JPS6321736A - Manufacture of charged particle beam deflector plate - Google Patents

Abstract

PURPOSE:To enable deflection electrodes to be disposed with high acuuracy so as to deflect charged particle beam with high accuracy by using a reference surface and the auxiliary reference surface of a block which regulates the distance from the reference surface. CONSTITUTION:Each supporter 13 is made to contact with a reference surface 1a and is positioned on its end face on the side where it holds a deflection electrode 14 on low voltage side, and each deflection electrode 14 is made to contact with the auxiliary reference surface 2a of a 1st block 2 and is positioned. At the same time each deflection electrode 15 is made to contact with auxiliary reference surfaces 2b and 2c of the 1st block 2 and is positioned, then end face on high voltage side of each deflection electrode 15 is held by a 2nd block 3 to be positioned. After positioning, the deflection electrode 15 is bonded to a spacer 17 with frit or like which is interposed in advance. By this constitution, deflection electrodes 14-16 can be disposed with errors within the tolerance.

Description

[Detailed description of the invention] Industrial application field The present invention utilizes the electric charge of an electron beam or an ion beam,
The present invention relates to a method for manufacturing a deflection plate used in a device that refracts these trajectories by applying an electric field perpendicular to the traveling direction and draws figures or displays television images using the charged particle beam.

BACKGROUND OF THE INVENTION The present applicant previously proposed this type of charged particle beam deflection plate in Japanese Patent Application No. 198801/1983. Hereinafter, the above conventional example will be explained with reference to the drawings.

As an example, as shown in Fig. 3, a pair of deflection plates 1)
, 12 are provided with a low voltage side deflection electrode 4 and a high voltage side deflection electrode 16 by vapor deposition or metallization on a support 13 made of an insulating material, respectively.
The deflection electrode 15 is attached to the spacer 17 attached to the support 13 between the spacers 6 and 6.

It is glued by glue etc.

As another example, as shown in FIG. 4, a pair of deflection plates 1)
, 12 are each provided with a high-voltage side deflection electrode 20 on a support 13 made of an insulating material by vapor deposition or metallization, and a deflection electrode 18 is attached to spacers 21 and 22 attached to the support 13 behind the deflection electrode 20. , 19 are adhered by frit or the like.

Next, the operation of the above conventional example will be explained. Each pair of deflection electrodes 1-1, 15.16+ or 18 divided into three
Different DC accelerating voltages are applied to each pair of deflection electrodes 14, 15, 16, or 18.
, 19 and 20, a common sawtooth deflection scanning voltage is applied. The charged particle beam 23 that has entered between the deflection plates 1) and 12 is accelerated and receives a deflection force, resulting in efficient deflection. At this time, deflection plate 1),
12 also functions as an electron lens since there is a DC voltage step between them as described above.

Problems to be Solved by the Invention In order to accurately deflect the charged particle beam 23, each deflection electrode 14, 15, 16, 18, 19, 20
It is necessary that the deflection electrodes 15 , 18 , 19 are processed with high precision, and in particular, the deviation of the axis of the deflection electrodes 15 , 18 , 19 from the central axis of the charged particle beam 23 on the male reference side and the deflection electrodes 15 , 18 .
It is known that the distance from the end face on the low voltage side of 19° has a large effect. Although the degree of quantitative influence varies depending on the dimensions of the deflection electrodes, voltage conditions, etc., according to an example, the amount of axis deviation of the deflection electrodes 15, 18, and 19 is about 4 times the amount, and the error in beam landing is The amount of positional deviation of the deflection electrodes 15, 18, and 19 in the beam traveling direction results in a beam landing error of approximately 5.5 times.
This is a large value compared to other dimensional errors.

However, in the conventional example described above, each of the deflecting plates 1) and 12 is processed as a single unit, and therefore the support body 13 serves as a reference for the dimensions. Therefore, the dimensional accuracy such as the roughness or flatness of the support 13 remains unchanged between the deflection electrodes 15 and 18.
, 19, especially the deflection electrodes 15, 18.
, 19 with frits or the like, errors occur due to variations in the jig, and depending on the combination, quite large errors occur.

Also, how to determine the positioning dimensions when bonding the deflection electrodes 15, 18, 19 with frits etc.
Since the dimensional error of the deflection electrodes 15, 18, 19 differs depending on whether the high-voltage side or the low-voltage side of the deflection electrodes 18, 19 is used as a reference, the influence on the landing error of the charged particle beam 23 is It will be done differently.

Therefore, the present invention solves the problems of the conventional example, and provides a charged particle beam deflection plate that can be provided with a deflection electrode with high precision and can deflect a charged particle beam with high precision. The aim is to provide a manufacturing method.

Means for solving the problem and the technical means of the present invention for solving the above problems are as follows: A pair of insulating materials are formed by a reference plane and an auxiliary reference plane of a block that defines the dimensions from this reference plane. A support body and a deflection electrode bonded to the support body via a spacer are positioned, and the deflection electrode is bonded to the spacer.

Operation The present invention can provide a deflection electrode with high precision and deflect a charged particle beam with high precision by the above-mentioned technical means.

EXAMPLES Hereinafter, examples of the present invention will be described with reference to the drawings.

First, a first embodiment of the present invention will be described.

FIG. 1 is a perspective view showing a first embodiment, and this embodiment is a method of manufacturing the deflection plates 1) and 12 shown in FIG.

As explained in FIG. 3, the deflection electrode 14 on the low voltage side and the deflection electrode 1 on the high voltage side are attached to each support 13 made of an insulating material such as glass.
6 is provided by vapor deposition or metallization, and a spacer 17 is attached between these deflection electrodes 14 and 16. To attach the deflection electrode 15 to this spacer 17, the reference plate 1
, a first block 2 (indicated by diagonal lines in FIG. 1) and a pair of second blocks 3 are used. The reference plate 1 has a reference surface 1a.
is formed, and a first block 2 is arranged at the center of this reference plane 1a. A first auxiliary reference surface 2a, which serves as a reference for the distance between the deflection electrodes 14, is formed in the first block 2 in a direction perpendicular to the reference surface 1a. A second auxiliary reference surface 2b is formed which is parallel to 1a and serves as a reference for the distance between the low voltage side end surface of the deflection electrode 15 and the reference surface 1a, and this second auxiliary reference surface 2b
Subsequently, a third auxiliary reference surface 2C, which serves as a reference for the distance between the deflection electrodes 15, is formed in a direction perpendicular to the reference surface 1a.

These first to third auxiliary reference surfaces 2a to 2C are the reference surface 1a.
It is machined in advance with high precision so that the dimensions are specified.

Then, the end face of each support 13 on the side provided with the deflection electrode 14 on the low voltage side is positioned in contact with the reference surface 1a, and each deflection electrode 14 is positioned on the first auxiliary reference surface 2a of the first block 2. Position it by touching it. At the same time, each deflection electrode 15 is positioned so as to come into contact with the second and third auxiliary base cutting surfaces 2b and 2C of the first protrusion 2. Subsequently, the high voltage side end face of each deflection electrode 15 is held down by the second block 3 to position it. After positioning, the deflection electrode 15 is bonded to the spacer 17 using a frit or the like that is interposed in advance.

This allows each deflection electrode 14, 15, 16 to be provided within tolerance.

Next, a second embodiment of the present invention will be described.

FIG. 2 is a perspective view showing a second embodiment, and this embodiment is a method of manufacturing the deflection plates 1) and 12 shown in FIG. 4.

This embodiment is different from the first embodiment described above in the shape of the first block, that is, in the arrangement of the auxiliary reference plane. Second
As shown in the figure, a first auxiliary reference surface 4a, which serves as a reference for the distance between the deflection electrodes 18, is formed in the first block 4 (indicated by diagonal lines) in a direction perpendicular to the reference surface 1a. A second auxiliary reference surface 4b, which serves as a reference for the distance between the deflection electrodes 19 in the perpendicular direction, is formed on the wide part of the high voltage side of the auxiliary reference surface 4a. The auxiliary reference surfaces 4a and 4b are processed in advance with high precision so that the dimensions from the reference surface 1a are defined.

Then, as in the first embodiment, the low voltage side end face of each support body 13 on which the deflection electrode 20 is formed is brought into contact with the reference surface 1a for positioning, and the deflection electrode 18 is positioned between the reference surface 18 and the first
The deflection electrode 19 is positioned by contacting the first auxiliary reference surface 4a of the block 4, and the deflection electrode 19 is positioned by contacting the second auxiliary reference surface 4b. Further, the high voltage side end face of the deflection electrode 19 is positioned by the second block 3. After positioning, the deflection electrodes 18 and 19 are bonded to the spacers 21 and 22 using frits or the like that are interposed in advance. This allows each deflection electrode 18, 19, 20 to be provided within tolerance.

According to each of the above embodiments, the deflection electrodes 15, 18, 19
The amount of axis deviation and positional deviation can be kept small,
Moreover, - set of deflection plates 1). By assembling 12 at the same time, variations in combination are eliminated, so a high-performance split type deflection plate can be manufactured.

In each of the above embodiments, a three-divided deflection plate has been described, but the present invention can be applied without being restricted by the number of divisions.

Effects of the Invention As described above, according to the present invention, the reference plane and the auxiliary reference plane of the block that defines the dimensions from this reference plane are used to bond a pair of insulating material supports and this support via a spacer. Since the deflection electrode is positioned and bonded to the spacer, the deflection electrode can be provided with high precision, and the charged particle beam can be deflected with high precision.

[Brief explanation of drawings]

FIG. 1 is a perspective view showing a method for manufacturing a charged particle beam deflection plate in a first embodiment of the present invention, FIG. 2 is a perspective view showing a method for manufacturing a charged particle beam deflection plate in a second embodiment of the present invention, FIGS. 3 and 4 are perspective views showing conventional charged particle deflection plates, respectively. DESCRIPTION OF SYMBOLS 1... Reference plate, 1a... Reference surface, 2... First block, 2a... First auxiliary reference surface, 2b... Second
Auxiliary reference plane, 2C...Third auxiliary reference plane, 3...
Second block, 4...First block, 4a...
First auxiliary reference surface, 4b Second auxiliary reference surface, 1)
, 12... Deflection plate, 13... Support body, 14, 15
, 16... Deflection electrode, 17... Spacer, 18
, 19, 20... Deflection electrode, 21, 22... Spacer. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure 2

Claims (2)

[Claims] (1) Position a pair of supports made of insulating material and a deflection electrode bonded to this support via a spacer using the reference plane and the auxiliary reference plane of the block that defines the dimensions from this reference plane. A method for manufacturing a charged particle beam deflection plate characterized by adhering it to a spacer. (2) A method for manufacturing a charged particle beam deflection plate according to claim 1, wherein the reference plane is provided on the low voltage side of the deflection plate.