JPS632136B2 - - Google Patents

Info

Publication number
JPS632136B2
JPS632136B2 JP14554082A JP14554082A JPS632136B2 JP S632136 B2 JPS632136 B2 JP S632136B2 JP 14554082 A JP14554082 A JP 14554082A JP 14554082 A JP14554082 A JP 14554082A JP S632136 B2 JPS632136 B2 JP S632136B2
Authority
JP
Japan
Prior art keywords
photomask
pattern
reticle
patterns
reticle pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14554082A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58168228A (ja
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57145540A priority Critical patent/JPS58168228A/ja
Publication of JPS58168228A publication Critical patent/JPS58168228A/ja
Publication of JPS632136B2 publication Critical patent/JPS632136B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP57145540A 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置 Granted JPS58168228A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57145540A JPS58168228A (ja) 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57145540A JPS58168228A (ja) 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置

Publications (2)

Publication Number Publication Date
JPS58168228A JPS58168228A (ja) 1983-10-04
JPS632136B2 true JPS632136B2 (US20100223739A1-20100909-C00025.png) 1988-01-18

Family

ID=15387546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57145540A Granted JPS58168228A (ja) 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置

Country Status (1)

Country Link
JP (1) JPS58168228A (US20100223739A1-20100909-C00025.png)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (US20100223739A1-20100909-C00025.png) * 1974-03-27 1975-10-07
JPS5354479A (en) * 1976-10-28 1978-05-17 Toshiba Corp Comparative inspecting apparatus of pattern plate
JPS5619622A (en) * 1979-07-26 1981-02-24 Fujitsu Ltd Photomask comparison inspecting mechanism
JPS5639516A (en) * 1979-09-10 1981-04-15 Fujitsu Ltd Comparative inspecting mechanism of photomask

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (US20100223739A1-20100909-C00025.png) * 1974-03-27 1975-10-07
JPS5354479A (en) * 1976-10-28 1978-05-17 Toshiba Corp Comparative inspecting apparatus of pattern plate
JPS5619622A (en) * 1979-07-26 1981-02-24 Fujitsu Ltd Photomask comparison inspecting mechanism
JPS5639516A (en) * 1979-09-10 1981-04-15 Fujitsu Ltd Comparative inspecting mechanism of photomask

Also Published As

Publication number Publication date
JPS58168228A (ja) 1983-10-04

Similar Documents

Publication Publication Date Title
US4595289A (en) Inspection system utilizing dark-field illumination
US4999510A (en) Apparatus for detecting foreign particles on a surface of a reticle or pellicle
US6512578B1 (en) Method and apparatus for surface inspection
US20020001759A1 (en) Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
JP3729156B2 (ja) パターン欠陥検出方法およびその装置
US4365163A (en) Pattern inspection tool - method and apparatus
JPS6138448B2 (US20100223739A1-20100909-C00025.png)
JPS632136B2 (US20100223739A1-20100909-C00025.png)
JPH0769272B2 (ja) 異物検査装置
JPS61260632A (ja) 異物検査装置
JPH10328872A (ja) レーザ加工装置及びレーザ加工方法
JPH06186168A (ja) 欠陥検査方法及び装置
US20240011915A1 (en) Inspection apparatus and inspection method
JPS63103949A (ja) 異物検査装置
GB2060876A (en) Testing photomasks
JPH0982264A (ja) パターン検査装置および走査型電子顕微鏡
JP2671896B2 (ja) 異物検査装置
JPH0712525A (ja) 共焦点走査方式レーザ顕微鏡を用いた厚さ計測装置
JPH01143334A (ja) マスクの欠陥検査方法及び欠陥検査装置
JPH0320649A (ja) フォトマスク検査装置
JPS6236638B2 (US20100223739A1-20100909-C00025.png)
KR960006825B1 (ko) 스텝퍼의 촛점 조절장치
JPS62219631A (ja) 異物検査装置
JPS63298105A (ja) スリット光源装置
JPS5913324A (ja) 縮小投影露光装置