JPS63200359U - - Google Patents

Info

Publication number
JPS63200359U
JPS63200359U JP9077987U JP9077987U JPS63200359U JP S63200359 U JPS63200359 U JP S63200359U JP 9077987 U JP9077987 U JP 9077987U JP 9077987 U JP9077987 U JP 9077987U JP S63200359 U JPS63200359 U JP S63200359U
Authority
JP
Japan
Prior art keywords
layer
grooves
laser element
element portion
heterojunction structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9077987U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9077987U priority Critical patent/JPS63200359U/ja
Publication of JPS63200359U publication Critical patent/JPS63200359U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図Aは、この考案の第一実施例の半導体レ
ーザ装置を概略的に示す断面図、第1図Bは、こ
の考案の第二実施例の半導体レーザ装置を概略的
に示す断面図、第2図A〜Dは、第1図Aに示し
た半導体レーザ装置の製造方法の一例を示す製造
工程図、第3図は、従来技術の説明に供する図で
あつて、LOC型の半導体レーザの構造を概略的
に示す断面図である。 31……化合物半導体下地(N型GaAs基板
)、33……第一溝、35……第二溝、37,3
7a,37b……下側クラツド層(N型Al
1−yAs層)、39……光導波層(N型Al
Ga1−zAs層)、41,41a,41b…
…活性層(AlGa1−xAs層)、43,4
3a,43b……上側クラツド層(P型Al
1−yAs層)、45,45a,45b……電
流阻止層(N型GaAs層)、47a,47b…
…P拡散領域、49a,49b……P側電極、5
1……第一レーザ素子部、53……第二レーザ素
子部、55……N側電極、57……分離溝、61
……内部電流狭窄層(P型GaAs層)、65a
,65b……キヤツプ層(P型GaAs層)、7
1……凹部。
FIG. 1A is a cross-sectional view schematically showing a semiconductor laser device according to a first embodiment of this invention, and FIG. 1B is a cross-sectional view schematically showing a semiconductor laser device according to a second embodiment of this invention. 2A to 2D are manufacturing process diagrams showing an example of a method for manufacturing the semiconductor laser device shown in FIG. 1A, and FIG. FIG. 2 is a cross-sectional view schematically showing the structure of FIG. 31...Compound semiconductor base (N-type GaAs substrate), 33...First groove, 35...Second groove, 37,3
7a, 37b...lower cladding layer (N-type Al y G
a 1-y As layer), 39... optical waveguide layer (N-type Al
z Ga 1-z As layer), 41, 41a, 41b...
...Active layer (Al x Ga 1-x As layer), 43,4
3a, 43b... Upper cladding layer (P-type Al y G
a1-y As layer), 45, 45a, 45b... current blocking layer (N-type GaAs layer), 47a, 47b...
...P diffusion region, 49a, 49b...P side electrode, 5
1... First laser element part, 53... Second laser element part, 55... N side electrode, 57... Separation groove, 61
...Internal current confinement layer (P-type GaAs layer), 65a
, 65b...cap layer (P-type GaAs layer), 7
1... Concavity.

Claims (1)

【実用新案登録請求の範囲】 共通な化合物半導体下地にストライプ状の溝で
あつて互いが並列になるように設けられた第一及
び第二溝と、 前記第一溝上方に設けられ下側クラツド層、光
導波層、活性層及び上側クラツド層のダブルヘテ
ロ接合構造を有するLOC型の第一レーザ素子部
と、 前記第二溝上方に設けられ下側クラツド層、活
性層及び上側クラツド層のダブルヘテロ接合構造
を有する第二レーザ素子部と を具えたことを特徴とする半導体レーザ装置。
[Claims for Utility Model Registration] First and second grooves that are striped grooves provided in parallel to each other on a common compound semiconductor base, and a lower cladding provided above the first grooves. a LOC-type first laser element portion having a double heterojunction structure of a layer, an optical waveguide layer, an active layer, and an upper cladding layer; A semiconductor laser device comprising: a second laser element portion having a heterojunction structure.
JP9077987U 1987-06-15 1987-06-15 Pending JPS63200359U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9077987U JPS63200359U (en) 1987-06-15 1987-06-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9077987U JPS63200359U (en) 1987-06-15 1987-06-15

Publications (1)

Publication Number Publication Date
JPS63200359U true JPS63200359U (en) 1988-12-23

Family

ID=30950957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9077987U Pending JPS63200359U (en) 1987-06-15 1987-06-15

Country Status (1)

Country Link
JP (1) JPS63200359U (en)

Similar Documents

Publication Publication Date Title
JPH08307003A (en) Semiconductor laser device
JPS63200359U (en)
JPH0560676B2 (en)
JPS63269593A (en) Semiconductor laser device and its manufacture
JPH0682886B2 (en) Method of manufacturing semiconductor laser device
JPS6057988A (en) Semiconductor laser
JPS6373691A (en) Semiconductor laser device
JPH0254592A (en) Semiconductor memory
JP2538258B2 (en) Semiconductor laser
JPS61247084A (en) Embedded hetero-structure semiconductor laser
KR960043387A (en) Compound Semiconductor Laser Diode and Manufacturing Method Thereof
JPS60213076A (en) Semiconductor laser
JPH0770779B2 (en) Semiconductor laser manufacturing method
JPH084176B2 (en) Method for manufacturing semiconductor laser device
JPH0578810B2 (en)
JPS6364069U (en)
JP2804533B2 (en) Manufacturing method of semiconductor laser
KR960002991A (en) Compound Semiconductor Laser Diode and Manufacturing Method Thereof
JPH01291482A (en) Manufacture of semiconductor light emitting device
JPH0328840B2 (en)
JPH0243789A (en) Manufacture of buried type semiconductor laser element
JPH0633223B2 (en) Liquid phase epitaxial growth method
JPH07106632A (en) Semiconductor light emitting element array
JPS62156884A (en) Array type semiconductor light emitting device
KR950012931A (en) Laser diode and manufacturing method thereof