pieces en materiau composite

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534158A (en) * 1978-09-01 1980-03-10 Sony Corp Vacuum reaction apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04138376U (ja) * 1991-06-19 1992-12-25 憲治 平 傘置き用ブロツク

Also Published As

Publication number Publication date
JPS59197141A (ja) 1984-11-08

Similar Documents

Publication Publication Date Title
US5584963A (en) Semiconductor device manufacturing apparatus and cleaning method for the apparatus
US4303467A (en) Process and gas for treatment of semiconductor devices
US7208428B2 (en) Method and apparatus for treating article to be treated
US5336356A (en) Apparatus for treating the surface of a semiconductor substrate
EP0601532A2 (en) HF vapour selective etching method and apparatus
KR101321265B1 (ko) 가스 스트림 처리 방법
JPH05154334A (ja) 半導体製造装置の排気ポンプシステム
JPS6235807B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
US5714011A (en) Diluted nitrogen trifluoride thermal cleaning process
JPS6322173B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
US6869579B2 (en) Process for treating exhaust gas
JPH03183693A (ja) 気相成長装置のクリーニング方法及び装置
JP2009088308A (ja) 基板処理装置
JPS5839373B2 (ja) 半導体製造装置の排気処理法
JPH0559987B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
US20240347324A1 (en) Method for organic effluent abatement
JPH0715131Y2 (ja) 有機金属気相成長装置
JPS5950165A (ja) 減圧反応装置
KR960012621B1 (ko) 웨이퍼 표면 산화막 제거방법
JPS63293913A (ja) 半導体製造装置
JPH01258718A (ja) 反応粉塵および粘性物質の除去方法とその装置
JPH01312833A (ja) 気相成長装置
JP2518283Y2 (ja) 排気ガス処理装置
JPS60227415A (ja) 気相成長装置
WO2024074922A1 (en) Exhaust gas abatement system and method thereof