JPS6319570U - - Google Patents
Info
- Publication number
- JPS6319570U JPS6319570U JP11092986U JP11092986U JPS6319570U JP S6319570 U JPS6319570 U JP S6319570U JP 11092986 U JP11092986 U JP 11092986U JP 11092986 U JP11092986 U JP 11092986U JP S6319570 U JPS6319570 U JP S6319570U
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- bubbling
- material liquid
- tank
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002994 raw material Substances 0.000 claims description 8
- 230000005587 bubbling Effects 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 7
- 239000012159 carrier gas Substances 0.000 claims 3
- 239000007789 gas Substances 0.000 claims 3
- 238000005229 chemical vapour deposition Methods 0.000 claims 2
- 229920006395 saturated elastomer Polymers 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11092986U JPH0441171Y2 (th) | 1986-07-18 | 1986-07-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11092986U JPH0441171Y2 (th) | 1986-07-18 | 1986-07-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6319570U true JPS6319570U (th) | 1988-02-09 |
| JPH0441171Y2 JPH0441171Y2 (th) | 1992-09-28 |
Family
ID=30990387
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11092986U Expired JPH0441171Y2 (th) | 1986-07-18 | 1986-07-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0441171Y2 (th) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010173660A (ja) * | 2009-01-27 | 2010-08-12 | Air Liquide Japan Ltd | 充填容器内の液体材料の供給装置および該液体材料の供給装置における充填容器内の液面管理方法 |
| JP2015147982A (ja) * | 2014-02-07 | 2015-08-20 | 株式会社サイオクス | ハイドライド気相成長装置、およびこれを用いた基板処理方法 |
| JP2017139317A (ja) * | 2016-02-03 | 2017-08-10 | 株式会社Ｓｃｒｅｅｎホールディングス | 処理液気化装置と基板処理装置 |
-
1986
- 1986-07-18 JP JP11092986U patent/JPH0441171Y2/ja not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010173660A (ja) * | 2009-01-27 | 2010-08-12 | Air Liquide Japan Ltd | 充填容器内の液体材料の供給装置および該液体材料の供給装置における充填容器内の液面管理方法 |
| JP2015147982A (ja) * | 2014-02-07 | 2015-08-20 | 株式会社サイオクス | ハイドライド気相成長装置、およびこれを用いた基板処理方法 |
| JP2017139317A (ja) * | 2016-02-03 | 2017-08-10 | 株式会社Ｓｃｒｅｅｎホールディングス | 処理液気化装置と基板処理装置 |
| US10651056B2 (en) | 2016-02-03 | 2020-05-12 | SCREEN Holdings Co., Ltd. | Treating liquid vaporizing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0441171Y2 (th) | 1992-09-28 |
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